GB8330864D0 - Pattern generation - Google Patents

Pattern generation

Info

Publication number
GB8330864D0
GB8330864D0 GB838330864A GB8330864A GB8330864D0 GB 8330864 D0 GB8330864 D0 GB 8330864D0 GB 838330864 A GB838330864 A GB 838330864A GB 8330864 A GB8330864 A GB 8330864A GB 8330864 D0 GB8330864 D0 GB 8330864D0
Authority
GB
United Kingdom
Prior art keywords
pattern generation
pattern
generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB838330864A
Other versions
GB2132789A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB8330864D0 publication Critical patent/GB8330864D0/en
Publication of GB2132789A publication Critical patent/GB2132789A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
  • Electron Beam Exposure (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Iron Core Of Rotating Electric Machines (AREA)
GB08330864A 1982-11-24 1983-11-18 Method of pattern generation Withdrawn GB2132789A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US44423882A 1982-11-24 1982-11-24

Publications (2)

Publication Number Publication Date
GB8330864D0 true GB8330864D0 (en) 1983-12-29
GB2132789A GB2132789A (en) 1984-07-11

Family

ID=23764056

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08330864A Withdrawn GB2132789A (en) 1982-11-24 1983-11-18 Method of pattern generation

Country Status (6)

Country Link
JP (1) JPS59105323A (en)
DE (1) DE3342319A1 (en)
FR (1) FR2536549A1 (en)
GB (1) GB2132789A (en)
IT (1) IT1167665B (en)
NL (1) NL8304031A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4028647C2 (en) * 1989-09-09 1997-02-06 Fraunhofer Ges Forschung Procedure for copying shadow masks
US7160673B2 (en) * 2002-10-03 2007-01-09 Massachusetts Institute Of Technology System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1057105A (en) * 1964-01-23 1967-02-01 Associated Semiconductor Mft An optical mask
US3539408A (en) * 1967-08-11 1970-11-10 Western Electric Co Methods of etching chromium patterns and photolithographic masks so produced
CH552470A (en) * 1967-08-30 1974-08-15 Pigur Karl August METHOD OF MANUFACTURING A COLORED REPRODUCTION MASK.
GB1325442A (en) * 1970-08-21 1973-08-01 Sun Printers Ltd Photomechanical processes
GB1530978A (en) * 1976-05-10 1978-11-01 Rca Corp Method for removing material from a substrate
DE2721687C2 (en) * 1977-05-13 1986-11-20 Hoechst Ag, 6230 Frankfurt Process for covering master copies with masks
JPS5858546A (en) * 1981-10-02 1983-04-07 Kimoto & Co Ltd Photosensitive mask material for photoengraving

Also Published As

Publication number Publication date
FR2536549A1 (en) 1984-05-25
IT8323849A0 (en) 1983-11-23
NL8304031A (en) 1984-06-18
JPS59105323A (en) 1984-06-18
IT8323849A1 (en) 1985-05-23
DE3342319A1 (en) 1984-05-24
IT1167665B (en) 1987-05-13
GB2132789A (en) 1984-07-11

Similar Documents

Publication Publication Date Title
DE3175181D1 (en) Pattern generator
GB8334034D0 (en) Forming pattern pieces
GB8305890D0 (en) Generators
DE3366728D1 (en) Steam generator
GB8310030D0 (en) Preparing pattern piece
GB2129974B (en) Pattern selection system
GB2126323B (en) Steam generaters
DE3278862D1 (en) Bit pattern generator
JPS5763586A (en) Pattern generator
GB8332005D0 (en) Speed pattern generator
GB8502536D0 (en) Generator
GB8312476D0 (en) Connection between generator
GB8308327D0 (en) Generator
GB8322786D0 (en) Patterns
JPS57204084A (en) Pattern generator
JPS57167081A (en) Character pattern generator
GB8330864D0 (en) Pattern generation
GB8316167D0 (en) Generating electricity
JPS57104983A (en) Line pattern generator
JPS57212484A (en) Character pattern generator
JPS56146182A (en) Pattern generator
JPS574866A (en) Generator for pattern
GB8332222D0 (en) Generators
JPS57204587A (en) Pattern generator
JPS57178285A (en) Pattern generator

Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)