JP2000087059A - Cutting liquid and cutting of work - Google Patents

Cutting liquid and cutting of work

Info

Publication number
JP2000087059A
JP2000087059A JP29900398A JP29900398A JP2000087059A JP 2000087059 A JP2000087059 A JP 2000087059A JP 29900398 A JP29900398 A JP 29900398A JP 29900398 A JP29900398 A JP 29900398A JP 2000087059 A JP2000087059 A JP 2000087059A
Authority
JP
Japan
Prior art keywords
cutting
work
water
agent
cutting fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29900398A
Other languages
Japanese (ja)
Inventor
Hisafuku Yamaguchi
久福 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP29900398A priority Critical patent/JP2000087059A/en
Publication of JP2000087059A publication Critical patent/JP2000087059A/en
Pending legal-status Critical Current

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  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Lubricants (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

PROBLEM TO BE SOLVED: To decrease friction coefficient and improve lubrication without a risk of flash and toxicity accompanied by the use of an organic solvent during a process of cleaning an article to be cut by making cutting liquid contain propylene glycol, a synthetic smectite, a high-molecular heteropolysaccharide and water. SOLUTION: Work cutting liquid is obtained by mixing 30-85 wt.% of propylene glycol with 0.2-0.8 wt.% of a synthetic smectite, 0.05-0.2 wt.% of a high-molecular heteropolysaccharide having molecular weight of not less than 200,000 and 14-69 wt.%, preferably 20-50 wt.% of water. In the work cutting liquid is dispersed 50-150 wt.%, preferably 60-120 wt.% of an abrasive particle such as that of SiC, ZrO, Al2O3 or the like having a diameter of 5-30 μm to give a cutting agent. A work 1 is cut with a cutting apparatus 2 such as a wiresaw and the like wile the cutting liquid is being supplied via a pump 6 and a nozzle 3 to desired portions of the work 1 fixed at a predetermined position. The cutting liquid 4 after cutting is then recovered in a work cutting agent storage tank 5.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、切断加工用切削液
に関するものであり、特にワイヤーソー用切削液及びこ
の切削液を用いる半導体単結晶インゴットや石英インゴ
ット等のワークの切断方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cutting fluid for cutting and, more particularly, to a cutting fluid for a wire saw and a method for cutting a work such as a semiconductor single crystal ingot and a quartz ingot using the cutting fluid. .

【0002】[0002]

【従来の技術】従来、シリコン単結晶などのワイヤーソ
ーによるインゴット切断(スライス)用の切削液は、主
に鉱物油を主成分とする非水溶性切削液が用いられてお
り、この切削液にシリコンカーバイドなどの砥粒を混合
・分散させた分散液を切削剤(スラリー)としてインゴ
ット切断部に供給することにより、インゴットの切断が
行われる。この被切断品は、洗浄工程を経て次工程に供
される。また、インゴット切断に用いられた後の切削剤
(スラリー)は最終的には廃棄物として処理されてい
る。前記スライス品の洗浄は、これに付着する切削液等
を除去するものであり、従来、洗浄剤として有機溶剤系
のハロゲン化合物(例えばフロン113、トリクロロエ
タン、塩化メチレン等の有機塩素化合物)が用いられて
来た。この有機溶剤系ハロゲン化合物の洗浄液によれ
ば、洗浄作業が簡単になるという利点がある。また、上
記インゴット切断用の加工具としては、上記ワイヤーソ
ー以外に、通常は外周刃又は内周刃が用いられている。
しかし、直径6インチ以上の比較的大直径のインゴット
の切断には、ワイヤーソーが多用されるようになってい
る。その理由は他の加工具に比べて、より均一な厚さで
インゴットをスライスすることができ、切削屑の発生が
少なくて済むだけでなく、一度に多数枚の基板を切断す
ることができるためである。
2. Description of the Related Art Conventionally, as a cutting fluid for cutting (slicing) an ingot with a wire saw such as a silicon single crystal, a water-insoluble cutting fluid mainly containing mineral oil as a main component has been used. The ingot is cut by supplying a dispersion liquid in which abrasive grains such as silicon carbide are mixed and dispersed to the ingot cutting section as a cutting agent (slurry). This cut product is provided to the next process through the cleaning process. Further, the cutting agent (slurry) after being used for cutting the ingot is finally treated as waste. The cleaning of the sliced product is to remove cutting fluid and the like adhering to the sliced product. Conventionally, an organic solvent-based halogen compound (for example, an organic chlorine compound such as Freon 113, trichloroethane, and methylene chloride) is used as a cleaning agent. I came. The use of the organic solvent-based halogen compound cleaning liquid has an advantage that the cleaning operation is simplified. Further, as the processing tool for cutting the ingot, an outer peripheral blade or an inner peripheral blade is usually used in addition to the wire saw.
However, wire saws are often used for cutting relatively large diameter ingots having a diameter of 6 inches or more. The reason is that compared to other processing tools, the ingot can be sliced with a more uniform thickness, which not only reduces the generation of cutting chips but also cuts many substrates at once. It is.

