GB665867A - Improvements in or relating to crystal triodes and semi-conductor materials therefor - Google Patents
Improvements in or relating to crystal triodes and semi-conductor materials thereforInfo
- Publication number
- GB665867A GB665867A GB8905/49A GB890549A GB665867A GB 665867 A GB665867 A GB 665867A GB 8905/49 A GB8905/49 A GB 8905/49A GB 890549 A GB890549 A GB 890549A GB 665867 A GB665867 A GB 665867A
- Authority
- GB
- United Kingdom
- Prior art keywords
- type
- germanium
- semi
- remelted
- ingot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 3
- 239000013078 crystal Substances 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 229910052732 germanium Inorganic materials 0.000 abstract 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 229940119177 germanium dioxide Drugs 0.000 abstract 1
- 229910002804 graphite Inorganic materials 0.000 abstract 1
- 239000010439 graphite Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 238000004663 powder metallurgy Methods 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 229910001868 water Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/313—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of semiconductor devices with two electrodes, one or two potential barriers, and exhibiting a negative resistance characteristic
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C3/00—Electrolytic production, recovery or refining of metals by electrolysis of melts
- C25C3/06—Electrolytic production, recovery or refining of metals by electrolysis of melts of aluminium
- C25C3/08—Cell construction, e.g. bottoms, walls, cathodes
- C25C3/12—Anodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/12—Etching of semiconducting materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
- H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3063—Electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Conductive Materials (AREA)
- Powder Metallurgy (AREA)
Abstract
665,867. Making germanium ingots; powder metallurgy. STANDARD TELEPHONES & CABLES, Ltd. March 31, 1950 [April 1, 1949], No. 8905/49. Drawings to Specification. Classes 83 (ii) and 83 (iv). [Also in Group XXXIX] An electric amplifying device comprises a semi-conducting body composed of uniformly distributed, small aggregates of atoms each of which aggregate has either P- or N-type rectification properties. The material is such that over any cross-section a random distribution of minute areas each providing either N- or P-type rectification exits. This results in P-type areas having, a high rectification ratio, which is not the case for homogeneous P-type crystals. One method of producing a semi-conductor of this type consists of heating germanium dioxide in pure dry hydrogen to produce pure germanium which is placed in graphite crucibles and remelted at low pressure in the presence of small amounts of oxygen, nitrogen, and water vapour. The proper amounts of gases to be added, which provide both donor and acceptor impurities, is determined experimentally in each case. The ingot is then rapidly cooled to provide the desired material. Alternatively the ingot may be remelted as above, but without the addition of the impurities, and the remelted ingot is continuously stirred while cooling, which has the effect of producing positive and negative ions. A third method consists in sintering a mixture of finely-ground homogeneous N-type and finely-ground homogeneous P-type germanium.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8905/49A GB665867A (en) | 1949-04-01 | 1949-04-01 | Improvements in or relating to crystal triodes and semi-conductor materials therefor |
FR1018849D FR1018849A (en) | 1906-09-03 | 1950-03-31 | Amplifier devices using semiconductors or crystals |
CH289520D CH289520A (en) | 1949-04-01 | 1950-04-01 | An electric semiconductor body and method of manufacturing this body. |
FR61721D FR61721E (en) | 1906-09-03 | 1951-05-30 | Amplifier devices using semiconductors or crystals |
FR66309D FR66309E (en) | 1906-09-03 | 1952-03-01 | Amplifier devices using semiconductors or crystals |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8905/49A GB665867A (en) | 1949-04-01 | 1949-04-01 | Improvements in or relating to crystal triodes and semi-conductor materials therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
GB665867A true GB665867A (en) | 1952-01-30 |
Family
ID=9861579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8905/49A Expired GB665867A (en) | 1906-09-03 | 1949-04-01 | Improvements in or relating to crystal triodes and semi-conductor materials therefor |
Country Status (2)
Country | Link |
