JP2000057953A - Automatic pre-processing device for measuring concentration of hydrofluoric acid, and automatic hydrofluoric acid supplying device - Google Patents
Automatic pre-processing device for measuring concentration of hydrofluoric acid, and automatic hydrofluoric acid supplying deviceInfo
- Publication number
- JP2000057953A JP2000057953A JP10221466A JP22146698A JP2000057953A JP 2000057953 A JP2000057953 A JP 2000057953A JP 10221466 A JP10221466 A JP 10221466A JP 22146698 A JP22146698 A JP 22146698A JP 2000057953 A JP2000057953 A JP 2000057953A
- Authority
- JP
- Japan
- Prior art keywords
- hydrofluoric acid
- concentration
- automatic
- acid solution
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ふっ酸液の濃度測
定のための自動前処理装置及びふっ酸液の自動供給装置
に関するものであり、特にブラウン管の製造において、
ガラスパネル内面の洗浄工程で使用されるふっ酸液の濃
度測定のための自動前処理装置、及び、該洗浄工程で使
用されるふっ酸液の自動供給装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an automatic pretreatment device for measuring the concentration of a hydrofluoric acid solution and an automatic supply device for a hydrofluoric acid solution.
The present invention relates to an automatic pretreatment device for measuring the concentration of a hydrofluoric acid solution used in a cleaning step of a glass panel inner surface, and an automatic supply device of a hydrofluoric acid solution used in the cleaning step.
【０００２】[0002]
【従来の技術】ブラウン管の製造工程において、ガラス
パネル内面に蛍光体含有液を塗布して蛍光面を形成する
に先だって、蛍光面形成面の汚れを落とすために、ガラ
スパネル内面をふっ酸液を用いて前処理する必要があ
る。このとき使用されるふっ酸液は良好な洗浄効果を得
るために、所定のふっ酸濃度に厳密に維持管理する必要
がある。しかも、洗浄に使用したふっ酸液は回収して繰
り返して使用するため、時間の経過とともにふっ酸が揮
散し、また、化学反応により、一般にふっ酸濃度が徐々
に低下していく。したがって、洗浄工程で使用するふっ
酸濃度を常に測定し、これを一定に維持するシステムが
必要となる。2. Description of the Related Art In a cathode ray tube manufacturing process, prior to applying a phosphor-containing liquid to the inner surface of a glass panel to form a fluorescent screen, a hydrofluoric acid solution is applied to the inner surface of the glass panel to remove dirt on the fluorescent screen forming surface. It must be used for pretreatment. The hydrofluoric acid solution used at this time must be strictly maintained at a predetermined hydrofluoric acid concentration in order to obtain a good cleaning effect. In addition, since the hydrofluoric acid solution used for washing is collected and used repeatedly, hydrofluoric acid volatilizes over time, and the concentration of hydrofluoric acid generally gradually decreases due to a chemical reaction. Therefore, there is a need for a system that constantly measures the concentration of hydrofluoric acid used in the washing step and keeps it constant.
【０００３】洗浄工程途中でふっ酸液の濃度を測定する
に際しては、回収したふっ酸液を直接濃度測定装置に導
入すると、回収液中の懸濁物により配管系が閉塞した
り、電磁弁やサンプル計量弁などの摺動部の磨耗を促進
したりして、故障等のトラブルが発生しやすい。そこ
で、濃度測定に際しては、予め前処理として、懸濁した
ふっ酸回収液中の粒子等の固形物を濾過等の方法で分離
して、溶液部のみを濃度測定装置に導入する必要があ
る。When measuring the concentration of the hydrofluoric acid solution during the washing process, if the recovered hydrofluoric acid solution is directly introduced into a concentration measuring device, the suspended matter in the recovered solution may cause clogging of the piping system, electromagnetic valves and the like. Troubles such as failures are likely to occur due to accelerated wear of sliding parts such as sample measuring valves. Therefore, at the time of concentration measurement, it is necessary to separate solids such as particles in the suspended hydrofluoric acid recovery solution by a method such as filtration as a pretreatment in advance, and to introduce only the solution part into the concentration measurement device.
【０００４】また、濃度測定等をある程度自動的に行う
ようにされた一般的な自動分析装置は、水溶液やその他
の溶媒に溶け込んだイオンとの化学反応で当量点を判断
する。このため、ブラウン管のパネル洗浄に用いる洗浄
回収液のように、溶解物、即ち蛍光体、アルミ膜、ポリ
ビニルアルコール薄膜、グラファイトカーボン等のスク
リーン表面を形成する各種材料が混入した懸濁液の場合
は予め濾過という操作が必要である。Further, a general automatic analyzer configured to perform concentration measurement and the like to some extent automatically determines an equivalent point by a chemical reaction with ions dissolved in an aqueous solution or another solvent. For this reason, in the case of a suspension in which various materials that form the screen surface such as a phosphor, an aluminum film, a polyvinyl alcohol thin film, and graphite carbon are mixed, such as a washing and recovering solution used for washing a CRT panel. An operation called filtration is required in advance.
【０００５】従って、従来、ふっ酸回収液を自動分析装
置により濃度測定しようとする場合であっても、予めふ
っ酸回収液を手動により濾過していた。Therefore, conventionally, even when the concentration of the hydrofluoric acid recovery solution is to be measured by an automatic analyzer, the hydrofluoric acid recovery solution has been manually filtered in advance.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、ブラウ
ン管の生産工程は大部分が自動化されており、ふっ酸洗
浄液の濃度管理においても、ふっ酸回収液の自動分析装
置を導入して一連の作業を自動化することが望まれる。However, most of the production process of the CRT is automated, and even in controlling the concentration of the hydrofluoric acid cleaning solution, an automatic analyzer for the hydrofluoric acid recovery solution is introduced to automate a series of operations. It is desired to do.
【０００７】自動分析装置を自動化工程に導入するため
には、自動フィルターシステムを確立する必要がある。
また、ブラウン管の製造工程は２４時間稼働ラインが多
く、ラインを停止することなく、フィルタ交換等のメン
テナンスが可能なシステムが必要である。In order to introduce an automatic analyzer into an automation process, it is necessary to establish an automatic filter system.
Further, the production process of a cathode ray tube has many lines operating for 24 hours, and a system capable of performing maintenance such as filter replacement without stopping the line is required.
【０００８】また、回収して再使用されるふっ酸洗浄液
の濃度を所定濃度に維持するために、目標値と測定値と
の差から求められるふっ酸新液の注加量の決定と、注加
作業を自動化する必要がある。In addition, in order to maintain the concentration of the hydrofluoric acid cleaning solution to be recovered and reused at a predetermined concentration, the amount of the new hydrofluoric acid solution to be added determined from the difference between the target value and the measured value is determined. Additional work needs to be automated.
