GB2464010A - A device providing a live three-dimensional image of a speciment - Google Patents

A device providing a live three-dimensional image of a speciment Download PDF

Info

Publication number
GB2464010A
GB2464010A GB0922723A GB0922723A GB2464010A GB 2464010 A GB2464010 A GB 2464010A GB 0922723 A GB0922723 A GB 0922723A GB 0922723 A GB0922723 A GB 0922723A GB 2464010 A GB2464010 A GB 2464010A
Authority
GB
United Kingdom
Prior art keywords
tilting
scanning
source
signal
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB0922723A
Other versions
GB0922723D0 (en
Inventor
Martin Zadrazil
Josef Rys Vka
Tomin Smid
Vojtech Filip
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tescan sro
Original Assignee
Tescan sro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tescan sro filed Critical Tescan sro
Publication of GB0922723D0 publication Critical patent/GB0922723D0/en
Publication of GB2464010A publication Critical patent/GB2464010A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1478—Beam tilting means, i.e. for stereoscopy or for beam channelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1506—Tilting or rocking beam around an axis substantially at an angle to optical axis
    • H01J2237/1507—Tilting or rocking beam around an axis substantially at an angle to optical axis dynamically, e.g. to obtain same impinging angle on whole area
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2611—Stereoscopic measurements and/or imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2814—Measurement of surface topography

Abstract

The beam of particles from the primary source is led to the secondary source (1) and a tilting and simultaneously scanning unit (2) placed above the objective (3) is inserted to the path of the output beam of particles with an axis (5). The tilting and scanning unit (2), seen in the direction from the viewed specimen (4) upwards, consists of a bottom stage (2.2) and a top stage (2.1). The top stage (2.1) and the bottom stage (2.2) consist of at least two tilting and scanning elements (6, 7) arranged to create fields orthogonal to each other in the area where the beam of particles with the axis (5) passes through them. Both the output of the first adjustable source (6.1) of a direct tilting signal and the first adjustable source (6.2) of an alternating scanning signal are connected to the first tilting and scanning element (6). Both the output of the second adjustable source (7.1) of a direct tilting signal and the second adjustable source (7.2) of an alternating scanning signal are connected to the second tilting and scanning element (7).
GB0922723A 2007-07-30 2008-04-28 A device providing a live three-dimensional image of a speciment Withdrawn GB2464010A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CZ20070510A CZ2007510A3 (en) 2007-07-30 2007-07-30 Device for spatial, real time representation of a sample
PCT/CZ2008/000050 WO2009015615A1 (en) 2007-07-30 2008-04-28 A device providing a live three-dimensional image of a speciment

Publications (2)

Publication Number Publication Date
GB0922723D0 GB0922723D0 (en) 2010-02-17
GB2464010A true GB2464010A (en) 2010-04-07

Family

ID=38973036

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0922723A Withdrawn GB2464010A (en) 2007-07-30 2008-04-28 A device providing a live three-dimensional image of a speciment

Country Status (4)

Country Link
CZ (1) CZ2007510A3 (en)
DE (2) DE202008018179U1 (en)
GB (1) GB2464010A (en)
WO (1) WO2009015615A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5259688B2 (en) 2010-12-09 2013-08-07 本田技研工業株式会社 Scanning electron microscope
JP5364112B2 (en) * 2011-01-25 2013-12-11 株式会社日立ハイテクノロジーズ Charged particle beam equipment
CN111508807B (en) * 2020-04-26 2022-11-25 北京工业大学 Scanning electron microscope stereo imaging system

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4983832A (en) * 1988-07-25 1991-01-08 Hitachi, Ltd. Scanning electron microscope
EP1045425A2 (en) * 1999-04-15 2000-10-18 ICT Integrated Circuit Testing GmbH Charged particle beam column
US20010025925A1 (en) * 2000-03-28 2001-10-04 Kabushiki Kaisha Toshiba Charged particle beam system and pattern slant observing method
EP1463087A1 (en) * 2003-03-24 2004-09-29 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Charged particle beam device
US6930308B1 (en) * 2002-07-11 2005-08-16 Kla-Tencor Technologies Corporation SEM profile and surface reconstruction using multiple data sets
US20050199827A1 (en) * 2004-01-21 2005-09-15 Osamu Nagano Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device
US6963067B2 (en) * 2003-01-06 2005-11-08 Hitachi High-Technologies Corporation Scanning electron microscope and sample observing method using it
US20060033037A1 (en) * 2004-08-10 2006-02-16 Takeshi Kawasaki Charged particle beam column

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3986027A (en) * 1975-04-07 1976-10-12 American Optical Corporation Stereo scanning microprobe

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4983832A (en) * 1988-07-25 1991-01-08 Hitachi, Ltd. Scanning electron microscope
EP1045425A2 (en) * 1999-04-15 2000-10-18 ICT Integrated Circuit Testing GmbH Charged particle beam column
US20010025925A1 (en) * 2000-03-28 2001-10-04 Kabushiki Kaisha Toshiba Charged particle beam system and pattern slant observing method
US6930308B1 (en) * 2002-07-11 2005-08-16 Kla-Tencor Technologies Corporation SEM profile and surface reconstruction using multiple data sets
US6963067B2 (en) * 2003-01-06 2005-11-08 Hitachi High-Technologies Corporation Scanning electron microscope and sample observing method using it
EP1463087A1 (en) * 2003-03-24 2004-09-29 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Charged particle beam device
US20050199827A1 (en) * 2004-01-21 2005-09-15 Osamu Nagano Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device
US20060033037A1 (en) * 2004-08-10 2006-02-16 Takeshi Kawasaki Charged particle beam column

Also Published As

Publication number Publication date
DE202008018179U1 (en) 2012-01-16
GB0922723D0 (en) 2010-02-17
WO2009015615A8 (en) 2011-05-26
DE112008002044T5 (en) 2010-12-30
WO2009015615A1 (en) 2009-02-05
CZ298798B6 (en) 2008-01-30
CZ2007510A3 (en) 2008-01-30

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)