GB8600328D0 - Production of semiconductors - Google Patents
Production of semiconductorsInfo
- Publication number
- GB8600328D0 GB8600328D0 GB868600328A GB8600328A GB8600328D0 GB 8600328 D0 GB8600328 D0 GB 8600328D0 GB 868600328 A GB868600328 A GB 868600328A GB 8600328 A GB8600328 A GB 8600328A GB 8600328 D0 GB8600328 D0 GB 8600328D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- semiconductors
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
- H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/2654—Bombardment with radiation with high-energy radiation producing ion implantation in AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60003066A JPS61161713A (en) | 1985-01-10 | 1985-01-10 | Parts for manufacture of semiconductor |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8600328D0 true GB8600328D0 (en) | 1986-02-12 |
GB2171556A GB2171556A (en) | 1986-08-28 |
GB2171556B GB2171556B (en) | 1988-08-17 |
Family
ID=11546956
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08600328A Expired GB2171556B (en) | 1985-01-10 | 1986-01-08 | Method and apparatus for the production of semiconductor devices |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS61161713A (en) |
GB (1) | GB2171556B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3428303B2 (en) * | 1996-07-11 | 2003-07-22 | 日新電機株式会社 | Ion irradiation equipment |
DE10027931C1 (en) * | 2000-05-31 | 2002-01-10 | Infineon Technologies Ag | Method for rear-side electrical contacting of a semiconductor substrate during its processing |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD143131A1 (en) * | 1979-04-26 | 1980-07-30 | Ute Bergner | DEVICE FOR ELECTROSTATIC HOLDING OF WORKPIECES, PARTICULARLY SEMICONDUCTED DISCS |
GB2126417A (en) * | 1982-08-26 | 1984-03-21 | Heraeus Schott Quarzschmelze | Support systems for conveying semiconductor devices into hostile environments during manufacture |
JPS5961043A (en) * | 1982-09-29 | 1984-04-07 | Nec Corp | Sample holder for ion implantation |
-
1985
- 1985-01-10 JP JP60003066A patent/JPS61161713A/en active Pending
-
1986
- 1986-01-08 GB GB08600328A patent/GB2171556B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB2171556A (en) | 1986-08-28 |
JPS61161713A (en) | 1986-07-22 |
GB2171556B (en) | 1988-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
746 | Register noted 'licences of right' (sect. 46/1977) |
Effective date: 20011018 |
|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20040108 |