【0003】[0003]

【発明が解決しようとする課題】しかし、鉱物油を主成
分とする切削液は、引火性のある危険物であることが多
い。また上記洗浄液として用いられる有機溶剤系ハロゲ
ン化合物、特に有機塩素化合物は、発ガン性を有し、更
に大気汚染やオゾン層の破壊の主原因になるため、最近
では使用が規制もしくは禁止されつつある。このため、
その代替品の早急な開発が待たれていた。鉱物油を主成
分とせず、かつ切断工程後に被切断品を有機溶剤系ハロ
ゲン化合物で洗浄する必要のない切削液の組成として
は、例えば水と任意に混ざり合う水溶性のものが考えら
れる。水溶性の切削液自体は公知であるが、従来のもの
では粘度が低いために砥粒を分散させることが不十分で
あった上に、摩擦係数が高くて潤滑性が不十分であっ
た。また臭いもあるという欠点もあった。
However, cutting fluids containing mineral oil as a main component are often flammable dangerous substances. In addition, organic solvent-based halogen compounds, particularly organic chlorine compounds, used as the above-mentioned cleaning liquid have carcinogenicity, and furthermore, are the main causes of air pollution and destruction of the ozone layer. . For this reason,
The immediate development of the replacement was awaited. As a composition of the cutting fluid which does not contain a mineral oil as a main component and which does not require the object to be cut to be washed with an organic solvent-based halogen compound after the cutting step, for example, a water-soluble composition which can be arbitrarily mixed with water can be considered. The water-soluble cutting fluid itself is known, but the conventional one has insufficient dispersion of abrasive grains due to low viscosity, and also has a high friction coefficient and insufficient lubricity. There was also a drawback that it also smelled.

【0004】[0004]

【課題を解決するための手段】本発明の目的は、従来の
非水溶性切削液を用いる際の引火の危険性や、被切断品
洗浄工程における有機溶剤の使用に伴う毒性や環境保全
等の諸問題を解決し、さらに水と任意に混ざり合い、簡
単な組成でかつ無臭性のワイヤーソー用切削液を提供す
ることにある。すなわち本発明は、半導体インゴット等
のワークのスライス時に使用する切削液において、プロ
ピレングリコールと合成スメクタイトと高分子ヘテロ多
糖類と水とを含むことを特徴とするワーク切削液であ
る。そして、前記プロピレングリコールの含有量が30
〜85重量%、合成スメクタイトの含有量が0.2〜
0.8重量%、高分子ヘテロ多糖類の含有量が0.05
〜0.2重量%、水の含有量が14〜69重量%である
ことが好適である。また本切削液に砥粒を分散させた分
散液を切削剤(スラリー)として用い、ワイヤーソーに
より半導体単結晶インゴット等をスライスすることを特
徴とするワークの切断方法を要旨とするものである。
SUMMARY OF THE INVENTION It is an object of the present invention to reduce the danger of ignition when using a conventional water-insoluble cutting fluid, the toxicity and the environmental protection associated with the use of an organic solvent in the washing process of a cut product. An object of the present invention is to provide a cutting fluid for wire saws which solves various problems, is arbitrarily mixed with water, has a simple composition, and has no odor. That is, the present invention relates to a cutting fluid used for slicing a workpiece such as a semiconductor ingot, which comprises propylene glycol, synthetic smectite, a polymer heteropolysaccharide, and water. And the content of the propylene glycol is 30
~ 85 wt%, synthetic smectite content 0.2 ~
0.8% by weight, the content of the polymer heteropolysaccharide is 0.05
It is preferable that the content of water is 14 to 69% by weight. The present invention also provides a method for cutting a work, characterized in that a semiconductor single crystal ingot or the like is sliced with a wire saw using a dispersion obtained by dispersing abrasive grains in the present cutting fluid as a cutting agent (slurry).

