IT1148956B - Laser a gas impulsanti in struttura sigillata - Google Patents
Laser a gas impulsanti in struttura sigillataInfo
- Publication number
- IT1148956B IT1148956B IT48641/82A IT4864182A IT1148956B IT 1148956 B IT1148956 B IT 1148956B IT 48641/82 A IT48641/82 A IT 48641/82A IT 4864182 A IT4864182 A IT 4864182A IT 1148956 B IT1148956 B IT 1148956B
- Authority
- IT
- Italy
- Prior art keywords
- sealed structure
- gas lasers
- pulsing gas
- pulsing
- lasers
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0305—Selection of materials for the tube or the coatings thereon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
- H01S3/09716—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation by ionising radiation
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lasers (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT48641/82A IT1148956B (it) | 1982-06-15 | 1982-06-15 | Laser a gas impulsanti in struttura sigillata |
EP83105881A EP0096899B1 (en) | 1982-06-15 | 1983-06-15 | Pulsed gas laser in a sealed structure |
DE8383105881T DE3373597D1 (en) | 1982-06-15 | 1983-06-15 | Pulsed gas laser in a sealed structure |
US06/504,133 US4546482A (en) | 1982-06-15 | 1983-06-15 | Sealed CO2 laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT48641/82A IT1148956B (it) | 1982-06-15 | 1982-06-15 | Laser a gas impulsanti in struttura sigillata |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8248641A0 IT8248641A0 (it) | 1982-06-15 |
IT1148956B true IT1148956B (it) | 1986-12-03 |
Family
ID=11267796
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT48641/82A IT1148956B (it) | 1982-06-15 | 1982-06-15 | Laser a gas impulsanti in struttura sigillata |
Country Status (4)
Country | Link |
---|---|
US (1) | US4546482A (it) |
EP (1) | EP0096899B1 (it) |
DE (1) | DE3373597D1 (it) |
IT (1) | IT1148956B (it) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1197768B (it) * | 1983-12-29 | 1988-12-06 | Selenia Ind Elettroniche | Preionizzatore ad effetto corona per laser a gas |
IT1197769B (it) * | 1983-12-29 | 1988-12-06 | Enea | Laser con preionizzazione corona ad alta cadenza ripetitiva |
DE3443539A1 (de) * | 1984-11-29 | 1986-06-05 | Eltro GmbH, Gesellschaft für Strahlungstechnik, 6900 Heidelberg | Verfahren und vorrichtung zum betreiben eines elektrisch angeregten gaslasers |
JPS61280499A (ja) * | 1985-06-05 | 1986-12-11 | Sumitomo Chem Co Ltd | ホスフイン酸アルミニウム塩のアミン付加化合物およびそれを有効成分とする植物病害防除剤 |
US4750182A (en) * | 1986-06-05 | 1988-06-07 | Uniphase Corporation | Gas lasers |
US4833686A (en) * | 1987-06-29 | 1989-05-23 | Hughes Aircraft Company | Electrodes for transversely excited gas lasers |
US5040184A (en) * | 1990-06-04 | 1991-08-13 | Raytheon Company | Starter circuit for an RF laser |
US6414979B2 (en) | 2000-06-09 | 2002-07-02 | Cymer, Inc. | Gas discharge laser with blade-dielectric electrode |
US7856044B2 (en) | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
US6466602B1 (en) | 2000-06-09 | 2002-10-15 | Cymer, Inc. | Gas discharge laser long life electrodes |
US6654403B2 (en) | 2000-06-09 | 2003-11-25 | Cymer, Inc. | Flow shaping electrode with erosion pad for gas discharge laser |
US6560263B1 (en) | 2000-06-09 | 2003-05-06 | Cymer, Inc. | Discharge laser having electrodes with sputter cavities and discharge peaks |
