JP2000105311A - Filter for plasma display panel - Google Patents
Filter for plasma display panelInfo
- Publication number
- JP2000105311A JP2000105311A JP10275795A JP27579598A JP2000105311A JP 2000105311 A JP2000105311 A JP 2000105311A JP 10275795 A JP10275795 A JP 10275795A JP 27579598 A JP27579598 A JP 27579598A JP 2000105311 A JP2000105311 A JP 2000105311A
- Authority
- JP
- Japan
- Prior art keywords
- film
- metal oxide
- filter
- layer
- silver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Filters (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、プラズマディスプ
レイパネル（以下、ＰＤＰと称す）の前面に配置し、Ｐ
ＤＰから発生する電磁波と近赤外線を同時にカットする
ＰＤＰ用フィルターおよびこのフィルターを貼り合わせ
てなるＰＤＰ表示装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel (PDP),
The present invention relates to a PDP filter that simultaneously cuts electromagnetic waves and near-infrared rays generated from a DP, and a PDP display device obtained by bonding the filters.
【０００２】[0002]
【従来の技術】ＰＤＰは、希ガス特にネオンを主体とす
るガスがパネル内に封入されている。ＰＤＰにおいて、
陰極から放出された電子が加速されてガス分子と衝突
し、励起したり電離したりして陽極へ進み、そこで生じ
た陽イオンも陰極と衝突して２次電子放出を起こし、放
電が開始される。この際、ネオン原子の遷移過程に伴い
電磁波および近赤外線が放出される。放出される近赤外
線は、波長が８５０〜１２００ｎｍである。一方、家電
製品、カラオケ、音響映像機器等のリモートコントロー
ラの受光感度は７００〜１３００ｎｍであることから、
ＰＤＰから放出された近赤外線がリモートコントローラ
を誤作動させてしまうという問題が生じている。しか
し、近赤外線はＰＤＰの原理上発生するものであり、Ｐ
ＤＰ自体では防止できない。2. Description of the Related Art In a PDP, a rare gas, particularly a gas mainly composed of neon, is sealed in a panel. In PDP,
Electrons emitted from the cathode are accelerated and collide with gas molecules, and are excited or ionized and proceed to the anode, and cations generated there also collide with the cathode to cause secondary electron emission, and discharge is started. You. At this time, electromagnetic waves and near-infrared rays are emitted along with the transition process of neon atoms. The emitted near infrared rays have a wavelength of 850 to 1200 nm. On the other hand, since the light receiving sensitivity of a remote controller of a home appliance, a karaoke machine, an audiovisual device, etc. is 700 to 1300 nm,
There is a problem that near infrared rays emitted from the PDP cause a remote controller to malfunction. However, near-infrared rays are generated due to the principle of PDP.
DP cannot prevent it.
【０００３】そのため、ＰＤＰから発生する電磁波と近
赤外線をカットするフィルターが検討されており、従来
たとえば、低抵抗値の金属メッシュまたはエッチングメ
ッシュを埋め込んだアクリル板と近赤外線を吸収する染
料系の材料を混入させたアクリル板とを貼合わせたまた
は熱融着させた板や、ガラス板に直接スパッタ法で銀系
薄膜等を形成したものに近赤外線吸収材入りフィルムを
貼合わせした板や、或いは、近赤外線を吸収する染料系
の材料を混入させたアクリル板にスパッタ法で銀系薄膜
等を形成したフィルムを貼合わせた板を、ＰＤＰの前面
に空気層を介してセッティングするという方法が採用さ
れている。For this reason, a filter for cutting off electromagnetic waves and near-infrared rays generated from a PDP has been studied. Conventionally, for example, an acrylic plate in which a metal mesh or an etching mesh having a low resistance value is embedded and a dye-based material that absorbs near-infrared rays are used. A plate in which a film containing a near-infrared absorbing material is bonded to a plate that is bonded or heat-bonded to an acrylic plate mixed with, or a glass plate on which a silver-based thin film or the like is formed directly by a sputtering method, or A method is adopted in which an acrylic plate mixed with a dye-based material that absorbs near-infrared rays is laminated with a film on which a silver-based thin film is formed by sputtering, and a plate is set in front of the PDP via an air layer. Have been.
【０００４】上記のメッシュタイプは、低抵抗値は得ら
れるが、近赤外線カットフィルターが別に必要であり、
ＰＤＰ表示パターン間隔によりモアレ現象を生じ表示品
位を損なうという欠点がある。また、スパッタ法を代表
とするドライプロセスで得られるフィルターはモアレ現
象は見られないが、低抵抗値、可視光透過特性、８５０
〜１２００ｎｍの近赤外線カット特性、可視光低反射特
性の諸特性を同時に満足するものであって、しかも、比
較的簡単な積層構成でなし得るフィルターは従来存在し
なかった。さらに、ＰＤＰの前面に空気層を介してセッ
ティングする方法である為、視認性が悪く、軽量、薄型
と言うＰＤＰの特徴を損なうものであった。[0004] Although the above-mentioned mesh type can obtain a low resistance value, a near infrared cut filter is separately required.
There is a disadvantage that moire phenomenon occurs due to the PDP display pattern interval and display quality is impaired. Further, a filter obtained by a dry process typified by a sputtering method does not show a moire phenomenon, but has a low resistance value, a visible light transmission characteristic,
There has been no filter that simultaneously satisfies various characteristics such as near-infrared cutoff characteristics of up to 1200 nm and low visible light reflection characteristics, and that can be formed with a relatively simple lamination structure. Furthermore, since the method is a method of setting the front of the PDP via an air layer, the visibility is poor, and the characteristics of the PDP such as light weight and thinness are impaired.
【０００５】[0005]
【発明が解決しようとする課題】本発明は、ＰＤＰが必
要とする電磁波シールド特性、近赤外線カット特性、可
視光低反射特性等の諸特性を、比較的簡単な積層構成で
同時に満足させると共に、しかも視認性が良く、軽量、
薄型のＰＤＰ用フィルターを提供することを課題とす
る。また、本発明のさらなる課題は、このＰＤＰ用フィ
ルターを貼り合わせてなるＰＤＰ表示装置を提供するこ
とにある。SUMMARY OF THE INVENTION According to the present invention, various characteristics such as electromagnetic wave shielding characteristics, near-infrared cut characteristics, and visible light low reflection characteristics required by a PDP are simultaneously satisfied with a relatively simple laminated structure. Moreover, good visibility, light weight,
It is an object to provide a thin PDP filter. A further object of the present invention is to provide a PDP display device in which the PDP filter is attached.
