IT1256443B - Impianto galvanico a celle elettrolitiche contrapposte con alimentazione in continuo delle superfici da trattare - Google Patents
Impianto galvanico a celle elettrolitiche contrapposte con alimentazione in continuo delle superfici da trattareInfo
- Publication number
- IT1256443B IT1256443B ITMI922679A ITMI922679A IT1256443B IT 1256443 B IT1256443 B IT 1256443B IT MI922679 A ITMI922679 A IT MI922679A IT MI922679 A ITMI922679 A IT MI922679A IT 1256443 B IT1256443 B IT 1256443B
- Authority
- IT
- Italy
- Prior art keywords
- cell
- electrolytic
- solution
- electrolytic cells
- treated
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
- H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1518—Vertically held PCB
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
- H05K3/0088—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor for treatment of holes
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Impianto galvanico (1) per la deposizione elettrolitica di metalli su elementi piani quali piastre (3) di circuiti stampati e simili, orientate parallelamente alla direzione di avanzamento e alimentate in continuo tramite una apparecchiatura (4) di trasporto e alimentazione di corrente catodica alle piastre (3) stesse, caratterizzato dal fatto che presenta almeno una coppia di celle elettrolitiche (8) ciascuna dotata di una apertura (9c) di alimentazione e di una apertura (9a) di fuoriuscita della soluzione elettrolitica alimentata in continuo tramite relativi mezzi (7) di prelievo della medesima da un serbatoio di recupero (6), ciascuna cella essendo dotata di anodi (10) e di mezzi (12) di regolazione della portata della soluzione elettrolitica, ciascuna cella di detta almeno una coppia essendo disposta con la rispettiva apertura (9a) di fuoriuscita contrapposta a quella dell'altra cella in modo da determinare uno spazio vuoto attraverso il quale viene fatta passare la piastra (3) che viene in tal modo in contatto con la soluzione elettrolitica, essendo anche previsti elementi (11) di contenimento della caduta della soluzione atti a determinare il passaggio della soluzione stessa attraverso fori (3a) attraversanti la piastra (3) per la loro metallizzazione.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITMI922679A IT1256443B (it) | 1992-11-23 | 1992-11-23 | Impianto galvanico a celle elettrolitiche contrapposte con alimentazione in continuo delle superfici da trattare |
EP93203246A EP0599416B1 (en) | 1992-11-23 | 1993-11-19 | Electroplating plant with opposed electrolitic cells and continuous feed of the surfaces to be treated |
ES93203246T ES2089701T3 (es) | 1992-11-23 | 1993-11-19 | Instalacion de electrodeposicion con celdas electroliticas opuestas y alimentacion continua de superficie a tratar. |
DE69302663T DE69302663T2 (de) | 1992-11-23 | 1993-11-19 | Elektroplattierungsanlage mit gegenüberliegenden elektrolytischen Zellen und kontinuierlicher Beschickung mit den zu behandelnden Oberflächen |
US08/156,096 US5417828A (en) | 1992-11-23 | 1993-11-22 | Electroplating plant with opposed electrolitic cells and continuous feed of the workpieces to be plated |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITMI922679A IT1256443B (it) | 1992-11-23 | 1992-11-23 | Impianto galvanico a celle elettrolitiche contrapposte con alimentazione in continuo delle superfici da trattare |
Publications (3)
Publication Number | Publication Date |
---|---|
ITMI922679A0 ITMI922679A0 (it) | 1992-11-23 |
ITMI922679A1 ITMI922679A1 (it) | 1994-05-23 |
IT1256443B true IT1256443B (it) | 1995-12-05 |
Family
ID=11364336
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ITMI922679A IT1256443B (it) | 1992-11-23 | 1992-11-23 | Impianto galvanico a celle elettrolitiche contrapposte con alimentazione in continuo delle superfici da trattare |
Country Status (5)
Country | Link |
---|---|
US (1) | US5417828A (it) |
EP (1) | EP0599416B1 (it) |
DE (1) | DE69302663T2 (it) |
ES (1) | ES2089701T3 (it) |
IT (1) | IT1256443B (it) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0759100B1 (de) * | 1994-05-11 | 1998-03-11 | Siemens S.A. | Vorrichtung zur behandlung von leiterplatten |
JP3043319B2 (ja) * | 1998-09-25 | 2000-05-22 | 栄電子工業株式会社 | 連続メッキ装置 |
US6153064A (en) * | 1998-11-25 | 2000-11-28 | Oliver Sales Company | Apparatus for in line plating |
US6676820B2 (en) | 2001-03-02 | 2004-01-13 | Ppg Industries Ohio, Inc. | Process for electrocoating metal blanks and coiled metal substrates |
US7204918B2 (en) * | 2003-03-10 | 2007-04-17 | Modular Components National, Inc. | High efficiency plating apparatus and method |
CN114540933B (zh) * | 2022-03-03 | 2023-04-25 | 常熟市新达模塑成型有限公司 | 一种无测量装置可连续控制电解液深度的电解池及其调节方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4401522A (en) * | 1980-09-29 | 1983-08-30 | Micro-Plate, Inc. | Plating method and apparatus |
US4402800A (en) * | 1981-10-02 | 1983-09-06 | Ash James J | Apparatus and method of treating tabs of printed circuit boards and the like |
US4587000A (en) * | 1984-11-19 | 1986-05-06 | Pellegrino Peter P | Electroplating method and apparatus for electroplating high aspect ratio thru-holes |
DE3528575A1 (de) * | 1985-08-06 | 1987-02-19 | Schering Ag | Verfahren und einrichtung zur reinigung, aktivierung und/oder metallisierung von bohrloechern in horizontal gefuehrten leiterplatten |
JPH0765209B2 (ja) * | 1985-12-06 | 1995-07-12 | ヤマハ発動機株式会社 | 電気めっき装置 |
US4761213A (en) * | 1986-07-28 | 1988-08-02 | Siemens Aktiengesellschaft | Treatment facility particularly for printed circuit boards to be treated while in a horizontal plane |
US4755271A (en) * | 1986-07-28 | 1988-07-05 | Siemens Aktiengesellschaft | Electroplating apparatus for plate-shaped workpieces, particularly printed circuit boards |
US4871435A (en) * | 1988-10-14 | 1989-10-03 | Charles Denofrio | Electroplating apparatus |
-
1992
- 1992-11-23 IT ITMI922679A patent/IT1256443B/it active IP Right Grant
-
1993
- 1993-11-19 ES ES93203246T patent/ES2089701T3/es not_active Expired - Lifetime
- 1993-11-19 EP EP93203246A patent/EP0599416B1/en not_active Expired - Lifetime
- 1993-11-19 DE DE69302663T patent/DE69302663T2/de not_active Expired - Fee Related
- 1993-11-22 US US08/156,096 patent/US5417828A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0599416B1 (en) | 1996-05-15 |
ES2089701T3 (es) | 1996-10-01 |
DE69302663T2 (de) | 1996-12-05 |
ITMI922679A0 (it) | 1992-11-23 |
EP0599416A1 (en) | 1994-06-01 |
DE69302663D1 (de) | 1996-06-20 |
US5417828A (en) | 1995-05-23 |
ITMI922679A1 (it) | 1994-05-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted | ||
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19951129 |