GB2187207A - Process for the production of laminated material or laminated workpieces by vapour deposit of at least one metal material on a metal substrate - Google Patents

Process for the production of laminated material or laminated workpieces by vapour deposit of at least one metal material on a metal substrate Download PDF

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Publication number
GB2187207A
GB2187207A GB08701503A GB8701503A GB2187207A GB 2187207 A GB2187207 A GB 2187207A GB 08701503 A GB08701503 A GB 08701503A GB 8701503 A GB8701503 A GB 8701503A GB 2187207 A GB2187207 A GB 2187207A
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Prior art keywords
vapour
process according
dispersion
deposited
vapour deposition
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GB8701503D0 (en
Inventor
Erich Hodes
Klaus Goerke
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GLYCO METALL WERKE
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GLYCO METALL WERKE
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/02Parts of sliding-contact bearings
    • F16C33/04Brasses; Bushes; Linings
    • F16C33/06Sliding surface mainly made of metal
    • F16C33/14Special methods of manufacture; Running-in
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0688Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2223/00Surface treatments; Hardening; Coating
    • F16C2223/30Coating surfaces
    • F16C2223/60Coating surfaces by vapour deposition, e.g. PVD, CVD

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

The invention relates to a process for the production of laminated materials in strip form or as strip portions or plates for the manufacture of friction or sliding elements, in particular friction bearings, friction bearing bushes or thrust discs for internal combustion engines, wherein a metal bearing material layer as a friction layer and possibly an intermediate layer or bonding layer is characterised by chemically reactive vapour depositing on the surface of the metal backing member, from one or more melting crucibles, inter alia by means of an electron beam, in a residual gas atmosphere, having a pressure of 10<-2>-10<-3>mbar and including at least one constituent which chemically reacts with at least one of the constituents of the material to be vapour deposited, wherein the material is dispersion- hardened simultaneously with the vapour deposit operation to form at least one chemical compound which is harder than the material to be vapour deposited. The residual gas atmosphere may be oxygen, wet oxygen, water vapour, nitrogen or air. The material to be vapour deposited suitable for forming oxides and nitrides thereof may be aluminium, cadmium, tin, zinc, nickel or copper. The process according to the invention enjoys particular significance in regard to the vapour deposit of dispersion alloys in order in that way to form dispersion-hardened layers of dispersion alloy, for example aluminium-lead dispersion alloy or lead-tin-bronze dispersion alloy.