【０００６】[0006]
【課題を解決するための手段】本発明らは、透明フィル
ム基材の表面に金属酸化物膜と銀系透明導電体膜を交互
に順次積層し、最外層に金属酸化物膜を形成してなる積
層体は、ＰＤＰ用フィルターが必要とする電磁波シール
ド特性、近赤外線カット特性、可視光線の高透過、低反
射特性等の諸特性を付与することが出来ることを知見し
たが、これらの特性を損なうことなく、フィルターの耐
擦傷性、耐汚染性、耐磨耗性等の機能を向上させるテー
マについて、さらに鋭意検討を行った。その結果、積層
体表面にこれらの機能を付加する層を形成するのではな
く、積層体が形成されている面とは反対の透明フィルム
基材の裏面に、耐擦傷性、耐汚染性、耐磨耗性および低
反射特性等の特性を付加する層を形成すると、この積層
体の有する電磁波シールド特性、近赤外線カット特性、
可視光線の高透過、低反射特性等の諸特性を損なうこと
なく、耐擦傷性、耐汚染性、耐磨耗性等の特性を付加し
うることを見出し、本発明に至ったものである。Means for Solving the Problems The present invention provides a method in which a metal oxide film and a silver-based transparent conductor film are alternately and sequentially laminated on the surface of a transparent film substrate, and a metal oxide film is formed as an outermost layer. It has been found that the laminated body can provide various characteristics such as an electromagnetic shielding property, a near-infrared cut property, a high transmission of visible light, and a low reflection property required by a filter for PDP. The theme for improving the functions of the filter such as abrasion resistance, stain resistance, and abrasion resistance without any loss was further studied. As a result, instead of forming a layer that adds these functions on the surface of the laminate, the scratch resistance, stain resistance, and the resistance of the transparent film substrate opposite to the surface on which the laminate is formed are formed. When a layer that adds properties such as abrasion and low reflection properties is formed, the electromagnetic wave shielding properties, near infrared cut properties,
The inventors have found that properties such as abrasion resistance, stain resistance, and abrasion resistance can be added without impairing various properties such as high transmission and low reflection properties of visible light, and have led to the present invention.
【０００７】即ち、本発明は、透明フィルム基材の裏面
にハードコート層、反射防止層および防汚染層が順次積
層されており、該フィルム基材の表面に、金属酸化物膜
と銀系透明導電体膜を１単位としてｎ単位（３≦ｎ≦１
０）が順次積層され、最外層に金属酸化物膜が形成され
ている積層体であって、上記最外層の金属酸化物膜の面
上に透明粘着剤層が形成されていることを特徴とするＰ
ＤＰ用フィルターに関するものであり、さらに、このＰ
ＤＰ用フィルターを透明粘着剤層を介してＰＤＰ前面表
示ガラス部に貼り合わせてなるＰＤＰ表示装置に関する
ものである。また、上記の金属酸化物膜は屈折率が１．
５〜２．７の光学的透明性を有する膜であり、銀系透明
導電体膜は厚さ５〜２０ｎｍの範囲内で略一定の値に設
定されており、且つ該基材表面の金属酸化物膜と最外層
の金属酸化物膜の各厚さが、銀系透明導電体膜の厚さの
５／２（１±０．１５）倍であり、それ以外の中間に位
置する金属酸化物膜の各厚さが、銀系透明導電体膜の厚
さの５（１±０．１５）倍となるように設計されている
ことが、上述の光学特性を達成するのに好ましい。上記
のｎ単位については、３≦ｎ≦１０が好適な範囲であ
り、ｎ＜３の場合、銀系透明導電体膜の厚さを増すこと
で表面抵抗値は下げられるが、光学特性を満足出来なく
なる。また、ｎ＞１０の場合、構成自体が複雑になり、
比較的簡単な構成で光学特性を達成するには難点があ
る。That is, according to the present invention, a hard coat layer, an antireflection layer and an antifouling layer are sequentially laminated on the back surface of a transparent film substrate, and a metal oxide film and a silver-based transparent film are formed on the surface of the film substrate. N units (3 ≦ n ≦ 1) with the conductor film as one unit
0) are sequentially laminated and a metal oxide film is formed on the outermost layer, wherein a transparent adhesive layer is formed on the surface of the outermost metal oxide film. P
It is related to a filter for DP.
The present invention relates to a PDP display device in which a DP filter is attached to a PDP front display glass portion via a transparent adhesive layer. The metal oxide film has a refractive index of 1.
A film having an optical transparency of 5 to 2.7; the silver-based transparent conductor film is set to a substantially constant value within a range of 5 to 20 nm; The thickness of each of the material film and the outermost metal oxide film is 5/2 (1 ± 0.15) times the thickness of the silver-based transparent conductor film, and the metal oxide film located at the other intermediate position It is preferable that the thickness of each film is designed to be 5 (1 ± 0.15) times the thickness of the silver-based transparent conductor film in order to achieve the above-mentioned optical characteristics. With respect to the above n unit, 3 ≦ n ≦ 10 is a preferable range. When n <3, the surface resistance can be reduced by increasing the thickness of the silver-based transparent conductor film, but the optical characteristics are satisfied. I cannot do it. When n> 10, the configuration itself becomes complicated,
There are difficulties in achieving optical characteristics with a relatively simple configuration.
