IT1229210B - Metodo e dispositivo per analizzare gas contenenti fluoro. - Google Patents

Metodo e dispositivo per analizzare gas contenenti fluoro.

Info

Publication number
IT1229210B
IT1229210B IT8919907A IT1990789A IT1229210B IT 1229210 B IT1229210 B IT 1229210B IT 8919907 A IT8919907 A IT 8919907A IT 1990789 A IT1990789 A IT 1990789A IT 1229210 B IT1229210 B IT 1229210B
Authority
IT
Italy
Prior art keywords
containing fluorine
gases containing
analyzing gases
analyzing
fluorine
Prior art date
Application number
IT8919907A
Other languages
English (en)
Other versions
IT8919907A0 (it
Inventor
Kohzo Hakuta
Takashi Suenaga
Hisaji Nakano
Minoru Aramaki
Mitsuo Kodama
Shinsuke Nakagawa
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31765888A external-priority patent/JPH0797106B2/ja
Priority claimed from JP33011588A external-priority patent/JPH0718862B2/ja
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of IT8919907A0 publication Critical patent/IT8919907A0/it
Application granted granted Critical
Publication of IT1229210B publication Critical patent/IT1229210B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/005—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods investigating the presence of an element by oxidation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
    • G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
    • G01N33/0052—Gaseous halogens
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/12—Condition responsive control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/19—Halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/20—Oxygen containing
    • Y10T436/204998—Inorganic carbon compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/20—Oxygen containing
    • Y10T436/207497—Molecular oxygen

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Food Science & Technology (AREA)
  • Combustion & Propulsion (AREA)
  • Molecular Biology (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
IT8919907A 1988-03-31 1989-03-24 Metodo e dispositivo per analizzare gas contenenti fluoro. IT1229210B (it)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7908888 1988-03-31
JP31765888A JPH0797106B2 (ja) 1988-12-16 1988-12-16 含フッ素ガス成分濃度測定方法およびその装置
JP33011588A JPH0718862B2 (ja) 1988-03-31 1988-12-27 フッ素濃度測定方法およびその装置

Publications (2)

Publication Number Publication Date
IT8919907A0 IT8919907A0 (it) 1989-03-24
IT1229210B true IT1229210B (it) 1991-07-25

Family

ID=27302920

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8919907A IT1229210B (it) 1988-03-31 1989-03-24 Metodo e dispositivo per analizzare gas contenenti fluoro.

Country Status (5)

