IT962430B - Disposizione per diffondere sostan ze di drogaggio in dischi di mate riale semiconduttore - Google Patents

Disposizione per diffondere sostan ze di drogaggio in dischi di mate riale semiconduttore

Info

Publication number
IT962430B
IT962430B IT2661572A IT2661572A IT962430B IT 962430 B IT962430 B IT 962430B IT 2661572 A IT2661572 A IT 2661572A IT 2661572 A IT2661572 A IT 2661572A IT 962430 B IT962430 B IT 962430B
Authority
IT
Italy
Prior art keywords
disseminating
discs
arrangement
semiconductive material
drug substances
Prior art date
Application number
IT2661572A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2133877A external-priority patent/DE2133877A1/de
Priority claimed from DE2133876A external-priority patent/DE2133876A1/de
Priority claimed from DE2133843A external-priority patent/DE2133843A1/de
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT962430B publication Critical patent/IT962430B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67313Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/14Substrate holders or susceptors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls

Landscapes

  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
IT2661572A 1971-07-07 1972-07-05 Disposizione per diffondere sostan ze di drogaggio in dischi di mate riale semiconduttore IT962430B (it)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2133877A DE2133877A1 (de) 1971-07-07 1971-07-07 Anordnung zum eindiffundieren von dotierstoffen in halbleiterscheiben
DE2133876A DE2133876A1 (de) 1971-07-07 1971-07-07 Anordnung zum eindiffundieren von dotierstoffen
DE2133843A DE2133843A1 (de) 1971-07-07 1971-07-07 Anordnung zum eindiffundieren von dotierstoffen in halbleiterscheiben

Publications (1)

Publication Number Publication Date
IT962430B true IT962430B (it) 1973-12-20

Family

ID=27183548

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2661572A IT962430B (it) 1971-07-07 1972-07-05 Disposizione per diffondere sostan ze di drogaggio in dischi di mate riale semiconduttore

Country Status (4)

Country Link
FR (1) FR2144678B1 (it)
GB (1) GB1385730A (it)
IT (1) IT962430B (it)
NL (1) NL7206014A (it)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1502754A (en) * 1975-12-22 1978-03-01 Siemens Ag Heat-treatment of semi-conductor wafers
JPS5595321A (en) * 1979-01-12 1980-07-19 Matsushita Electric Ind Co Ltd Container of semiconductor substrate for liquid-phase epitaxial growth
US4577650A (en) * 1984-05-21 1986-03-25 Mcconnell Christopher F Vessel and system for treating wafers with fluids
US4856544A (en) * 1984-05-21 1989-08-15 Cfm Technologies, Inc. Vessel and system for treating wafers with fluids
US4740249A (en) * 1984-05-21 1988-04-26 Christopher F. McConnell Method of treating wafers with fluid
US4738272A (en) * 1984-05-21 1988-04-19 Mcconnell Christopher F Vessel and system for treating wafers with fluids
US4633893A (en) * 1984-05-21 1987-01-06 Cfm Technologies Limited Partnership Apparatus for treating semiconductor wafers
FR2702088B1 (fr) * 1993-02-24 1995-05-24 Sgs Thomson Microelectronics Nacelle pour plaquettes de silicium.
WO1998035765A1 (en) * 1997-02-18 1998-08-20 Scp Global Technologies Multiple stage wet processing chamber
WO2002003428A2 (en) * 2000-06-30 2002-01-10 Integrated Materials, Inc. Silicon fixtures for supporting wafers during thermal processing and method of fabrication
US6450346B1 (en) 2000-06-30 2002-09-17 Integrated Materials, Inc. Silicon fixtures for supporting wafers during thermal processing
US20040188319A1 (en) * 2003-03-28 2004-09-30 Saint-Gobain Ceramics & Plastics, Inc. Wafer carrier having improved processing characteristics
DE102015004419A1 (de) * 2015-04-02 2016-10-06 Centrotherm Photovoltaics Ag Waferboot und Plasma-Behandlungsvorrichtung für Wafer

Also Published As

Publication number Publication date
GB1385730A (en) 1975-02-26
NL7206014A (it) 1973-01-09
FR2144678A1 (it) 1973-02-16
FR2144678B1 (it) 1975-08-29

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