【０００９】さらに、繰り返しの使用によって劣化した
ふっ酸洗浄液に代えて、新たにふっ酸液を調合する作業
を自動化する必要がある。Further, it is necessary to automate the operation of preparing a new hydrofluoric acid solution instead of the hydrofluoric acid cleaning solution deteriorated by repeated use.
【００１０】本発明は、ガラスパネルの洗浄に使用する
ふっ酸洗浄液の濃度管理作業に自動分析装置を組み込む
ことにより、ふっ酸洗浄液の維持管理を自動化して、こ
れによりブラウン管の製造の安定化とコストの低減及び
作業者の安全確保を図ることを最終目的とし、これを可
能にするふっ酸液の濃度測定のための自動前処理装置、
及びふっ酸液の自動供給装置を提供することを目的とす
る。The present invention automates the maintenance of the hydrofluoric acid cleaning solution by incorporating an automatic analyzer into the concentration control operation of the hydrofluoric acid cleaning solution used for cleaning the glass panel, thereby stabilizing the production of the CRT. An automatic pretreatment device for measuring the concentration of hydrofluoric acid solution, with the ultimate goal of reducing costs and ensuring worker safety,
And an automatic supply device for a hydrofluoric acid solution.
【００１１】[0011]
【課題を解決するための手段】本発明は上記の目的を達
成するために以下の構成とする。The present invention has the following configuration to achieve the above object.
【００１２】即ち、本発明にかかるふっ酸液の濃度測定
のための自動前処理装置は、ガラスの洗浄工程に使用す
るふっ酸液の濃度測定のための自動前処理装置であっ
て、濃度測定に先だって前記ふっ酸液を濾過するフィル
タと、前記フィルタを逆洗浄する逆洗浄装置とを有する
ことを特徴とする。かかる本発明の構成によれば、ふっ
酸液の濃度測定に先だってふっ酸液をフィルタで濾過す
るので、懸濁物のない被測定液を自動的に得ることがで
き、懸濁物による装置のトラブルや測定誤差を抑えるこ
とができる。また、濾過後、フィルタを逆洗浄するの
で、フィルタ再生がなされ、フィルタ寿命が大幅に伸び
るとともに、順次濃度測定を自動的に行うことができ
る。そして、フィルタ濾過及び逆洗浄という一連の作業
を自動的に行うことができるので、本発明の自動前処理
装置をふっ酸自動濃度調整装置と組む合わせることによ
り、濃度管理されたふっ酸液を安定的に得ることが可能
になるので、ガラスの洗浄工程の完全自動化を実現する
ことができる。That is, the automatic pretreatment device for measuring the concentration of a hydrofluoric acid solution according to the present invention is an automatic pretreatment device for measuring the concentration of a hydrofluoric acid solution used in a glass washing step, Prior to this, a filter for filtering the hydrofluoric acid solution and a backwashing device for backwashing the filter are provided. According to the configuration of the present invention, since the hydrofluoric acid solution is filtered by the filter prior to the concentration measurement of the hydrofluoric acid solution, the liquid to be measured without the suspension can be automatically obtained, and the apparatus using the suspension can be used. Troubles and measurement errors can be suppressed. Further, since the filter is backwashed after the filtration, the filter is regenerated, the life of the filter is greatly extended, and the concentration measurement can be automatically performed sequentially. Since a series of operations such as filter filtration and back washing can be performed automatically, the concentration-controlled hydrofluoric acid solution can be stabilized by combining the automatic pretreatment device of the present invention with the hydrofluoric acid automatic concentration adjusting device. Therefore, it is possible to completely automate the glass cleaning process.
【００１３】上記の構成において、前記濾過に要する時
間を計測し、濾過時間が所定時間を越えたときは警報を
発する機能を有することが好ましい。かかる好ましい構
成によれば、フィルタの逆洗浄によってもフィルタが完
全に再生されず、目詰まりを生じ、濾過機能が低下して
いることを容易に知ることができるので、適切な処置を
早期にとることが可能になり、装置全体の稼働率の向上
を図ることができる。In the above configuration, it is preferable to have a function of measuring a time required for the filtration and issuing an alarm when the filtration time exceeds a predetermined time. According to such a preferable configuration, the filter is not completely regenerated even by the backwashing of the filter, the clogging occurs, and it is possible to easily know that the filtration function is deteriorated. Therefore, appropriate measures are taken at an early stage. It is possible to improve the operation rate of the entire apparatus.
【００１４】また、上記の構成において、フィルタを複
数個有することが好ましい。かかる好ましい構成によれ
ば、フィルタの目詰まり等により濾過機能が低下した場
合に、次のフィルタで濾過するように被測定液（ふっ酸
液）の配管ラインを切り替えることにより、フィルタ交
換などの作業による自動前処理装置の停止を防止するこ
とができ、洗浄工程の自動化ラインの稼働率の低下を防
止することができる。Further, in the above configuration, it is preferable to have a plurality of filters. According to this preferred configuration, when the filtering function is deteriorated due to clogging of the filter or the like, the piping for the liquid to be measured (hydrofluoric acid solution) is switched so that the next filter is used for filtration, thereby performing operations such as filter replacement. Can prevent the stoppage of the automatic pretreatment device, and can prevent a reduction in the operation rate of the automation line for the cleaning process.
【００１５】また、上記の構成において、前記フィルタ
の逆洗浄を気体を用いて行うことが好ましい。かかる好
ましい構成によれば、液体（例えば蒸留水又はふっ酸新
液）を用いて逆洗浄する場合と比較して、逆洗浄後にフ
ィルタにふっ酸濃度を変動させる要因を残すことがない
ので、続けて次の被測定液のフィルタ濾過を行っても、
被測定液の濃度変化が生じない。したがって、正確な濃
度測定が可能になるとともに、連続して濃度測定を行う
ことができ、被測定液の前処理装置の自動化に大きく貢
献する。In the above structure, it is preferable that the backwashing of the filter is performed by using a gas. According to such a preferred configuration, compared to the case of back washing using a liquid (for example, distilled water or a new solution of hydrofluoric acid), there is no factor that causes the concentration of hydrofluoric acid to fluctuate in the filter after the back washing. Even after performing the next filtration of the liquid to be measured,
There is no change in the concentration of the liquid to be measured. Therefore, accurate concentration measurement can be performed, and concentration measurement can be performed continuously, which greatly contributes to automation of a pretreatment device for the liquid to be measured.
