HK1189993A1 - Vapor etching apparatus with multiple chambers - Google Patents
Vapor etching apparatus with multiple chambersInfo
- Publication number
- HK1189993A1 HK1189993A1 HK14103085.4A HK14103085A HK1189993A1 HK 1189993 A1 HK1189993 A1 HK 1189993A1 HK 14103085 A HK14103085 A HK 14103085A HK 1189993 A1 HK1189993 A1 HK 1189993A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- etching apparatus
- multiple chambers
- vapor etching
- vapor
- chambers
- Prior art date
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210295616.7A CN103594314B (en) | 2012-08-17 | 2012-08-17 | There is the vapor phase etchant equipment of Multicarity |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1189993A1 true HK1189993A1 (en) | 2014-06-20 |
Family
ID=50084408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK14103085.4A HK1189993A1 (en) | 2012-08-17 | 2014-03-31 | Vapor etching apparatus with multiple chambers |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN103594314B (en) |
HK (1) | HK1189993A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3038169A1 (en) * | 2014-12-22 | 2016-06-29 | Solvay SA | Process for the manufacture of solar cells |
CN111668086B (en) * | 2020-07-14 | 2023-04-14 | 北京北方华创微电子装备有限公司 | Semiconductor device and gas supply control method thereof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56105483A (en) * | 1980-01-25 | 1981-08-21 | Mitsubishi Electric Corp | Dry etching device |
US7189332B2 (en) * | 2001-09-17 | 2007-03-13 | Texas Instruments Incorporated | Apparatus and method for detecting an endpoint in a vapor phase etch |
CN100369192C (en) * | 2005-12-26 | 2008-02-13 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Semiconductor processing system reaction chamber |
CN100587904C (en) * | 2006-12-11 | 2010-02-03 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber inner lining and reaction chamber containing the inner lining |
CN202712119U (en) * | 2012-08-17 | 2013-01-30 | 晶呈科技股份有限公司 | Gas phase etching equipment with multiple cavities |
-
2012
- 2012-08-17 CN CN201210295616.7A patent/CN103594314B/en active Active
-
2014
- 2014-03-31 HK HK14103085.4A patent/HK1189993A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN103594314B (en) | 2015-11-18 |
CN103594314A (en) | 2014-02-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20200813 |