【0005】[0005]

【発明の実施の形態】以下、本発明の実施の形態を説明
する。本発明のワーク切削液は、プロピレングリコール
と合成スメクタイトと高分子ヘテロ多糖類と水とを含
む。本発明の切削液に含まれるプロピレングリコール
は、インゴットと切断装置、例えば半導体シリコン単結
晶インゴットとワイヤーソーの摩擦係数を低下させる潤
滑剤として作用すると共に切削液の粘度を上げて砥粒の
ワイヤーへの付着量を増やしてインゴットの切削効果を
高める作用がある。プロピレングリコールの含有量は3
0〜85重量%とすることが好ましい。30重量%未満
では切削液の粘度が不十分で、十分な切削性及び潤滑性
が得られず、85重量%を超えると砥粒の分散性が低下
したり、切削液が引火点を示すようになる。30〜85
重量%とすると、より好適な切削性と分散性を得ること
ができる。プロピレングリコールは有機溶剤の中では沸
点が188℃と高く、水と自由に混合し、無色、無臭、
低揮発性で、しかも毒性がほとんど無いので、食用、医
薬、化粧用にも使用されている。合成スメクタイトは、
ガードハウス構造による砥粒の分散性向上剤(砥粒沈降
防止剤)として作用するものである。合成スメクタイト
には合成ヘクトライトと合成サポナイトとがある。天然
スメクタイトの代表的なものがベントナイトである。ベ
ントナイトは純度、化学的組成、特性などに問題があ
り、砥粒の分散剤として十分に満足できるものではな
い。ヘクトライトは、一般に
Embodiments of the present invention will be described below. The work cutting fluid of the present invention contains propylene glycol, synthetic smectite, polymer heteropolysaccharide, and water. Propylene glycol contained in the cutting fluid of the present invention acts as a lubricant to reduce the friction coefficient of the ingot and the cutting device, for example, the semiconductor silicon single crystal ingot and the wire saw, and increases the viscosity of the cutting fluid to the abrasive wire. Has the effect of increasing the amount of adherence and enhancing the cutting effect of the ingot. Propylene glycol content is 3
The content is preferably set to 0 to 85% by weight. If the amount is less than 30% by weight, the viscosity of the cutting fluid is insufficient, and sufficient cutting properties and lubricity cannot be obtained. If the amount exceeds 85% by weight, the dispersibility of the abrasive grains is reduced, or the cutting fluid exhibits a flash point. become. 30-85
When the content is set to be% by weight, more suitable cutting properties and dispersibility can be obtained. Propylene glycol has a high boiling point of 188 ° C among organic solvents, is freely mixed with water, is colorless, odorless,
Since it is low volatile and has almost no toxicity, it is also used for food, medicine and cosmetics. Synthetic smectite is
It acts as an agent for improving the dispersibility of abrasive grains (an abrasive sedimentation preventing agent) with a guard house structure. Synthetic smectite includes synthetic hectorite and synthetic saponite. A typical example of natural smectite is bentonite. Bentonite has problems in purity, chemical composition, characteristics, and the like, and is not sufficiently satisfactory as a dispersant for abrasive grains. Hectorite is generally

【化1】(Mg8/3Li1/3)Si10(O
H)1/3・nHO サポナイトは、一般に
Embedded image (Mg 8/3 Li 1/3 ) Si 4 O 10 (O
H) 2 M 1/3 · nH 2 O saponite is generally