【００１６】また、本発明にかかるふっ酸液の自動供給
装置は、ガラスの洗浄工程に使用するふっ酸液の自動供
給装置であって、前記ふっ酸液を濾過するフィルタを有
する自動前処理装置と、前記濾過されたふっ酸液のふっ
酸濃度を測定する濃度測定装置及び前記測定されたふっ
酸濃度に基づいて、所定濃度になるように前記ふっ酸液
にふっ酸を供給する供給装置を有するふっ酸自動濃度調
整装置とを有することを特徴とする。かかる本発明の構
成によれば、ふっ酸液の濃度測定に先だってふっ酸液を
フィルタで濾過する自動前処理装置を有するので、懸濁
物のない被測定液を自動的に得ることができ、懸濁物に
よる装置のトラブルや測定誤差を抑えることができる。
また、濾過されたふっ酸液を濃度測定する濃度測定装置
と、所定濃度になるようにふっ酸を供給する供給装置と
を有するふっ酸自動濃度調整装置を有するので、所定濃
度のふっ酸洗浄液を効率よく調製することができる。そ
して、これらの一連の作業を自動的に行うことができる
ので、濃度管理されたふっ酸液を安定的に得ることが可
能になるので、ガラスの洗浄工程の完全自動化による省
力化と作業者の安全確保を実現することができる。Further, an apparatus for automatically supplying a hydrofluoric acid solution according to the present invention is an apparatus for automatically supplying a hydrofluoric acid solution used in a glass cleaning step, wherein the automatic pretreatment apparatus has a filter for filtering the hydrofluoric acid solution. A concentration measuring device for measuring the concentration of hydrofluoric acid in the filtered hydrofluoric acid solution, and a supply device for supplying hydrofluoric acid to the hydrofluoric acid solution to a predetermined concentration based on the measured hydrofluoric acid concentration. And a hydrofluoric acid automatic concentration adjusting device. According to the configuration of the present invention, since the hydrofluoric acid solution has an automatic pretreatment device for filtering with a filter prior to the concentration measurement of the hydrofluoric acid solution, the liquid to be measured without suspension can be obtained automatically, It is possible to suppress the trouble of the apparatus and the measurement error due to the suspension.
In addition, since there is provided a concentration measuring device for measuring the concentration of the filtered hydrofluoric acid solution and a hydrofluoric acid automatic concentration adjusting device having a supply device for supplying hydrofluoric acid to a predetermined concentration, the hydrofluoric acid cleaning solution having a predetermined concentration is used. It can be efficiently prepared. Since a series of these operations can be performed automatically, it is possible to stably obtain a hydrofluoric acid solution of which concentration is controlled. Safety can be ensured.
【００１７】上記の構成において、前記ふっ酸自動濃度
調整装置が、さらに、ふっ酸液を新たに調合する機能を
有することが好ましい。かかる好ましい構成によれば、
繰り返し使用により劣化したふっ酸洗浄液の交換時にお
いて、新たにふっ酸液を自動調合して洗浄工程に使用す
ることができるので、ふっ酸液の交換作業による洗浄工
程の長時間停止を防止することができる。また、作業者
がふっ酸液に触れることなく安全に交換作業を行うこと
ができる。この結果、洗浄工程におけるふっ酸液の交換
作業による停止時間の短縮と、作業者に対する安全確保
が可能になる。In the above configuration, it is preferable that the hydrofluoric acid automatic concentration adjusting device further has a function of newly preparing a hydrofluoric acid solution. According to such a preferred configuration,
When replacing the hydrofluoric acid cleaning solution that has deteriorated due to repeated use, a new hydrofluoric acid solution can be automatically prepared and used in the cleaning process, so that the cleaning process can be prevented from being stopped for a long time by replacing the hydrofluoric acid solution. Can be. Further, the replacement operation can be performed safely without the operator touching the hydrofluoric acid solution. As a result, it is possible to shorten the stop time due to the replacement of the hydrofluoric acid solution in the cleaning process and to ensure safety for the operator.
【００１８】上記の構成を有する本発明のふっ酸液の濃
度測定のための自動前処理装置及びふっ酸液の自動供給
装置は、ふっ酸液を用いたガラス洗浄工程に広く使用す
ることができるが、中でもブラウン管の製造工程、及び
管球用ガラスの洗浄工程に好ましく使用することができ
る。The automatic pretreatment device for hydrofluoric acid solution concentration measurement and the automatic hydrofluoric acid solution supply device of the present invention having the above-mentioned structure can be widely used in a glass cleaning process using a hydrofluoric acid solution. However, it can be preferably used particularly in a cathode ray tube manufacturing process and a tube glass washing process.
【００１９】[0019]
【発明の実施の形態】以下に本発明の実施の形態を図面
を参照しながら具体的に説明する。Embodiments of the present invention will be specifically described below with reference to the drawings.
【００２０】図１は、本発明のふっ酸液の自動供給装置
の全体構成を示した概略図である。FIG. 1 is a schematic view showing the entire configuration of an automatic hydrofluoric acid solution supply apparatus according to the present invention.
【００２１】図示した自動供給装置は、ふっ酸洗浄液を
貯蔵する洗浄槽２１０ａ，２１０ｂと、濃度測定をする
に際して予めふっ酸洗浄液を濾過する自動フィルタユニ
ット１００ａ，１００ｂと、ふっ酸の濃度測定を行う自
動分析装置２０１とを有する。図示した装置は、洗浄工
程が２系列（ラインＡ，ラインＢ）ある場合を想定して
おり、これに対応して洗浄槽及び自動フィルターユニッ
トをそれぞれ２系列有している。The illustrated automatic supply apparatus performs cleaning tanks 210a and 210b for storing a hydrofluoric acid cleaning liquid, automatic filter units 100a and 100b for filtering the hydrofluoric acid cleaning liquid in advance when measuring the concentration, and performs the concentration measurement of hydrofluoric acid. And an automatic analyzer 201. The illustrated apparatus assumes a case where there are two cleaning processes (line A and line B), and has two cleaning tanks and two automatic filter units corresponding to this.
【００２２】洗浄槽２１０ａ，２１０ｂに貯蔵されたふ
っ酸洗浄液は、配管２１１ａ，２１１ｂにより各洗浄工
程（図示せず）に送られ、配管２１２ａ，２１２ｂによ
り洗浄槽２１０ａ，２１０ｂに回収される。このように
して洗浄液は、洗浄工程と洗浄槽との間を循環して使用
される。The hydrofluoric acid cleaning liquid stored in the cleaning tanks 210a and 210b is sent to each cleaning step (not shown) by the pipes 211a and 211b, and is collected by the cleaning tanks 210a and 210b by the pipes 212a and 212b. Thus, the cleaning liquid is used by circulating between the cleaning step and the cleaning tank.
