IT1316806B1 - Impianto di trattamento per substrati piatti - Google Patents

Impianto di trattamento per substrati piatti

Info

Publication number
IT1316806B1
IT1316806B1 IT2000MI000564A ITMI20000564A IT1316806B1 IT 1316806 B1 IT1316806 B1 IT 1316806B1 IT 2000MI000564 A IT2000MI000564 A IT 2000MI000564A IT MI20000564 A ITMI20000564 A IT MI20000564A IT 1316806 B1 IT1316806 B1 IT 1316806B1
Authority
IT
Italy
Prior art keywords
treatment plant
flat substrates
substrates
flat
plant
Prior art date
Application number
IT2000MI000564A
Other languages
English (en)
Inventor
Karl-Heinrich Wenk
Original Assignee
Leybold Systems Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Systems Gmbh filed Critical Leybold Systems Gmbh
Publication of ITMI20000564A0 publication Critical patent/ITMI20000564A0/it
Publication of ITMI20000564A1 publication Critical patent/ITMI20000564A1/it
Application granted granted Critical
Publication of IT1316806B1 publication Critical patent/IT1316806B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
IT2000MI000564A 1999-03-20 2000-03-17 Impianto di trattamento per substrati piatti IT1316806B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19912707A DE19912707B4 (de) 1999-03-20 1999-03-20 Behandlungsanlage für flache Substrate

Publications (3)

Publication Number Publication Date
ITMI20000564A0 ITMI20000564A0 (it) 2000-03-17
ITMI20000564A1 ITMI20000564A1 (it) 2001-09-17
IT1316806B1 true IT1316806B1 (it) 2003-05-12

Family

ID=7901846

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2000MI000564A IT1316806B1 (it) 1999-03-20 2000-03-17 Impianto di trattamento per substrati piatti

Country Status (3)

Country Link
DE (1) DE19912707B4 (it)
GB (1) GB2348212B (it)
IT (1) IT1316806B1 (it)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2824080B1 (fr) * 2001-04-30 2004-03-05 Tecmachine Dispositif d'introduction d'un materiau souple en bande dans une enceinte
US7799182B2 (en) 2006-12-01 2010-09-21 Applied Materials, Inc. Electroplating on roll-to-roll flexible solar cell substrates
DE102009017305B4 (de) * 2009-04-16 2012-12-06 Von Ardenne Anlagentechnik Gmbh Einrichtung zum Transport von Substraten durch Vakuumanlagen

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1279426B (de) * 1966-08-24 1968-10-03 Leybold Heraeus Gmbh & Co Kg Bandbedampfungsvorrichtung
DE2747061A1 (de) * 1977-10-20 1979-04-26 Leybold Heraeus Gmbh & Co Kg Verfahren und vorrichtung zum beschichten von baendern in vakuumanlagen mit schleuseneinrichtungen
DE3224234A1 (de) * 1981-09-01 1983-03-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von metallfreien streifen bei der metallbedampfung eines isolierstoffbandes und vorrichtung zur durchfuehrung des verfahrens
JPH01306562A (ja) * 1988-06-04 1989-12-11 Nippon Steel Corp 真空チャンバー用シール装置
JPH02294481A (ja) * 1989-05-09 1990-12-05 Matsushita Electric Ind Co Ltd 蒸着装置
DE4310085A1 (de) * 1993-03-27 1994-09-29 Leybold Ag Verfahren und Vorrichtung zur Erzeugung von Mustern auf Substraten
DE19527604A1 (de) * 1995-07-28 1997-01-30 Leybold Ag Verfahren und Vorrichtung zur Herstellung von metallfreien Streifen bei der Metallbedampfung
DE19537779A1 (de) * 1995-10-11 1997-04-17 Leybold Ag Beschichtungsanlage für Folien
DE19537781A1 (de) * 1995-10-11 1997-04-17 Leybold Ag Beschichtungsanlage für Folien

Also Published As

Publication number Publication date
DE19912707B4 (de) 2010-01-21
DE19912707A1 (de) 2000-09-21
ITMI20000564A1 (it) 2001-09-17
GB2348212B (en) 2003-07-30
ITMI20000564A0 (it) 2000-03-17
GB0006605D0 (en) 2000-05-10
GB2348212A (en) 2000-09-27

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