GB2201258B - A mask holding device - Google Patents

A mask holding device

Info

Publication number
GB2201258B
GB2201258B GB8802217A GB8802217A GB2201258B GB 2201258 B GB2201258 B GB 2201258B GB 8802217 A GB8802217 A GB 8802217A GB 8802217 A GB8802217 A GB 8802217A GB 2201258 B GB2201258 B GB 2201258B
Authority
GB
United Kingdom
Prior art keywords
holding device
mask holding
mask
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB8802217A
Other versions
GB8802217D0 (en
GB2201258A (en
Inventor
Hidehiko Fujioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8802217D0 publication Critical patent/GB8802217D0/en
Publication of GB2201258A publication Critical patent/GB2201258A/en
Application granted granted Critical
Publication of GB2201258B publication Critical patent/GB2201258B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
GB8802217A 1987-02-09 1988-02-02 A mask holding device Expired - Lifetime GB2201258B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62026456A JPH07101663B2 (en) 1987-02-09 1987-02-09 Mask holding device

Publications (3)

Publication Number Publication Date
GB8802217D0 GB8802217D0 (en) 1988-03-02
GB2201258A GB2201258A (en) 1988-08-24
GB2201258B true GB2201258B (en) 1991-04-24

Family

ID=12194007

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8802217A Expired - Lifetime GB2201258B (en) 1987-02-09 1988-02-02 A mask holding device

Country Status (4)

Country Link
JP (1) JPH07101663B2 (en)
DE (1) DE3803738A1 (en)
FR (1) FR2610740B1 (en)
GB (1) GB2201258B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4304912C2 (en) * 1993-02-18 2003-03-06 Klaus Siebert Method and device for continuous automatic chip production under vacuum
JP3470469B2 (en) * 1995-09-27 2003-11-25 株式会社ニコン Reticle holding device and holding method
DE19859172A1 (en) * 1998-12-21 2000-06-29 Uhp Corp Selective surface treatment with magnetic mask holder
TW490596B (en) * 1999-03-08 2002-06-11 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
JP2004103799A (en) * 2002-09-09 2004-04-02 Canon Inc Substrate holding unit, apparatus and method for manufacturing device
KR100495872B1 (en) * 2002-10-07 2005-06-16 주식회사 소로나 Shadowmask attaching method for organic light emitting device and apparatus adopting the same
EP1513017A1 (en) 2003-09-04 2005-03-09 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1513021B1 (en) * 2003-09-04 2007-10-03 ASML Netherlands B.V. Lithographic apparatus and a method of compensating for thermal deformation in a lithographic apparatus
CN102566336B (en) * 2010-12-30 2015-08-26 上海微电子装备有限公司 The stationary installation of mask and fixing means thereof
WO2013174398A1 (en) * 2012-05-22 2013-11-28 Carl Zeiss Smt Gmbh Reticle, reticle-chuck, reticle positioning system and optical system
KR102146162B1 (en) * 2018-07-25 2020-08-19 주식회사 야스 Glass Mask
CN113687574A (en) * 2020-05-18 2021-11-23 长鑫存储技术有限公司 Photoetching equipment and light source position monitoring method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4418420A (en) * 1980-08-09 1983-11-29 Agfa-Gevaert Aktiengesellschaft Method and arrangement for gripping X-ray film

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3941480A (en) * 1974-02-08 1976-03-02 The Gerber Scientific Instrument Company Work locating system and method with temperature and other compensation capabilities
US4019109A (en) * 1974-05-13 1977-04-19 Hughes Aircraft Company Alignment system and method with micromovement stage
US4506205A (en) * 1983-06-10 1985-03-19 The Perkin-Elmer Corporation Electro-magnetic alignment apparatus
JPS6068340A (en) * 1983-09-26 1985-04-18 Canon Inc Structural body of mask for lithography
DE3435178A1 (en) * 1983-09-26 1985-04-04 Canon K.K., Tokio/Tokyo OBJECT WITH MASK STRUCTURE FOR LITHOGRAPHY
US4592081A (en) * 1984-02-10 1986-05-27 Varian Associates, Inc. Adaptive X-ray lithography mask
JPS60251621A (en) * 1984-05-29 1985-12-12 Hitachi Ltd X-ray mask and x-ray exposure device using thereof
DE3620970A1 (en) * 1985-06-24 1987-01-08 Canon Kk Mask holding device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4418420A (en) * 1980-08-09 1983-11-29 Agfa-Gevaert Aktiengesellschaft Method and arrangement for gripping X-ray film

Also Published As

Publication number Publication date
JPH07101663B2 (en) 1995-11-01
FR2610740B1 (en) 1995-06-30
JPS63194331A (en) 1988-08-11
DE3803738C2 (en) 1992-12-24
GB8802217D0 (en) 1988-03-02
DE3803738A1 (en) 1988-08-25
FR2610740A1 (en) 1988-08-12
GB2201258A (en) 1988-08-24

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20040202