【００２３】ふっ酸洗浄液の濃度測定は、一定の周期ご
とに、懸濁したふっ酸洗浄液をサンプルポンプ１１１
ａ，１１１ｂ及びサンプル供給配管１１２ａ，１１２ｂ
を通じて自動フィルタユニット１００ａ，１００ｂに供
給し、濾過した後、配管１９１ａ，１９１ｂを通じて自
動分析装置２０１に送られて行われる。図１のように洗
浄工程及び洗浄槽が複数ある場合には、各洗浄槽ごと
に、被測定液を順次自動分析装置２０１に送り濃度測定
を行うことができる。In measuring the concentration of the hydrofluoric acid cleaning solution, the suspended hydrofluoric acid cleaning solution is sampled at regular intervals.
a, 111b and sample supply pipes 112a, 112b
After being supplied to the automatic filter units 100a and 100b through the filter and filtered, it is sent to the automatic analyzer 201 through the pipes 191a and 191b and performed. When there are a plurality of washing steps and washing tanks as shown in FIG. 1, the liquid to be measured can be sequentially sent to the automatic analyzer 201 for each washing tank to measure the concentration.
【００２４】自動分析装置２０１の測定結果に基づい
て、ふっ酸濃度を所定の目標値に維持するために、ふっ
酸新液供給タンク２２０に貯蔵されたふっ酸新液を定量
性ポンプ２２１及び配管２２２を通じて所定の洗浄槽に
供給する。On the basis of the measurement result of the automatic analyzer 201, in order to maintain the hydrofluoric acid concentration at a predetermined target value, the hydrofluoric acid fresh liquid stored in the hydrofluoric acid fresh liquid supply tank 220 is supplied to the quantitative pump 221 and the piping. It supplies to a predetermined washing tank through 222.
【００２５】図２は、図１に示した自動フィルタユニッ
トの構成の詳細を示した図である。被測定液はふっ酸洗
浄槽２１０ａ（又は２１０ｂ）よりサンプルポンプ１１
１ａ（又は１１１ｂ）の供給圧力でフッ素樹脂製の耐酸
配管１１２ａ（又は１１２ｂ）を通り、入り口電磁バル
ブ１１３の解放により、導入配管１１４を通り、入り口
側コック１１５により、ポリエチレン又はフッ素系樹脂
などからなる耐酸性のフィルタ１２０，１２１の一方に
送られる。フィルタで懸濁物を除去された被測定液は、
濾過側コック１１６を通り、気液分離器１１７に貯めら
れる。気液分離器１１７内の液面は液面センサ１１８で
監視され、規定の液量に達すると入り口側電磁バルブ１
１３と出口側電磁バルブ１８２を閉じる。気液分離器１
１７に貯蔵された被測定液は、配管１９１ａ（又は１９
１ｂ）を通じて自動分析装置２０１に吸引される。FIG. 2 is a diagram showing details of the configuration of the automatic filter unit shown in FIG. The liquid to be measured is supplied to the sample pump 11 from the hydrofluoric acid cleaning tank 210a (or 210b).
At the supply pressure of 1a (or 111b), it passes through the acid-resisting pipe 112a (or 112b) made of fluororesin, opens the inlet electromagnetic valve 113, passes through the inlet pipe 114, and enters the inlet cock 115 from polyethylene or fluororesin. Is sent to one of the acid-resistant filters 120 and 121. The test liquid from which suspended matter has been removed by the filter is
It passes through the filtration cock 116 and is stored in the gas-liquid separator 117. The liquid level in the gas-liquid separator 117 is monitored by a liquid level sensor 118, and when the liquid level reaches a specified level, the inlet side electromagnetic valve 1
13 and the outlet side electromagnetic valve 182 are closed. Gas-liquid separator 1
The liquid to be measured stored in the pipe 17 is supplied to the pipe 191a (or 19).
It is sucked into the automatic analyzer 201 through 1b).
【００２６】第１フィルタ１２０での濾過中、一定量の
被測定液を濾過するのに要する時間を計測し、濾過時間
が所定時間を越えた場合は警報を発してフィルタの目詰
まりを知らせる。このとき、他方の第２フィルタ１２１
に被測定液が流れるように、入り口側コック１１５及び
濾過側コック１１６を切り替える。こうすることで第２
フィルタ１２１での濾過中に目詰まりした第１フィルタ
１２０の交換作業を行うことができる。したがって、濃
度測定のための被測定液の前処理操作を停止する必要が
ない。濾過時間の計測は、気液分離器１１７の液面の上
昇時間を液面センサ１１８を用いて測定することにより
行える。During the filtration by the first filter 120, the time required to filter a predetermined amount of the liquid to be measured is measured, and if the filtration time exceeds a predetermined time, an alarm is issued to notify the clogging of the filter. At this time, the other second filter 121
The inlet-side cock 115 and the filtration-side cock 116 are switched so that the liquid to be measured flows through the filter. By doing this the second
The replacement operation of the first filter 120 clogged during the filtration by the filter 121 can be performed. Therefore, there is no need to stop the pretreatment operation of the liquid to be measured for measuring the concentration. The filtration time can be measured by measuring the rise time of the liquid level of the gas-liquid separator 117 using the liquid level sensor 118.
【００２７】第１洗浄槽２１０ａのふっ酸洗浄液の濾過
が完了すると、第２洗浄槽２１０ｂのふっ酸洗浄液の濾
過を同様に行う。この際、次の濾過に入る前に、フィル
タユニット内の残留サンプルの排出を行う。排出は、３
方電磁バルブ１３２と出口側電磁バルブ１８２を開い
て、空気供給配管１３１より圧縮空気を導入して行う。
圧縮空気は、気液分離器１１７、濾過側コック１１６、
フィルタ１２０（又は１２１）、出口側コック１１９、
出口側電磁バルブ１８２を順に通過して、配管及びフィ
ルタ内の残留サンプルを戻し配管１８１ａ（又は１８１
ｂ）を通じて洗浄槽２１０ａ（又は２１０ｂ）に排出す
る。このとき、圧縮空気がフィルタ１２０（又は１２
１）内を被測定液の濾過時とは逆方向に通過することに
より、フィルタ内の捕集粒子を同時に排出するため、フ
ィルタの逆洗浄が同時に行え、フィルタが再生される。
なお、排出操作は、空気に代えて窒素ガス等の他の気体
を使用することもできる。When the filtering of the hydrofluoric acid cleaning liquid in the first cleaning tank 210a is completed, the filtering of the hydrofluoric acid cleaning liquid in the second cleaning tank 210b is performed in the same manner. At this time, before starting the next filtration, the residual sample in the filter unit is discharged. Emission is 3
This is performed by opening the one-way electromagnetic valve 132 and the outlet-side electromagnetic valve 182 and introducing compressed air from the air supply pipe 131.
The compressed air is supplied to the gas-liquid separator 117, the filtration cock 116,
A filter 120 (or 121), an outlet cock 119,
After passing through the outlet side electromagnetic valve 182 in order, the residual sample in the pipe and the filter is returned to the return pipe 181a (or 181).
The liquid is discharged to the cleaning tank 210a (or 210b) through b). At this time, the compressed air passes through the filter 120 (or 12).
