JP2000015034A - Washing apparatus - Google Patents

Washing apparatus

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Publication number
JP2000015034A
JP2000015034A JP10187826A JP18782698A JP2000015034A JP 2000015034 A JP2000015034 A JP 2000015034A JP 10187826 A JP10187826 A JP 10187826A JP 18782698 A JP18782698 A JP 18782698A JP 2000015034 A JP2000015034 A JP 2000015034A
Authority
JP
Japan
Prior art keywords
chamber
gas
liquid
guide member
cleaning liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10187826A
Other languages
Japanese (ja)
Other versions
JP3329372B2 (en
Inventor
Hisao Sakurai
久夫 桜井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SAKURAI SETSUBI KK
Original Assignee
SAKURAI SETSUBI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SAKURAI SETSUBI KK filed Critical SAKURAI SETSUBI KK
Priority to JP18782698A priority Critical patent/JP3329372B2/en
Publication of JP2000015034A publication Critical patent/JP2000015034A/en
Application granted granted Critical
Publication of JP3329372B2 publication Critical patent/JP3329372B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a washing apparatus with a simple structure and capable of removing dust, soot and smoke, malodor, and the likes contained in a gas at remarkably high efficiency. SOLUTION: When a second chamber 22 becomes at negative pressure by successive evacuation of a fourth chamber 24, a third chamber 23, and a second chamber 22 and gas discharge out of the chambers by a fan 36, the liquid level of a washing liquid of the second chamber 22 is elevated and the liquid level of a washing liquid of a first chamber 21 is lowered. Together with the washing liquid of the first chamber 21, the gas of the first chamber 21 is taken in a gas-liquid stirring and separating means 15 and mixed and stirred and then separated. Dust and the likes contained in the gas are washed out and removed at the time of mixing and stirring the gas with the washing liquid. The resultant gas separated from the washing liquid by the gas-liquid stirring and separating means 15 flows into the second chamber 22, is further cleaned in the same manner by a gas-liquid stirring and separating apparatus 18 and flows into the fourth chamber 23 from the third chamber 23, and then is discharged to the atmospheric air by the fan 36. Consequently, dust and the likes contained in a gas can efficiently be removed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、気体中に含まれる
塵埃、煤煙、臭気或いは各種の有害物質等を除去して清
浄な気体にする洗浄装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for removing dust, soot, odor or various harmful substances contained in a gas to obtain a clean gas.

【0002】[0002]

【従来の技術】例えば、ある種の工場や工事現場等にお
いては発生した塵埃や粉塵、或いは煤煙や酸性ガス等が
大気中に含まれており、また、ゴミ処理施設等において
は煤煙や悪臭等が大気に多量に含まれており、これらの
有害成分を除去することが必要不可欠である。このた
め、これらの物質を含む大気を洗浄して有害成分を除去
するようにしている。
2. Description of the Related Art For example, dust and dust, soot, acid gas, and the like generated in a certain factory or construction site are contained in the air, and soot and foul odor in a garbage disposal facility or the like. Is contained in a large amount in the atmosphere, and it is essential to remove these harmful components. Therefore, the air containing these substances is washed to remove harmful components.

【0003】図3は、従来の洗浄塔の断面を示す。図3
に示すように洗浄塔1は、洗浄液例えば、洗浄水が貯溜
されたタンク2と、タンク2の上方に配設されパンチメ
タル等の多数の小孔が穿設された受皿3、4と、これら
の各受皿3、4の上方に夫々配設された噴射ノズル5、
6と、タンク2内の水を各噴射ノズル5、6に供給する
ポンプ7と、タンク2の僅か上方位置に設けられた入口
1aと、上部に設けられた出口1bと、入口1aに設け
られて例えば、塵埃を含んだ空気を塔内に押し込むため
のファン8と、前記各受皿3、4に多数山積み載置され
て前記塵埃を効果的に除去するための気体攪拌用の坦体
例えば、小さな円筒の側面に全面に亘り小孔が多数穿設
されたネットリング9等により構成されている。
FIG. 3 shows a cross section of a conventional washing tower. FIG.
As shown in FIG. 1, a washing tower 1 includes a tank 2 in which a washing liquid, for example, washing water is stored, and trays 3 and 4 provided above the tank 2 and having a number of small holes such as punched metal. The injection nozzles 5, which are respectively disposed above the receiving trays 3, 4,
6, a pump 7 for supplying water in the tank 2 to each of the spray nozzles 5, 6, an inlet 1a provided slightly above the tank 2, an outlet 1b provided at an upper portion, and an inlet 1a provided at the inlet 1a. For example, a fan 8 for forcing dust-containing air into the tower, and a carrier for gas agitation for removing the dust efficiently by being piled up and piled on each of the receiving trays 3 and 4, for example, It is constituted by a net ring 9 and the like in which many small holes are formed on the entire side surface of a small cylinder.