【化2】Mg(Si1/3Al1/3)O10(O
H)1/3・nHO で示され、今日工業的に合成が可能になり、いくつかの
製品が市販されているが、商品名:ルーセンタイトSW
N(コープケミカル製)、スメクトンSA(クニミネ工
業製)などを使用することが好ましい。今日、合成スメ
クタイトは、純粋な化学原料を用いて合成が可能とな
り、夾雑物を含まないため、天然スメクタイトに比べて
水に溶かした場合、透明性、砥粒分散性が大幅に改善さ
れる。上記、切削液中の合成スメクタイトの含有量は
0.2〜0.8重量%であることが好ましい。0.2重
量%未満では、砥粒の分散性が低下し、0.8重量%を
超えるとワーク切削液の粘度が高くなり過ぎるためであ
る。高分子ヘテロ多糖類は、架橋性の増粘剤として作用
するものである。ここで高分子ヘテロ多糖類は分子量2
0万以上のヘテロ多糖類が適しており、具体例として
は、植物多糖類の中のグアーガム誘導体(通常ナトリウ
ム塩)及び微生物多糖類の中のキサンタンガムを使用す
ることが好ましい。両者は天然物を出発物質とするが、
その水溶液は低濃度でも高い粘性を示し、酸、塩類その
他酵素や熱に対しても安定である。高分子ヘテロ多糖類
としては、何種類かの製品が市販されているが、グアー
ガム誘導体では、商品名:Benaqua 1000
(米国Rheox社製)、キサンタンガムでは、商品
名:コージン(興人社製)、商品名:Rheodige
l J(ソマール社扱い)などを使用することができ
る。上記、切削液中の高分子ヘテロ多糖類の含有量は
0.05〜0.2重量%であることが好ましい。0.0
5重量%未満では増粘効果が不十分で、0.2重量%を
超えると粘度が高くなり過ぎるためである。水は、本発
明の切削剤において、冷却剤及び粘度調節剤として作用
するものである。切削の後に洗浄工程に供するため、こ
こで使用する水は上水程度の純度のものを使用すること
が好ましい。水の含有量は、14〜69重量%であるこ
とが好ましい。14重量%未満では切削時の冷却力が不
十分となり、また10重量%を切ると切削液が引火点を
示すようになるので好ましくない。また、69重量%を
超えると、潤滑性や粘度不足を来すためである。特に2
0〜50重量%とすると、切削時における十分な冷却力
が保持されると共に、粘度も好適に保つことができる。
本発明のワーク切削剤は、上記成分に砥粒を添加して調
製する。ここで使用する砥粒としては、SiC,Zr
O,Alなどを挙げることができる。砥粒の粒径
は、5〜30μmであることが、研削力保持の理由から
好ましい。砥粒をワーク切削液へ添加して切削剤とする
にあたっては、その添加量をワーク切削液に対して50
〜150重量%とすることが好ましい。50重量%未満
ではワークを切削する際の研削力が不足し、150重量
%を超えると切削時の流動性が低下してワークに熱がか
かるためである。60〜120重量%とすると、良好な
流動性を保持できると共に、高い研削力を保持でき、し
かも、ワークの冷却効果が高い。本発明のワーク切削液
には、必要に応じて防錆剤や防腐剤を適宜添加してもよ
い。本発明のワーク切削液、切削剤ともに水溶性であ
り、調製も容易で引火の危険もなく、水で洗い落とせる
ことから被切断品を洗浄工程で洗浄する際に有機ハロゲ
ン化物を使用する必要がなく、作業環境を良好に保つこ
とができる。本発明のワーク切断方法においては、切削
剤調製工程において、ワーク切削剤を調製する。所定量
の合成スメクタイトを水に加えて高速撹拌機で撹拌して
分散液を調製する。この分散液にさらに所定量の高分子
ヘテロ多糖類を加えて更に撹拌する。この分散液に所定
量のプロピレングリコールを添加して撹拌し、ワーク切
削液を調製する。次いでこのワーク切削液に所定量の砥
粒を添加してよく混合し、ワーク切削剤を調製する。次
に、図1に示す切断工程において、所定の位置に半導体
単結晶シリコンインゴット1などのワークをセットす
る。このワークの所望の箇所にワーク切削剤4をポンプ
6によってノズル3を通じて供給しながら、例えば、ワ
イヤーソー2などの切断装置によってワークを切断す
る。切断後のワーク切削剤4はワーク切削剤貯留タンク
5に回収される。上記のようにしてスライスした被切断
品は、本発明の水溶性のワーク切削剤を使用しているた
め、切断後の洗浄工程において、水を用いて容易に洗い
落とすことができる。
Embedded image Mg 3 (Si 1/3 Al 1/3 ) O 10 (O
H) 2 M 1/3 · nH 2 O, which can be synthesized industrially today, and several products are commercially available. Trade name: Lucentite SW
It is preferable to use N (manufactured by Corp Chemical), Smecton SA (manufactured by Kunimine Industries) or the like. Today, synthetic smectites can be synthesized using pure chemical raw materials and do not contain contaminants. Therefore, when dissolved in water, transparency and abrasive dispersibility are greatly improved as compared with natural smectites. The content of the synthetic smectite in the cutting fluid is preferably 0.2 to 0.8% by weight. If the amount is less than 0.2% by weight, the dispersibility of the abrasive grains decreases, and if the amount exceeds 0.8% by weight, the viscosity of the work cutting fluid becomes too high. Polymeric heteropolysaccharides act as crosslinkable thickeners. Here, the polymer heteropolysaccharide has a molecular weight of 2
More than 10,000 heteropolysaccharides are suitable, and specific examples include the use of guar gum derivatives (usually sodium salts) in plant polysaccharides and xanthan gum in microbial polysaccharides. Both use natural products as starting materials,
The aqueous solution has a high viscosity even at a low concentration, and is stable to acids, salts, other enzymes and heat. As the polymer heteropolysaccharide, several types of products are commercially available, and among the guar gum derivatives, trade name: Benaqua 1000
(Rheox, USA), xanthan gum, trade name: Kojin (produced by Kojin), trade name: Rheodige