Since the trapped particles in the filter are simultaneously discharged by passing the liquid to be measured in the direction opposite to the direction in which the liquid to be measured is filtered, back washing of the filter can be performed at the same time, and the filter is regenerated.
In the discharging operation, another gas such as nitrogen gas can be used instead of air.
【００２８】さらに、上記の濾過操作と排出操作を１工
程とする経路内の共洗い洗浄を所定回数繰り返してもよ
い。この操作により、前回の測定の残留サンプルを完全
に除去し、次回の測定における残留サンプルの影響をよ
り一層抑えることができる。Further, the above-mentioned co-washing and washing in the path in which the filtering operation and the discharging operation are one step may be repeated a predetermined number of times. By this operation, the residual sample of the previous measurement can be completely removed, and the influence of the residual sample in the next measurement can be further suppressed.
【００２９】自動フィルタユニットによる濃度測定のた
めの自動前処理操作は、上述した濾過操作、排出操作、
及び必要に応じて行う共洗い洗浄を１サイクルとして、
予め設定された時間間隔で繰り返して行う。このとき、
図１のように、洗浄槽が複数ある場合は、所定の時間間
隔で各洗浄槽からふっ酸洗浄液を順次導入して前処理す
る。The automatic pre-processing operation for the concentration measurement by the automatic filter unit includes the above-described filtering operation, discharging operation,
And the co-washing and washing performed as necessary as one cycle,
This is repeated at a preset time interval. At this time,
As shown in FIG. 1, when there are a plurality of cleaning tanks, a pretreatment is performed by sequentially introducing a hydrofluoric acid cleaning liquid from each cleaning tank at predetermined time intervals.
【００３０】本発明の上記の前処理装置によれば、フィ
ルタの目詰まりによるフィルタ交換作業等の保守作業を
除いて一連の操作を自動化して行うことが可能である。According to the above-mentioned pretreatment device of the present invention, a series of operations can be performed automatically except for maintenance work such as filter replacement work due to filter clogging.
【００３１】なお図２において１３３は廃液配管であ
る。In FIG. 2, 133 is a waste liquid pipe.
【００３２】次に、本発明のふっ酸自動濃度調整装置に
ついて説明する。Next, the hydrofluoric acid automatic concentration adjusting apparatus of the present invention will be described.
【００３３】図３は、図１の自動供給装置に使用される
ふっ酸自動濃度調整装置の構成の詳細を示した図であ
る。FIG. 3 is a diagram showing details of the configuration of the hydrofluoric acid automatic concentration adjusting device used in the automatic supply device of FIG.
【００３４】洗浄槽２１０ａのふっ酸洗浄液は自動フィ
ルタユニット１００ａで濾過された後、自動分析装置２
０１に送られて、ふっ酸濃度が測定される。自動分析装
置２０１としては周知の自動濃度測定装置が使用でき
る。濃度測定の結果、予め決定された所定の目標濃度よ
り低いと判断されると、自動分析装置は、電磁バルブ制
御信号２０３ａを発して電磁バルブ２２３ａを開くとと
もに、ポンプ制御信号２０２を発して定量性ポンプ２２
１を駆動する。これに基づき、ふっ酸新液供給タンク２
２０に貯蔵された所定濃度のふっ酸新液が所定量だけ配
管２２２，２２２ａを通じて洗浄槽２１０ａに送られ
る。かくして、洗浄槽２１０ａ中のふっ酸液は一定範囲
の許容濃度に維持される。なお、２４０はふっ酸液を廃
棄する廃液配管である。The hydrofluoric acid cleaning solution in the cleaning tank 210a is filtered by the automatic filter unit 100a, and then filtered by the automatic analyzer 2.
01 and the hydrofluoric acid concentration is measured. As the automatic analyzer 201, a known automatic concentration measuring device can be used. As a result of the concentration measurement, when it is determined that the concentration is lower than a predetermined target concentration, the automatic analyzer issues an electromagnetic valve control signal 203a to open the electromagnetic valve 223a, and issues a pump control signal 202 to perform quantitative analysis. Pump 22
1 is driven. Based on this, the hydrofluoric acid new liquid supply tank 2
A predetermined amount of the hydrofluoric acid fresh solution stored in the storage unit 20 is sent to the cleaning tank 210a through the pipes 222, 222a by a predetermined amount. Thus, the hydrofluoric acid solution in the cleaning tank 210a is maintained at a certain range of allowable concentration. Reference numeral 240 denotes a waste liquid pipe for discarding the hydrofluoric acid solution.
【００３５】次いで、洗浄槽２１０ｂのふっ酸洗浄液の
濃度測定を行い、濃度測定の結果、予め決定された所定
の目標濃度より低いと判断されると、上記と同様に、自
動分析装置は、電磁バルブ制御信号２０３ｂを発して電
磁バルブ２２３ｂを開くとともに、ポンプ制御信号２０
２を発して定量性ポンプ２２１を駆動し、ふっ酸新液が
所定量だけ配管２２２，２２２ｂを通じて洗浄槽２１０
ｂに送られる。Next, the concentration of the hydrofluoric acid cleaning solution in the cleaning tank 210b is measured, and if it is determined that the concentration is lower than a predetermined target concentration determined in advance as described above, the automatic analyzer is operated in the same manner as described above. A valve control signal 203b is issued to open the electromagnetic valve 223b, and the pump control signal 20
2 to drive the quantitative pump 221 so that a predetermined amount of the hydrofluoric acid fresh solution is supplied through the pipes 222 and 222b to the cleaning tank 210.
b.
【００３６】以上の操作を所定間隔をおいて自動的に繰
り返して行うことにより、洗浄工程に使用するふっ酸洗
浄液のふっ酸濃度の管理を自動化することが可能にな
る。By automatically repeating the above operations at predetermined intervals, it becomes possible to automate the management of the hydrofluoric acid concentration of the hydrofluoric acid cleaning solution used in the cleaning step.
【００３７】ふっ酸洗浄液は、繰り返して使用すること
により徐々に劣化したり、貯蔵量が減少したりして、ふ
っ酸新液の供給のみではもはや対応できなくなる場合が
ある。このような場合、ふっ酸洗浄液を新たに調合する
必要がある。The hydrofluoric acid cleaning solution may gradually deteriorate or its storage amount may decrease due to repeated use, so that it may no longer be possible to respond only by supplying the hydrofluoric acid fresh solution. In such a case, it is necessary to newly prepare a hydrofluoric acid cleaning liquid.
【００３８】図４は、図３のふっ酸自動濃度調整装置が
ふっ酸液を新たに調合する場合の装置構成の詳細を示し
た図である。FIG. 4 is a diagram showing the details of the apparatus configuration when the hydrofluoric acid automatic concentration adjusting apparatus of FIG. 3 newly prepares a hydrofluoric acid solution.