【０００８】屈折率が１．５〜２．７の光学的透明性を
有する金属酸化物膜としては、酸化インジウム、酸化
錫、二酸化チタン、酸化セリウム、酸化ジルコニウム、
酸化亜鉛、酸化ジルコニウム、酸化タンタル、五酸化ニ
オブ、硫化亜鉛よりなる群から選ばれる１又は２以上の
化合物からなる薄膜であるのが好ましい。また、銀系透
明導電体膜は、９０重量％以上の銀と、金、銅、パラジ
ュウム、白金、マンガン、カドニウムから選択された１
つまたは２つ以上の元素により構成された薄膜であるの
が好ましい。また、ハードコート層は鉛筆硬度で２Ｈ以
上であり、透明フィルム基材の裏面に順次積層されたハ
ードコート層、反射防止層および防汚染性層の空気との
反射率が２％以下であるのが好ましい。さらに、透明粘
着剤層の弾性率が１×１０Ｅ5 〜１×１０Ｅ7 dyn/c
m2 、厚さ１０〜５００μｍであるのが好ましい。The metal oxide film having an optical transparency having a refractive index of 1.5 to 2.7 includes indium oxide, tin oxide, titanium dioxide, cerium oxide, zirconium oxide, and the like.
The thin film is preferably made of one or more compounds selected from the group consisting of zinc oxide, zirconium oxide, tantalum oxide, niobium pentoxide, and zinc sulfide. In addition, the silver-based transparent conductor film is made of 90% by weight or more of silver and one selected from gold, copper, palladium, platinum, manganese, and cadmium.
It is preferable that the thin film is composed of one or two or more elements. The hard coat layer has a pencil hardness of 2H or more, and the reflectance of the hard coat layer, the antireflection layer and the antifouling layer, which are sequentially laminated on the back surface of the transparent film substrate, with air is 2% or less. Is preferred. Further, the elastic modulus of the transparent pressure-sensitive adhesive layer is 1 × 10E 5 to 1 × 10E 7 dyn / c.
m 2 and a thickness of 10 to 500 μm are preferred.
【０００９】[0009]
【発明の実施の形態】以下において、図１を使用して本
発明のＰＤＰ用フィルターを具体的に説明する。図１
は、透明フィルム基材１の裏面にハードコート層４、反
射防止層５および防汚染層６が順次積層されており、該
フィルム基材の表面には、金属酸化物膜および銀系透明
導電体膜を１単位として、金属酸化物膜（２Ａ、２Ｂ、
２Ｃ）および銀系透明導電体膜（３Ａ、３Ｂ、３Ｃ）が
順次繰り返し積層され（図１は３単位の例を示す）、そ
の最外層に金属酸化物膜２Ｄが形成されている積層体で
あって、上記最外層の金属酸化物膜２Ｄの面上に透明粘
着剤層７が形成されているＰＤＰ用フィルターを示して
いる。この際、上記の金属酸化物膜は屈折率が１．５〜
２．７の光学的透明性を有する膜であり、銀系透明導電
体膜は厚さ５〜２０ｎｍの範囲内で略一定の値に設定さ
れており、且つ該基材表面の金属酸化物膜と最外層の金
属酸化物膜の各厚さが、銀系透明導電体膜の厚さの５／
２（１±０．１５）倍であり、それ以外の中間に位置す
る金属酸化物膜の各厚さが、銀系透明導電体膜の厚さの
５（１±０．１５）倍となるように設計されているの
が、電磁波シールド特性、近赤外線カット特性、可視光
透過・低反射特性等の諸特性を付与するのに好ましい。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a PDP filter of the present invention will be specifically described with reference to FIG. FIG.
Has a hard coat layer 4, an antireflection layer 5, and an antifouling layer 6 laminated sequentially on the back surface of a transparent film substrate 1, and a metal oxide film and a silver-based transparent conductor are formed on the surface of the film substrate. The metal oxide film (2A, 2B,
2C) and a silver-based transparent conductor film (3A, 3B, 3C) are sequentially and repeatedly laminated (FIG. 1 shows an example of three units), and a metal oxide film 2D is formed on the outermost layer. 2 shows a PDP filter in which a transparent pressure-sensitive adhesive layer 7 is formed on the surface of the outermost metal oxide film 2D. At this time, the metal oxide film has a refractive index of 1.5 to
A film having an optical transparency of 2.7, wherein the silver-based transparent conductive film is set to a substantially constant value within a range of 5 to 20 nm, and a metal oxide film on the surface of the base material. And the thickness of the outermost metal oxide film is 5/5 of the thickness of the silver-based transparent conductor film.
2 (1 ± 0.15) times, and the thickness of each of the other metal oxide films located in the middle is 5 (1 ± 0.15) times the thickness of the silver-based transparent conductor film. Such a design is preferable for imparting various characteristics such as an electromagnetic wave shielding characteristic, a near-infrared cutoff characteristic, and a visible light transmission / low reflection characteristic.
【００１０】本発明において使用する透明フィルム基材
としては、可視光領域における透明性を有するもので、
ある程度表面が平滑であれば使用できる。例えば、ポリ
エチレンテレフタレート、トリアセチルセルロース、ポ
リエチレンナフタレート、ポリエーテルスルホン、ポリ
カーボネート、ポリアリレート、ポリエーテルエーテル
ケトン等が好ましい。フィルム基材厚さは、ドライプロ
セスで熱ジワなどの問題が発生しなければ制限はない
が、通常厚さ１０〜２５０μｍのものが使用される。ま
た、可視光の色調整のための色素を、透明フィルム基材
中に混入させてもよく、透明フィルム基材に塗布しても
よい。The transparent film substrate used in the present invention has transparency in the visible light region.
It can be used if the surface is somewhat smooth. For example, polyethylene terephthalate, triacetyl cellulose, polyethylene naphthalate, polyether sulfone, polycarbonate, polyarylate, polyether ether ketone, and the like are preferable. The thickness of the film substrate is not limited as long as there is no problem such as thermal wrinkles in the dry process, but usually a thickness of 10 to 250 μm is used. Further, a dye for adjusting the color of visible light may be mixed into the transparent film substrate, or may be applied to the transparent film substrate.