【0004】ファン8により洗浄塔1内の下部に押し込
まれた前記塵埃を含んだ空気は、正圧となって出口1b
に向かって上昇し、受皿3の各小孔を通り山積みされて
いる多数のネットリング9により攪拌され、噴射ノズル
5からシャワー状に噴射される洗浄水により塵埃の一部
が洗い落とされて除去され、更に、上昇して受皿4の各
小孔を通り山積みされている多数のネットリング9によ
り再び攪拌され、噴射ノズル6からシャワー状に噴射さ
れる洗浄水により塵埃が洗い落とされて洗浄され、出口
1bから排出される。洗い落とされた塵埃は、洗浄水と
共にタンク2に滴下する。このようにして塵埃を除去し
て空気を浄化するようにしている。タンク2内の水は、
ポンプ7により噴射ノズル5、6に循環されて繰り返し
使用される。尚、タンク2内の水は、塵埃等が徐々に増
えて汚れ、洗浄効果が少なくなるために適当な時期に交
換される。
The dust-containing air pushed into the lower portion of the washing tower 1 by the fan 8 has a positive pressure, and the outlet 1 b
, And is agitated by a large number of net rings 9 piled up through the small holes of the receiving tray 3, and a part of the dust is removed by washing water sprayed from the spray nozzle 5 in a shower shape. Further, the dust is washed again by the washing water sprayed from the spray nozzle 6 in a shower form by the many net rings 9 which are raised and are piled up through the small holes of the receiving tray 4 and are washed. Are discharged from the outlet 1b. The washed-out dust is dropped onto the tank 2 together with the washing water. Thus, dust is removed to purify the air. The water in tank 2
It is circulated to the injection nozzles 5 and 6 by the pump 7 and used repeatedly. The water in the tank 2 is replaced at an appropriate time because dust and the like gradually increase and become dirty and the cleaning effect is reduced.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記従
来の洗浄塔は、ファン8により塔内に押し込まれた空気
が正圧となることで、各受皿3、4に山積みされている
多数のネットリング9の抵抗の大きい小孔を通らずに抵
抗の少ない各ネットリング9の間を迅速に通り抜けてし
まうためにこれらネットリング9により殆ど攪拌され
ず、しかも、噴射ノズル5、6からシャワー状に噴射す
る洗浄水により大気中の塵埃を単に洗い落とす構成とし
ているために微細な塵埃を除去することができず、洗浄
効率が非常に悪い。また、臭気を除去することが困難で
あり、悪臭等を含んだ大気(気体)を洗浄することがで
きない。
However, in the above-mentioned conventional washing tower, a large number of net rings are piled up on each of the receiving trays 3 and 4 when the air pushed into the tower by the fan 8 has a positive pressure. 9 quickly passes through each net ring 9 having a small resistance without passing through a small hole having a large resistance, and is hardly agitated by these net rings 9; Since the dust in the atmosphere is simply washed away with the washing water to be removed, fine dust cannot be removed, and the washing efficiency is very poor. Further, it is difficult to remove the odor, and it is not possible to clean the atmosphere (gas) containing a bad odor or the like.

【0006】更に、攪拌部材としてのネットリング9を
載置する受皿3、4を積み上げて配置する構造であるた
めに洗浄塔の高さが高くなり、しかも、洗浄効率が悪い
ために3段、4段等多段構造にする必要があり、益々高
さが高くなり、設置場所が制限されると共にメンテナン
スが困難である。更に、洗浄塔が大型化するために非常
に高価である等の問題がある。
Further, the height of the washing tower is increased due to the structure in which the trays 3, 4 on which the net ring 9 as the stirring member is placed are stacked, and the washing efficiency is poor. It is necessary to have a multi-stage structure such as a four-stage structure, so that the height is further increased, the installation place is restricted, and maintenance is difficult. Further, there is a problem that the washing tower is very expensive due to an increase in size.

【0007】本発明は、上述の点に鑑みてなされたもの
で、簡単な構造で気体中に含まれる塵埃、煤煙、悪臭等
を極めて効率よく除去することが可能な洗浄装置を提供
することを目的とする。
The present invention has been made in view of the above points, and has as its object to provide a cleaning apparatus capable of removing dust, soot, foul odor, and the like contained in gas with a simple structure and extremely efficiently. Aim.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
に本発明によれば、請求項1では、下部に洗浄液が貯溜
され上部に洗浄すべき気体を吸入する入口が設けられた
第1室と、下部に洗浄液が貯溜され、上部に洗浄した前
記気体を排気する出口が設けられた第2室と、前記第1
室と第2室とを画成し、且つこれら両室の下部を連通す
る隔壁と、前記第2室の気体を排気して当該第2室を負
圧にするファンと、前記隔壁の前記第1室と第2室の洗
浄液の液面位置に設けられ、前記第2室の負圧により前
記第1室の気体を当該第1室内の洗浄液と共に取り込み
攪拌した後これらの気体と洗浄液とを分離して気体のみ
を前記第2室に流出させる気液攪拌分離手段とを備えた
ことを特徴とする。
According to the present invention, there is provided a first chamber in which a cleaning liquid is stored in a lower portion and an inlet for sucking a gas to be cleaned is provided in an upper portion. A second chamber in which a cleaning liquid is stored in a lower portion and an outlet for exhausting the cleaned gas is provided in an upper portion;
A partition defining a chamber and a second chamber, and communicating a lower portion of both the chambers; a fan for exhausting gas in the second chamber to make the second chamber a negative pressure; It is provided at the liquid surface position of the cleaning liquid in the first chamber and the second chamber. The gas in the first chamber is taken in together with the cleaning liquid in the first chamber by the negative pressure of the second chamber and stirred, and then these gases and the cleaning liquid are separated. And gas-liquid agitation and separation means for allowing only gas to flow into the second chamber.

