GB844039A - Improvements in or relating to photo-mechanical reproduction - Google Patents

Improvements in or relating to photo-mechanical reproduction

Info

Publication number
GB844039A
GB844039A GB600159A GB600159A GB844039A GB 844039 A GB844039 A GB 844039A GB 600159 A GB600159 A GB 600159A GB 600159 A GB600159 A GB 600159A GB 844039 A GB844039 A GB 844039A
Authority
GB
United Kingdom
Prior art keywords
sulphochloride
diazide
photo
relating
naphthoquinone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB600159A
Inventor
Wilhelm Neugebauer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Priority to GB600159A priority Critical patent/GB844039A/en
Publication of GB844039A publication Critical patent/GB844039A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Esters of 6-hydroxy-(11,21,1,2)-pyridobenzimidazole are made by treating this substance with I naphthoquinone:(1,2) - diazide - (2) - 4 - sulphochloride, II the corresponding -5-sulphochloride, III naphthoquinone-(1,2)-diazide-(1)-5-sulphochloride, IV the corresponding -6-sulphochloride, V the corresponding -7-sulphochloride and VI benzoquinone-(1,2)- diazide-(2)-4-sulphochloride, in aqueous alkaline ethylene glycol monomethyl ether. The sulphochloride reactants may be obtained by heating the sodium salts of the corresponding sulphonic acids with chlorosulphonic acid.
GB600159A 1959-02-20 1959-02-20 Improvements in or relating to photo-mechanical reproduction Expired GB844039A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB600159A GB844039A (en) 1959-02-20 1959-02-20 Improvements in or relating to photo-mechanical reproduction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB600159A GB844039A (en) 1959-02-20 1959-02-20 Improvements in or relating to photo-mechanical reproduction

Publications (1)

Publication Number Publication Date
GB844039A true GB844039A (en) 1960-08-10

Family

ID=9806597

Family Applications (1)

Application Number Title Priority Date Filing Date
GB600159A Expired GB844039A (en) 1959-02-20 1959-02-20 Improvements in or relating to photo-mechanical reproduction

Country Status (1)

Country Link
GB (1) GB844039A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3634086A (en) * 1966-05-31 1972-01-11 Howson Algraphy Ltd Solvent development of light-sensitive diazo layers
EP0199303A2 (en) * 1985-04-18 1986-10-29 Oki Electric Industry Company, Limited Method of forming a photoresist pattern
US4659649A (en) * 1983-05-06 1987-04-21 Sericol Group Limited Photosensitive systems showing visible indication of exposure
EP0404206A2 (en) * 1982-08-23 1990-12-27 International Business Machines Corporation Resist compositions
US5725997A (en) * 1995-07-26 1998-03-10 Tdk Corporation Method for preparing a resist pattern of t-shaped cross section

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3634086A (en) * 1966-05-31 1972-01-11 Howson Algraphy Ltd Solvent development of light-sensitive diazo layers
EP0404206A2 (en) * 1982-08-23 1990-12-27 International Business Machines Corporation Resist compositions
EP0404206A3 (en) * 1982-08-23 1991-02-27 International Business Machines Corporation Resist compositions
US4659649A (en) * 1983-05-06 1987-04-21 Sericol Group Limited Photosensitive systems showing visible indication of exposure
EP0199303A2 (en) * 1985-04-18 1986-10-29 Oki Electric Industry Company, Limited Method of forming a photoresist pattern
EP0199303A3 (en) * 1985-04-18 1987-12-23 Oki Electric Industry Company, Limited Method of forming a photoresist pattern
US4801518A (en) * 1985-04-18 1989-01-31 Oki Electric Industry, Co., Ltd. Method of forming a photoresist pattern
US5725997A (en) * 1995-07-26 1998-03-10 Tdk Corporation Method for preparing a resist pattern of t-shaped cross section

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