1J (treated by Somar) can be used. The content of the polymer heteropolysaccharide in the cutting fluid is preferably 0.05 to 0.2% by weight. 0.0
If it is less than 5% by weight, the thickening effect is insufficient, and if it exceeds 0.2% by weight, the viscosity becomes too high. Water acts as a coolant and a viscosity modifier in the cutting agent of the present invention. It is preferable to use water having a purity equivalent to that of tap water in order to provide a washing step after cutting. The water content is preferably from 14 to 69% by weight. If it is less than 14% by weight, the cooling power at the time of cutting will be insufficient, and if it is less than 10% by weight, the cutting fluid will show a flash point, which is not preferable. On the other hand, if it exceeds 69% by weight, lubricity and viscosity are insufficient. Especially 2
When the content is 0 to 50% by weight, a sufficient cooling power at the time of cutting can be maintained, and the viscosity can be suitably maintained.
The work cutting agent of the present invention is prepared by adding abrasive grains to the above components. The abrasive grains used here are SiC, Zr
O, Al 2 O 3 and the like can be mentioned. The particle size of the abrasive grains is preferably 5 to 30 μm from the viewpoint of maintaining the grinding force. When adding abrasive grains to the work cutting fluid to form a cutting agent, the amount of addition should be 50 to the work cutting fluid.
It is preferable to set it to 150% by weight. If the amount is less than 50% by weight, the grinding force at the time of cutting the work is insufficient. When the content is 60 to 120% by weight, good fluidity can be maintained, a high grinding force can be maintained, and a work cooling effect is high. A rust preventive or a preservative may be appropriately added to the work cutting fluid of the present invention as needed. The work cutting fluid and the cutting agent of the present invention are both water-soluble, are easy to prepare, have no danger of ignition, and can be washed off with water, so that it is necessary to use an organic halide when washing the workpiece in the washing step. And a good working environment can be maintained. In the work cutting method of the present invention, a work cutting agent is prepared in the cutting agent preparation step. A predetermined amount of synthetic smectite is added to water and stirred with a high-speed stirrer to prepare a dispersion. A predetermined amount of the polymer heteropolysaccharide is further added to the dispersion, and the mixture is further stirred. A predetermined amount of propylene glycol is added to the dispersion and stirred to prepare a work cutting liquid. Next, a predetermined amount of abrasive grains is added to the work cutting fluid and mixed well to prepare a work cutting agent. Next, in the cutting step shown in FIG. 1, a work such as a semiconductor single crystal silicon ingot 1 is set at a predetermined position. The work is cut by a cutting device such as a wire saw 2 while supplying the work cutting agent 4 to a desired portion of the work through the nozzle 3 by the pump 6. The work cutting agent 4 after cutting is collected in the work cutting agent storage tank 5. The cut product sliced as described above uses the water-soluble work cutting agent of the present invention, so that it can be easily washed off with water in the washing step after cutting.