【0009】ファンにより第2室の気体が排気されて当
該第2室の内圧が負圧になると、当該第2室の洗浄液の
液面が上昇し、第1室の洗浄液の液面が低下する。第1
室の気体は、当該第1室の洗浄液と共に気液攪拌分離手
段に取り込まれて混合攪拌され、更に、分離される。前
記気体は、洗浄液と混合攪拌される際に洗浄されて含ま
れる塵埃等が除去される。気液攪拌分離手段により洗浄
液と分離された気体は、第2室の負圧により当該第2室
に流入する。この第2室に流入した気体は、ファンによ
り大気に排気される。第1室の気体が気液攪拌分離手段
により洗浄されて第2室に流入することで当該第1室の
内圧が低下し、これに伴い洗浄すべき気体が第1室に流
入する。これにより、気体に含まれる塵埃等が良好に除
去される。第1室と第2室は、連通されていることで、
洗浄液は常時、等量に保持され、両室の洗浄液の液面が
気液攪拌分離手段の高さに保持される。
When the gas in the second chamber is exhausted by the fan and the internal pressure of the second chamber becomes negative, the level of the cleaning liquid in the second chamber rises and the level of the cleaning liquid in the first chamber drops. . First
The gas in the chamber is taken into the gas-liquid stirring / separating means together with the cleaning liquid in the first chamber, mixed and stirred, and further separated. When the gas is mixed and stirred with the cleaning liquid, the gas is washed to remove dust and the like contained therein. The gas separated from the cleaning liquid by the gas-liquid stirring / separating means flows into the second chamber due to the negative pressure of the second chamber. The gas flowing into the second chamber is exhausted to the atmosphere by a fan. The gas in the first chamber is washed by the gas-liquid agitation / separation means and flows into the second chamber, whereby the internal pressure of the first chamber decreases, and accordingly, the gas to be washed flows into the first chamber. As a result, dust and the like contained in the gas are favorably removed. The first room and the second room are in communication,
The cleaning liquid is always kept at the same volume, and the liquid surfaces of the cleaning liquid in both chambers are kept at the level of the gas-liquid stirring / separating means.

【0010】請求項2では、前記気液攪拌分離手段は、
円筒の側面を軸方向に切り開いた略樋状をなす第1、第
2のガイド部材から成り、前記第1のガイド部材は、凹
面が第2室に臨み、上縁部が前記洗浄液の液面の上下で
分割された前記隔壁の上側の隔壁の下端部に取り付けら
れ、前記第2のガイド部材は、凹面が第1室に臨み、下
縁部が前記分割された隔壁の下側の隔壁の上端部に取り
付けられ、且つ前記第1のガイド部材の下縁部が前記第
2のガイド部材の凹部に、前記第2のガイド部材の上縁
部が前記第1のガイド部材の凹部に夫々間隙を存して入
り込んで構成されていることを特徴とする。
[0010] In the second aspect, the gas-liquid stirring / separating means includes:
The first and second guide members each have a substantially gutter-like shape in which a side surface of a cylinder is opened in an axial direction, and the first guide member has a concave surface facing the second chamber, and an upper edge portion having a liquid surface of the cleaning liquid. The second guide member has a concave surface facing the first chamber, and a lower edge portion of the lower partition wall below the divided partition wall. A lower edge of the first guide member is attached to an upper end portion, and a lower edge of the first guide member is in a recess of the second guide member, and an upper edge of the second guide member is in a gap in the recess of the first guide member. , And is characterized in that it is configured to enter.

【0011】第1室の気体は、洗浄液と共に第1のガイ
ド部材の下側を回り込んで第2のガイド部材の凹部に流
入し、更に当該第2のガイド部材の凹面に沿って流動し
て第1のガイド部材の凹部に流入する。これにより、気
体が洗浄液と混合、攪拌されて含まれる塵埃等が除去さ
れて洗浄される。次いで、洗浄液と気体とが分離され、
洗浄液は、滴下し、気体のみが第1のガイド部材の凹面
に沿って第2室に流入する。
The gas in the first chamber flows under the first guide member together with the cleaning liquid, flows into the concave portion of the second guide member, and flows along the concave surface of the second guide member. It flows into the recess of the first guide member. As a result, the gas is mixed and agitated with the cleaning liquid, and the dust and the like contained therein are removed to be cleaned. Next, the cleaning liquid and the gas are separated,
The cleaning liquid is dropped, and only the gas flows into the second chamber along the concave surface of the first guide member.

【0012】[0012]

【発明の実施の形態】以下本発明の実施の形態を図面に
より詳細に説明する。図1は、本発明に係る洗浄装置の
断面図を示し、図2は、図1に示す洗浄装置の気液攪拌
分離機構の拡大図である。
Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 is a sectional view of a cleaning apparatus according to the present invention, and FIG. 2 is an enlarged view of a gas-liquid stirring / separation mechanism of the cleaning apparatus shown in FIG.

【0013】図1において、洗浄装置10は、本体11
が略立方体形状をなしており、この本体11は、底面1
1aの略中央に垂設された仕切板12により左右に画成
されている。仕切板12は、例えば、本体11の高さの
略3/4程度の高さとされ、下端部及び両端部が夫々底
面及び前後面に液密に溶着されている。仕切板12の左
右は、夫々略中央位置に垂設された隔壁13、14によ
り二分割されて、図中左側から第1室21、第2室2
2、第3室23、及び第4室24とされている。第1室
21は、上面に洗浄すべき気体を吸入(導入)するため
の入口11bが設けられており、第4室24は、上面に
洗浄した気体を排気する出口11cが設けられている。
尚、仕切板12の高さは、本体11の大きさ、洗浄すべ
き物質の種類、処理時間等により最適の高さに設定され
る。
In FIG. 1, a cleaning device 10 includes a main body 11.
Has a substantially cubic shape.
1a is defined on the left and right by a partition plate 12 suspended substantially at the center. The partition plate 12 has, for example, a height of about / of the height of the main body 11, and has a lower end portion and both end portions liquid-tightly welded to the bottom surface and the front and rear surfaces, respectively. The left and right sides of the partition plate 12 are divided into two by partition walls 13 and 14 which are respectively provided substantially at the center, and the first and second chambers 21 and 2 are arranged from the left side in the figure.
2, a third chamber 23, and a fourth chamber 24. The first chamber 21 is provided with an inlet 11b for sucking (introducing) gas to be cleaned on the upper surface, and the fourth chamber 24 is provided with an outlet 11c for exhausting the cleaned gas on the upper surface.
The height of the partition plate 12 is set to an optimum height according to the size of the main body 11, the type of the substance to be washed, the processing time, and the like.