【００１１】ハードコート層は、ＵＶ硬化型のフッ素系
ポリマー材料、熱硬化型のＳｉＯ2系の材料でも良く、
界面反射を低減する為に、透明フィルム基材の屈折率に
近似の屈折率を有する材料から成膜するのが好ましい。
ハードコート層の厚さは１〜１０μｍが適当である。１
μｍより薄いと鉛筆硬度を２Ｈ以上とするのが難しく、
耐擦傷性効果も低下し、１０μｍ以上ではクラックの発
生が起こりやすい。反射防止層についても、ＵＶ硬化型
でも熱硬化型でも良く、低屈折率のフッ素系ポリマー材
料、ＭｇＦ2 、ＣａＦ2 等の光学膜を塗工法やスパッタ
法などのドライプロセスにより形成してもよい。反射防
止層の材料は、屈折率が通常１．４２以下の低屈折率材
料が使用され、反射防止特性を向上させる為に多層構成
にしてもよく、ハードコート層との接着性の良い材料を
選ぶのがよい。防汚染層は、反射防止層の特性を損なう
ことのないように厚さ２〜１０ｎｍで形成するのが好ま
しく、材料としては撥水性のフッ素系ポリマー材料、Ｍ
ｏＳ2等の材料を薄層塗工法やスパッタ法などのドライ
プロセスにより形成してもよい。さらに、反射防止層自
体に防汚染性を持たせてもよい。The hard coat layer may be a UV-curable fluorine-based polymer material or a thermosetting SiO 2 -based material.
In order to reduce interface reflection, it is preferable to form a film from a material having a refractive index close to the refractive index of the transparent film substrate.
The thickness of the hard coat layer is suitably from 1 to 10 μm. 1
If it is thinner than μm, it is difficult to make the pencil hardness 2H or more,
The abrasion resistance effect is also reduced, and cracks tend to occur at a thickness of 10 μm or more. The antireflection layer may also be a UV-curable type or a thermosetting type, and may be formed by a low-refractive-index fluoropolymer material, an optical film of MgF 2 , CaF 2, or the like by a dry process such as a coating method or a sputtering method. . As the material of the antireflection layer, a low refractive index material having a refractive index of usually 1.42 or less is used, and a multilayer structure may be used to improve the antireflection characteristics. Good to choose. The anti-stain layer is preferably formed to a thickness of 2 to 10 nm so as not to impair the properties of the anti-reflection layer.
A material such as oS 2 may be formed by a dry process such as a thin layer coating method or a sputtering method. Further, the antireflection layer itself may have anti-staining properties.
【００１２】金属酸化物膜の材料としては、高屈折率の
光学膜材料ならある程度使用できるが、薄膜の屈折率が
１．５〜２．７の範囲が好ましい。屈折率１．５以下の
場合、金属酸化物膜の厚さを厚くする必要があり、多層
にした場合クラックが入りやすくなる。また、屈折率
２．７を超えると、最外層の金属酸化物膜と空気との屈
折率差が大きくなりすぎ、可視光反射率を低くおさえる
ことが難しくなる。また、単一の金属酸化物でも複数の
金属酸化物を混合した材料を用いてもよい。さらに、銀
のマイグレーション防止効果や水、酸素のバリア効果が
ある材料ならさらに好ましい。好適な金属酸化物材料と
しては、酸化インジウムを主成分とし二酸化チタンや、
酸化錫、酸化セリウムを少量含有させたもの、二酸化チ
タン、酸化ジルコニウム、硫化亜鉛、酸化ビスマス、五
酸化ニオブ、酸化亜鉛などが挙げられる。これらの薄膜
層は、スパッタリング、真空蒸着、イオンプレーティン
グ等の真空ドライプロセスで設けることができる。金属
酸化物膜の膜厚は、１８〜１００ｎｍが適当であり、そ
の屈折率、銀系透明導電体膜の厚さ、全層数などによ
り、光学特性を最適にする膜厚が決定される。As the material of the metal oxide film, a high refractive index optical film material can be used to some extent, but the refractive index of the thin film is preferably in the range of 1.5 to 2.7. When the refractive index is 1.5 or less, it is necessary to increase the thickness of the metal oxide film. On the other hand, if the refractive index exceeds 2.7, the difference in refractive index between the metal oxide film as the outermost layer and air becomes too large, and it becomes difficult to suppress the visible light reflectance to a low level. Further, a single metal oxide or a material in which a plurality of metal oxides are mixed may be used. Further, a material having an effect of preventing migration of silver and a barrier effect of water and oxygen is more preferable. Preferred metal oxide materials include indium oxide as a main component, titanium dioxide,
Examples thereof include tin oxide, a substance containing a small amount of cerium oxide, titanium dioxide, zirconium oxide, zinc sulfide, bismuth oxide, niobium pentoxide, and zinc oxide. These thin film layers can be provided by a vacuum dry process such as sputtering, vacuum deposition, or ion plating. The thickness of the metal oxide film is suitably from 18 to 100 nm, and the thickness for optimizing the optical characteristics is determined by the refractive index, the thickness of the silver-based transparent conductor film, the total number of layers, and the like.
【００１３】銀系透明導電体膜の材料としては、９０重
量％以上の銀と、金、銅、パラジュウム、白金、マンガ
ン、カドニウムから選択された１つまたは２つ以上の元
素により構成されるが、９０〜９９重量％の銀と上記金
属１〜１０重量％を固溶させた材料であるのが好まし
い。特に銀中に１〜１０重量％の金を固溶させたもの
は、銀の劣化防止の観点から好ましい。金を１０重量％
以上混入すると比抵抗が上昇し低抵抗値が得られ難く、
また１重量％以下では銀の劣化が起こりやすい。銀系透
明導電体膜を形成する手段としては、スパッタ法などの
真空ドライプロセスが用いられる。銀系透明導電体膜の
厚さは、５〜２０ｎｍが適当であるが、さらに好ましく
は、９〜１７ｎｍである。The material of the silver-based transparent conductor film is composed of 90% by weight or more of silver and one or more elements selected from gold, copper, palladium, platinum, manganese and cadmium. , 90 to 99% by weight of silver and the above metal of 1 to 10% by weight as a solid solution. In particular, a solid solution of 1 to 10% by weight of gold in silver is preferable from the viewpoint of preventing silver from deteriorating. 10% by weight of gold
If mixed above, the specific resistance increases and it is difficult to obtain a low resistance value,
If it is less than 1% by weight, silver is likely to deteriorate. As means for forming the silver-based transparent conductor film, a vacuum dry process such as a sputtering method is used. The thickness of the silver-based transparent conductor film is suitably from 5 to 20 nm, and more preferably from 9 to 17 nm.