Description

SPECIFICATION Process for the production of laminated material or laminated workpiece by vapour deposition of at least one metal material on a metal substrate The present invention relates to a process for the production of laminated material or laminated workpieces provided with a metal friction or sliding layer, in which layers are formed by vapour deposition (deposition by evaporation coating) of at least one metal material on a metal substrate.
DE-PS 2935417 discloses deposition ofthin metal layers in the form offriction or sliding layers on to metal carriers by vapour deposition in vacuum, wherein the metals can be evaporated by electron bombardment, in accordance with DE-PS 882174 and DD-PS54154. If metal alloys are to be vapour-deposited, that can be done by the prepared alloy being vaporised out of a crucible. However AT-PS 236185 and L.HOLLAND "Vacuum Deposition of Thin Films", Chapman + Hall 1961, page 197 also disclose vaporisation of all or some alloy constituents separately out of their own crucibles simultaneously or in succession, in particularwhen the vapour pressures ofthe alloy components exhibit substantial differences. On the other hand, DE-PS 2853724 discloses achieving dispersion hardening, in relation to metal layers which are to be applied by cathodic sputtering, in that a certain content of oxygen is allowed to remain in the plasma or the target and added to the material to be deposited by sputter coating are such metals as form harder particles of oxide and in respect of which the metal oxide is of larger volume than the metal itself.
In contrastthereto,the problem of the present invention, for the production offriction or sliding elements, is to afford the possibility, when using vacuum vapour deposition, in a continuous or discontinuous process, of producing layers and in particularfriction or sliding layers from bearing materials, and dispersion-hardening same in one and the same process.
In accordance with the invention, that problem is solved in that vapour deposition of the material of at least one of the layers to be vapour-deposited, preferably the material of the friction or sliding layer, is effected continuously or discontinuously in the presence of a residual gas atmosphere at pressures in the range of from 10-2to 1 0 -3 m ba r, wherei n the residual gas atmosphere includes at least one constituent which chemically reacts with at least one of the constituents of the material to be vapour-deposited, to form at least one chemical compound which is harder than the material to be vapour-deposited.
The invention provides a process for reactive vapour deposition with which it is possibleto produce dispersion-hardened bearing materials whose tribolog ical properties satisfy the practical requirements which are imposed at the presenttime.
Acrucial advance in respect of the production of dispersion-hardened friction or sliding layers in a rational process was afforded by vapour deposition in accordance with the invention, with a suitable residual gas, in particular also becausevapour deposition with coating rates of about O.311m/s is considerably more cost effective than cathodic sputtering (coating rate of 1 Fm/min at the most).
Preferably, in the process accordingtothe invention,the substrate on which the coating is to be formed, during the vapour deposition of the material, is maintained at an elevated temperature of between about 200 "C and 800 "C, which is adapted to the nature ofthe material to be vapour-deposited.
When vapour-depositing an aluminium alloy, the substrate can be kept at a temperature of between about 200 C and about300 C while in thevapour deposition of a copper-lead alloy, the substrate can be kept at a temperature in the range between about 500 "C and 700 "C. Heating of the substrate on which the vapour deposit is to be formed is preferably effected by means of electron beams, possibly in conjunction with electrical resistance heating.In the reactivevapourdepositoperation, high substrate temperatures can accelerate the reaction procedure byvirtue of the factthat atom transposition processes are facilitated. On the other hand a substrate temperature which is higherthan about 300 "C, particularly in the vapour deposition of aluminium bearing materials, can result in the formation of intermetallic phases which, as a result oftheir brittleness, in regard to bending our cyclic loading, can result in the bond between the sliding layer and the backing layer (in particular steel) separating.In such cases it may become necessary to cool the substrate during the vapour deposition of the respective material in order to keep the temperature within the appropriate range which is determined by the nature of the material to be vapour-deposited. The cooling operation can then advantageously be effected in a chamberwith an altered pressure stage using inert gas. On the other hand the composition of vapour deposition and a subsequent heating process can improve the adhesion effect by virtue oftheformation of intermediate diffusion layers.