【0014】隔壁13は、上、中、下に三分割されて隔
壁13a、13b、13cとされ、上側の隔壁13a
は、両端部及び上端部が、夫々本体11の対向する前後
面及び上面に液密に溶着され、中央の隔壁13bは、隔
壁13a及び本体11に対して液密に昇降可能とされ、
下側の隔壁13cは、両端部及び下端部が本体11の前
後面及び底面11aに液密に溶着されており、且つ第1
室21と第2室22とを連通する連通孔13dが設けら
れている。隔壁14についても隔壁13と同様に構成さ
れている。
The partition 13 is divided into upper, middle, and lower portions to be divided into partitions 13a, 13b, and 13c.
The both ends and the upper end are liquid-tightly welded to the front and rear surfaces and the upper surface, respectively, of the main body 11 facing each other, and the central partition 13b can be raised and lowered in a liquid-tight manner with respect to the partition 13a and the main body 11,
Both ends and a lower end of the lower partition wall 13c are welded to the front and rear surfaces and the bottom surface 11a of the main body 11 in a liquid-tight manner.
A communication hole 13d for communicating the chamber 21 with the second chamber 22 is provided. The partition 14 is configured similarly to the partition 13.

【0015】隔壁13の中央の隔壁13bの下端部と下
側の隔壁13cの上端部との間、及び隔壁14の中央の
隔壁14bの下端部と下側の隔壁14cの上端部との間
に、且つ仕切板12よりも低い例えば、仕切板12の略
半分の高さ位置に夫々気液攪拌分離手段としての気液攪
拌分離機構15、18が設けられている。
Between the lower end of the central partition 13b of the partition 13 and the upper end of the lower partition 13c, and between the lower end of the central partition 14b of the partition 14 and the upper end of the lower partition 14c. For example, gas-liquid stirring / separating mechanisms 15 and 18 as gas-liquid stirring / separating means are provided at a position lower than the partition plate 12, for example, at approximately half the height of the partition plate 12.

【0016】気液攪拌分離機構15は、2本のガイド部
材16と17とにより構成されており、各ガイド部材1
6、17は、夫々円筒部材の側壁を例えば、周方向に沿
って略1/4、且つ長手方向に沿って全長に亘り切り取
った端面視略3/4円状の樋状をなしている。図示のよ
うにガイド部材16は、凹面16aが第2室22に臨ん
で水平に配置され、上縁部16bが隔壁13bの下端部
に溶着固定され、ガイド部材17は、凹面17aが第1
室に臨んで水平に配置され、下縁部17cが隔壁13c
の上端部に溶着固定され、且つガイド部材16の下縁部
16cがガイド部材17の凹部17aの略中央まで、ガ
イド部材17の上縁部17bがガイド部材16の凹部1
6aの略中央まで、互いに入り込んでおり、上下に、且
つ間隙を存して噛み合うような状態に配置されている。
The gas-liquid stirring / separating mechanism 15 is composed of two guide members 16 and 17,
Numerals 6 and 17 each have, for example, a trough-like shape in which the side wall of the cylindrical member is cut in substantially 1/4 along the circumferential direction and cut along the entire length along the longitudinal direction and has a substantially 3/4 circular shape in end view. As shown in the drawing, the guide member 16 has a concave surface 16a horizontally disposed facing the second chamber 22, an upper edge portion 16b is welded and fixed to a lower end portion of the partition wall 13b, and the guide member 17 has a concave surface 17a having a first surface.
It is arranged horizontally facing the chamber, and the lower edge 17c is a partition 13c.
The upper edge 17b of the guide member 17 is welded and fixed to the upper end of the guide member 16, and the lower edge 16c of the guide member 16 is substantially the center of the recess 17a of the guide member 17.
6a are arranged in such a manner that they enter each other up to substantially the center and engage with each other up and down and with a gap.

【0017】そして、ガイド部材16の下縁部16cと
ガイド部材17の上縁部17bとは底面11aから略同
じ高さ位置において離隔対向しており、ガイド部材17
の上縁部17bとガイド部材16の上縁部16bとの間
の間隔aと、ガイド部材16の下縁部16cとガイド部
材17の凹面17aとの間の間隔bとは、略同じ間隔と
されている。また、間隔aは、隔壁13bを昇降するこ
とで調節可能とされている。気液攪拌分離機構18も2
本のガイド部材19、20から成り、気液攪拌分離機構
15と全く同様に構成されている。これらの本体11、
仕切板12、隔壁13、14、気液攪拌分離機構15、
18等は、例えば、鉄板で形成されている。
The lower edge 16c of the guide member 16 and the upper edge 17b of the guide member 17 are opposed to each other at substantially the same height from the bottom surface 11a.
The distance a between the upper edge 17b of the guide member 16 and the upper edge 16b of the guide member 16 and the distance b between the lower edge 16c of the guide member 16 and the concave surface 17a of the guide member 17 are substantially the same. Have been. The interval a can be adjusted by moving up and down the partition 13b. Gas-liquid stirring and separation mechanism 18 is also 2
It is composed of the guide members 19 and 20 and has exactly the same configuration as the gas-liquid stirring / separation mechanism 15. These body 11,
Partition plate 12, partition walls 13, 14, gas-liquid stirring / separation mechanism 15,
18 and the like are formed of, for example, an iron plate.

【0018】第1室21と第2室22との間、及び第3
室23と第4室24との間には夫々洗浄液を循環させる
ポンプ30、31が設けられている。また、第1室21
の上部には噴射ノズル33が、第2室22と第3室23
との上部には噴射ノズル34が、夫々噴口を下方に向け
て設けられており、ポンプ35により第1室21の洗浄
液が循環して供給される。また、出口11cには第4室
24内の気体を吸引して大気に排気するためのファン3
6が設けられている。そして、第4室24は、ファン3
6により内部の気体が吸引排気されることで、内圧が負
圧となる。
Between the first chamber 21 and the second chamber 22, and
Pumps 30 and 31 for circulating a cleaning liquid are provided between the chamber 23 and the fourth chamber 24, respectively. Also, the first room 21
A jet nozzle 33 is provided above the second chamber 22 and the third chamber 23.
An injection nozzle 34 is provided in the upper part of the nozzle with the injection port directed downward, and the cleaning liquid in the first chamber 21 is circulated and supplied by the pump 35. A fan 3 for sucking the gas in the fourth chamber 24 and exhausting it to the atmosphere is provided at the outlet 11c.
6 are provided. And the fourth room 24 is a fan 3
The internal pressure is reduced to a negative pressure by the internal gas being sucked and exhausted by 6.