【００１４】透明粘着剤層は、弾性係数が１×１０Ｅ5
〜１×１０Ｅ7 dyn/cm2 、厚さは１０〜５００μｍ、さ
らに好ましくは２５〜３００μｍである。その材料とし
てはアクリル系、ゴム系、ポリエステル系などがあり、
特にアクリル系粘着剤を用いるのが好ましい。アクリル
系粘着剤は、粘着剤としての適度の濡れ性、柔軟性を付
与するための主単量体として、ポリマー化した際のガラ
ス転移点が−１０℃以下の（メタ）アクリル酸アルキル
エステルを１種もしくは２種以上と、必要によりアクリ
ル酸、メタアクリル酸、２−ヒドロキシエチルアクリレ
ート等の官能基含有単量体およびその他の共重合性単量
体とを、適宜の重合触媒を用いて溶液重合法、乳化重合
法、塊状重合法（特に紫外線による重合法）、懸濁重合
法などの方法で重合して得られるアクリル系ポリマー
に、架橋剤等の各種添加剤を添加したものが用いられ
る。熱架橋タイプ、光（紫外線、電子線）架橋タイプな
どであってもよい。The transparent pressure-sensitive adhesive layer has an elastic modulus of 1 × 10E 5
１1 × 10E 7 dyn / cm 2 , thickness is 10-500 μm, more preferably 25-300 μm. The material is acrylic, rubber, polyester, etc.
In particular, it is preferable to use an acrylic pressure-sensitive adhesive. Acrylic pressure-sensitive adhesives include, as a main monomer for imparting appropriate wettability and flexibility as a pressure-sensitive adhesive, a (meth) acrylic acid alkyl ester having a glass transition point of −10 ° C. or less when polymerized. One or two or more, and if necessary, a functional group-containing monomer such as acrylic acid, methacrylic acid, or 2-hydroxyethyl acrylate, and another copolymerizable monomer are mixed with an appropriate polymerization catalyst to form a solution. An acrylic polymer obtained by polymerization by a polymerization method, an emulsion polymerization method, a bulk polymerization method (particularly, a polymerization method using ultraviolet rays), a suspension polymerization method, or the like, to which various additives such as a crosslinking agent are added is used. . A thermal crosslinking type, a light (ultraviolet ray, electron beam) crosslinking type, or the like may be used.
【００１５】本発明者らは、ＰＤＰの電磁波シールド・
近赤外線カットフィルターとしての備えるべき特性の目
標値を、次の表１の通り設定して研究開発を鋭意進め
た。The present inventors have proposed an electromagnetic wave shield for a PDP.
The target values of the characteristics to be provided as the near-infrared cut filter were set as shown in the following Table 1, and the research and development were proceeded earnestly.
【００１６】[0016]
【表１】 [Table 1]
【００１７】これに対して、電磁波シールド特性、近赤
外線カット特性、可視光線の高透過、低反射特性は、透
明フィルム基材に銀系透明導電体膜と金属酸化物膜をそ
れら各層の膜厚、銀系透明導電体膜の比抵抗、金属酸化
物膜の屈折率を調整して、スパッタ法で多層構成にする
ことによって実現することが出来る。しかしながら、銀
系透明導電体膜と金属酸化物膜からなる積層体自体の耐
擦傷性、耐汚染性、耐磨耗性等の特性は必ずしも十分な
ものではない。On the other hand, the electromagnetic wave shielding property, near-infrared cut property, high transmission of visible light, and low reflection property are as follows. A silver-based transparent conductor film and a metal oxide film are formed on a transparent film substrate. It can be realized by adjusting the specific resistance of the silver-based transparent conductor film and the refractive index of the metal oxide film to form a multilayer structure by a sputtering method. However, the laminate itself comprising the silver-based transparent conductor film and the metal oxide film does not always have sufficient properties such as scratch resistance, stain resistance, and abrasion resistance.
【００１８】本発明者らは、前記の目標特性を満たすべ
くＰＤＰ用フィルターの全体構成について検討の結果、
透明フィルム基材の裏面にハードコート層、反射防止層
および防汚染層が順次積層されており、該フィルム基材
の表面に、金属酸化物膜と銀系透明導電体膜を１単位と
してｎ単位（３≦ｎ≦１０）が順次積層され、最外層に
金属酸化物膜が形成されている積層体であって、上記最
外層の金属酸化物膜の面上に透明粘着剤層を形成した構
成とすることにより、透明粘着剤層を介してＰＤＰ前面
表示ガラス部に貼り合わせることが出来、しかも電磁波
シールド特性、近赤外線カット特性、可視光線の高透
過、低反射特性を損なうことなしに、耐擦傷性、耐汚染
性、耐磨耗性等の特性を付加できることを見出したもで
ある。この場合、ＰＤＰ用フィルターの耐擦傷性、耐汚
染性、耐磨耗性等の特性は、図１におけるハードコート
層４、反射防止層５、防汚染性層６の特性により左右さ
れる。また、可視光線の低反射性は、金属酸化物膜と銀
系透明導電体膜の交互積層してなる積層体の反射率によ
り左右され、反射防止層５はそれを損なわないようにす
る為に設けられる。The present inventors have studied the overall structure of a PDP filter in order to satisfy the above-mentioned target characteristics.
A hard coat layer, an antireflection layer and an anti-contamination layer are sequentially laminated on the back surface of the transparent film substrate. On the surface of the film substrate, a metal oxide film and a silver-based transparent conductor film are defined as one unit and n units are formed. (3 ≦ n ≦ 10) are sequentially laminated, and a metal oxide film is formed on the outermost layer, wherein a transparent pressure-sensitive adhesive layer is formed on the surface of the outermost metal oxide film. By doing so, it can be bonded to the front display glass part of the PDP via the transparent pressure-sensitive adhesive layer, and without impairing the electromagnetic wave shielding characteristics, near infrared cut characteristics, high transmission of visible light, and low reflection characteristics, They have found that properties such as abrasion resistance, stain resistance, and abrasion resistance can be added. In this case, the properties of the PDP filter, such as scratch resistance, stain resistance, and abrasion resistance, depend on the properties of the hard coat layer 4, the antireflection layer 5, and the stain resistant layer 6 in FIG. Further, the low reflectivity of visible light depends on the reflectance of a laminated body formed by alternately laminating a metal oxide film and a silver-based transparent conductor film, and the antireflection layer 5 is provided so as not to impair it. Provided.
