GB9608565D0 - Plasma enhanced chemical vapour deposition of a layer - Google Patents

Plasma enhanced chemical vapour deposition of a layer

Info

Publication number
GB9608565D0
GB9608565D0 GBGB9608565.9A GB9608565A GB9608565D0 GB 9608565 D0 GB9608565 D0 GB 9608565D0 GB 9608565 A GB9608565 A GB 9608565A GB 9608565 D0 GB9608565 D0 GB 9608565D0
Authority
GB
United Kingdom
Prior art keywords
layer
vapour deposition
plasma enhanced
enhanced chemical
chemical vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB9608565.9A
Other versions
GB2312439A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nortel Networks Ltd
Original Assignee
Northern Telecom Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Northern Telecom Ltd filed Critical Northern Telecom Ltd
Priority to GB9608565A priority Critical patent/GB2312439A/en
Publication of GB9608565D0 publication Critical patent/GB9608565D0/en
Publication of GB2312439A publication Critical patent/GB2312439A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Optical Integrated Circuits (AREA)
GB9608565A 1996-04-24 1996-04-24 Plasma enhanced chemical vapour deposition of a layer Withdrawn GB2312439A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9608565A GB2312439A (en) 1996-04-24 1996-04-24 Plasma enhanced chemical vapour deposition of a layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9608565A GB2312439A (en) 1996-04-24 1996-04-24 Plasma enhanced chemical vapour deposition of a layer

Publications (2)

Publication Number Publication Date
GB9608565D0 true GB9608565D0 (en) 1996-07-03
GB2312439A GB2312439A (en) 1997-10-29

Family

ID=10792617

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9608565A Withdrawn GB2312439A (en) 1996-04-24 1996-04-24 Plasma enhanced chemical vapour deposition of a layer

Country Status (1)

Country Link
GB (1) GB2312439A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7080528B2 (en) 2002-10-23 2006-07-25 Applied Materials, Inc. Method of forming a phosphorus doped optical core using a PECVD process
US9484199B2 (en) 2013-09-06 2016-11-01 Applied Materials, Inc. PECVD microcrystalline silicon germanium (SiGe)
CN106783542A (en) * 2016-12-23 2017-05-31 苏州工业园区纳米产业技术研究院有限公司 The method that LPCVD methods deposit germanium-silicon film

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4060660A (en) * 1976-01-15 1977-11-29 Rca Corporation Deposition of transparent amorphous carbon films
US4681653A (en) * 1984-06-01 1987-07-21 Texas Instruments Incorporated Planarized dielectric deposited using plasma enhanced chemical vapor deposition
GB8620346D0 (en) * 1986-08-21 1986-10-01 Special Research Systems Ltd Chemical vapour deposition of films
US5312778A (en) * 1989-10-03 1994-05-17 Applied Materials, Inc. Method for plasma processing using magnetically enhanced plasma chemical vapor deposition
JP2739129B2 (en) * 1990-02-21 1998-04-08 日本碍子株式会社 Manufacturing method of composite member
US5120680A (en) * 1990-07-19 1992-06-09 At&T Bell Laboratories Method for depositing dielectric layers
US5052339A (en) * 1990-10-16 1991-10-01 Air Products And Chemicals, Inc. Radio frequency plasma enhanced chemical vapor deposition process and reactor
DE69216747T2 (en) * 1991-10-07 1997-07-31 Sumitomo Metal Ind Process for forming a thin film
GB2270326B (en) * 1992-09-03 1996-10-09 Kobe Steel Europ Ltd Preparation of diamond films on silicon substrates
JP3351843B2 (en) * 1993-02-24 2002-12-03 忠弘 大見 Film formation method
GB9414905D0 (en) * 1994-07-23 1994-09-21 Barr & Stroud Ltd Protective coatings for optical components

Also Published As

Publication number Publication date
GB2312439A (en) 1997-10-29

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)