IT1249985B - Procedimento di galvanostegia. - Google Patents

Procedimento di galvanostegia.

Info

Publication number
IT1249985B
IT1249985B ITTO910643A ITTO910643A IT1249985B IT 1249985 B IT1249985 B IT 1249985B IT TO910643 A ITTO910643 A IT TO910643A IT TO910643 A ITTO910643 A IT TO910643A IT 1249985 B IT1249985 B IT 1249985B
Authority
IT
Italy
Prior art keywords
bath
substrate
conductive material
liquid
plating
Prior art date
Application number
ITTO910643A
Other languages
English (en)
Inventor
Guy Desthomas
Original Assignee
Enthone Omi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enthone Omi Inc filed Critical Enthone Omi Inc
Publication of ITTO910643A0 publication Critical patent/ITTO910643A0/it
Publication of ITTO910643A1 publication Critical patent/ITTO910643A1/it
Application granted granted Critical
Publication of IT1249985B publication Critical patent/IT1249985B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • C25D17/28—Apparatus for electrolytic coating of small objects in bulk with means for moving the objects individually through the apparatus during treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemically Coating (AREA)

Abstract

Viene illustrato un procedimento per la deposizione elettrolitica di un materiale conduttore su un substrato che comprende la messa in posizione mobile del substrato in un primo bagno elettrolitico liquido conduttore che contiene il materiale conduttore, il mantenimento di condizioni sostanzialmente costanti di temperatura e circolazione liquida nel primo bagno, il passaggio di una corrente elettrica attraverso il substrato e il primo bagno in modo da depositare il materiale conduttore sul substrato, il periodico trasferimento del substrato ad un secondo bagno liquido, contenendo detto secondo bagno un liquido della medesima composizione o minori concentrazioni di componenti disciolti a fronte del primo bagno, la pesata del substrato immerso nel secondo bagno e di qui il calcolo del peso in aria di materiale conduttore depositato, il ritorno del substrato al primo bagno e il proseguimento della placcatura in una serie di stadi di placcatura, pesando nel liquido e placcando sino alla costituzione del deposito desiderato.Viene altresì illustrata un'apparecchiatura per l'esecuzione pratica del metodo.
ITTO910643A 1990-08-17 1991-08-09 Procedimento di galvanostegia. IT1249985B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9018116A GB2247468B (en) 1990-08-17 1990-08-17 Electroplating process

Publications (3)

Publication Number Publication Date
ITTO910643A0 ITTO910643A0 (it) 1991-08-09
ITTO910643A1 ITTO910643A1 (it) 1993-02-09
IT1249985B true IT1249985B (it) 1995-03-30

Family

ID=10680845

Family Applications (1)

Application Number Title Priority Date Filing Date
ITTO910643A IT1249985B (it) 1990-08-17 1991-08-09 Procedimento di galvanostegia.

Country Status (9)