【００１９】[0019]
【実施例】次に、本発明を実施例により具体的に説明す
るが、本発明はかかる実施例のみに限定するものではな
い。 実施例１ 厚さ１２５μｍの透明ポリエチレンテレフタレート（Ｐ
ＥＴ）フィルムの表面に、ＤＣマグネトロンスパッタ法
で金属酸化物膜と銀系透明導電体膜を交互に積層し、最
外層に金属酸化物膜を形成する方法を用いた。金属酸化
物膜を形成するターゲット材料には、Ｉｎ2 Ｏ3 ―１
２．６重量％ＴｉＯ2 を使用し、銀系透明導電体膜を形
成するターゲット材料には、Ａｇ―５重量％Ａｕを使用
した。膜厚の測定は、厚膜に付けた膜の表面粗さ計（Ｄ
ＥＫＴＡＫ３）による製膜速度の検量線と透過型電子顕
微鏡による精密測定により行った。光学特性は、日立製
作所製Ｕ−３４１０を用いて測定した。上記透明フィル
ム基材の表面に、金属酸化物膜と銀系透明導電体膜を１
単位として、下記の厚さでｎ単位（ｎ＝３）が順次積層
され、最外層に金属酸化物膜が積層された積層体を作製
した。各膜の厚さ ：32.5/13/65/13/65/13/32.5（ｎｍ） 次に、上記の積層体のＰＥＴフィルム裏面に、屈折率が
１．５５のアクリルウレタン系ハードコート材料（大日
本インキ化学工業社製、商品名ユニディック１７−８１
３を主成分とする）をグラビア塗工して、３００ｍＪで
３分間紫外線照射し硬化させて厚さ５μｍのハードコー
ト層を形成し、その面上に屈折率が１．３６の熱硬化型
反射防止材料（日産化学社製、商品名ＬＲ２０１）を塗
工し、１５０℃で５分間硬化させて厚さ０．１μｍの反
射防止層を形成した後、さらにその面上にポリ四フッ化
エチレン製のターゲット材料（三井金属社製）を用い
て、高周波スパッタリング法にてフッ素系ポリマーの厚
さ２ｎｍの防汚染層を形成した。上記のように形成され
た防汚染層表面の鉛筆硬度は３Ｈであった。次いで、上
記積層体の最外層の金属酸化物膜の面上に、固形分２０
重量％のアクリル系の粘着剤溶液を塗布し、１５０℃で
５分間乾燥させ厚さ１００μｍ、弾性率１×１０Ｅ6 d
yn/cm2の透明粘着剤層を形成した。上記の構成要素から
なるＰＤＰフィルターを、透明粘着剤層を介して厚さ３
ｍｍの透明ガラス基板に貼り合わせて、ＰＤＰフィルタ
ーとしての特性試験を行い、その結果を表２に示した。
その際、ＰＤＰフィルターを透明ガラス基板より４辺共
２０ｍｍはみ出す大きさにし、はみ出した導電面側に、
銅基材の導電性テープ（日東電工社製、ＣＴ３１１Ｃ）
を貼り合わせて表面抵抗測定用端子とした。EXAMPLES Next, the present invention will be described in detail with reference to examples, but the present invention is not limited to only these examples. Example 1 125 μm thick transparent polyethylene terephthalate (P
ET) A method was used in which a metal oxide film and a silver-based transparent conductor film were alternately laminated on the surface of a film by DC magnetron sputtering, and a metal oxide film was formed as the outermost layer. The target material for forming the metal oxide film is In 2 O 3 -1
2.6 wt% TiO 2 was used, and Ag-5 wt% Au was used as a target material for forming a silver-based transparent conductor film. The thickness of the film was measured using a surface roughness meter (D
The measurement was carried out by a calibration curve of the film formation rate by EKTAK3) and precise measurement by a transmission electron microscope. The optical characteristics were measured using U-3410 manufactured by Hitachi, Ltd. A metal oxide film and a silver-based transparent conductor film are formed on the surface of the transparent film substrate.
As a unit, n units (n = 3) having the following thickness were sequentially laminated, and a laminate in which a metal oxide film was laminated on the outermost layer was produced. Thickness of each film : 32.5 / 13/65/13/65/13 / 32.5 (nm) Next, an acrylic urethane-based hard coat material having a refractive index of 1.55 (large Product name: UNIDIC 17-81, manufactured by Nippon Ink Chemical Industry Co., Ltd.
3 as a main component), and irradiate with ultraviolet light at 300 mJ for 3 minutes to cure to form a hard coat layer having a thickness of 5 μm, and a thermosetting reflection layer having a refractive index of 1.36 on the surface. An anti-reflective material (trade name: LR201, manufactured by Nissan Chemical Co., Ltd.) is applied and cured at 150 ° C. for 5 minutes to form an anti-reflection layer having a thickness of 0.1 μm. The target material (manufactured by Mitsui Kinzoku Co., Ltd.) was used to form a fluorine-based polymer antifouling layer having a thickness of 2 nm by a high frequency sputtering method. The pencil hardness of the surface of the anti-staining layer formed as described above was 3H. Next, a solid content of 20 was formed on the surface of the outermost metal oxide film of the laminate.
Weight% of an acrylic pressure-sensitive adhesive solution, dried at 150 ° C. for 5 minutes, thickness 100 μm, elastic modulus 1 × 10E 6 d
A transparent pressure-sensitive adhesive layer of yn / cm 2 was formed. The PDP filter composed of the above-mentioned constituents is coated with a thickness of 3
It was attached to a transparent glass substrate having a thickness of 2 mm and subjected to a characteristic test as a PDP filter. The results are shown in Table 2.
At that time, the PDP filter was set to a size that protruded 20 mm on all four sides from the transparent glass substrate, and on the protruding conductive surface side,
Copper-based conductive tape (CT311C, manufactured by Nitto Denko Corporation)
Were bonded to form a terminal for surface resistance measurement.