Country Link
US (2) US5017499A (it)
DE (1) DE3910345A1 (it)
FR (1) FR2627863B1 (it)
GB (1) GB2217842B (it)
IT (1) IT1229210B (it)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1229210B (it) * 1988-03-31 1991-07-25 Central Glass Co Ltd Metodo e dispositivo per analizzare gas contenenti fluoro.
JPH02112292A (ja) * 1988-10-20 1990-04-24 Mitsubishi Electric Corp ハロゲンガスレーザのガス制御装置
GB8927209D0 (en) * 1989-12-01 1990-01-31 British Aerospace Apparatus for controlling the composition of a laser gas or gas mixture
US5214658A (en) * 1990-07-27 1993-05-25 Ion Laser Technology Mixed gas ion laser
US5377215A (en) * 1992-11-13 1994-12-27 Cymer Laser Technologies Excimer laser
JP3787662B2 (ja) * 1995-01-18 2006-06-21 ソニー株式会社 画像データの色変換装置および画像データの色変換方法
JP3815578B2 (ja) * 1996-07-19 2006-08-30 忠弘 大見 エキシマレーザー発振装置
US6331994B1 (en) * 1996-07-19 2001-12-18 Canon Kabushiki Kaisha Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
US6282013B1 (en) 1997-04-30 2001-08-28 Lasermed, Inc. System for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation
US6008264A (en) 1997-04-30 1999-12-28 Laser Med, Inc. Method for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation
EP1027010A1 (en) 1997-10-29 2000-08-16 Bisco, Inc. Dental composite light curing system
US6116900A (en) * 1997-11-17 2000-09-12 Lumachem, Inc. Binary energizer and peroxide delivery system for dental bleaching
US6200134B1 (en) 1998-01-20 2001-03-13 Kerr Corporation Apparatus and method for curing materials with radiation
US6240117B1 (en) * 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
JP3880314B2 (ja) * 1998-01-30 2007-02-14 サイマー， インコーポレイテッド フッ素モニターを有するフッ素制御システム
US5978406A (en) * 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6212214B1 (en) * 1998-10-05 2001-04-03 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6526085B2 (en) * 1998-10-05 2003-02-25 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
DE19942455A1 (de) 1998-10-05 2000-04-06 Lambda Physik Gmbh Leistungssteuersystem und -verfahren für Gasentladungslaser
US6804285B2 (en) 1998-10-29 2004-10-12 Canon Kabushiki Kaisha Gas supply path structure for a gas laser
US6965624B2 (en) * 1999-03-17 2005-11-15 Lambda Physik Ag Laser gas replenishment method
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6243406B1 (en) 1999-03-12 2001-06-05 Peter Heist Gas performance control system for gas discharge lasers
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US6714577B1 (en) 1999-03-17 2004-03-30 Lambda Physik Ag Energy stabilized gas discharge laser
JP3377183B2 (ja) * 1999-04-09 2003-02-17 セントラル硝子株式会社 Ｎｆ３の処理方法
US6157661A (en) * 1999-05-12 2000-12-05 Laserphysics, Inc. System for producing a pulsed, varied and modulated laser output
US7179653B2 (en) * 2000-03-31 2007-02-20 Showa Denko K.K. Measuring method for concentration of halogen and fluorine compound, measuring equipment thereof and manufacturing method of halogen compound
US6721345B2 (en) 2000-07-14 2004-04-13 Lambda Physik Ag Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers
KR100633870B1 (ko) * 2001-06-29 2006-10-13 쇼와 덴코 가부시키가이샤 고순도 불소 가스, 그의 제조 방법 및 용도
JP2003021619A (ja) * 2001-07-05 2003-01-24 Canon Inc 蛍石及びその分析法、製造法、光学特性評価法
US7830934B2 (en) * 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US7209507B2 (en) * 2003-07-30 2007-04-24 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge MOPA laser system
US7317179B2 (en) * 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7679029B2 (en) * 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US9066777B2 (en) 2009-04-02 2015-06-30 Kerr Corporation Curing light device
US9072572B2 (en) 2009-04-02 2015-07-07 Kerr Corporation Dental light device
US8444935B2 (en) * 2009-06-12 2013-05-21 Bose Corporation Multiple-specimen device testing with particle measurement
EP2488448A1 (en) * 2009-10-16 2012-08-22 Solvay Fluor und Derivate GmbH High-purity fluorine gas, the production and use thereof, and a method for monitoring impurities in a fluorine gas
CN105353057B (zh) * 2015-12-17 2017-02-01 中国原子能科学研究院 一种用于在线分析Ne中微量He、H2和杂质组分的气相色谱检测***及方法
CN106896179B (zh) * 2015-12-21 2019-01-22 中昊晨光化工研究院有限公司 一种氟化工行业的环境在线监测***和在线监测方法
CN105548075A (zh) * 2016-01-08 2016-05-04 楚天科技股份有限公司 一种玻璃药瓶内氧气含量的检测装置与方法
CN111148994A (zh) * 2017-09-25 2020-05-12 西默有限公司 气体放电光源中的氟检测
CN108287157A (zh) * 2017-12-29 2018-07-17 和立气体（上海）有限公司 一种氟气分析转化装置
TWI770568B (zh) * 2019-08-29 2022-07-11 美商希瑪有限責任公司 氣體放電光源中之氟偵測
KR20230045093A (ko) * 2020-09-10 2023-04-04 사이머 엘엘씨 불소 측정 장치 및 방법
CN113917075A (zh) * 2021-09-14 2022-01-11 苏州金宏气体股份有限公司 含氟混合气体中氟含量测试装置及方法
CN114813448A (zh) * 2022-04-18 2022-07-29 浙江博瑞中硝科技有限公司 一种氟氮混合气中氟含量自动化测试的方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2925327A (en) * 1958-03-13 1960-02-16 Katz Sidney Continuous gas analyzer
US3579305A (en) * 1968-07-25 1971-05-18 Beckman Instruments Inc Scrubber apparatus
US3915645A (en) * 1973-04-24 1975-10-28 Us Army Chemical reaction transducers for use with flueric gas concentration sensing systems
US3847552A (en) * 1973-11-23 1974-11-12 Ibm Environmental monitoring device and method
US4147513A (en) * 1977-09-26 1979-04-03 Bendix Autolite Corporation Method and apparatus for measuring the O2 content of a gas
US4298347A (en) * 1980-02-25 1981-11-03 Kor Incorporated 13 CO2 Breath test
JPS60152519A (ja) * 1984-01-23 1985-08-10 Japan Synthetic Rubber Co Ltd 変性エチレン・α−オレフイン系共重合ゴムの製造方法
US4637987A (en) * 1984-05-07 1987-01-20 Gould Inc. Gas monitoring device and method
JPS61101231A (ja) * 1984-10-23 1986-05-20 Central Glass Co Ltd フツ素ガスの除去方法
CA1298959C (en) * 1985-09-28 1992-04-21 Kohzo Hakuta Method of refining rare gas halide excimer laser gas
DE3644819A1 (de) * 1986-12-31 1988-09-22 Gyulai Maria Dobosne Anordnung und verfahren zur quantitaiven bestimmung von fluor-, chlor- und bromgas und anderen stark oxydierenden gasen
IT1229210B (it) * 1988-03-31 1991-07-25 Central Glass Co Ltd Metodo e dispositivo per analizzare gas contenenti fluoro.

