IT8922871A0 - SUSPECTOR - Google Patents
SUSPECTORInfo
- Publication number
- IT8922871A0 IT8922871A0 IT22871A IT2287189A IT8922871A0 IT 8922871 A0 IT8922871 A0 IT 8922871A0 IT 22871 A IT22871 A IT 22871A IT 2287189 A IT2287189 A IT 2287189A IT 8922871 A0 IT8922871 A0 IT 8922871A0
- Authority
- IT
- Italy
- Prior art keywords
- suspector
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001004835A JP2002208353A (en) | 2001-01-12 | 2001-01-12 | Adjusting method of white uniformity of color cathode- ray tube and color cathode-ray tube |
Publications (3)
Publication Number | Publication Date |
---|---|
IT8922871A0 true IT8922871A0 (en) | 1989-12-29 |
IT8922871A1 IT8922871A1 (en) | 1991-06-29 |
IT1236991B IT1236991B (en) | 1993-05-12 |
Family
ID=18872969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT02287189A IT1236991B (en) | 2001-01-12 | 1989-12-29 | susceptor |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2002208353A (en) |
IT (1) | IT1236991B (en) |
-
1989
- 1989-12-29 IT IT02287189A patent/IT1236991B/en active IP Right Grant
-
2001
- 2001-01-12 JP JP2001004835A patent/JP2002208353A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2002208353A (en) | 2002-07-26 |
IT1236991B (en) | 1993-05-12 |
IT8922871A1 (en) | 1991-06-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted | ||
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19961227 |