【0006】[0006]

【実施例】以下の実施例により、本発明をさらに具体的
に説明するが、本発明はこれらの実施例に何等限定され
るものではない。
EXAMPLES The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.

【実施例1】合成スメクタイト商品名:SWN(コープ
ケミカル製)150gを水11.8kgに添加して高速
撹拌機にて、10分間撹拌して、分散液を調製した。次
いで、この分散液に高分子ヘテロ多糖類であるグアーガ
ム誘導体商品名:Benaqua 1000(米国Rh
eox社製)30gを添加して、更に3分間撹拌して高
粘度分散液を調製した。次いで、この分散液にプロピレ
ングリコール28kgを加えて、5分間撹拌して、ワー
ク切削液を調製した。次いで、砥粒GP600(信濃電
気精錬製、成分SiC、平均粒径16μm)10kg
を、上で調製したワーク切削液10kgに添加して、1
0分間低速で撹拌して、本発明のワーク切削剤を調製し
た。
Example 1 A dispersion was prepared by adding 150 g of synthetic smectite trade name: SWN (manufactured by Corp Chemical) to 11.8 kg of water and stirring for 10 minutes with a high-speed stirrer. Next, a guar gum derivative, which is a polymer heteropolysaccharide, trade name: Benaqua 1000 (Rh, USA)
eox) (30 g) and stirred for 3 minutes to prepare a high viscosity dispersion. Next, 28 kg of propylene glycol was added to the dispersion and stirred for 5 minutes to prepare a work cutting liquid. Next, 10 kg of abrasive GP600 (Shinano Electric Refining Co., component SiC, average particle size 16 μm)
Was added to 10 kg of the work cutting fluid prepared above, and 1
The mixture was stirred at a low speed for 0 minute to prepare a work cutting agent of the present invention.

【実施例2】合成スメクタイトとして商品名:スメクト
ンSA(クニミネ工業製)150g、高分子ヘテロ多糖
類として、キサンタンガム商品名:コージン(興人社
製)30gに代えた他は実施例1と同じ処方・方法でワ
ーク切削剤を調製した。
Example 2 The same formulation as in Example 1 except that the synthetic smectite was replaced by 150 g of smecton SA (manufactured by Kunimine Industries) and the polymer heteropolysaccharide was replaced by 30 g of xanthan gum trade name: Kojin (manufactured by Kojin).・ Work cutting agent was prepared by the method.

【比較例】切削液として、鉱物油を含む従来の切削液
商品名:PS−LW−1(パレス化学社製)を用いた他
は実施例1と同様にして、切削剤を調製した。実施例お
よび比較例の切削液および切削剤について、以下の物性
を測定した。 1)水溶性:切削液と水とを1:0.5〜1:5.0の
範囲で混合して、水に対する溶解性を均質化を指標とし
て、目視にて観察した。 2)比 重:切削液を20℃で測定した。 3)粘 度:ビスコテスターVT−04(リオン社製)
を用い、3号ローターで、回転数62.5rpmで測定
した。 4)沸 点:切削液で測定した。 5)引火点:切削液で測定した。 6)分散率:切削剤を24時間静置した後、液全体に対
する沈降高さを%で表示した。 7)臭 気:室温における切削液の臭気を示した。 以上の物性値の測定結果を表1に示す。
[Comparative Example] Conventional cutting fluid containing mineral oil as cutting fluid
Trade name: A cutting agent was prepared in the same manner as in Example 1 except that PS-LW-1 (manufactured by Palace Chemical Company) was used. The following physical properties were measured for the cutting fluids and cutting agents of Examples and Comparative Examples. 1) Water solubility: Cutting fluid and water were mixed in the range of 1: 0.5 to 1: 5.0, and the solubility in water was visually observed using homogenization as an index. 2) Specific gravity: The cutting fluid was measured at 20 ° C. 3) Viscosity: Visco Tester VT-04 (manufactured by Rion)
Was measured with a No. 3 rotor at a rotation speed of 62.5 rpm. 4) Boiling point: Measured with cutting fluid. 5) Flash point: measured with cutting fluid. 6) Dispersion: After the cutting agent was allowed to stand for 24 hours, the sedimentation height with respect to the whole liquid was indicated by%. 7) Odor: Odor of the cutting fluid at room temperature was shown. Table 1 shows the measurement results of the above physical properties.