【0019】そして、第1室21及び第2室22には洗
浄液例えば、洗浄水が貯溜されており、その液面の高さ
が気液攪拌分離機構15のガイド部材16の下縁部16
c近傍に位置している。第1室21と第2室22とは隔
壁13cに設けられている連通孔13dにより連通され
ており、これら両室の洗浄水の液面は、同一となってい
る。第3室23及び第4室24についても同様である。
以下に作動を説明する。
The first chamber 21 and the second chamber 22 store a cleaning liquid, for example, cleaning water, and the level of the liquid is lower than the lower edge 16 of the guide member 16 of the gas-liquid stirring / separation mechanism 15.
c. The first chamber 21 and the second chamber 22 are communicated with each other by a communication hole 13d provided in the partition 13c, and the liquid level of the cleaning water in both chambers is the same. The same applies to the third chamber 23 and the fourth chamber 24.
The operation will be described below.

【0020】洗浄装置10は、導入口11bがダクト4
0を介して例えば、塵埃を発生する工場の建物(図示せ
ず)に接続される。そして、ファン36が駆動され、噴
射ノズル33、34から洗浄水が下方に噴霧される。
In the cleaning device 10, the inlet 11b is connected to the duct 4
For example, it is connected to a factory building (not shown) that generates dust. Then, the fan 36 is driven, and the cleaning water is sprayed downward from the injection nozzles 33 and 34.

【0021】洗浄装置10は、ファン36が作動される
と、第4室24内の大気が排気されることで当該第4室
24内が負圧になり、これに伴い図2に示すように第4
室24内の洗浄水の液面Saが2点鎖線Sa’で示すよ
うに僅かに上昇して水位が上がり、第3室23内の洗浄
水の液面Sbが2点鎖線Sb’で示すように僅かに低く
なって水位が下がる。この結果、第3室23及び第2室
22内の大気が当該第3室23内の洗浄水の液面近傍に
引き込まれながら実線の矢印のようにガイド部材19の
外周面19dに沿ってガイド部材20の凹部20eに流
れ込み、更に当該凹面20aに沿って渦を巻くようにし
て流れてガイド部材19の下縁部19cの上方を乗り越
え、当該筒状部材19の凹部19e内に流れ込む。この
ときに洗浄水がミスと状をなして滴下しながら大気と分
離され、大気は、点線の矢印のようにガイド部材19の
凹面19aとガイド部材20の外周面20dとの間を通
して第4室24内に流入する。
In the cleaning apparatus 10, when the fan 36 is operated, the atmosphere in the fourth chamber 24 is evacuated to a negative pressure in the fourth chamber 24, and as a result, as shown in FIG. 4th
The liquid level Sa of the washing water in the chamber 24 rises slightly as indicated by a two-dot chain line Sa ', and the water level rises, and the liquid level Sb of the washing water in the third chamber 23 is indicated by a two-dot chain line Sb'. And the water level drops slightly. As a result, the air in the third chamber 23 and the second chamber 22 is guided along the outer peripheral surface 19d of the guide member 19 as indicated by a solid arrow while being drawn into the vicinity of the liquid level of the cleaning water in the third chamber 23. It flows into the concave portion 20 e of the member 20, further flows in a spiral along the concave surface 20 a, climbs over the lower edge portion 19 c of the guide member 19, and flows into the concave portion 19 e of the tubular member 19. At this time, the washing water is separated from the atmosphere while dripping in a mistake, and the atmosphere passes between the concave surface 19a of the guide member 19 and the outer peripheral surface 20d of the guide member 20 as indicated by the dotted arrow. 24.

【0022】第3室23内の大気は、筒状部材19の湾
曲する外周面近傍19dにおいて当該第3室23内の洗
浄水に混入することで大部分の塵埃が除去され、更にガ
イド部材19と20との間に渦巻き状に発生する乱流に
より攪拌されることで塵埃が除去され、最後にミスト状
の洗浄液と分離されて第4室24に流入する。従って、
第4室24内に流れ込んだときには塵埃の殆どが除去さ
れる。第3室23と第4室24とは隔壁14cの連通孔
14dにより連通されており、従って、これら両室内の
洗浄水は同量に確保される。
The air in the third chamber 23 is mixed with the cleaning water in the third chamber 23 near the curved outer peripheral surface 19d of the cylindrical member 19, whereby most of the dust is removed. The dust is removed by being agitated by a turbulent flow generated in a spiral shape between the cleaning liquid and the cleaning liquid 20, and is finally separated from the mist-like cleaning liquid and flows into the fourth chamber 24. Therefore,
When it flows into the fourth chamber 24, most of the dust is removed. The third chamber 23 and the fourth chamber 24 are communicated with each other by the communication hole 14d of the partition wall 14c, so that the same amount of washing water in both chambers is secured.