【００３９】ふっ酸洗浄液の劣化による交換時におい
て、洗浄槽２１０ａのふっ酸液を新たに調合する必要が
あると判断されると、劣化したふっ酸洗浄液を排出後、
自動分析装置２０１は、電磁バルブ制御信号２０３ａを
発して電磁バルブ２２３ａを開くとともに、ポンプ制御
信号２０２を発して定量性ポンプ２２１を駆動し、ふっ
酸新液を所定量だけ配管２２２，２２２ａを通じて洗浄
槽２１０ａに供給する。同時に、自動分析装置２０１
は、電磁バルブ制御信号２０４ａを発して電磁バルブ２
３１ａを所定時間だけ開き、水供給配管２３０，２３０
ａを通じて水を所定量だけ洗浄槽２１０ａに供給する。
これにより、一定範囲の許容濃度に維持されたふっ酸液
が洗浄槽２１０ａ中に調製される。At the time of replacement due to deterioration of the hydrofluoric acid cleaning solution, when it is determined that it is necessary to newly prepare the hydrofluoric acid solution in the cleaning tank 210a, the deteriorated hydrofluoric acid cleaning solution is discharged.
The automatic analyzer 201 issues an electromagnetic valve control signal 203a to open the electromagnetic valve 223a, and emits a pump control signal 202 to drive the quantitative pump 221 to clean a predetermined amount of the hydrofluoric acid solution through the pipes 222 and 222a. It is supplied to the tank 210a. At the same time, the automatic analyzer 201
Issues the electromagnetic valve control signal 204a and outputs the electromagnetic valve 2
31a is opened for a predetermined time, and the water supply pipes 230, 230
A predetermined amount of water is supplied to the cleaning tank 210a through a.
As a result, a hydrofluoric acid solution maintained at a certain range of allowable concentration is prepared in the cleaning tank 210a.
【００４０】また、洗浄槽２１０ｂのふっ酸洗浄液の濃
度測定の結果、洗浄槽２１０ｂのふっ酸液を新たに調合
する必要があると判断されると、上記と同様にして、ふ
っ酸新液と蒸留水をそれぞれ所定量洗浄槽２１０ｂに供
給してふっ酸液を調製する。Further, as a result of measuring the concentration of the hydrofluoric acid cleaning solution in the cleaning tank 210b, when it is determined that it is necessary to newly prepare the hydrofluoric acid solution in the cleaning tank 210b, the hydrofluoric acid cleaning solution is prepared in the same manner as described above. A predetermined amount of distilled water is supplied to the cleaning tank 210b to prepare a hydrofluoric acid solution.
【００４１】以上の一連のふっ酸液の調合操作を自動的
に行うようにすることにより、ふっ酸液の劣化などに対
しても自動的に対応することができるようになり、洗浄
工程に使用するふっ酸洗浄液の管理をより一層効率的に
行うことができる。By automatically performing the above series of operations for preparing a hydrofluoric acid solution, it is possible to automatically cope with the deterioration of the hydrofluoric acid solution and the like, and to use the cleaning process. The hydrofluoric acid cleaning solution can be more efficiently managed.
【００４２】なお、以上の実施の形態ではブラウン管を
製造する場合について説明したが、電球等の管球ガラス
の洗浄工程に対して、本発明のふっ酸液の濃度測定のた
めの自動前処理装置及びふっ酸液の自動供給装置を同様
に適用することができる。In the above embodiment, the case of manufacturing a cathode ray tube has been described. However, an automatic pretreatment apparatus for measuring the concentration of a hydrofluoric acid solution according to the present invention is used in the washing process of a bulb glass such as a light bulb. An automatic supply device for a hydrofluoric acid solution can be similarly applied.
【００４３】[0043]
【発明の効果】以上のように、本発明のふっ酸液の濃度
測定のための自動前処理装置によれば、ふっ酸液の濃度
測定に先だってふっ酸液をフィルタで濾過するので、懸
濁物のない被測定液を自動的に得ることができ、懸濁物
による装置のトラブルや測定誤差を抑えることができ
る。また、濾過後、フィルタを逆洗浄するので、フィル
タ再生がなされ、フィルタ寿命が大幅に伸びるととも
に、順次濃度測定を自動的に行うことができる。そし
て、フィルタ濾過及び逆洗浄という一連の作業を自動的
に行うことができるので、本発明の自動前処理装置をふ
っ酸自動濃度調整装置と組む合わせることにより、濃度
管理されたふっ酸液を安定的に得ることが可能になるの
で、ブラウン管の洗浄工程の完全自動化を実現すること
ができる。As described above, according to the automatic pretreatment apparatus for measuring the concentration of a hydrofluoric acid solution of the present invention, the hydrofluoric acid solution is filtered by a filter prior to the concentration measurement of the hydrofluoric acid solution. The liquid to be measured without any substance can be automatically obtained, and the trouble of the apparatus and the measurement error due to the suspended matter can be suppressed. Further, since the filter is backwashed after the filtration, the filter is regenerated, the life of the filter is greatly extended, and the concentration measurement can be automatically performed sequentially. Since a series of operations such as filter filtration and back washing can be performed automatically, the concentration-controlled hydrofluoric acid solution can be stabilized by combining the automatic pretreatment device of the present invention with the hydrofluoric acid automatic concentration adjusting device. Therefore, it is possible to completely automate the cleaning process of the cathode ray tube.
【００４４】また、本発明のふっ酸液の自動供給装置に
よれば、ふっ酸液の濃度測定に先だってふっ酸液をフィ
ルタで濾過する自動前処理装置を有するので、懸濁物の
ない被測定液を自動的に得ることができ、懸濁物による
装置のトラブルや測定誤差を抑えることができる。ま
た、濾過されたふっ酸液を濃度測定し、所定濃度になる
ようにふっ酸を供給するふっ酸自動濃度調整装置を有す
るので、所定濃度のふっ酸洗浄液を効率よく調製するこ
とができる。そして、これらの一連の作業を自動的に行
うことができるので、濃度管理されたふっ酸液を安定的
に得ることが可能になるので、ブラウン管の洗浄工程の
完全自動化による省力化と作業者の安全確保を実現する
ことができる。Further, according to the apparatus for automatically supplying hydrofluoric acid of the present invention, an automatic pretreatment device for filtering the hydrofluoric acid solution with a filter prior to the measurement of the concentration of hydrofluoric acid is provided. The liquid can be obtained automatically, and the trouble of the apparatus and the measurement error due to the suspension can be suppressed. In addition, since there is an automatic hydrofluoric acid concentration adjusting device for measuring the concentration of the filtered hydrofluoric acid solution and supplying hydrofluoric acid to a predetermined concentration, a hydrofluoric acid cleaning solution having a predetermined concentration can be efficiently prepared. Since a series of these operations can be performed automatically, it is possible to stably obtain a hydrofluoric acid solution with a controlled concentration. Safety can be ensured.