In accordancewiththe invention vapour deposition ofthe respective material or the alloy constituents thereof is preferably effected in an oxidising residual gas atmosphere which contains oxygen, moist oxygen, water vapour, nitrogen and/or air let into the vacuum chamber. Reactive vapour deposition of that kind has particular advantages in regard to laminated materials or laminated workpieces in which the metal material of the matrixforthe layer to be produced byvapour deposition is a conventional plain bearing alloy, for example of one or more metals from the group comprising aluminium, lead, cadmium,tin,zinc, nickel and copper. In that connection harder dispersion-hardening particles of oxides or nitrides of one of those metals or a plurality ofthose metals areformed. ltisalsopossiblehoweverfordispersion hardening by reactive vapour deposition to be achieved orfurther enhanced bythedegreeof oxidation of oxide layers being substantially increased, by the addition to the material which isto be vapour-deposited of elements or oxides from the rare earth group (oxides of lanthanides including lanthanum) and also yttrium, in such an amount that in the vapour-deposited layerthey do not exceed a maximum dispersion component of 15 by volume.
Anotherwaywhich is embraced by the invention for forming harder dispersion-hardening constituents provides thatthe residual gas atmosphere contains oxygen and added to the material to be vapour-deposited are suboxides, for example SiO and/orTiO,thevaporisationtemperatureofwhich is lowerthan that of the corresponding dioxides forming hard dispersion-hardening constituents.
In the process according to the invention, steel strips or strips of other backing materials, for example lead bronze, can be provided with a vapour deposit of virtually all plain bearing materials, and at the same time dispersion-hardened. The coating operation takes place in a vacuum under extremely clean conditions, wherein the residual gas composition is such that the oxide content ofthe hardening particles is between 1 and 5% by volume, preferably below 1% by volume.The The advantage of vapour deposition on a stripforthe production of laminated materialsforthe production of sliding and friction elements is due to the fact that on the one hand there are no waste water problems,that isto say the process is environmentally acceptable, while on the other hand vapour deposition can be produced on both sides of the strip at the same time, more particularly using different materials. That means that one side of the steel carrier or backing member can be provided with a vapour deposit constituting one or more layers for sliding orfriction purposes, and the rear side can be provided by vapourdepositwith a layer which serves as protection from corrosion.Thus it is also possible in that way to produce layers of different thicknesses on the respective sides ofthe strip.
A strip vapour deposition installation which is constructed in accordance with the basic principles ofthe process according to the invention can be converted to using different metals to be vapour-deposited, without involving time-consuming and expensive alterations and additions.
With the process according to the invention it is also possible easily to produce multi-component layers in which different materials are vapour-deposited in different thicknesses in superposed relationship from successively disposed vaporisation systems. For example, it is possible to provideforvapourdeposition oftin as protection from corrosion (flash) on a steel backing member, on the rear side of the steel strip, in one pass. On the other hand, the oppositely disposed functional side may receive a vapour deposition of a friction bearing alloycomprising aCuPb orAIPb basealloyora bonding layer comprising pure aluminium or nickel between a steel backing member and the actual friction layer.
In the case of steel/Al composite materials with a steel/Al bearing alloy structure, it is also possible and appropriate to provide a corrosion-resistant layer by vapour deposition on the rear side of the steel strip, that layer comprising for example tin or PbSn, while a bonding layer of CuSn for bonding to the intermediate layer of Al bearing alloy, and a friction bearing alloy which is disposed thereover, preferably comprising a PbSnCu alloy, isto be vapour deposited on the oppositely disposed functional side. All those layers can involve dispersion hardening in the manner according to the present invention.
As another example, reference may be made to a steel strip which is tin-plated on its rear side and which on its functional side has a CuPb22Sn1 intermediate layer, a diffusion barrier layer of Ni which is about 1 lim in thickness, and a further run-in and sliding layer which is also produced by vapour deposition and which com prises for exa m ple Pbln or PbSnCu. In the case of thicknesses of steel strip ( > 6 mm) which can no longer be wound from one roll to another, plates are advantageously introduced in what is known as single-chamber or multi-chamber installations (batch type installations).
In accordancewith the invention, ion beam-activated coating can preferably be carried out. Such an ion beam-activated coating operation is between the above-mentioned high vacuum vapour deposition and what is referred to as plasma-activated coating. An ion source generates positively charged ions which are accelerated towards the substrate. At the same time, a stream of particles passes on to the substrate from a vaporiser.