【００２０】[0020]
【表２】 [Table 2]
【００２１】但し、表面抵抗値は、対向２辺の導電性テ
ープ間をテスターで測定し、透明ガラス基板の縦、横の
長さで補正した値を表面抵抗とした。光学特性は、反対
側のガラス面に黒テープを貼り、防汚染層側を入斜面側
として測定した値である。反射率の測定は、入斜面の反
対側のガラス面に黒テープを貼り、空気層との界面反射
をなくすようにした。鉛筆硬度、耐擦傷性、耐摩耗性試
験は、防汚染層側に対して行った。このような構成にす
ることにより、ＰＤＰフィルターに要求される光学特
性、電磁波シールド特性を損なうことなく、フィルター
の表面硬度、耐擦傷性、耐摩耗性、防汚染性を付加でき
ることが確認された。However, the surface resistance was measured with a tester between the conductive tapes on the two opposite sides, and the value corrected by the vertical and horizontal lengths of the transparent glass substrate was defined as the surface resistance. The optical characteristics are values measured by attaching a black tape to the glass surface on the opposite side and setting the anti-staining layer side as the slope side. For the measurement of the reflectance, a black tape was applied to the glass surface opposite to the inclined surface so as to eliminate the reflection at the interface with the air layer. The pencil hardness, abrasion resistance, and abrasion resistance tests were performed on the anti-staining layer side. It has been confirmed that by adopting such a configuration, the surface hardness, abrasion resistance, abrasion resistance and stain resistance of the filter can be added without impairing the optical characteristics and electromagnetic wave shielding characteristics required for the PDP filter.
【００２２】このフィルターの表面硬度、耐擦傷性、耐
摩耗性、防汚染性はハードコート層、反射防止層、防汚
染層の特性により決まり、擦傷試験、摩耗試験後も電磁
波シールド特性は安定しており、従って銀系導電体膜が
保護されていることが確認された。上記の表２に示した
ように、ＰＤＰ用フィルターに要求される特性を満足す
るフィルターが得ることが出来た。さらに、透明粘着剤
層を介してＰＤＰの前面表示ガラス部に、このフィルタ
ーを貼り合わせることによって、ＰＤＰの画質を損なう
ことなく、電磁波シールド効果、近赤外線カット効果を
発揮でき、耐摩耗性、耐擦傷性、耐汚染性を持ち合わせ
たプラズマディスプレイパネルが得られることが確認で
きた。The surface hardness, abrasion resistance, abrasion resistance, and stain resistance of this filter are determined by the properties of the hard coat layer, the antireflection layer, and the stain prevention layer. Therefore, it was confirmed that the silver-based conductor film was protected. As shown in Table 2 above, a filter satisfying the characteristics required for a PDP filter was obtained. Furthermore, by attaching this filter to the front display glass part of the PDP via the transparent adhesive layer, the electromagnetic wave shielding effect and the near-infrared cut effect can be exhibited without impairing the image quality of the PDP, and the abrasion resistance, It was confirmed that a plasma display panel having both abrasion resistance and stain resistance was obtained.
【００２３】[0023]
【発明の効果】本発明のＰＤＰ用フィルターは、特に積
層体を構成する金属酸化物膜と銀系透明導電体膜との相
互の厚さ関係を特定の数値に設定することにより、ＰＤ
Ｐが必要とする電磁波シールド特性、近赤外線カット特
性、可視光低反射特性等の諸特性を、比較的簡単な積層
構成で同時に満足させると共に、しかも視認性が良く、
軽量、薄型のフィルターを提供することができる。ま
た、本発明は、このＰＤＰ用フィルターを備えた光学特
性の優れたＰＤＰ表示装置を提供することができる。The filter for a PDP of the present invention can be used for a PDP filter by setting the mutual thickness relationship between a metal oxide film and a silver-based transparent conductor film constituting a laminate to a specific value.
Various characteristics such as electromagnetic wave shielding characteristics, near-infrared cut characteristics, and visible light low reflection characteristics required by P are simultaneously satisfied with a relatively simple laminated structure, and the visibility is good.
A lightweight and thin filter can be provided. Further, the present invention can provide a PDP display device provided with this PDP filter and having excellent optical characteristics.
【００２４】[0024]
【図１】図１は、本発明のプラズマディスプレイパネル
用フィルターの一実施態様の概略を示す断面図である。FIG. 1 is a sectional view schematically showing an embodiment of a filter for a plasma display panel according to the present invention.
１：透明フィルム基材 ２Ａ，２Ｂ，２Ｃ，２Ｄ：金属酸化物膜 ３Ａ，３Ｂ，３Ｃ：銀系透明導電体膜 ４：ハードコート層 ５：反射防止層 ６：防汚染層 ７：透明粘着剤層 1: transparent film substrate 2A, 2B, 2C, 2D: metal oxide film 3A, 3B, 3C: silver-based transparent conductor film 4: hard coat layer 5: anti-reflection layer 6: anti-staining layer 7: transparent adhesive layer
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 2H048 CA05 CA12 CA19 CA29 2K009 AA04 AA15 BB24 CC26 CC35 DD02 DD04 EE05 5C040 GH01 GH10 JA09 KA04 KB13 KB24 MA04 MA08 MA10 MA11 5E321 AA04 BB23 BB25 CC16 GG05 GH01 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H048 CA05 CA12 CA19 CA29 2K009 AA04 AA15 BB24 CC26 CC35 DD02 DD04 EE05 5C040 GH01 GH10 JA09 KA04 KB13 KB24 MA04 MA08 MA10 MA11 5E321 AA04 BB23 BB25 CC16 GG05 GH01
Claims (7)
層、反射防止層および防汚染層が順次積層されており、
該フィルム基材の表面に、金属酸化物膜と銀系透明導電
体膜を１単位としてｎ単位（３≦ｎ≦１０）が順次積層
され、最外層に金属酸化物膜が形成されている積層体で
あって、上記最外層の金属酸化物膜の面上に透明粘着剤
層が形成されていることを特徴とするプラズマディスプ
レイパネル用フィルター。1. A hard coat layer, an antireflection layer and an antifouling layer are sequentially laminated on a back surface of a transparent film substrate,
A laminate in which n units (3 ≦ n ≦ 10) are sequentially laminated on a surface of the film substrate, with a metal oxide film and a silver-based transparent conductor film as one unit, and a metal oxide film is formed as an outermost layer. A filter for a plasma display panel, wherein a transparent pressure-sensitive adhesive layer is formed on a surface of the outermost metal oxide film.