【図１】 本発明のふっ酸液の自動供給装置の全体構成
を示した概略図である。FIG. 1 is a schematic view showing the entire configuration of an automatic hydrofluoric acid solution supply device of the present invention.
【図２】 図１に示した自動フィルタユニットの構成の
詳細を示した図である。FIG. 2 is a diagram illustrating details of a configuration of an automatic filter unit illustrated in FIG. 1;
【図３】 図１の自動供給装置に使用されるふっ酸自動
濃度調整装置の構成の詳細を示した図である。FIG. 3 is a diagram showing details of a configuration of a hydrofluoric acid automatic concentration adjusting device used in the automatic supply device of FIG. 1;
【図４】 図３のふっ酸自動濃度調整装置がふっ酸液を
新たに調合する場合の装置構成の詳細を示した図であ
る。FIG. 4 is a diagram showing details of a device configuration when the hydrofluoric acid automatic concentration adjusting device of FIG. 3 newly prepares a hydrofluoric acid solution.
【符号の説明】 １００ａ，１００ｂ 自動フィルタユニット １１１ａ，１１１ｂ サンプルポンプ １１２ａ，１１２ｂ サンプル供給配管 １１３ 入り口電磁バルブ １１４ 導入配管 １１５ 入り口側コック １１６ 濾過側コック １１７ 気液分離器 １１８ 液面センサ １１９ 出口側コック １２０，１２１ フィルタ １３１ 空気供給配管 １３２ ３方電磁バルブ １３３ 廃液配管 １８１ａ，１８１ｂ 戻し配管 １８２ 出口側電磁バルブ １９１ａ，１９１ｂ 配管 ２０１ 自動分析装置 ２０２ ポンプ制御信号 ２０３ａ，２０３ｂ 電磁バルブ制御信号 ２０４ａ，２０４ｂ 電磁バルブ制御信号 ２１０ａ，２１０ｂ 洗浄槽 ２１１ａ，２１１ｂ 配管 ２１２ａ，２１２ｂ 配管 ２２０ ふっ酸新液供給タンク ２２１ 定量性ポンプ ２２２，２２２ａ，２２２ｂ 配管 ２２３ａ，２２３ｂ 電磁バルブ ２３０，２３０ａ，２３０ｂ 水供給配管 ２３１ａ，２３１ｂ 電磁バルブ ２４０ 廃液配管[Description of Signs] 100a, 100b Automatic filter units 111a, 111b Sample pumps 112a, 112b Sample supply piping 113 Inlet electromagnetic valve 114 Inlet piping 115 Inlet cock 116 Filtration cock 117 Gas-liquid separator 118 Liquid level sensor 119 Outlet cock 120, 121 Filter 131 Air supply pipe 132 Three-way electromagnetic valve 133 Waste liquid pipe 181a, 181b Return pipe 182 Outlet side electromagnetic valve 191a, 191b Pipe 201 Automatic analyzer 202 Pump control signal 203a, 203b Electromagnetic valve control signal 204a, 204b Electromagnetic valve Control signal 210a, 210b Cleaning tank 211a, 211b Piping 212a, 212b Piping 220 Hydrofluoric acid new liquid supply tank 221 Quantitative pump 222, 222a, 22 b pipes 223a, 223b electromagnetic valves 230 and 230, 230b water supply pipe 231a, 231b solenoid valve 240 effluent pipe
───────────────────────────────────────────────────── フロントページの続き (72)発明者 矢藤 久典 大阪府高槻市幸町１番１号 松下電子工業 株式会社内 (72)発明者 光亦 博志 大阪府高槻市幸町１番１号 松下電子工業 株式会社内 (72)発明者 山口 明広 大阪府高槻市幸町１番１号 松下電子工業 株式会社内 (72)発明者 呉坪 清 大阪府高槻市幸町１番１号 松下電子工業 株式会社内 Ｆターム(参考） 3B116 AA26 BB02 BB03 CA00 CC05 CD22 CD24 CD42 CD43 3B201 AA26 AB42 BB02 BB03 BB96 CB15 CD22 CD24 CD42 CD43 5C012 AA02 BD04 BE01 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Hisanori Yato 1-1, Sachimachi, Takatsuki-shi, Osaka Matsushita Electronics Industrial Co., Ltd. (72) Hiroshi Mitsumitsu 1-1, Sachimachi, Takatsuki-shi, Osaka Matsushita Electronics (72) Inventor Akihiro Yamaguchi 1-1, Sachimachi, Takatsuki-shi, Osaka Prefecture Inside Matsushita Electronics Corporation (72) Inventor Kiyoshi Tsubotsu 1-1, Sachimachi, Takatsuki-shi, Osaka Matsushita Electronics Corporation F term (reference) 3B116 AA26 BB02 BB03 CA00 CC05 CD22 CD24 CD42 CD43 3B201 AA26 AB42 BB02 BB03 BB96 CB15 CD22 CD24 CD42 CD43 5C012 AA02 BD04 BE01
Claims (14)
濃度測定のための自動前処理装置であって、濃度測定に
先だって前記ふっ酸液を濾過するフィルタと、前記フィ
ルタを逆洗浄する逆洗浄装置とを有することを特徴とす
るふっ酸液の濃度測定のための自動前処理装置。1. An automatic pretreatment device for measuring the concentration of a hydrofluoric acid solution used in a glass cleaning process, wherein the filter filters the hydrofluoric acid solution prior to the concentration measurement, and the reverse filter cleans the filter. An automatic pretreatment device for measuring the concentration of a hydrofluoric acid solution, comprising a cleaning device.
間が所定時間を越えたときは警報を発する機能を有する
請求項１に記載のふっ酸液の濃度測定のための自動前処
理装置。2. The automatic pretreatment device for measuring the concentration of a hydrofluoric acid solution according to claim 1, further comprising a function of measuring a time required for the filtration and issuing an alarm when the filtration time exceeds a predetermined time.
に記載のふっ酸液の濃度測定のための自動前処理装置。3. The filter according to claim 1, wherein the filter has a plurality of filters.
3. An automatic pretreatment device for measuring the concentration of a hydrofluoric acid solution according to claim 1.
う請求項１〜３のいずれかに記載のふっ酸液の濃度測定
のための自動前処理装置。4. The automatic pretreatment apparatus for measuring the concentration of a hydrofluoric acid solution according to claim 1, wherein the backwashing of the filter is performed using a gas.