The following types of ion source may be used: 1) ion generation byglowdischarge 2) ion generation by HF-discharges 3) ion generation by Penning discharges 4) ion generation by arc discharges and 5) ion generation by spark discharges.
In accordance with the present invention, forthe purposes ofvaporisation ofthe material, use is preferably made of an electron beam vaporiser, preferably an electron beam line vaporiser, in which the backscattered electrons are prevented from reaching the substrate (steel strip) by a magnetictrap so thatthe coating temperature of eg. 300 to 500 "C achieved by preheating is not exceeded in the case of vapour deposition of Al bearing material,thus ensuring that the formation of brittie Al-Fe-phases which reduce the bonding strength is prevented. In principlethevaporisation source used may be both a row of juxtaposed spotvaporisers as well as a line vaporiser. In both cases the vaporisation source must extend over the entire width of the strip to be coated. However, it can be expectedthatthe distribution of the thickness of the layer will be in principle more uniform if a line vaporiser is used instead of a row of spot vaporisers. The vaporiser pot which is filled with the vaporisation material extends over the entire width of the strip to be coated. A high-power electron beam is generated in an electron beam gun and passed in a linear configuration over the surface ofthevaporisation material.
The process according to the invention forthe production of a laminated material can take place substantially in the following manner: The steel strip to be evaporation coated, after careful preliminary cleaning (degreasing) is to be at a minimum temperature of 200 to 300 "C atthe moment of the vapour deposition, when vapour depositing Al bearing alloys, and is to be at a somewhat higher minimum temperature, more particularly in the range offrom 500 to 700 "C, when vapour depositing CuPb-base alloys. Thefollowing methods for heating up the strip before it passes into the actual coating chamber may be used: 1) induction heating, 2) resistance heating by direct passage of current, and 3) direct heating by bombardment with electron beams.
Induction heating can give rise to difficulties in a vacuum and also has a poor level of efficiency in relation to thin strips. Resistance heating is less flexible in regard to temperature distribution over the width of the strip. Therefore the preferred heating method isthatwhich uses an electron beam as distribution of the heating output can be satisfactorily control led both over the width of the strip and also along the path of movement of the strip. In that way it is possible on the one hand to set a uniform temperature over the width of the strip while on the other hand it is possible to providefor the most favourable characteristic in respect ofthe rise in temperature in the strip.For that purpose, in accordance with the invention, it is possible to use electron beam guns with a strip-shaped beam which is oscillated at high frequency transversely with respect to the direction of movement ofthe strip.
An installation for producing laminated material by the process according to the invention, for the production of plain bearings, liners (bushes) and thrust washers or discs can be designed e.g. along the following lines: Such an installation can be provided with two electron beam guns for the strip preheating operation and electron beam vaporisers, depending on the respective alloy components and the sequence of layers. The steel strip passes byway of a plurality of pressure stages into a heating chamber in which there is installed a heating means using electron beam guns or a combined heating means using electron beam guns and resistance heating.It may also be advantageous for the substrate to be cleaned before passing into the vaporisation installation, by means of a low-temperature heating operation, in order reliably to remove chemisorbed surface layers ofwaterwhich would weaken the bonding effect.
It is importantthat, with a viewto economical production ofthe electron beam generators, the vaporiser crucible(s) and deflection systems form a compact, easily interchangeable unit. The electron beam is deflected in a non-homogeneous magnetic field by 180 "to 300 , depending on the particular requirements involved, in order in that way to protectthe cathode from vapour deposition.
The steel strips which pass into the vaporisation installations or discontinuously introduced plates or steel strip portions can be covered with fabrics, cloths or fleeces, for example, consisting of Fibres, ceramicfibres, plastics fibres or hybrid fibres.