【0023】上述のようにして第3室23が負圧となる
と、これに伴い第2室22が負圧となり、前述と同様に
気液攪拌分離機構15の作用により、第2室22の洗浄
水の液面が上昇して水位が高くなり、第1室21の洗浄
水の液面が低下して水位が低くなる。そして、第1室2
1内の大気が当該第1室21内の洗浄水と共に気液攪拌
分離機構15内に流入して攪拌され、気液分離されて、
大気が第2室22内に流入する。第1室21内の塵埃を
含んだ大気は、気液攪拌分離機構15により第1室21
内の洗浄水に混入し、攪拌されることで殆どの塵埃が除
去され、次いで、気液分離されることで、洗浄される。
As described above, when the pressure in the third chamber 23 becomes negative, the pressure in the second chamber 22 becomes negative, and the second chamber 22 is cleaned by the action of the gas-liquid stirring / separating mechanism 15 as described above. The liquid level of the water rises and the water level rises, and the liquid level of the washing water in the first chamber 21 falls and the water level falls. And the first room 2
The air in 1 flows into the gas-liquid stirring and separation mechanism 15 together with the washing water in the first chamber 21 to be stirred and gas-liquid separated.
Atmosphere flows into the second chamber 22. The dust-containing air in the first chamber 21 is separated from the first chamber 21 by the gas-liquid stirring / separation mechanism 15.
Most of the dust is removed by being mixed into the washing water in the inside and being stirred, and then is washed by being separated into gas and liquid.

【0024】第1室21内の空気が第2室22内に引き
込まれるに伴い当該第1室21の内圧が下がり、これに
伴いダクト40を介して塵埃を含んだ大気(気体)が吸
入(導入)され、当該吸入(導入)された大気は、上述
のようにして塵埃が除去されて洗浄される。
As the air in the first chamber 21 is drawn into the second chamber 22, the internal pressure of the first chamber 21 decreases, and the air (gas) containing dust is sucked in through the duct 40 ( The introduced (introduced) atmosphere is cleaned by removing dust as described above.

【0025】即ち、ダクト40から第1室21内に吸入
された塵埃を含む大気は、先ず、噴射ノズル33から噴
射される洗浄水のシャワーにより比較的粒子の大きな塵
埃が洗い落とされて除去される。尚、第1室21に導入
される気体は、洗浄水のシャワーにより温度が下げられ
ることで、高温の気体でも温度の低下が図られる。次い
で、気液攪拌分離機構15により前述したように第1室
21内の洗浄液で塵埃の大部分が除去されて第2室22
に流れ込む。第2室22に流れ込んだ大気は、噴射ノズ
ル34からの洗浄水のシャワーにより更に塵埃が洗い落
とされて第3室23へと流れる。そして、第3室23内
の大気は気液攪拌分離機構18により前述したように第
3室23内の洗浄液で残る塵埃の殆どが除去されて第4
室24に流れ込み、出口11cから排気される。これに
より、出口11cから清浄な空気が大気中に排気され
る。
That is, the air containing dust sucked into the first chamber 21 from the duct 40 is first cleaned by a shower of washing water sprayed from the spray nozzle 33 to remove relatively large particles of dust. You. In addition, the temperature of the gas introduced into the first chamber 21 is reduced by the shower of the cleaning water, so that the temperature of the high-temperature gas is also reduced. Next, as described above, most of the dust is removed by the cleaning liquid in the first chamber 21 by the gas-liquid stirring / separation mechanism 15, and the second chamber 22 is removed.
Flow into The air that has flowed into the second chamber 22 is further washed away by the shower of cleaning water from the spray nozzle 34, and flows into the third chamber 23. Then, the air in the third chamber 23 is removed by the gas-liquid stirring / separation mechanism 18 as described above so that most of the dust remaining with the cleaning liquid in the third chamber 23 is removed.
It flows into the chamber 24 and is exhausted from the outlet 11c. Thereby, clean air is exhausted into the atmosphere from the outlet 11c.

【0026】また、隔壁13bを上動又は下降させて気
液攪拌分離機構15のガイド部材16と17との間隔
a、bを、隔壁14bを上動又は下降させて気液攪拌分
離機構18のガイド部材19と20との間隔c、dを夫
々調整することで、吸入空気量、及び排気量を調節する
ことができる。即ち、洗浄すべき気体の処理能力を調整
することができる。
The distances a and b between the guide members 16 and 17 of the gas-liquid stirring / separating mechanism 15 are raised or lowered by moving the partition 13b upward or downward. By adjusting the distances c and d between the guide members 19 and 20, respectively, the amount of intake air and the amount of exhaust can be adjusted. That is, the processing capacity of the gas to be cleaned can be adjusted.

【0027】第1室21と第2室22は、隔壁13cの
連通孔13dにより連通されていることで、これら両室
の洗浄液の液面が気液攪拌分離機構15の高さに保持さ
れ、気体の洗浄が確実に行われる。また、第1室21と
第2室22内の洗浄水、第3室と第4室24内の洗浄水
は、夫々ポンプ30、31により循環されることで、汚
れが均一化される。勿論、これらの各室の洗浄水は、汚
れ具合により適宜交換する。
Since the first chamber 21 and the second chamber 22 are communicated with each other through the communication hole 13d of the partition wall 13c, the level of the cleaning liquid in both chambers is maintained at the height of the gas-liquid stirring / separation mechanism 15, Gas cleaning is ensured. The cleaning water in the first chamber 21 and the second chamber 22 and the cleaning water in the third chamber and the fourth chamber 24 are circulated by the pumps 30 and 31, respectively, so that the dirt is made uniform. Of course, the washing water in each of these chambers is appropriately replaced depending on the degree of contamination.

【0028】ところで、本発明の洗浄装置は、基本的に
は第1室21、第2室22、気液攪拌分離機構15、及
び負圧源としてのファン36により構成されるもので、
この基本構成により極めて良好に塵埃等を除去すること
が可能である。実施例の洗浄装置10は、この基本的な
洗浄装置を2段並べて直列に接続した構成としたもので
ある。
The cleaning apparatus of the present invention basically comprises a first chamber 21, a second chamber 22, a gas-liquid stirring / separation mechanism 15, and a fan 36 as a negative pressure source.
With this basic configuration, it is possible to very effectively remove dust and the like. The cleaning apparatus 10 of the embodiment has a configuration in which the basic cleaning apparatuses are arranged in two stages and connected in series.

