GB2562170B - A method of ionising analyte molecules for analysis - Google Patents
A method of ionising analyte molecules for analysisInfo
- Publication number
- GB2562170B GB2562170B GB1806777.7A GB201806777A GB2562170B GB 2562170 B GB2562170 B GB 2562170B GB 201806777 A GB201806777 A GB 201806777A GB 2562170 B GB2562170 B GB 2562170B
- Authority
- GB
- United Kingdom
- Prior art keywords
- analysis
- analyte molecules
- ionising analyte
- ionising
- molecules
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
- H01J49/147—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
- H01J27/205—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers with electrons, e.g. electron impact ionisation, electron attachment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1806777.7A GB2562170B (en) | 2013-02-19 | 2013-02-19 | A method of ionising analyte molecules for analysis |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1806777.7A GB2562170B (en) | 2013-02-19 | 2013-02-19 | A method of ionising analyte molecules for analysis |
GB1302818.8A GB2518122B (en) | 2013-02-19 | 2013-02-19 | An electron ionisation apparatus |
Publications (3)
Publication Number | Publication Date |
---|---|
GB201806777D0 GB201806777D0 (en) | 2018-06-06 |
GB2562170A GB2562170A (en) | 2018-11-07 |
GB2562170B true GB2562170B (en) | 2019-02-06 |
Family
ID=62236184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1806777.7A Active GB2562170B (en) | 2013-02-19 | 2013-02-19 | A method of ionising analyte molecules for analysis |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2562170B (en) |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02121233A (en) * | 1988-10-28 | 1990-05-09 | Nec Corp | Ion source |
US5387843A (en) * | 1991-11-20 | 1995-02-07 | Mitsubishi Denki Kabushiki Kaisha | Ion source having plasma chamber, an electron source, and a plasma power supply |
US20040000647A1 (en) * | 2002-06-26 | 2004-01-01 | Horsky Thomas N. | Electron impact ion source |
US20040104682A1 (en) * | 2000-11-30 | 2004-06-03 | Horsky Thomas N. | Ion implantation system and control method |
WO2005003717A2 (en) * | 2002-11-12 | 2005-01-13 | California Institute Of Technology | Chemical sensor system |
US20050184735A1 (en) * | 2004-02-19 | 2005-08-25 | Helix Technology Corporation | Ionization gauge |
US20070194252A1 (en) * | 2002-06-26 | 2007-08-23 | Semequip, Inc. | Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
GB2515886A (en) * | 2013-06-24 | 2015-01-07 | Agilent Technologies Inc | Electron ionization (EI) utilizing different EI energies |
GB2518122A (en) * | 2013-02-19 | 2015-03-18 | Markes Int Ltd | An electron ionisation apparatus |
-
2013
- 2013-02-19 GB GB1806777.7A patent/GB2562170B/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02121233A (en) * | 1988-10-28 | 1990-05-09 | Nec Corp | Ion source |
US5387843A (en) * | 1991-11-20 | 1995-02-07 | Mitsubishi Denki Kabushiki Kaisha | Ion source having plasma chamber, an electron source, and a plasma power supply |
US20040104682A1 (en) * | 2000-11-30 | 2004-06-03 | Horsky Thomas N. | Ion implantation system and control method |
US20040000647A1 (en) * | 2002-06-26 | 2004-01-01 | Horsky Thomas N. | Electron impact ion source |
US20070194252A1 (en) * | 2002-06-26 | 2007-08-23 | Semequip, Inc. | Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
WO2005003717A2 (en) * | 2002-11-12 | 2005-01-13 | California Institute Of Technology | Chemical sensor system |
US20050184735A1 (en) * | 2004-02-19 | 2005-08-25 | Helix Technology Corporation | Ionization gauge |
GB2518122A (en) * | 2013-02-19 | 2015-03-18 | Markes Int Ltd | An electron ionisation apparatus |
GB2515886A (en) * | 2013-06-24 | 2015-01-07 | Agilent Technologies Inc | Electron ionization (EI) utilizing different EI energies |
Also Published As
Publication number | Publication date |
---|---|
GB201806777D0 (en) | 2018-06-06 |
GB2562170A (en) | 2018-11-07 |
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