The process according to the invention is of particular significance in connection with the formation of dispersion-hardened layers of dispersion alloy. In that connection the process according to the invention may be used to particular advantageforthe production of dispersion-hardened layers of dispersion alloy on an aluminium-lead base, an aluminium-tin base ora copper-lead base. For example the process according to the invention is particularly advantageously suitableforthe production of sliding layers of dispersion alloys on an aluminium-lead base. Forthat purpose, in the process according to the invention, a vaporisation material on an aluminium base may be introduced in one melting crucible and a vaporisation material on a Pb base may be put in another crucible.In that case for example vaporisation material on an Al base with a composition AlCul Ni 0.5 may be considered. The vaporisation material on a Pb base may be for example of a composition PbSn2to PbSn4.
In another situation of use which is particularly suitable forthe production of intermediate layers on composite material for friction and sliding elements, a vaporisation material on atin-bronze base can be introduced into one crucible and a material on a lead base can be introduced into the other crucible. In that way, the process according to the invention provides for a dispersion-hardened layer of lead-tin-bronze dispersion alloy which is distinguished by particularly fine distribution of lead and particularly fine distribution of the dispersion-hardening elements, that isto saythe dispersoids, in the lead-tin-bronze layer.In a similar manner,the process according to the invention can also provide forthe production of a layer of lead-tin-bronze dispersion alloy when a vaporisation material on a tin-bronze base is disposed in one crucible and a vaporisation material on a lead-bronze base is disposed in the other crucible.
In all situations of use, a further advantage ofthe invention is that the reactive vapour deposition gives rise to considerably fewer problems under residual gas conditions than bombardment under a protective gas, for example hydrogen, and has a substantially higher level of efficiency than the formation of layers by cathodic sputtering. Metal carriers,in particularsteels,dependingontheir respective composition, have a tendency, in the bright annealing operation which precedes the actual casting operation, in a hydrogen atmosphere, to absorb that gas to a greater or lesser degree and, upon cooling, the gas, escaping to the cast surface, urges the dispersed component downwardlywith respect to the surface ofthe backing member, and thus additionally gives rise to segregation phenomena.
In accordance with the invention, the metal strip, for example a steel strip which is used as a backing member, may be subjected to a preliminary treatment in the evacuated chamber, possibly even in the presence of the residual gas atmosphere. In that way, the absorption of hydrogen or other gas in the metal strip to be coated is eliminated or at least greatly reduced. The metal strip, fdr example steel strip, which is to be coated, can then be passed into the vapour deposition chamber at an initial temperature for the vapour deposition.
The invention also affords the possibility, in a particularly advantageous manner, of providing for vapour deposition of layers of different chemical compositions. The vapour deposition of such layers of different chemical compositions can then be carried out in subsequent stations within the evacuated chamber or the chamberwhen it still contains a residual gas atmosphere.
Priorto leaving the strip installation,the vapour-deposited metal strip, for example a steel strip, may be cooled to a temperature of 100 "C so that the atmosphere does not have any harmful effect on the vapour-deposited layer.
The process according to the invention will now be described in greater detail with reference to the drawings in which: Figure 1 shows the polished section of a composite material according to the invention with vapour-deposited layer; Figure2 shows the polished section of a conventional composite material produced by powder rolling, sintering or plating, with the same composition of material of the applied layer; and Figure 3shows the comparison in respect of loading between the composite material according to the invention and a known composite material, in the form ofa bardiagram.
Figure 1 shows the polished section of composite material according to the invention with a vapour-deposited, dispersion-hardened layer of AlPb dispersion alloy, in which the lead 11 occurs in finely dispersed form in the Al matrix 10. In addition, the dispersoids 12 produced by reactive vapour deposit are very finely distributed in the Al matrix 10.
In contrast, Figure 2 shows the polished section of a conventional composite material with an AlPb-dispersion alloy layer in which the lead 11 is embedded in the matrix 10 in a line-type arrangement. The fatigue strength ofthe material is considerably reduced by virtue ofthat line-type arrangement of the lead.
Figure 3 shows a bar diagram in which the load-carrying capacity of the composite material with vapour-deposited dispersion-hardened AIPb dispersion alloy layer as shown in Figure 1 (lower bar) and a conventional composite material with an AIPb dispersion alloy layer as shown in Figure 2 (upper bar) is illustrated. It will be seen therefrom thatthe fatigue impact strength of the composite material with a vapour-deposited dispersion-hardened AIPb dispersion alloy layer is about 60% higher than that of a known material,for example a material as disclosed in German laid-open application (DE-OS) No.1775322.