自動供給装置であって、前記ふっ酸液を濾過するフィル
タを有する自動前処理装置と、前記濾過されたふっ酸液
のふっ酸濃度を測定する濃度測定装置及び前記測定され
たふっ酸濃度に基づいて、所定濃度になるように前記ふ
っ酸液にふっ酸を供給する供給装置を有するふっ酸自動
濃度調整装置とを有することを特徴とするふっ酸液の自
動供給装置。5. An apparatus for automatically supplying a hydrofluoric acid solution used in a glass cleaning step, comprising: an automatic pretreatment device having a filter for filtering the hydrofluoric acid solution; and a hydrofluoric acid concentration of the filtered hydrofluoric acid solution. And a hydrofluoric acid automatic concentration adjusting device having a supply device for supplying hydrofluoric acid to the hydrofluoric acid solution to a predetermined concentration based on the measured hydrofluoric acid concentration. Automatic supply device for hydrofluoric acid.
に、ふっ酸液を新たに調合する機能を有する請求項５に
記載のふっ酸液の自動供給装置。6. The automatic hydrofluoric acid solution supply device according to claim 5, wherein the hydrofluoric acid automatic concentration adjusting device further has a function of newly preparing a hydrofluoric acid solution.
記フィルタを逆洗浄する逆洗浄装置を有する請求項５又
は６に記載のふっ酸液の自動供給装置。7. The hydrofluoric acid solution automatic supply device according to claim 5, wherein the automatic pretreatment device has a backwashing device for backwashing the filter after the filtration.
う請求項７に記載のふっ酸液の自動供給装置。8. The apparatus for automatically supplying a hydrofluoric acid solution according to claim 7, wherein the backwashing of the filter is performed using gas.
る時間を計測し、濾過時間が所定時間を越えたときは警
報を発する機能を有する請求項５〜８のいずれかに記載
のふっ酸液の自動供給装置。9. The hydrofluoric acid according to claim 5, wherein the automatic pretreatment device has a function of measuring a time required for the filtration and issuing an alarm when the filtration time exceeds a predetermined time. Automatic liquid supply device.
数個有する請求項５〜９のいずれかに記載のふっ酸液の
自動供給装置。10. The apparatus for automatically supplying a hydrofluoric acid solution according to claim 5, wherein the automatic pretreatment apparatus has a plurality of filters.
する請求項１〜４のいずれかに記載のふっ酸液の濃度測
定のための自動前処理装置。11. The automatic pretreatment apparatus for measuring the concentration of a hydrofluoric acid solution according to claim 1, which is used in a step of cleaning the glass for a tube.
る請求項１〜４のいずれかに記載のふっ酸液の濃度測定
のための自動前処理装置。12. The automatic pretreatment apparatus for measuring the concentration of a hydrofluoric acid solution according to claim 1, which is used in a process for producing a cathode ray tube.
する請求項５〜１０のいずれかに記載のふっ酸液の自動
供給装置。13. The apparatus for automatically supplying a hydrofluoric acid solution according to claim 5, which is used in a step of cleaning the glass for a bulb.
る請求項５〜１０のいずれかに記載のふっ酸液の自動供
給装置。14. The apparatus for automatically supplying a hydrofluoric acid according to claim 5, which is used in a cathode ray tube manufacturing process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10221466A JP2000057953A (en) | 1998-08-05 | 1998-08-05 | Automatic pre-processing device for measuring concentration of hydrofluoric acid, and automatic hydrofluoric acid supplying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10221466A JP2000057953A (en) | 1998-08-05 | 1998-08-05 | Automatic pre-processing device for measuring concentration of hydrofluoric acid, and automatic hydrofluoric acid supplying device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000057953A true JP2000057953A (en) | 2000-02-25 |
Family
ID=16767165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10221466A Pending JP2000057953A (en) | 1998-08-05 | 1998-08-05 | Automatic pre-processing device for measuring concentration of hydrofluoric acid, and automatic hydrofluoric acid supplying device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000057953A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100452860C (en) * | 2002-07-15 | 2009-01-14 | 株式会社日立制作所 | Information processing terminal and recorder/player |
| WO2012095923A1 (en) * | 2011-01-14 | 2012-07-19 | 株式会社 日立ハイテクノロジーズ | Analytical apparatus |
| WO2013077261A1 (en) * | 2011-11-22 | 2013-05-30 | シャープ株式会社 | Concentration control method and concentration control device |
| JP2013523428A (en) * | 2010-03-29 | 2013-06-17 | ヘルベルト・カンネギーサー・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | Method for wet processing of an object, especially cleaning |
-
1998
- 1998-08-05 JP JP10221466A patent/JP2000057953A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100452860C (en) * | 2002-07-15 | 2009-01-14 | 株式会社日立制作所 | Information processing terminal and recorder/player |
| JP2013523428A (en) * | 2010-03-29 | 2013-06-17 | ヘルベルト・カンネギーサー・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | Method for wet processing of an object, especially cleaning |
| WO2012095923A1 (en) * | 2011-01-14 | 2012-07-19 | 株式会社 日立ハイテクノロジーズ | Analytical apparatus |
| WO2013077261A1 (en) * | 2011-11-22 | 2013-05-30 | シャープ株式会社 | Concentration control method and concentration control device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100429744B1 (en) | Filtration Monitoring and Control System | |
| US5832948A (en) | Liquid transfer system | |
| JP4879485B2 (en) | Sample dilution apparatus and sample dilution method | |
| JP2019037979A (en) | Gas removal method | |
| JPH0540345A (en) | Developer managing device | |
| EP0495393A1 (en) | Gas adsorber for exhaust gas | |
| JP2000057953A (en) | Automatic pre-processing device for measuring concentration of hydrofluoric acid, and automatic hydrofluoric acid supplying device | |
| CN111410314B (en) | Pre-control method and device for denitrification and dephosphorization by improved oxidation ditch process | |
| EP4194850A1 (en) | Analysis system and management system, analysis method, and analysis program | |
| EP0118478B1 (en) | Nebulizer | |
| CN109368838A (en) | Microfiltration systems water treatment technology | |
| US3733906A (en) | Method and apparatus for the continuous withdrawal of samples from industrial process baths or the like for analysis | |
| US11295964B2 (en) | Pressure regulating device and semiconductor production system | |
| JPH0156999B2 (en) | ||
| CN114894887A (en) | Nondestructive inspection process parameter matching optimization expert system | |
| JPH11505607A (en) | Dynamic contaminant extraction measurement for drug distribution systems | |
| EP4179060A1 (en) | Bioreactor cleaning installation for bioreactors in rail vehicles | |
| JP2008149205A (en) | Perfectness testing automatic measuring instrument of membrane type virus removing filter | |
| CN115554848A (en) | Monitoring method and monitoring device of pure water system and pure water system | |
| CN111977604A (en) | Automatic vacuum purification and oil filling equipment | |
| JP2006084386A (en) | Waste water neutralization system | |
| KR20030020654A (en) | Apparatus For Coating And Method Of Handling The Same | |
| JPH03151009A (en) | Method for controlling filter | |
| JP2005342713A (en) | Device and method for controlling introduction of process waste gas into constitution component for post treatment |