GB2335929B - Apparatus for depositing a thin film on a substrate - Google Patents

Apparatus for depositing a thin film on a substrate

Info

Publication number
GB2335929B
GB2335929B GB9911077A GB9911077A GB2335929B GB 2335929 B GB2335929 B GB 2335929B GB 9911077 A GB9911077 A GB 9911077A GB 9911077 A GB9911077 A GB 9911077A GB 2335929 B GB2335929 B GB 2335929B
Authority
GB
United Kingdom
Prior art keywords
depositing
substrate
thin film
thin
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9911077A
Other versions
GB9911077D0 (en
GB2335929A (en
Inventor
Akio Tanikawa
Taishi Kubota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP9167521A external-priority patent/JPH1116838A/en
Application filed by NEC Corp filed Critical NEC Corp
Publication of GB9911077D0 publication Critical patent/GB9911077D0/en
Publication of GB2335929A publication Critical patent/GB2335929A/en
Application granted granted Critical
Publication of GB2335929B publication Critical patent/GB2335929B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Inorganic Chemistry (AREA)
GB9911077A 1997-06-24 1998-06-15 Apparatus for depositing a thin film on a substrate Expired - Fee Related GB2335929B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9167521A JPH1116838A (en) 1997-06-24 1997-06-24 Growth of polycrystalline silicon film and cvd apparatus
GB9812887A GB2326648B (en) 1997-06-24 1998-06-15 Growth method of polycrystal silicon film

Publications (3)

Publication Number Publication Date
GB9911077D0 GB9911077D0 (en) 1999-07-14
GB2335929A GB2335929A (en) 1999-10-06
GB2335929B true GB2335929B (en) 2000-03-29

Family

ID=26313870

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9911077A Expired - Fee Related GB2335929B (en) 1997-06-24 1998-06-15 Apparatus for depositing a thin film on a substrate

Country Status (1)

Country Link
GB (1) GB2335929B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5060354A (en) * 1990-07-02 1991-10-29 George Chizinsky Heated plate rapid thermal processor
WO1995031582A1 (en) * 1994-05-16 1995-11-23 Ag Associates, Inc. Chemical vapor deposition reactor and method
WO1999007915A1 (en) * 1997-08-11 1999-02-18 Torrex Equipment Corporation Mini-batch process chamber

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5060354A (en) * 1990-07-02 1991-10-29 George Chizinsky Heated plate rapid thermal processor
WO1995031582A1 (en) * 1994-05-16 1995-11-23 Ag Associates, Inc. Chemical vapor deposition reactor and method
WO1999007915A1 (en) * 1997-08-11 1999-02-18 Torrex Equipment Corporation Mini-batch process chamber

Also Published As

Publication number Publication date
GB9911077D0 (en) 1999-07-14
GB2335929A (en) 1999-10-06

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20020615