【表1】 表1に示したように、本発明のワーク切削剤は、比較例
に示す従来の切削剤と同等の取り扱い性を有しているこ
とが明らかになった。更に、本発明のワーク切削剤は無
臭で、作業中に引火する恐れもない。また、本発明の切
削剤を使用した場合を、従来の切削剤を使用した場合と
比較すると、切断されたウヱーハーの厚みの均一性、切
断屑の発生、切断できる枚数などにおいても相違はなか
った。
[Table 1] As shown in Table 1, it became clear that the work cutting agent of the present invention had the same handling properties as the conventional cutting agent shown in Comparative Examples. Further, the work cutting agent of the present invention has no odor and there is no danger of catching fire during work. In addition, when the cutting agent of the present invention was used, there was no difference in the uniformity of the thickness of the cut wafer, generation of cutting chips, the number of pieces that could be cut, and the like, as compared with the case of using the conventional cutting agent. .

【0007】[0007]

【発明の効果】本発明によれば、水溶性の、無臭のワー
ク切削液および切削剤を提供することができる。更に、
本発明のワーク切削剤は、被切断品から水で容易に洗い
落とすことができ、洗浄工程における作業環境を良好に
保つことができる。また、環境に対する問題も引き起こ
さない。
According to the present invention, a water-soluble, odorless work cutting fluid and a cutting agent can be provided. Furthermore,
The work cutting agent of the present invention can be easily washed off from a cut product with water, and can maintain a favorable working environment in the washing process. Also, it does not cause environmental problems.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は切断工程を示す概略図である。FIG. 1 is a schematic view showing a cutting step.

【符号の説明】[Explanation of symbols]

1 シリコン単結晶インゴット 2 ワイヤーソー 3 ノズル 4 ワーク切削剤 5 ワーク切削剤貯留タンク 6 ポンプ DESCRIPTION OF SYMBOLS 1 Silicon single crystal ingot 2 Wire saw 3 Nozzle 4 Work cutting agent 5 Work cutting agent storage tank 6 Pump

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) //(C10M 105/14 145:40 125:30) C10N 10:04 30:04 40:22 Continuation of the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (reference) // (C10M 105/14 145: 40 125: 30) C10N 10:04 30:04 40:22

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】プロピレングリコールと合成スメクタイト
と高分子ヘテロ多糖類と水とを含むことを特徴とするワ
ーク切削液
1. A workpiece cutting fluid comprising propylene glycol, synthetic smectite, a polymer heteropolysaccharide, and water.
【請求項2】前記プロピレングリコールの含有量が30
〜85重量%、前記合成スメクタイトの含有量が0.2
〜0.8重量%、前記高分子ヘテロ多糖類の含有量が
0.05〜0.2重量%、前記水の含有量が14〜69
重量%であることを特徴とする請求項1に記載のワーク
切削液
2. The propylene glycol content of 30
~ 85 wt%, the content of the synthetic smectite is 0.2
-0.8 wt%, the content of the polymer heteropolysaccharide is 0.05-0.2 wt%, and the water content is 14-69.
2. The cutting fluid according to claim 1, wherein the weight is% by weight. 3.
【請求項3】請求項1項及び2項に記載の切削液に砥粒
を分散させた分散液を切削剤(スラリー)として用い、
ワイヤーソーによりワークをスライスすることを特徴と
するワークの切断方法
3. A cutting liquid (a slurry) obtained by dispersing abrasive grains in the cutting liquid according to claim 1 or 2 as a cutting agent (slurry),
A method for cutting a work, comprising slicing the work with a wire saw
JP29900398A 1998-09-16 1998-09-16 Cutting liquid and cutting of work Pending JP2000087059A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29900398A JP2000087059A (en) 1998-09-16 1998-09-16 Cutting liquid and cutting of work