US6363094B1 (en) | 2000-06-09 | 2002-03-26 | Cymer, Inc. | Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects |
US7132123B2 (en) * | 2000-06-09 | 2006-11-07 | Cymer, Inc. | High rep-rate laser with improved electrodes |
US7190708B2 (en) | 2000-11-01 | 2007-03-13 | Cymer, Inc. | Annealed copper alloy electrodes for fluorine containing gas discharge lasers |
US6690706B2 (en) | 2000-06-09 | 2004-02-10 | Cymer, Inc. | High rep-rate laser with improved electrodes |
US6711202B2 (en) | 2000-06-09 | 2004-03-23 | Cymer, Inc. | Discharge laser with porous insulating layer covering anode discharge surface |
US7230965B2 (en) * | 2001-02-01 | 2007-06-12 | Cymer, Inc. | Anodes for fluorine gas discharge lasers |
US7339973B2 (en) * | 2001-09-13 | 2008-03-04 | Cymer, Inc. | Electrodes for fluorine gas discharge lasers |
US7095774B2 (en) * | 2001-09-13 | 2006-08-22 | Cymer, Inc. | Cathodes for fluorine gas discharge lasers |
US7671349B2 (en) * | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
US7301980B2 (en) * | 2002-03-22 | 2007-11-27 | Cymer, Inc. | Halogen gas discharge laser electrodes |
RU2002120302A (ru) * | 2002-07-31 | 2004-03-20 | Владимир Михайлович Борисов | Эксимерный лазер |
US7633989B2 (en) | 2005-06-27 | 2009-12-15 | Cymer, Inc. | High pulse repetition rate gas discharge laser |
US7540945B2 (en) * | 2005-07-29 | 2009-06-02 | Marquez Salvatierra Manuel Antonio | Anticorrosive treatment for shaving blades |
US7706424B2 (en) * | 2005-09-29 | 2010-04-27 | Cymer, Inc. | Gas discharge laser system electrodes and power supply for delivering electrical energy to same |
US20070071047A1 (en) * | 2005-09-29 | 2007-03-29 | Cymer, Inc. | 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements |
US7655925B2 (en) | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
US7812329B2 (en) * | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
US8519366B2 (en) | 2008-08-06 | 2013-08-27 | Cymer, Inc. | Debris protection system having a magnetic field for an EUV light source |
JP5687488B2 (ja) | 2010-02-22 | 2015-03-18 | ギガフォトン株式会社 | 極端紫外光生成装置 |
WO2015115624A1 (ja) * | 2014-01-30 | 2015-08-06 | 京セラ株式会社 | 筒体、プラズマ装置、ガスレーザー装置、および筒体の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2338502A1 (de) * | 1973-07-30 | 1975-02-20 | Siemens Ag | Entladungsgefaess fuer einen gaslaser |
CH612298A5 (it) * | 1976-06-23 | 1979-07-13 | Battelle Memorial Institute | |
WO1979000432A1 (en) * | 1977-12-23 | 1979-07-12 | Battelle Memorial Institute | Electronically excited impulse laser in an active gas medium |
JPS5720488A (en) * | 1980-07-14 | 1982-02-02 | Ushio Inc | Discharge electrode body for exciting gas laser |
DE3138570C2 (de) * | 1981-09-28 | 1983-11-03 | Siemens AG, 1000 Berlin und 8000 München | Gaslaser |
-
1982
- 1982-06-15 IT IT48641/82A patent/IT1148956B/it active
-
1983
- 1983-06-15 US US06/504,133 patent/US4546482A/en not_active Expired - Fee Related
- 1983-06-15 EP EP83105881A patent/EP0096899B1/en not_active Expired
- 1983-06-15 DE DE8383105881T patent/DE3373597D1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0096899A2 (en) | 1983-12-28 |
IT8248641A0 (it) | 1982-06-15 |
US4546482A (en) | 1985-10-08 |
EP0096899A3 (en) | 1984-04-04 |
EP0096899B1 (en) | 1987-09-09 |
DE3373597D1 (en) | 1987-10-15 |
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