Claims (17)

1. A process forthe production of laminated material or laminated workpieces provided with a metal friction or sliding layer, in which layers are formed by vapour deposition of at least one metal material on a metal substrate, wherein vapour deposition ofthe material of at least one ofthe layers to be vapour-deposited, preferably the material of the friction or sliding layer, is effected continuously or discontinuously in the presence of a residual gas atmosphere at pressures in the range of from 10-2to 10-3 mbar, wherein the residual gas atmosphere includes at least one constituent which chemically reacts with at least one of the constituents ofthe material to be vapour-deposited, to form at least one chemical compound which isharderthanthe material to be vapour-deposited.
2. A process according to Claim 1 wherein during the vapour deposition of the material, the substrate on which the vapour deposit isto be formed is maintained at an elevated temperature of between substantially 200 and 800 "C, which is adapted to the nature of the material to be vapour-deposited.
3. A process according to Claim 2 wherein during the vapour deposition of an aluminium alloythe substrate on which the vapour deposit is to be formed is maintained at a temperature substantially between 200 "C and 300 "C.
4. A process according to Claim 2 wherein during the vapour deposition of a copper-lead alloy the substrate on which the vapour deposit isto be formed is maintained at a temperature in the range between substantially 50000 and 700 "C.
5. A process according to any one of Claims 2 to 4 wherein heating of the substrate on which the vapour deposit is to be formed is effected by electron beam heating possibly in conjunction with electrical resistance heating.
6. A process according to any one of Claims 1 to 5 wherein following the vapour deposition of a layer, for example a friction or sliding layer, a heating process is carried out, forming an intermediate diffusion layer.
7. A process according to any one of Claims 1 to 6 wherein, in the vapour deposition of the material, an amount of residual gas is maintained which includes one of or a mixture of, the following gases: oxygen, wet oxygen, water vapour, nitrogen or air.
8. A process according to Claim 7 wherein the material which is to be vapour-deposited, contains at least one metal forming harder dispersion-hardening oxides or nitrides, for example aluminium, lead, cadmium, tin, zinc, nickel or copper.
9. A process according to Claim 7 wherein chemical elements or oxides from the rare earth group and also yttrium are added to the material which is to be vapour-deposited, in such an amount thatinthevapour-deposited layer they do not exceed a maximum dispersion component of 15% by volume.
10. A process according to Claim 7 wherein the residual gas atmosphere contains oxygen and added to the material to be vapour-deposited are suboxides, for example SiO and/orTiO, the evaporation temperature of which is lower than that of the corresponding dioxides forming hard dispersion-hardening constituents.
11. A process according to onq of Claims 1 to 10 wherein, in the vapour deposition of layers, in particular friction or sliding layers, of dispersion alloy, for example aluminium-lead dispersion alloy or on a CuPb base, there is provided a residual gas atmosphere which includes at least one gas constituent which chemically reacts at least with one of the constituents of the dispersion alloy, forming harder materials than the alloy constituents.
12. A process according to Claim 11 wherein vaporisation ofthe constituents forming the dispersion alloy is effected from various sources with a vapour-deposit material which differs in respect of its composition and nature, in a predetermined rhthm in accordance with the desired composition in alternate succession.
13. A process according to one of Claims 1 to 12 wherein vapour deposition ofthe material is effected in the mannerofa plasma-activated coating operation, with ions, preferably ions of the residual gas constituents, being injected into the material vapour and with the application of an electrical potential of opposite polarity to that of the charge on the ions.
14. A process according to one of Claims 1 to 12 wherein the vapour deposition of the material is effected in the manner of an ion beam-activated coating operation in which positively charged ions which are generated in an ion source are accelerated towards the substrate and at the same time guided on to the surface of the substrate by a stream of particles from a vaporiser.
15. A process according to one of Claims 1 to 14 wherein the vaporising the material is effected using an electron beam linevaporiserora row of juxtaposed spot vaporisers, wherein backscattered electrons are prevented from reaching the substrate by means of a magnetic trap.
16. A process according to one of Claims 1 to 15 wherein prior to the vapour deposition of the material,thesubstrate is covered with fabric, cloth or fleece comprising C-fibres, ceramicfibres, plastics fibres or hybrid fibres.
17. A process according to one of Claims 1 to 16 wherein the laminated material or laminated workpieces with a vapour deposit produced by chemical reactive means is heated following the vapour deposit operation,forming diffusion intermediate layers.
GB08701503A 1986-02-28 1987-01-23 Process for the production of laminated material or laminated workpieces by vapour deposit of at least one metal material on a metal substrate Withdrawn GB2187207A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863606529 DE3606529A1 (en) 1986-02-28 1986-02-28 METHOD FOR THE PRODUCTION OF LAYING MATERIAL OR LAYING MATERIAL PIECES BY EVAPORATING AT LEAST ONE METAL MATERIAL ONTO A METAL SUBSTRATE

