GB2368597B - Rectangular cathodic arc source and method of steering an arc spot - Google Patents

Rectangular cathodic arc source and method of steering an arc spot

Info

Publication number
GB2368597B
GB2368597B GB0125844A GB0125844A GB2368597B GB 2368597 B GB2368597 B GB 2368597B GB 0125844 A GB0125844 A GB 0125844A GB 0125844 A GB0125844 A GB 0125844A GB 2368597 B GB2368597 B GB 2368597B
Authority
GB
United Kingdom
Prior art keywords
arc
steering
spot
source
rectangular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0125844A
Other versions
GB2368597A (en
GB0125844D0 (en
Inventor
Vladimir I Gorokhovsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of GB0125844D0 publication Critical patent/GB0125844D0/en
Publication of GB2368597A publication Critical patent/GB2368597A/en
Application granted granted Critical
Publication of GB2368597B publication Critical patent/GB2368597B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB0125844A 1999-04-12 2000-04-07 Rectangular cathodic arc source and method of steering an arc spot Expired - Fee Related GB2368597B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CA002268659A CA2268659C (en) 1999-04-12 1999-04-12 Rectangular cathodic arc source and method of steering an arc spot
PCT/CA2000/000380 WO2000062327A2 (en) 1999-04-12 2000-04-07 Rectangular cathodic arc source and method of steering an arc spot

Publications (3)

Publication Number Publication Date
GB0125844D0 GB0125844D0 (en) 2001-12-19
GB2368597A GB2368597A (en) 2002-05-08
GB2368597B true GB2368597B (en) 2003-08-27

Family

ID=4163456

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0125844A Expired - Fee Related GB2368597B (en) 1999-04-12 2000-04-07 Rectangular cathodic arc source and method of steering an arc spot

Country Status (6)

Country Link
JP (1) JP4689843B2 (en)
AU (1) AU762277B2 (en)
CA (1) CA2268659C (en)
DE (1) DE10084452B3 (en)
GB (1) GB2368597B (en)
WO (1) WO2000062327A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3555844B2 (en) 1999-04-09 2004-08-18 三宅 正二郎 Sliding member and manufacturing method thereof
US6929727B2 (en) 1999-04-12 2005-08-16 G & H Technologies, Llc Rectangular cathodic arc source and method of steering an arc spot
CA2305938C (en) 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
US6969198B2 (en) 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
JP4863152B2 (en) 2003-07-31 2012-01-25 日産自動車株式会社 gear
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
US7381311B2 (en) * 2003-10-21 2008-06-03 The United States Of America As Represented By The Secretary Of The Air Force Filtered cathodic-arc plasma source
DE102010020737A1 (en) * 2010-05-17 2011-11-17 Oerlikon Trading Ag, Trübbach Target for spark evaporation with spatial limitation of the propagation of the spark
CN103132020B (en) * 2013-03-17 2018-04-20 广东世创金属科技股份有限公司 The electric arc target and its control system of a kind of improved structure
KR102037910B1 (en) * 2017-03-27 2019-10-30 세메스 주식회사 Coating apparatus and coating method
SK500322019A3 (en) * 2019-07-11 2021-01-13 STATON, s. r. o. Plasma source using a cathodic vacuum arc with an improved magnetic field configuration and method of operation

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
EP0495447A1 (en) * 1991-01-17 1992-07-22 KABUSHIKI KAISHA KOBE SEIKO SHO also known as Kobe Steel Ltd. Method of controlling an arc spot in vacuum arc vapor deposition and an evaporation source
EP0511153A1 (en) * 1991-04-22 1992-10-28 Multi-Arc Scientific Coatings Plasma enhancement apparatus and method for physical vapor deposition
DE4223592A1 (en) * 1992-06-24 1994-01-05 Leybold Ag Arc vaporising apparatus - with movable magnetic coil below target to adjust magnetic field and ensure uniform target vaporisation
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
US5387326A (en) * 1987-02-03 1995-02-07 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
US5435900A (en) * 1992-11-04 1995-07-25 Gorokhovsky; Vladimir I. Apparatus for application of coatings in vacuum
US5468363A (en) * 1994-04-25 1995-11-21 Regents Of The University Of California Magnetic-cusp, cathodic-arc source
US5840163A (en) * 1994-04-25 1998-11-24 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
DE19739527A1 (en) * 1997-09-09 1999-03-11 Rossendorf Forschzent Magnetically filtered vacuum arc plasma source

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US4448659A (en) * 1983-09-12 1984-05-15 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization including initial target cleaning
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US5380421A (en) * 1992-11-04 1995-01-10 Gorokhovsky; Vladimir I. Vacuum-arc plasma source
US5587207A (en) * 1994-11-14 1996-12-24 Gorokhovsky; Vladimir I. Arc assisted CVD coating and sintering method
KR100230279B1 (en) * 1997-03-31 1999-11-15 윤종용 Coating apparatus by using cathodic arc discharge
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
US5387326A (en) * 1987-02-03 1995-02-07 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
EP0495447A1 (en) * 1991-01-17 1992-07-22 KABUSHIKI KAISHA KOBE SEIKO SHO also known as Kobe Steel Ltd. Method of controlling an arc spot in vacuum arc vapor deposition and an evaporation source
EP0511153A1 (en) * 1991-04-22 1992-10-28 Multi-Arc Scientific Coatings Plasma enhancement apparatus and method for physical vapor deposition
DE4223592A1 (en) * 1992-06-24 1994-01-05 Leybold Ag Arc vaporising apparatus - with movable magnetic coil below target to adjust magnetic field and ensure uniform target vaporisation
US5435900A (en) * 1992-11-04 1995-07-25 Gorokhovsky; Vladimir I. Apparatus for application of coatings in vacuum
US5468363A (en) * 1994-04-25 1995-11-21 Regents Of The University Of California Magnetic-cusp, cathodic-arc source
US5840163A (en) * 1994-04-25 1998-11-24 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
DE19739527A1 (en) * 1997-09-09 1999-03-11 Rossendorf Forschzent Magnetically filtered vacuum arc plasma source

Also Published As

Publication number Publication date
AU762277B2 (en) 2003-06-19
GB2368597A (en) 2002-05-08
GB0125844D0 (en) 2001-12-19
CA2268659A1 (en) 2000-10-12
AU3950900A (en) 2000-11-14
JP2002541335A (en) 2002-12-03
JP4689843B2 (en) 2011-05-25
WO2000062327A2 (en) 2000-10-19
DE10084452B3 (en) 2016-03-17
DE10084452T1 (en) 2002-06-20
CA2268659C (en) 2008-12-30
WO2000062327A3 (en) 2001-01-18

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20160407