GB2615659B - Automatically controlled cleaning apparatus and controlled cleaning method for MEMS chip - Google Patents
Automatically controlled cleaning apparatus and controlled cleaning method for MEMS chip Download PDFInfo
- Publication number
- GB2615659B GB2615659B GB2304383.9A GB202304383A GB2615659B GB 2615659 B GB2615659 B GB 2615659B GB 202304383 A GB202304383 A GB 202304383A GB 2615659 B GB2615659 B GB 2615659B
- Authority
- GB
- United Kingdom
- Prior art keywords
- controlled cleaning
- mems chip
- cleaning apparatus
- automatically controlled
- cleaning method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004140 cleaning Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00841—Cleaning during or after manufacture
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00841—Cleaning during or after manufacture
- B81C1/00849—Cleaning during or after manufacture during manufacture
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00841—Cleaning during or after manufacture
- B81C1/00857—Cleaning during or after manufacture after manufacture, e.g. back-end of the line process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C99/00—Subject matter not provided for in other groups of this subclass
- B81C99/0005—Apparatus specially adapted for the manufacture or treatment of microstructural devices or systems, or methods for manufacturing the same
- B81C99/0025—Apparatus specially adapted for the manufacture or treatment of microstructural devices or systems not provided for in B81C99/001 - B81C99/002
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
- C02F1/4693—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Hydrology & Water Resources (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Electrochemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Molecular Biology (AREA)
- Analytical Chemistry (AREA)
- Computer Hardware Design (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210941656.8A CN114985361B (en) | 2022-08-08 | 2022-08-08 | Automatic control cleaning device and control cleaning method for MEMS chip |
PCT/CN2022/134790 WO2024031873A1 (en) | 2022-08-08 | 2022-11-28 | Device and method for automatically controlling cleaning of mems chip |
Publications (3)
Publication Number | Publication Date |
---|---|
GB202304383D0 GB202304383D0 (en) | 2023-05-10 |
GB2615659A GB2615659A (en) | 2023-08-16 |
GB2615659B true GB2615659B (en) | 2024-03-06 |
Family
ID=87312890
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2304383.9A Active GB2615659B (en) | 2022-08-08 | 2022-11-28 | Automatically controlled cleaning apparatus and controlled cleaning method for MEMS chip |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2615659B (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001017839A (en) * | 1999-07-08 | 2001-01-23 | Ebara Corp | Method and apparatus for reusing chemical liquid for surface treatment |
US20190143481A1 (en) * | 2017-11-14 | 2019-05-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and apparatus for cleaning process monitoring |
CN213612868U (en) * | 2020-07-11 | 2021-07-06 | 青岛龙利电子有限公司 | Pretreatment cleaning equipment for circuit board manufacturing |
CN114602875A (en) * | 2022-02-16 | 2022-06-10 | 无锡恒大电子科技有限公司 | Organic cleaning equipment for MEMS (micro-electromechanical systems) process |
CN217411651U (en) * | 2022-04-06 | 2022-09-13 | 强一半导体(苏州)有限公司 | MEMS wafer spraying device |
-
2022
- 2022-11-28 GB GB2304383.9A patent/GB2615659B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001017839A (en) * | 1999-07-08 | 2001-01-23 | Ebara Corp | Method and apparatus for reusing chemical liquid for surface treatment |
US20190143481A1 (en) * | 2017-11-14 | 2019-05-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and apparatus for cleaning process monitoring |
CN213612868U (en) * | 2020-07-11 | 2021-07-06 | 青岛龙利电子有限公司 | Pretreatment cleaning equipment for circuit board manufacturing |
CN114602875A (en) * | 2022-02-16 | 2022-06-10 | 无锡恒大电子科技有限公司 | Organic cleaning equipment for MEMS (micro-electromechanical systems) process |
CN217411651U (en) * | 2022-04-06 | 2022-09-13 | 强一半导体(苏州)有限公司 | MEMS wafer spraying device |
Also Published As
Publication number | Publication date |
---|---|
GB2615659A (en) | 2023-08-16 |
GB202304383D0 (en) | 2023-05-10 |
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