２．７の光学的透明性を有する膜であり、銀系透明導電
体膜は厚さ５〜２０ｎｍの範囲内で略一定の値に設定さ
れており、且つ該基材表面の金属酸化物膜と最外層の金
属酸化物膜の各厚さが、銀系透明導電体膜の厚さの５／
２（１±０．１５）倍であり、それ以外の中間に位置す
る金属酸化物膜の各厚さが、銀系透明導電体膜の厚さの
５（１±０．１５）倍となるように設計されている請求
項１記載のプラズマディスプレイパネル用フィルター。2. The metal oxide film has a refractive index of 1.5 to 1.5.
A film having an optical transparency of 2.7, wherein the silver-based transparent conductive film is set to a substantially constant value within a range of 5 to 20 nm, and a metal oxide film on the surface of the base material. And the thickness of the outermost metal oxide film is 5/5 of the thickness of the silver-based transparent conductor film.
2 (1 ± 0.15) times, and the thickness of each of the other metal oxide films located in the middle is 5 (1 ± 0.15) times the thickness of the silver-based transparent conductor film. 2. The filter for a plasma display panel according to claim 1, wherein the filter is designed as follows.
錫、二酸化チタン、酸化セリウム、酸化ジルコニウム、
酸化亜鉛、酸化ジルコニウム、酸化タンタル、五酸化ニ
オブ、硫化亜鉛よりなる群から選ばれる１又は２以上の
化合物からなる薄膜である請求項１記載のプラズマディ
スプレイパネル用フィルター。3. The method according to claim 1, wherein the metal oxide film is made of indium oxide, tin oxide, titanium dioxide, cerium oxide, zirconium oxide,
2. The filter for a plasma display panel according to claim 1, wherein the filter is a thin film made of one or more compounds selected from the group consisting of zinc oxide, zirconium oxide, tantalum oxide, niobium pentoxide, and zinc sulfide.
銀と、金、銅、パラジュウム、白金、マンガン、カドニ
ウムから選択された１つまたは２つ以上の元素により構
成された薄膜である請求項１記載のプラズマディスプレ
イパネル用フィルター。4. A silver-based transparent conductive film is a thin film composed of 90% by weight or more of silver and one or more elements selected from gold, copper, palladium, platinum, manganese, and cadmium. The filter for a plasma display panel according to claim 1.
ある請求項１記載のプラズマディスプレイパネル用フィ
ルター。5. The filter for a plasma display panel according to claim 1, wherein the hard coat layer has a pencil hardness of 2H or more.
１×１０Ｅ7 dyn/cm2、厚さ１０〜５００μｍである請
求項１記載のプラズマディスプレイパネル用フィルタ
ー。6. The transparent pressure-sensitive adhesive layer has an elastic modulus of 1 × 10E 5 or more.
2. The filter for a plasma display panel according to claim 1, which has a thickness of 1 × 10E 7 dyn / cm 2 and a thickness of 10 to 500 μm.
ガラス部に、請求項１記載のフィルターを透明粘着剤層
を介して貼り合わせてなるプラズマディスプレイパネル
表示装置。7. A plasma display panel display device comprising the filter according to claim 1 bonded to a front display glass portion of the plasma display panel via a transparent adhesive layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10275795A JP2000105311A (en) | 1998-09-29 | 1998-09-29 | Filter for plasma display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10275795A JP2000105311A (en) | 1998-09-29 | 1998-09-29 | Filter for plasma display panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000105311A true JP2000105311A (en) | 2000-04-11 |
Family
ID=17560531
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10275795A Pending JP2000105311A (en) | 1998-09-29 | 1998-09-29 | Filter for plasma display panel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000105311A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000190414A (en) * | 1998-12-28 | 2000-07-11 | Takiron Co Ltd | Polyfunctional composite material |
| JP2001353802A (en) * | 2000-06-14 | 2001-12-25 | Nitto Denko Corp | Transparent laminate and filter for plasma display panel |
| JP2002214427A (en) * | 2000-11-20 | 2002-07-31 | Hitachi Chem Co Ltd | Nir absorbing composition, absorbing film and method for preparing the composition |
| WO2006090798A1 (en) * | 2005-02-25 | 2006-08-31 | Asahi Glass Company, Limited | Electromagnetic shielding laminate and display using same |
| US7163739B2 (en) | 2001-03-15 | 2007-01-16 | Mitsui Chemicals, Inc. | Laminate and display apparatus using the same |
| JP2007299672A (en) * | 2006-05-01 | 2007-11-15 | Asahi Glass Co Ltd | Conductive laminated body, and protective plate for plasma display |
| US8262239B2 (en) | 2006-03-08 | 2012-09-11 | Samsung Corning Precision Materials Co., Ltd. | Display filter having a great EM-radiation shielding effect and display apparatus including the same |
-
1998
- 1998-09-29 JP JP10275795A patent/JP2000105311A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000190414A (en) * | 1998-12-28 | 2000-07-11 | Takiron Co Ltd | Polyfunctional composite material |
| JP2001353802A (en) * | 2000-06-14 | 2001-12-25 | Nitto Denko Corp | Transparent laminate and filter for plasma display panel |
| JP2002214427A (en) * | 2000-11-20 | 2002-07-31 | Hitachi Chem Co Ltd | Nir absorbing composition, absorbing film and method for preparing the composition |
| US7163739B2 (en) | 2001-03-15 | 2007-01-16 | Mitsui Chemicals, Inc. | Laminate and display apparatus using the same |
| WO2006090798A1 (en) * | 2005-02-25 | 2006-08-31 | Asahi Glass Company, Limited | Electromagnetic shielding laminate and display using same |
| JPWO2006090798A1 (en) * | 2005-02-25 | 2008-07-24 | 旭硝子株式会社 | Electromagnetic wave shielding laminate and display device using the same |
| US8262239B2 (en) | 2006-03-08 | 2012-09-11 | Samsung Corning Precision Materials Co., Ltd. | Display filter having a great EM-radiation shielding effect and display apparatus including the same |
| JP2007299672A (en) * | 2006-05-01 | 2007-11-15 | Asahi Glass Co Ltd | Conductive laminated body, and protective plate for plasma display |
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