IL266484B - Measurement system, lithographic system, and method of measuring a target - Google Patents
Measurement system, lithographic system, and method of measuring a targetInfo
- Publication number
- IL266484B IL266484B IL266484A IL26648419A IL266484B IL 266484 B IL266484 B IL 266484B IL 266484 A IL266484 A IL 266484A IL 26648419 A IL26648419 A IL 26648419A IL 266484 B IL266484 B IL 266484B
- Authority
- IL
- Israel
- Prior art keywords
- target
- measuring
- lithographic
- measurement system
- measurement
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Radar Systems And Details Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP16198200.4A EP3321736A1 (en) | 2016-11-10 | 2016-11-10 | Measurement system, lithographic system, and method of measuring a target |
PCT/EP2017/077013 WO2018086852A1 (en) | 2016-11-10 | 2017-10-23 | Measurement system, lithographic system, and method of measuring a target |
Publications (2)
Publication Number | Publication Date |
---|---|
IL266484A IL266484A (en) | 2019-07-31 |
IL266484B true IL266484B (en) | 2022-05-01 |
Family
ID=57286326
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL266484A IL266484B (en) | 2016-11-10 | 2019-05-06 | Measurement system, lithographic system, and method of measuring a target |
Country Status (7)
Country | Link |
---|---|
US (1) | US10437159B2 (en) |
EP (1) | EP3321736A1 (en) |
KR (1) | KR102262185B1 (en) |
CN (1) | CN109952538B (en) |
IL (1) | IL266484B (en) |
TW (1) | TWI691800B (en) |
WO (1) | WO2018086852A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10852237B2 (en) * | 2018-03-26 | 2020-12-01 | Centrillion Technologies Taiwan Co., Ltd. | Microarray, imaging system and method for microarray imaging |
CN114730140A (en) * | 2019-12-05 | 2022-07-08 | Asml控股股份有限公司 | Overlay measurement system using lock-in amplifier technology |
WO2022008160A1 (en) * | 2020-07-06 | 2022-01-13 | Asml Netherlands B.V. | Illumination apparatus and associated metrology and lithographic apparatuses |
CN116472498A (en) * | 2020-11-24 | 2023-07-21 | Asml控股股份有限公司 | Multi-objective metrology system, lithographic apparatus and method thereof |
CN115166903B (en) * | 2022-07-06 | 2023-08-15 | 中国科学院上海光学精密机械研究所 | Multi-beam small-angle incident beam target coupling aiming positioning device and method |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100468213C (en) * | 2006-10-18 | 2009-03-11 | 上海微电子装备有限公司 | Alignment system for photoetching device and stage jointing grating system |
US7633689B2 (en) | 2007-07-18 | 2009-12-15 | Asml Holding N.V. | Catadioptric optical system for scatterometry |
NL1036245A1 (en) | 2007-12-17 | 2009-06-18 | Asml Netherlands Bv | Diffraction based overlay metrology tool and method or diffraction based overlay metrology. |
NL1036597A1 (en) | 2008-02-29 | 2009-09-01 | Asml Netherlands Bv | Metrology method and apparatus, lithographic apparatus, and device manufacturing method. |
NL2005162A (en) | 2009-07-31 | 2011-02-02 | Asml Netherlands Bv | Methods and scatterometers, lithographic systems, and lithographic processing cells. |
JP2013502592A (en) | 2009-08-24 | 2013-01-24 | エーエスエムエル ネザーランズ ビー.ブイ. | Metrology method and apparatus, lithographic apparatus, lithography processing cell, and substrate comprising metrology target |
WO2012062501A1 (en) | 2010-11-12 | 2012-05-18 | Asml Netherlands B.V. | Metrology method and apparatus, and device manufacturing method |
JP5722136B2 (en) * | 2011-06-30 | 2015-05-20 | 株式会社Screenホールディングス | Pattern drawing apparatus and pattern drawing method |
NL2009508A (en) * | 2011-10-24 | 2013-04-25 | Asml Netherlands Bv | Metrology method and apparatus, and device manufacturing method. |
CN103777476B (en) * | 2012-10-19 | 2016-01-27 | 上海微电子装备有限公司 | A kind of off-axis alignment system and alignment methods |
DE102014002514B4 (en) * | 2014-02-21 | 2015-10-29 | Universität Stuttgart | Device and method for multi- or hyperspectral imaging and / or for distance and / or 2-D or 3-D profile measurement of an object by means of spectrometry |
CN106662824B (en) * | 2014-07-09 | 2018-07-24 | Asml荷兰有限公司 | Check device, inspection method and device manufacturing method |
WO2016015987A1 (en) * | 2014-07-28 | 2016-02-04 | Asml Netherlands B.V. | Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method |
US10072921B2 (en) * | 2014-12-05 | 2018-09-11 | Kla-Tencor Corporation | Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element |
KR102047429B1 (en) * | 2015-12-07 | 2019-11-21 | 에이에스엠엘 홀딩 엔.브이. | Objective lens system |
CN108604065B (en) * | 2015-12-23 | 2021-10-26 | Asml荷兰有限公司 | Metrology method, target and substrate |
WO2018001747A1 (en) | 2016-07-01 | 2018-01-04 | Asml Netherlands B.V. | Illumination system for a lithographic or inspection apparatus |
KR102221714B1 (en) | 2016-08-23 | 2021-03-03 | 에이에스엠엘 네델란즈 비.브이. | A metrology apparatus for measuring a structure formed on a substrate by a lithographic process, a lithography system, and a method for measuring a structure formed on a substrate by a lithographic process |
-
2016
- 2016-11-10 EP EP16198200.4A patent/EP3321736A1/en not_active Withdrawn
-
2017
- 2017-10-23 KR KR1020197016392A patent/KR102262185B1/en active IP Right Grant
- 2017-10-23 CN CN201780069941.2A patent/CN109952538B/en active Active
- 2017-10-23 WO PCT/EP2017/077013 patent/WO2018086852A1/en active Application Filing
- 2017-11-03 US US15/802,701 patent/US10437159B2/en active Active
- 2017-11-08 TW TW106138537A patent/TWI691800B/en active
-
2019
- 2019-05-06 IL IL266484A patent/IL266484B/en unknown
Also Published As
Publication number | Publication date |
---|---|
EP3321736A1 (en) | 2018-05-16 |
KR20190071826A (en) | 2019-06-24 |
TWI691800B (en) | 2020-04-21 |
CN109952538A (en) | 2019-06-28 |
IL266484A (en) | 2019-07-31 |
TW201826040A (en) | 2018-07-16 |
KR102262185B1 (en) | 2021-06-08 |
CN109952538B (en) | 2021-10-15 |
US20180164699A1 (en) | 2018-06-14 |
WO2018086852A1 (en) | 2018-05-17 |
US10437159B2 (en) | 2019-10-08 |
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