IT1152129B - SEMICONDUCTOR MEMORY DEVICE AND PROCESS FOR ITS MANUFACTURE - Google Patents

SEMICONDUCTOR MEMORY DEVICE AND PROCESS FOR ITS MANUFACTURE

Info

Publication number
IT1152129B
IT1152129B IT21211/82A IT2121182A IT1152129B IT 1152129 B IT1152129 B IT 1152129B IT 21211/82 A IT21211/82 A IT 21211/82A IT 2121182 A IT2121182 A IT 2121182A IT 1152129 B IT1152129 B IT 1152129B
Authority
IT
Italy
Prior art keywords
manufacture
memory device
semiconductor memory
semiconductor
memory
Prior art date
Application number
IT21211/82A
Other languages
Italian (it)
Other versions
IT8221211A0 (en
Inventor
Masamichi Ishihara
Masanori Tazunoki
Takeshi Kajimoto
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of IT8221211A0 publication Critical patent/IT8221211A0/en
Application granted granted Critical
Publication of IT1152129B publication Critical patent/IT1152129B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/51Insulating materials associated therewith
    • H01L29/511Insulating materials associated therewith with a compositional variation, e.g. multilayer structures
    • H01L29/513Insulating materials associated therewith with a compositional variation, e.g. multilayer structures the variation being perpendicular to the channel plane
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/51Insulating materials associated therewith
    • H01L29/518Insulating materials associated therewith the insulating material containing nitrogen, e.g. nitride, oxynitride, nitrogen-doped material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008Making conductor-insulator-semiconductor electrodes
    • H01L21/28017Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28158Making the insulator
    • H01L21/28167Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
    • H01L21/28211Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation in a gaseous ambient using an oxygen or a water vapour, e.g. RTO, possibly through a layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
IT21211/82A 1981-05-13 1982-05-12 SEMICONDUCTOR MEMORY DEVICE AND PROCESS FOR ITS MANUFACTURE IT1152129B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56070732A JPS57186354A (en) 1981-05-13 1981-05-13 Semiconductor memory storage and manufacture thereof

Publications (2)

Publication Number Publication Date
IT8221211A0 IT8221211A0 (en) 1982-05-12
IT1152129B true IT1152129B (en) 1986-12-31

Family

ID=13439994

Family Applications (1)

Application Number Title Priority Date Filing Date
IT21211/82A IT1152129B (en) 1981-05-13 1982-05-12 SEMICONDUCTOR MEMORY DEVICE AND PROCESS FOR ITS MANUFACTURE

Country Status (6)

Country Link
JP (1) JPS57186354A (en)
KR (1) KR840000082A (en)
DE (1) DE3217896A1 (en)
FR (1) FR2506058A1 (en)
GB (1) GB2098397A (en)
IT (1) IT1152129B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2519461A1 (en) * 1982-01-06 1983-07-08 Hitachi Ltd SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SUCH A DEVICE
JPS58181319A (en) * 1982-04-19 1983-10-24 Hitachi Ltd Timing generating circuit
JPH0612619B2 (en) * 1982-09-22 1994-02-16 株式会社日立製作所 Semiconductor memory device
JPS59172761A (en) * 1983-03-23 1984-09-29 Hitachi Ltd Semiconductor device
US4617471A (en) * 1983-12-27 1986-10-14 Kabushiki Kaisha Toshiba Image sensing device
JPS60206163A (en) * 1984-03-30 1985-10-17 Toshiba Corp Semiconductor memory device
JPS6421788A (en) * 1987-07-16 1989-01-25 Nec Corp Semiconductor memory device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2130908A1 (en) * 1970-06-22 1971-12-30 Cogar Corp Storage cell with metal oxide semiconductor devices with different slopes
DE2646245A1 (en) * 1975-10-28 1977-05-05 Motorola Inc MEMORY CIRCUIT
DE2633558C2 (en) * 1976-07-26 1978-08-03 Siemens Ag, 1000 Berlin Und 8000 Muenchen Memory chip
JPS53112686A (en) * 1977-03-14 1978-10-02 Oki Electric Ind Co Ltd Manufacture for semiconductor device
JPS5559759A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Semiconductor device

Also Published As

Publication number Publication date
FR2506058B1 (en) 1985-04-12
KR840000082A (en) 1984-01-30
FR2506058A1 (en) 1982-11-19
JPS57186354A (en) 1982-11-16
IT8221211A0 (en) 1982-05-12
DE3217896A1 (en) 1983-05-26
GB2098397A (en) 1982-11-17

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