GB794572A - Improvements in photopolymerizable compositions and printing plates containing them - Google Patents
Improvements in photopolymerizable compositions and printing plates containing themInfo
- Publication number
- GB794572A GB794572A GB1342055A GB1342055A GB794572A GB 794572 A GB794572 A GB 794572A GB 1342055 A GB1342055 A GB 1342055A GB 1342055 A GB1342055 A GB 1342055A GB 794572 A GB794572 A GB 794572A
- Authority
- GB
- United Kingdom
- Prior art keywords
- mixture
- toluene
- ketone
- parts
- epoxy resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
- C08G59/1461—Unsaturated monoacids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Emergency Medicine (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Photopolymerizable compositions for use in the production of printing plates employed in offset lithography consist of an epoxy resin, obtained by reaction of epichlorhydrin with polyhydric phenols or alcohols, esterified with an unsaturated aliphatic monocarboxylic acid or a cycloaliphatic, aromatic or heterocyclic monocarboxylic acids having unsaturated side chains and a photopolymerizable catalyst. Unsaturated acids specified are cinnamic, sorbic, cyclohexanylacrylic, furyl acrylic; the corresponding acid chlorides or anhydrides may also be used; known esterification methods are employed. Suitable catalysts for the photopolymerization are quinones, e.g. tolyquinone, 2 : 6 dichlorquinone, 2 : 5-diphenyl-p-quinone, 1 : 2 and 1 : 4 naphthaquinone anthraquinones; Michler's ketone, 4,41-tetraethyldiamine; diphenyl ketone, 4 : 41-tetramethyl diamino diphenyl carbinol, 4 : 41-tetramethyl diamino benzophenone imide; cross linking may be effected by addition of dicinnamylidene vinyl ketone. Stability of the compounds is improved by adding inhibitors, e.g. hydroquinone. The materials may be applied to the plate in solution in mixtures of toluene and methyl ethyl ketone. (1) 20 Parts epoxy resin were mixed with toluene and heated under reflux and cooled. 50 Parts cinnamoyl chloride were added and the mixture refluxed at 100-110 DEG C. The mixture was diluted with toluene and the epoxy ester precipitated by addition of ethyl alcohol. A 1 per cent solution of a mixture of 200 parts of the ester and 5 parts dicinnamylidene vinyl ketone in a 95 per cent toluene-5 per cent butanol mixture was applied to an aluminium base plate and dried. The plate was exposed to ultra-violet radiation and then developed with a composition comprising an epoxy resin dissolved in a mixture of xylene and cyclohexanol, dibutyl phthalate carbon black and gum arabic.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL207001D NL207001A (en) | 1955-05-09 | ||
GB1342055A GB794572A (en) | 1955-05-09 | 1955-05-09 | Improvements in photopolymerizable compositions and printing plates containing them |
DEG19576A DE1104339B (en) | 1955-05-09 | 1956-05-08 | Copy layer made of epoxy resins for planographic printing plates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1342055A GB794572A (en) | 1955-05-09 | 1955-05-09 | Improvements in photopolymerizable compositions and printing plates containing them |
Publications (1)
Publication Number | Publication Date |
---|---|
GB794572A true GB794572A (en) | 1958-05-07 |
Family
ID=10022637
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1342055A Expired GB794572A (en) | 1955-05-09 | 1955-05-09 | Improvements in photopolymerizable compositions and printing plates containing them |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE1104339B (en) |
GB (1) | GB794572A (en) |
NL (1) | NL207001A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3387976A (en) * | 1964-07-22 | 1968-06-11 | Harris Intertype Corp | Photopolymer and lithographic plates |
US3647470A (en) * | 1965-06-09 | 1972-03-07 | Agency Ind Science Techn | Photosensitive compositions containing furylacrylyl-containing polymer |
US3661576A (en) * | 1970-02-09 | 1972-05-09 | Brady Co W H | Photopolymerizable compositions and articles |
US3816140A (en) * | 1971-07-02 | 1974-06-11 | Fuji Photo Film Co Ltd | Light-sensitive composition containing ketone-formaldehyde resin |
US4330611A (en) * | 1969-05-29 | 1982-05-18 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials |
US4486526A (en) * | 1969-05-29 | 1984-12-04 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0030213A1 (en) * | 1979-11-29 | 1981-06-10 | Ciba-Geigy Ag | Photo-cross-linkable layer on printing surfaces and process for the manufacture of offset printing plates |
EP0204292B1 (en) * | 1985-06-05 | 1991-05-29 | Siemens Aktiengesellschaft | Process for the production of printed circuits using a photopolymerisable system |
EP0309783A3 (en) * | 1987-09-28 | 1989-08-30 | Siemens Nixdorf Informationssysteme Aktiengesellschaft | Radiation crosslinkable resins for applications in the electronic |
-
0
- NL NL207001D patent/NL207001A/xx unknown
-
1955
- 1955-05-09 GB GB1342055A patent/GB794572A/en not_active Expired
-
1956
- 1956-05-08 DE DEG19576A patent/DE1104339B/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3387976A (en) * | 1964-07-22 | 1968-06-11 | Harris Intertype Corp | Photopolymer and lithographic plates |
US3647470A (en) * | 1965-06-09 | 1972-03-07 | Agency Ind Science Techn | Photosensitive compositions containing furylacrylyl-containing polymer |
US4330611A (en) * | 1969-05-29 | 1982-05-18 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials |
US4486526A (en) * | 1969-05-29 | 1984-12-04 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials |
US3661576A (en) * | 1970-02-09 | 1972-05-09 | Brady Co W H | Photopolymerizable compositions and articles |
US3816140A (en) * | 1971-07-02 | 1974-06-11 | Fuji Photo Film Co Ltd | Light-sensitive composition containing ketone-formaldehyde resin |
Also Published As
Publication number | Publication date |
---|---|
NL207001A (en) | |
DE1104339B (en) | 1961-04-06 |
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