GB2284070B - Phase shift masks - Google Patents

Phase shift masks

Info

Publication number
GB2284070B
GB2284070B GB9323595A GB9323595A GB2284070B GB 2284070 B GB2284070 B GB 2284070B GB 9323595 A GB9323595 A GB 9323595A GB 9323595 A GB9323595 A GB 9323595A GB 2284070 B GB2284070 B GB 2284070B
Authority
GB
United Kingdom
Prior art keywords
phase shift
shift masks
masks
phase
shift
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9323595A
Other versions
GB2284070A (en
GB9323595D0 (en
Inventor
Andre Hawryliw
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Compugraphics International Ltd
Original Assignee
Compugraphics International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Compugraphics International Ltd filed Critical Compugraphics International Ltd
Priority to GB9323595A priority Critical patent/GB2284070B/en
Publication of GB9323595D0 publication Critical patent/GB9323595D0/en
Publication of GB2284070A publication Critical patent/GB2284070A/en
Application granted granted Critical
Publication of GB2284070B publication Critical patent/GB2284070B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
GB9323595A 1993-11-16 1993-11-16 Phase shift masks Expired - Fee Related GB2284070B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9323595A GB2284070B (en) 1993-11-16 1993-11-16 Phase shift masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9323595A GB2284070B (en) 1993-11-16 1993-11-16 Phase shift masks

Publications (3)

Publication Number Publication Date
GB9323595D0 GB9323595D0 (en) 1994-01-05
GB2284070A GB2284070A (en) 1995-05-24
GB2284070B true GB2284070B (en) 1997-08-27

Family

ID=10745236

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9323595A Expired - Fee Related GB2284070B (en) 1993-11-16 1993-11-16 Phase shift masks

Country Status (1)

Country Link
GB (1) GB2284070B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5897977A (en) * 1996-05-20 1999-04-27 E. I. Du Pont De Nemours And Company Attenuating embedded phase shift photomask blanks
WO1999030370A1 (en) * 1997-12-09 1999-06-17 Seiko Epson Corporation Method of manufacturing semiconductor device and semiconductor device, method of manufacturing electrooptic device and electrooptic device, and electronic apparatus employing it

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0404742A2 (en) * 1989-06-19 1990-12-27 International Business Machines Corporation Method of making and using a high resolution lithographic mask
EP0488245A1 (en) * 1990-11-29 1992-06-03 Asahi Glass Company Ltd. Phase-shifting mask and process for its production

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0404742A2 (en) * 1989-06-19 1990-12-27 International Business Machines Corporation Method of making and using a high resolution lithographic mask
EP0488245A1 (en) * 1990-11-29 1992-06-03 Asahi Glass Company Ltd. Phase-shifting mask and process for its production

Also Published As

Publication number Publication date
GB2284070A (en) 1995-05-24
GB9323595D0 (en) 1994-01-05

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19981116