---|---|
CH (1) | CH289520A (en) |
GB (1) | GB665867A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2802065A (en) * | 1953-02-13 | 1957-08-06 | Rca Corp | Cascade connected common base transistor amplifier using complementary transistors |
DE1037594B (en) * | 1953-02-06 | 1958-08-28 | Siemens Ag | Process for the production of moldings from germanium or silicon |
US2851542A (en) * | 1956-05-17 | 1958-09-09 | Rca Corp | Transistor signal amplifier circuits |
US2863955A (en) * | 1953-03-09 | 1958-12-09 | Gen Electric | Direct-coupled amplifiers |
US2883313A (en) * | 1954-08-16 | 1959-04-21 | Rca Corp | Semiconductor devices |
US2885495A (en) * | 1954-03-24 | 1959-05-05 | Rca Corp | Emitter coupled transistor amplifier |
US2966632A (en) * | 1952-11-15 | 1960-12-27 | Rca Corp | Multistage semi-conductor signal translating circuits |
US2982918A (en) * | 1953-11-09 | 1961-05-02 | Philips Corp | Amplifying-circuit arrangement |
US3008091A (en) * | 1952-11-05 | 1961-11-07 | Philips Corp | Direct coupled cascaded complimentary transistor amplifier |
US3018444A (en) * | 1954-04-29 | 1962-01-23 | Franklin F Offner | Transistor amplifier |
-
1949
- 1949-04-01 GB GB8905/49A patent/GB665867A/en not_active Expired
-
1950
- 1950-04-01 CH CH289520D patent/CH289520A/en unknown
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3008091A (en) * | 1952-11-05 | 1961-11-07 | Philips Corp | Direct coupled cascaded complimentary transistor amplifier |
US2966632A (en) * | 1952-11-15 | 1960-12-27 | Rca Corp | Multistage semi-conductor signal translating circuits |
DE1037594B (en) * | 1953-02-06 | 1958-08-28 | Siemens Ag | Process for the production of moldings from germanium or silicon |
US2802065A (en) * | 1953-02-13 | 1957-08-06 | Rca Corp | Cascade connected common base transistor amplifier using complementary transistors |
US2863955A (en) * | 1953-03-09 | 1958-12-09 | Gen Electric | Direct-coupled amplifiers |
US2982918A (en) * | 1953-11-09 | 1961-05-02 | Philips Corp | Amplifying-circuit arrangement |
US2885495A (en) * | 1954-03-24 | 1959-05-05 | Rca Corp | Emitter coupled transistor amplifier |
US3018444A (en) * | 1954-04-29 | 1962-01-23 | Franklin F Offner | Transistor amplifier |
US2883313A (en) * | 1954-08-16 | 1959-04-21 | Rca Corp | Semiconductor devices |
US2851542A (en) * | 1956-05-17 | 1958-09-09 | Rca Corp | Transistor signal amplifier circuits |
Also Published As
Publication number | Publication date |
---|---|
CH289520A (en) | 1953-03-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US2957789A (en) | Semiconductor devices and methods of preparing the same | |
Thurmond et al. | The equilibrium pressure of N2 over GaN | |
US2753281A (en) | Method of preparing germanium for translating devices | |
GB665867A (en) | Improvements in or relating to crystal triodes and semi-conductor materials therefor | |
GB769674A (en) | Processes for the control of solute segregation | |
Reid et al. | GaSb prepared from nonstoichiometric melts | |
Nimtz et al. | Long‐term Hall‐type conversion by vacancy diffusion in Hg1− xCdxTe at room temperature | |
GB801138A (en) | Improvements in electric current controlling devices utilising the semi-conductor germanium | |
GB1452637A (en) | Diffusion of impurities into a semiconductor | |
GB1037766A (en) | Improvements relating to gallium arsenide crystals | |
GB853365A (en) | Improvements in or relating to silicon carbide semiconductor devices | |
GB763059A (en) | Improvements in and relating to the composition and manufacture of semi-conductor devices | |
GB907846A (en) | Semiconductors | |
GB930432A (en) | Improvements in or relating to methods of making bodies of semi-conductor material | |
GB1007555A (en) | Semiconductor material | |
Kumar et al. | Liquid phase epitaxy growth of high purity InP using rare earth dysprosium gettering | |
Kassyan et al. | Investigation of the transport properties of InSb single-crystal films obtained by directional crystallization | |
Fujimoto et al. | A possible mechanism for hexagonal void movement observed during sublimation growth of SiC single crystals | |
US3073882A (en) | Thermoelectric material | |
US2565338A (en) | Germanium crystals | |
GB690243A (en) | Improvements relating to processes for the preparation of germanium rectifier crystals and rectifier crystals prepared thereby | |
JPS6445115A (en) | Manufacture of hydrogen-bonded amorphous silicon carbide film | |
JPS59131599A (en) | Production of gaas single crystal | |
GB944052A (en) | Improvements relating to methods of growing crystals | |
GB1037765A (en) | Artificial textile fibres and their production |