【0029】勿論、洗浄装置は、処理能力、或いは、除
去し難い臭気等に対しては実施例のように2段並べて直
列に接続した構成としてもよく、更に3段、4段と並べ
て直列に接続してもよい。このように多段に使用する場
合でも、洗浄装置を横に並べたり、或いは重ねること
で、設置性が向上し、狭い場所にも容易に設置すること
が可能となる。例えば、各種の異臭の発生源となる調理
室の屋外に簡単に設置することができる。
Of course, the cleaning device may have a configuration in which two stages are arranged in series and connected in series as in the embodiment as to the processing capability or odor which is difficult to remove, and furthermore, three stages and four stages are arranged in series. You may connect. Thus, even in the case of using in multiple stages, by arranging or stacking the cleaning devices side by side, the installation property is improved, and the cleaning devices can be easily installed even in a narrow place. For example, it can be easily installed outside a cooking room, which is a source of various off-flavors.

【0030】また、上記実施例では、第1室21、第2
室22及び第3室23に噴射ノズル33、34を設けた
が、これらの噴射ノズルは必ずしも必要ではない。しか
しながら、最初に気体を吸入(導入)する第1室21に
噴射ノズル33を設けることで、吸入した気体の温度を
下げることができ、特に高温の気体に対しては有効であ
る。
In the above embodiment, the first chamber 21 and the second
Although the injection nozzles 33 and 34 are provided in the chamber 22 and the third chamber 23, these injection nozzles are not necessarily required. However, by providing the injection nozzle 33 in the first chamber 21 for initially sucking (introducing) the gas, the temperature of the sucked gas can be reduced, and this is particularly effective for high-temperature gas.

【0031】尚、上記実施例では、塵埃を含む大気を洗
浄する場合について説明したが、これに限るものではな
く、煤煙、或いは、酸性ガス、セメントの粉塵、悪臭等
各種の物質を含む各種の気体の洗浄に適用し得ることは
勿論である。尚、この場合、洗浄液としては、対象とす
る気体に混合している物質により最適なものを使用す
る。例えば、酸性ガスに対しては、アルカリ性の洗浄液
を使用して中和する等の措置をとる。
In the above embodiment, the case where the atmosphere containing dust is cleaned has been described. However, the present invention is not limited to this, and various kinds of substances including various substances such as soot, acid gas, cement dust, and malodor are described. Of course, it can be applied to gas cleaning. In this case, the most appropriate cleaning liquid is used depending on the substance mixed with the target gas. For example, measures such as neutralizing an acidic gas using an alkaline cleaning liquid are taken.

【0032】また、上記実施例では、本体11、仕切板
21、隔壁13、14、気液攪拌分離機構15、18等
を鉄板により形成したが、これに限るものではなく、洗
浄する気体に応じて、鋼板、ステンレス、或いは合成樹
脂部材その他適宜のものを使用すればよい。例えば、合
成樹脂部材により形成した場合には、耐食性、耐熱性、
軽量化、低廉化等が図られる。
In the above embodiment, the main body 11, the partition plate 21, the partitions 13, 14, the gas-liquid stirring / separating mechanisms 15, 18 and the like are formed by iron plates. However, the present invention is not limited to this. Then, a steel plate, stainless steel, a synthetic resin member or any other appropriate material may be used. For example, when formed of a synthetic resin member, corrosion resistance, heat resistance,
Weight reduction and cost reduction are achieved.

【0033】[0033]

【発明の効果】以上説明したように、本発明では、下部
に洗浄液が貯溜され上部に洗浄すべき気体を吸入する入
口が設けられた第1室と、下部に洗浄液が貯溜され、上
部に洗浄した前記気体を排気する出口が設けられた第2
室と、前記第1室と第2室とを画成し、且つこれら両室
の下部を連通する隔壁と、前記第2室の気体を排気して
当該第2室を負圧にするファンと、前記隔壁の前記第1
室と第2室の洗浄液の液面位置に設けられ、前記第2室
の負圧により前記第1室の気体を当該第1室内の洗浄液
と共に取り込み攪拌した後これらの気体と洗浄液とを分
離して気体のみを前記第2室に流出させる気液攪拌分離
手段とを備えた構成としたことで、極めて良好に気体を
洗浄して混合物を除去することが可能となり、清浄効率
を大幅に高めにことができる。また、構造が簡単であ
り、小型、軽量化及びコストの低減を図ることができ、
汎用性に優れている。更に、メンテナンスが容易であ
る。請求項2の発明では、気液攪拌分離手段は、極めて
簡単な構成でありながら、気体と洗浄液とを極めて良好
に混合し、攪拌し、更にこれらの気体と洗浄液とを分離
することができ、洗浄した清浄な気体のみを取り出すこ
とが可能となる。
As described above, in the present invention, the first chamber in which the cleaning liquid is stored in the lower part and the inlet for sucking the gas to be cleaned is provided in the upper part, the cleaning liquid is stored in the lower part, and the cleaning liquid is stored in the upper part. A second port provided with an outlet for exhausting the gas
A chamber, a partition defining the first chamber and the second chamber, and a partition communicating the lower portions of the two chambers; and a fan for exhausting gas in the second chamber to make the second chamber a negative pressure. The first of the partition walls
The gas in the first chamber is provided together with the cleaning liquid in the first chamber due to the negative pressure in the second chamber, and the gas is separated from the cleaning liquid. And gas-liquid agitation / separation means for allowing only the gas to flow into the second chamber, thereby making it possible to clean the gas and remove the mixture extremely satisfactorily, greatly improving the cleaning efficiency. be able to. In addition, the structure is simple, and it is possible to reduce the size, weight, and cost,
Excellent versatility. Further, maintenance is easy. According to the second aspect of the present invention, the gas-liquid stirring / separating means can mix and stir the gas and the cleaning liquid extremely well while having a very simple configuration, and can further separate these gases and the cleaning liquid, Only the clean and clean gas can be taken out.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る洗浄装置の実施の形態を示す断面
図である。
FIG. 1 is a sectional view showing an embodiment of a cleaning apparatus according to the present invention.