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29900398A JP2000087059A (en) 1998-09-16 1998-09-16 Cutting liquid and cutting of work

Publications (1)

Publication Number Publication Date
JP2000087059A true JP2000087059A (en) 2000-03-28

Family

ID=17866988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29900398A Pending JP2000087059A (en) 1998-09-16 1998-09-16 Cutting liquid and cutting of work

Country Status (1)

Country Link
JP (1) JP2000087059A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002060777A (en) * 2000-08-22 2002-02-26 Ishii Hyoki Corp Aqueous slurry for wire saw
JP2002080883A (en) * 2000-06-20 2002-03-22 Neos Co Ltd Water soluble processing liquid for wire saw
JP2003082334A (en) * 2001-09-06 2003-03-19 Yushiro Chem Ind Co Ltd Water-soluble work liquid composition for abrasive train fixed wire saw
JP2006249320A (en) * 2005-03-11 2006-09-21 Toshiba Mach Co Ltd Aqueous lubricant for machining and method for machining
JP2007227659A (en) * 2006-02-23 2007-09-06 Sharp Corp Manufacturing method of washed-off silicon wafer
WO2010120491A3 (en) * 2009-04-01 2011-01-13 Cabot Microelectronics Corporation Self-cleaning wiresaw apparatus and method
EP2376587A1 (en) * 2008-12-19 2011-10-19 Cabot Microelectronics Corporation Slurry composition containing non-ionic polymer and method for use
CN113845956A (en) * 2021-11-10 2021-12-28 江苏智摩金属抗磨修复有限责任公司 Wear-resistant self-repairing material for heavy-duty gear box and preparation method thereof

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002080883A (en) * 2000-06-20 2002-03-22 Neos Co Ltd Water soluble processing liquid for wire saw
JP2002060777A (en) * 2000-08-22 2002-02-26 Ishii Hyoki Corp Aqueous slurry for wire saw
JP2003082334A (en) * 2001-09-06 2003-03-19 Yushiro Chem Ind Co Ltd Water-soluble work liquid composition for abrasive train fixed wire saw
JP4497767B2 (en) * 2001-09-06 2010-07-07 ユシロ化学工業株式会社 Water-soluble machining fluid composition for fixed abrasive wire saw
JP2006249320A (en) * 2005-03-11 2006-09-21 Toshiba Mach Co Ltd Aqueous lubricant for machining and method for machining
JP2007227659A (en) * 2006-02-23 2007-09-06 Sharp Corp Manufacturing method of washed-off silicon wafer
JP4637034B2 (en) * 2006-02-23 2011-02-23 シャープ株式会社 Manufacturing method of cleaned silicon wafer
EP2376587A1 (en) * 2008-12-19 2011-10-19 Cabot Microelectronics Corporation Slurry composition containing non-ionic polymer and method for use
JP2012512951A (en) * 2008-12-19 2012-06-07 キャボット マイクロエレクトロニクス コーポレイション Slurry composition containing nonionic polymer and method of using the same
EP2376587A4 (en) * 2008-12-19 2014-10-29 Cabot Microelectronics Corp Slurry composition containing non-ionic polymer and method for use
WO2010120491A3 (en) * 2009-04-01 2011-01-13 Cabot Microelectronics Corporation Self-cleaning wiresaw apparatus and method
CN113845956A (en) * 2021-11-10 2021-12-28 江苏智摩金属抗磨修复有限责任公司 Wear-resistant self-repairing material for heavy-duty gear box and preparation method thereof

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