HK1096490A1 - Electron cyclotron resonance(ecr) plasma source having a linear plasma discharge opening - Google Patents

Electron cyclotron resonance(ecr) plasma source having a linear plasma discharge opening

Info

Publication number
HK1096490A1
HK1096490A1 HK07103444.9A HK07103444A HK1096490A1 HK 1096490 A1 HK1096490 A1 HK 1096490A1 HK 07103444 A HK07103444 A HK 07103444A HK 1096490 A1 HK1096490 A1 HK 1096490A1
Authority
HK
Hong Kong
Prior art keywords
discharge opening
plasma
linear
ecr
plasma discharge
Prior art date
Application number
HK07103444.9A
Other languages
English (en)
Inventor
Joachim Mai
Dietmar Roth
Original Assignee
Roth & Rau Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Roth & Rau Ag filed Critical Roth & Rau Ag
Publication of HK1096490A1 publication Critical patent/HK1096490A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
HK07103444.9A 2003-09-08 2007-03-30 Electron cyclotron resonance(ecr) plasma source having a linear plasma discharge opening HK1096490A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10341239A DE10341239B4 (de) 2003-09-08 2003-09-08 ECR-Plasmaquelle mit linearer Plasmaaustrittsöffnung
PCT/DE2004/002027 WO2005027595A2 (de) 2003-09-08 2004-09-08 Ecr-plasmaquelle mit linearer plasmaaustrittsöffnung

Publications (1)

Publication Number Publication Date
HK1096490A1 true HK1096490A1 (en) 2007-06-01

Family

ID=34305603

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07103444.9A HK1096490A1 (en) 2003-09-08 2007-03-30 Electron cyclotron resonance(ecr) plasma source having a linear plasma discharge opening

Country Status (8)

Country Link
US (1) US20060254521A1 (xx)
EP (1) EP1665324B1 (xx)
JP (1) JP2007505451A (xx)
CN (1) CN100530509C (xx)
AT (1) ATE352862T1 (xx)
DE (2) DE10341239B4 (xx)
HK (1) HK1096490A1 (xx)
WO (1) WO2005027595A2 (xx)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7999479B2 (en) * 2009-04-16 2011-08-16 Varian Semiconductor Equipment Associates, Inc. Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control
US8203199B2 (en) * 2009-12-10 2012-06-19 National Semiconductor Corporation Tie bar and mold cavity bar arrangements for multiple leadframe stack package
WO2011142125A1 (ja) * 2010-05-13 2011-11-17 パナソニック株式会社 プラズマ処理装置及び方法
FR2995493B1 (fr) 2012-09-11 2014-08-22 Hydromecanique & Frottement Dispositif pour generer un plasma presentant une etendue importante le long d'un axe par resonnance cyclotronique electronique rce a partir d'un milieu gazeux
CN105088196A (zh) * 2015-08-26 2015-11-25 中国科学院等离子体物理研究所 一种大面积、高密度微波等离子体产生装置
EP3309815B1 (de) 2016-10-12 2019-03-20 Meyer Burger (Germany) AG Plasmabehandlungsvorrichtung mit zwei, miteinander gekoppelten mikrowellenplasmaquellen sowie verfahren zum betreiben einer solchen plasmabehandlungsvorrichtung
DE102018127716A1 (de) 2018-11-07 2020-05-07 Meyer Burger (Germany) Gmbh Membranherstellungsanlage
CN117894653A (zh) * 2022-12-19 2024-04-16 广东省新兴激光等离子体技术研究院 引出带状离子束的离子源

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1027549C (zh) * 1985-10-14 1995-02-01 株式会社半导体能源研究所 利用磁场的微波增强型cvd***和方法
JPH0770519B2 (ja) * 1986-02-28 1995-07-31 日本電信電話株式会社 プラズマ処理装置
JPH01159937A (ja) * 1987-12-16 1989-06-22 Hitachi Ltd 負イオン源
DE3923390A1 (de) * 1988-07-14 1990-01-25 Canon Kk Vorrichtung zur bildung eines grossflaechigen aufgedampften films unter verwendung von wenigstens zwei getrennt gebildeten aktivierten gasen
CN1023239C (zh) * 1988-07-14 1993-12-22 佳能株式会社 利用分别生成的多种活性气体制备大面积沉积膜的装置
JPH0225574A (ja) * 1988-07-14 1990-01-29 Canon Inc 堆積膜形成装置
JPH068510B2 (ja) * 1988-09-02 1994-02-02 日本電信電話株式会社 プラズマ／イオン生成源およびプラズマ／イオン処理装置
JPH07105384B2 (ja) * 1988-11-11 1995-11-13 三菱電機株式会社 プラズマ反応装置
JP2507059B2 (ja) * 1989-06-19 1996-06-12 松下電器産業株式会社 マイクロ波プラズマ源および処理装置
JPH03150377A (ja) * 1989-11-02 1991-06-26 Ricoh Co Ltd プラズマ処理装置
JPH03191068A (ja) * 1989-12-20 1991-08-21 Matsushita Electric Ind Co Ltd マイクロ波プラズマ装置
JP2546405B2 (ja) * 1990-03-12 1996-10-23 富士電機株式会社 プラズマ処理装置ならびにその運転方法
JPH0417675A (ja) * 1990-05-10 1992-01-22 Ricoh Co Ltd Ｅｃｒプラズマｃｖｄ装置
FR2711035B1 (fr) * 1993-10-04 1995-12-29 Plasmion Dispositif et procédé pour former un plasma par application de micro-ondes.
US5466295A (en) * 1993-10-25 1995-11-14 Board Of Regents Acting For The Univ. Of Michigan ECR plasma generation apparatus and methods
DE19603685C1 (de) * 1996-02-02 1997-08-21 Wu Jeng Ming Mikrowellengerät
JPH11214196A (ja) * 1998-01-29 1999-08-06 Mitsubishi Electric Corp プラズマ発生装置
DE19812558B4 (de) * 1998-03-21 2010-09-23 Roth & Rau Ag Vorrichtung zur Erzeugung linear ausgedehnter ECR-Plasmen
JPH11297673A (ja) * 1998-04-15 1999-10-29 Hitachi Ltd プラズマ処理装置及びクリーニング方法
DE19925493C1 (de) * 1999-06-04 2001-01-18 Fraunhofer Ges Forschung Linear ausgedehnte Anordnung zur großflächigen Mikrowellenbehandlung und zur großflächigen Plasmaerzeugung
SE521904C2 (sv) * 1999-11-26 2003-12-16 Ladislav Bardos Anordning för hybridplasmabehandling
TW521540B (en) * 2001-10-03 2003-02-21 Hau-Ran Ni An ECR plasma reactor system with multiple exciters

Also Published As

Publication number Publication date
US20060254521A1 (en) 2006-11-16
EP1665324B1 (de) 2007-01-24
DE502004002806D1 (de) 2007-03-15
WO2005027595A2 (de) 2005-03-24
JP2007505451A (ja) 2007-03-08
WO2005027595A3 (de) 2005-06-16
DE10341239A1 (de) 2005-04-14
CN1849690A (zh) 2006-10-18
EP1665324A2 (de) 2006-06-07
DE10341239B4 (de) 2006-05-24
ATE352862T1 (de) 2007-02-15
CN100530509C (zh) 2009-08-19

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210908