【図2】図1の気液攪拌分離機構の拡大図である。FIG. 2 is an enlarged view of the gas-liquid stirring / separation mechanism of FIG.

【図3】従来の洗浄塔の断面図である。FIG. 3 is a sectional view of a conventional washing tower.

【符号の説明】[Explanation of symbols]

10 洗浄装置 11 本体 12 仕切板 13、14 隔壁 15、18 気液攪拌分離機構 16、17、19、20 ガイド部材 21 第1室 22 第2室 23 第3室 24 第4室 30、31、35 ポンプ 33、34 噴射ノズル 36 ファン DESCRIPTION OF SYMBOLS 10 Cleaning apparatus 11 Main body 12 Partition plate 13, 14 Partition wall 15, 18 Gas-liquid stirring separation mechanism 16, 17, 19, 20 Guide member 21 1st chamber 22 2nd chamber 23 3rd chamber 24 4th chamber 30, 31, 35 Pump 33, 34 Injection nozzle 36 Fan

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 下部に洗浄液が貯溜され上部に洗浄すべ
き気体を吸入する入口が設けられた第1室と、 下部に洗浄液が貯溜され、上部に洗浄した前記気体を排
気する出口が設けられた第2室と、 前記第1室と第2室とを画成し、且つこれら両室の下部
を連通する隔壁と、 前記第2室の気体を排気して当該第2室を負圧にするフ
ァンと、 前記隔壁の前記第1室と第2室の洗浄液の液面位置に設
けられ、前記第2室の負圧により前記第1室の気体を当
該第1室内の洗浄液と共に取り込み攪拌した後これらの
気体と洗浄液とを分離して気体のみを前記第2室に流出
させる気液攪拌分離手段とを備えたことを特徴とする洗
浄装置。
A first chamber in which a cleaning liquid is stored in a lower part and an inlet for sucking a gas to be cleaned is provided in an upper part; an outlet for storing a cleaning liquid in a lower part and exhausting the cleaned gas is provided in an upper part; A second chamber, the first chamber and the second chamber are defined, and a partition wall communicates with the lower portions of the two chambers; and the gas in the second chamber is exhausted to make the second chamber a negative pressure. And a fan that is provided at a liquid surface position of the cleaning liquid in the first chamber and the second chamber on the partition wall, and the gas in the first chamber is taken in together with the cleaning liquid in the first chamber by the negative pressure of the second chamber and stirred. And a gas-liquid stirring / separating means for separating the gas from the cleaning liquid and allowing only the gas to flow into the second chamber.
【請求項2】 前記気液攪拌分離手段は、円筒の側面を
軸方向に切り開いた略樋状をなす第1、第2のガイド部
材から成り、 前記第1のガイド部材は、凹面が第2室に臨み、上縁部
が前記洗浄液の液面の上下で分割された前記隔壁の上側
の隔壁の下端部に取り付けられ、 前記第2のガイド部材は、凹面が第1室に臨み、下縁部
が前記分割された隔壁の下側の隔壁の上端部に取り付け
られ、 且つ前記第1のガイド部材の下縁部が前記第2のガイド
部材の凹部に、前記第2のガイド部材の上縁部が前記第
1のガイド部材の凹部に夫々間隙を存して入り込んで構
成されていることを特徴とする請求項1に記載の洗浄装
置。
2. The gas-liquid agitation / separation means comprises first and second guide members each having a substantially trough shape formed by cutting a side surface of a cylinder in an axial direction, and wherein the first guide member has a concave surface having a second surface. The upper edge portion is attached to a lower end portion of a partition wall above the partition wall which is divided above and below a liquid surface of the cleaning liquid. The second guide member has a concave surface facing the first chamber and a lower edge. A portion is attached to an upper end portion of the partition wall below the divided partition wall, and a lower edge of the first guide member is provided in a concave portion of the second guide member, and an upper edge of the second guide member is provided. The cleaning device according to claim 1, wherein the portions are configured to enter into the recesses of the first guide member with a gap therebetween.
JP18782698A 1998-07-02 1998-07-02 Cleaning equipment Expired - Fee Related JP3329372B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18782698A JP3329372B2 (en) 1998-07-02 1998-07-02 Cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18782698A JP3329372B2 (en) 1998-07-02 1998-07-02 Cleaning equipment

Publications (2)

Publication Number Publication Date
JP2000015034A true JP2000015034A (en) 2000-01-18
JP3329372B2 JP3329372B2 (en) 2002-09-30

Family

ID=16212919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18782698A Expired - Fee Related JP3329372B2 (en) 1998-07-02 1998-07-02 Cleaning equipment

Country Status (1)

Country Link
JP (1) JP3329372B2 (en)

Cited By (5)

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JP2012110853A (en) * 2010-11-26 2012-06-14 Disco Corp Dust disposal device
JP2012115724A (en) * 2010-11-29 2012-06-21 Disco Corp Dust-treating apparatus
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100372591C (en) * 2004-10-26 2008-03-05 新明和工业株式会社 Wet type dust collection unit
JP2012110853A (en) * 2010-11-26 2012-06-14 Disco Corp Dust disposal device
JP2012115724A (en) * 2010-11-29 2012-06-21 Disco Corp Dust-treating apparatus
JP2020000997A (en) * 2018-06-28 2020-01-09 Jfeスチール株式会社 Particle recovery apparatus and particle recovery method
CN114733311A (en) * 2022-04-15 2022-07-12 杭州老板电器股份有限公司 Fume exhauster
CN114733311B (en) * 2022-04-15 2023-01-10 杭州老板电器股份有限公司 Fume exhauster

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