Country Link
US (1) US5108552A (it)
JP (1) JPH0647759B2 (it)
CA (1) CA2047281C (it)
CH (1) CH683845A5 (it)
DE (1) DE4124814C2 (it)
ES (1) ES2033583B1 (it)
FR (1) FR2665910B1 (it)
GB (1) GB2247468B (it)
IT (1) IT1249985B (it)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5378285A (en) * 1993-02-10 1995-01-03 Matsushita Electric Industrial Co., Ltd. Apparatus for forming a diamond-like thin film
US5393405A (en) * 1993-12-01 1995-02-28 Ultralite Technology Incorporated Method of electroforming a gold jewelry article
JP3055434B2 (ja) * 1995-07-14 2000-06-26 株式会社村田製作所 チップ型電子部品のメッキ装置
US5993892A (en) * 1996-09-12 1999-11-30 Wasserman; Arthur Method of monitoring and controlling electroless plating in real time
US5985122A (en) 1997-09-26 1999-11-16 General Electric Company Method for preventing plating of material in surface openings of turbine airfoils
KR100414598B1 (ko) * 2001-04-20 2004-01-07 주식회사 티케이씨 표면처리장치
US20040055873A1 (en) * 2002-09-24 2004-03-25 Digital Matrix Corporation Apparatus and method for improved electroforming
US20060073348A1 (en) * 2004-10-06 2006-04-06 General Electric Company Electroplated fuel nozzle/swirler wear coat
JP5274628B2 (ja) * 2010-08-17 2013-08-28 キヤノン株式会社 塗布装置、電子写真感光体の製造方法および電子写真感光体の量産方法
CN102677113B (zh) * 2012-01-09 2014-07-16 河南科技大学 一种制备金属多层膜镀层的装置
ITVI20120099A1 (it) * 2012-04-26 2013-10-27 Italo Caoduro Apparato e metodo per la realizzazione di un oggetto tramite deposizione elettrolitica.
JP5515056B1 (ja) * 2012-11-01 2014-06-11 ユケン工業株式会社 めっき装置、ノズル−アノードユニット、めっき部材の製造方法、および被めっき部材固定装置
US11961991B2 (en) 2017-06-20 2024-04-16 Coreshell Technologies, Incorporated Solution-phase deposition of thin films on solid-state electrolytes
CN111095627A (zh) * 2017-06-20 2020-05-01 核壳科技公司 用于将薄膜液相沉积到电池电极的表面上的方法、***和组合物
CN114232059A (zh) * 2022-01-08 2022-03-25 铜陵蓝盾丰山微电子有限公司 一种全自动环保型电镀设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1712284A (en) * 1925-12-17 1929-05-07 Lawrence C Turnock Method and apparatus for electrodeposition
US1856409A (en) * 1927-11-04 1932-05-03 Dayton Scale Co Weighing sealing device
US2958331A (en) * 1956-07-09 1960-11-01 Allied Res Products Inc Automatic plating machine
DE1933261A1 (de) * 1969-07-01 1971-02-04 Zachariae Oelsch Meier Metallgewichtszaehler
DE2039634B2 (de) * 1970-08-10 1972-03-09 Grundig Emv Verfahren zur messung der abscheidungsgeschwindigkeit von metallabscheidungen in reduktiven und galvanischen metalli sierungsbaedern sowie eine vorrichtung zur durchfuehrung dieses verfahrens
DE2411155A1 (de) * 1974-03-08 1975-09-11 Oelsch Fernsteuergeraete Verfahren zur ueberwachung des prozessablaufs bei der oberflaechenbehandlung von werkstuecken
DE2719699A1 (de) * 1977-05-03 1978-11-09 Montblanc Simplo Gmbh Transportvorrichtung fuer galvanisieranlagen
GB2092775A (en) * 1981-02-11 1982-08-18 Kodak Ltd Electrolytic Cells
SU1225885A1 (ru) * 1984-11-29 1986-04-23 Смоленский Филиал Московского Ордена Ленина И Ордена Октябрьской Революции Энергетического Института Устройство дл автоматического контрол массы осажденного металла

Also Published As

Publication number Publication date
ES2033583B1 (es) 1994-04-01
GB2247468A (en) 1992-03-04
DE4124814C2 (de) 1996-11-21
JPH0665796A (ja) 1994-03-08
ITTO910643A1 (it) 1993-02-09
US5108552A (en) 1992-04-28
ITTO910643A0 (it) 1991-08-09
CA2047281C (en) 1999-01-12
CH683845A5 (de) 1994-05-31
DE4124814A1 (de) 1992-02-20
JPH0647759B2 (ja) 1994-06-22
CA2047281A1 (en) 1992-02-18
ES2033583A1 (es) 1993-03-16
GB2247468B (en) 1994-10-05
GB9018116D0 (en) 1990-10-03
FR2665910A1 (fr) 1992-02-21
FR2665910B1 (fr) 1993-10-08

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970827