HK1152977A1 - Manufacturing method for vapor deposition device and thin-film device - Google Patents

Manufacturing method for vapor deposition device and thin-film device

Info

Publication number
HK1152977A1
HK1152977A1 HK11106953.9A HK11106953A HK1152977A1 HK 1152977 A1 HK1152977 A1 HK 1152977A1 HK 11106953 A HK11106953 A HK 11106953A HK 1152977 A1 HK1152977 A1 HK 1152977A1
Authority
HK
Hong Kong
Prior art keywords
thin
manufacturing
vapor deposition
film
film device
Prior art date
Application number
HK11106953.9A
Other languages
English (en)
Inventor
Ichiro Shiono
Yousong Jiang
Ekishu Nagae
Hiromitsu Honda
Takanori Murata
Original Assignee
Shincron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shincron Co Ltd filed Critical Shincron Co Ltd
Publication of HK1152977A1 publication Critical patent/HK1152977A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0026—Activation or excitation of reactive gases outside the coating chamber
    • C23C14/0031—Bombardment of substrates by reactive ion beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
HK11106953.9A 2008-06-30 2011-07-06 Manufacturing method for vapor deposition device and thin-film device HK1152977A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008171113 2008-06-30
PCT/JP2009/060938 WO2010001717A1 (ja) 2008-06-30 2009-06-16 蒸着装置及び薄膜デバイスの製造方法

Publications (1)

Publication Number Publication Date
HK1152977A1 true HK1152977A1 (en) 2012-03-16

Family

ID=41465820

Family Applications (1)

Application Number Title Priority Date Filing Date
HK11106953.9A HK1152977A1 (en) 2008-06-30 2011-07-06 Manufacturing method for vapor deposition device and thin-film device

Country Status (8)

Country Link
US (1) US20110097511A1 (de)
EP (1) EP2302093B1 (de)
JP (1) JP4512669B2 (de)
KR (1) KR101053387B1 (de)
CN (1) CN102076880B (de)
HK (1) HK1152977A1 (de)
TW (1) TW201005110A (de)
WO (1) WO2010001717A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101068278B1 (ko) * 2008-06-30 2011-09-28 신크론 컴퍼니 리미티드 증착장치 및 박막 디바이스의 제조방법
KR101302237B1 (ko) * 2008-09-05 2013-09-02 신크론 컴퍼니 리미티드 성막방법 및 발유성 기재
US10077207B2 (en) * 2011-11-30 2018-09-18 Corning Incorporated Optical coating method, apparatus and product
CN104969099A (zh) 2012-09-26 2015-10-07 8797625加拿大有限公司 多层光干涉滤片
JP5989601B2 (ja) * 2013-05-29 2016-09-07 住友重機械工業株式会社 プラズマ蒸発装置
US9275866B2 (en) * 2014-05-15 2016-03-01 International Business Machines Corporation Gas cluster reactor for anisotropic film growth
EP3366804B1 (de) * 2017-02-22 2022-05-11 Satisloh AG Vakuumbeschichtungsvorrichtung zur vakuumbeschichtung von substraten, insbesondere von brillenlinsen
KR102597694B1 (ko) * 2021-06-23 2023-11-03 주식회사 아이브이티코리아 렌즈 코팅 장치 및 그 제어 방법
CN115466927B (zh) * 2022-08-31 2023-07-18 安徽其芒光电科技有限公司 薄膜沉积装置及薄膜沉积方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59139930A (ja) * 1983-01-31 1984-08-11 Konishiroku Photo Ind Co Ltd 蒸着装置
JPH04318162A (ja) * 1991-04-16 1992-11-09 Kobe Steel Ltd 立方晶窒化硼素被膜の形成方法および形成装置
JP3958870B2 (ja) 1998-06-26 2007-08-15 大日本印刷株式会社 真空成膜装置
JP3954043B2 (ja) * 2004-05-31 2007-08-08 月島機械株式会社 プラズマアシスト蒸着装置及びその制御方法
JP3986513B2 (ja) * 2004-08-05 2007-10-03 株式会社シンクロン 薄膜形成装置
JP4873455B2 (ja) * 2006-03-16 2012-02-08 株式会社シンクロン 光学薄膜形成方法および装置

Also Published As

Publication number Publication date
CN102076880A (zh) 2011-05-25
KR20110039421A (ko) 2011-04-18
JPWO2010001717A1 (ja) 2011-12-15
EP2302093B1 (de) 2012-10-31
TW201005110A (en) 2010-02-01
EP2302093A4 (de) 2011-11-30
CN102076880B (zh) 2012-11-21
US20110097511A1 (en) 2011-04-28
WO2010001717A1 (ja) 2010-01-07
TWI345590B (de) 2011-07-21
EP2302093A1 (de) 2011-03-30
KR101053387B1 (ko) 2011-08-01
JP4512669B2 (ja) 2010-07-28

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20180616