ITMI20041003A1 - Strutture di cella eeprom aventi spessore di dielettrico di canale non uniforme e procedimenti di realizzazione delle medesime - Google Patents

Strutture di cella eeprom aventi spessore di dielettrico di canale non uniforme e procedimenti di realizzazione delle medesime

Info

Publication number
ITMI20041003A1
ITMI20041003A1 IT001003A ITMI20041003A ITMI20041003A1 IT MI20041003 A1 ITMI20041003 A1 IT MI20041003A1 IT 001003 A IT001003 A IT 001003A IT MI20041003 A ITMI20041003 A IT MI20041003A IT MI20041003 A1 ITMI20041003 A1 IT MI20041003A1
Authority
IT
Italy
Prior art keywords
implementing
procedures
same
cell structures
dielectric thickness
Prior art date
Application number
IT001003A
Other languages
English (en)
Inventor
Jeong-Uk Han
Sung-Taeg Kang
Sung-Woo Park
Seung-Beom Yoon
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/834,226 external-priority patent/US20040232476A1/en
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of ITMI20041003A1 publication Critical patent/ITMI20041003A1/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42324Gate electrodes for transistors with a floating gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7883Programmable transistors with only two possible levels of programmation charging by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
IT001003A 2003-05-20 2004-05-19 Strutture di cella eeprom aventi spessore di dielettrico di canale non uniforme e procedimenti di realizzazione delle medesime ITMI20041003A1 (it)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR20030031910 2003-05-20
KR1020030060763A KR20040100813A (ko) 2003-05-20 2003-09-01 메모리 게이트 산화막의 두께가 부분적으로 다른 이이피롬소자 및 그 제조방법
US10/834,226 US20040232476A1 (en) 2003-05-20 2004-04-29 EEPROM cell structures having non-uniform channel-dielectric thickness and methods of making the same

Publications (1)

Publication Number Publication Date
ITMI20041003A1 true ITMI20041003A1 (it) 2004-08-19

Family

ID=37378147

Family Applications (1)

Application Number Title Priority Date Filing Date
IT001003A ITMI20041003A1 (it) 2003-05-20 2004-05-19 Strutture di cella eeprom aventi spessore di dielettrico di canale non uniforme e procedimenti di realizzazione delle medesime

Country Status (2)

Country Link
KR (1) KR20040100813A (it)
IT (1) ITMI20041003A1 (it)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7579645B2 (en) * 2004-12-24 2009-08-25 Ricoh Company, Ltd. Semiconductor device having non-volatile memory cell

Also Published As

Publication number Publication date
KR20040100813A (ko) 2004-12-02

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