Also Published As

Publication number Publication date
GB8907052D0 (en) 1989-05-10
GB2217842B (en) 1991-10-09
DE3910345C2 (it) 1991-04-18
FR2627863A1 (fr) 1989-09-01
GB2217842A (en) 1989-11-01
FR2627863B1 (fr) 1991-05-24
US5017499A (en) 1991-05-21
IT8919907A0 (it) 1989-03-24
DE3910345A1 (de) 1989-10-26
US5149659A (en) 1992-09-22

Similar Documents

Publication Publication Date Title
IT1229210B (it) Metodo e dispositivo per analizzare gas contenenti fluoro.
FI96450B (fi) Yksikanavainen kaasun pitoisuuden mittausmenetelmä ja -laitteisto
DE69030824D1 (de) Reagenzgasanalysevorrichtung und -verfahren
FR2599505B1 (fr) Analyseur de gaz photoacoustique
DE3686492D1 (de) Gas-fluessigkeit-kontakt-vorrichtung und -verfahren.
KR880700049A (ko) 가스의 암모니아처리 방법 및 그 장치
DK56087D0 (da) Fremgangsmaade og apparat til bestemmmelse af parametre for stoffer i gasform
FR2718848B1 (fr) Procédé pour mesurer le point de rosée ou la concentration d'un gaz, et appareil pour prédire le givrage.
DK49684D0 (da) Afstivningsmiddel til frakturerede olie- og gaskilder
EP0059557A3 (en) Method and apparatus for measuring the concentration of gases
GB2269901B (en) Method and apparatus for testing gases, particularly breath alcohol
EP0684470A3 (en) Method and device for gas analysis.
BR8403331A (pt) Detector de gases e sistema monitor de concentracao de um gas selecionado
DK573084A (da) Apparat til gasanalyse
IT1136188B (it) Metodo ed apparecchio per la purificazione dei gas di scarico
DE69400794D1 (de) Gaskompressionsverfahren und Vorrichtung
KR950702307A (ko) 라만 분석 장치 및 방법(raman analysis apparatus and methods)
JPS56133651A (en) Gas analyzing apparatus and method
NO862428D0 (no) Fremgangsmaate og anordning for gassdektering.
IT1170385B (it) Metodo e dispositivo di lavorazione elttrica con la detossificazione mediante laser dei gas svolti
KR900007467A (ko) 오염기체의 정화방법 및 그 장치
DK428986A (da) Fremgangsmaade og indretning til undervandsfastgoerelse
ITTO920229A0 (it) Metodo per ottenere la combustione di gas poveri mediante un gas comburente e relativo dispositivo di combustione
IT8768145A0 (it) Dispositivo e procedimento per laperforazione di cartucce di gas
DK24086A (da) Fremgangsmaade og apparat til konditionering af en gasfoeler

Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19940331