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GB8701503D0 GB8701503D0 (en) 1987-02-25
GB2187207A true GB2187207A (en) 1987-09-03

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GB08701503A Withdrawn GB2187207A (en) 1986-02-28 1987-01-23 Process for the production of laminated material or laminated workpieces by vapour deposit of at least one metal material on a metal substrate

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JP (1) JPS62222057A (en)
AT (1) AT395020B (en)
BR (1) BR8700886A (en)
DE (1) DE3606529A1 (en)
FR (1) FR2596419A1 (en)
GB (1) GB2187207A (en)
IT (1) IT1201171B (en)

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GB2253412A (en) * 1991-02-20 1992-09-09 T & N Technology Ltd Wear resistant bearing overlay
US5770323A (en) * 1991-02-20 1998-06-23 T & N Technology Limited Bearings
US5955202A (en) * 1995-04-21 1999-09-21 Federal-Mogul Wiesbaden Gmbh Concave sliding element and production process therefor
US6444086B1 (en) 1997-12-03 2002-09-03 Ferderal-Mogul Wiesbaden Gmbh & Co. Kg Device for vacuum coating slide bearings
CN1105833C (en) * 1998-06-02 2003-04-16 联合莫古尔威斯巴登有限公司 Plain bearing and method for the production thereof
US7781015B2 (en) 2005-07-12 2010-08-24 Miba Gleitlager Gmbh Coating method
GB2602705A (en) * 2021-10-21 2022-07-13 Butterworth Colin Floating underwater pipeline "Process of Tyn"

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DE19514836C2 (en) * 1995-04-21 2000-06-08 Fraunhofer Ges Forschung bearing shell
DE19824308C1 (en) 1998-06-02 1999-09-09 Fraunhofer Ges Forschung Plain bearing shell especially a steel-backed bearing shell with an aluminum-tin alloy running-in layer
AT407404B (en) * 1998-07-29 2001-03-26 Miba Gleitlager Ag INTERMEDIATE LAYER, IN PARTICULAR BOND LAYER, FROM AN ALUMINUM-BASED ALLOY
JP2001132754A (en) * 1999-11-04 2001-05-18 Daido Metal Co Ltd Multilayer slide bearing
DE102010011083B3 (en) * 2010-03-12 2011-06-16 Ks Gleitlager Gmbh Plain bearing composite material
DE102015213052A1 (en) * 2015-07-13 2017-01-19 Federal-Mogul Wiesbaden Gmbh Sliding bearing, sliding bearing material, method for producing a sliding bearing material and use of a sliding bearing material for a sliding bearing

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DE2853724A1 (en) * 1978-12-13 1980-06-19 Glyco Metall Werke Sputtered or wire explosion formed hard wear resistant metal coating - has finely dispersed metal oxide particles in metal matrix
GB2040315A (en) * 1978-12-13 1980-08-28 Glyco Metall Werke Laminar material or element and a process for its manufacture
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GB1427674A (en) * 1973-03-05 1976-03-10 Suwa Seikosha Kk Process for coating a material onto a timepiece part
GB1574677A (en) * 1977-06-07 1980-09-10 Gantois M Method of coating electrically conductive components
DE2853724A1 (en) * 1978-12-13 1980-06-19 Glyco Metall Werke Sputtered or wire explosion formed hard wear resistant metal coating - has finely dispersed metal oxide particles in metal matrix
GB2040315A (en) * 1978-12-13 1980-08-28 Glyco Metall Werke Laminar material or element and a process for its manufacture
GB2055403A (en) * 1979-08-02 1981-03-04 Balzers Hochvakuum Method for depositing hard wear-resistant coatings on substrates
GB2117009A (en) * 1982-03-05 1983-10-05 Citizen Watch Co Ltd Process for manufacturing ornamental parts and ion plating apparatus to be used therefor
GB2156387A (en) * 1983-08-25 1985-10-09 Vni Instrument Inst Cutting tool and method of manufacture thereof
EP0138515A2 (en) * 1983-10-07 1985-04-24 Nihon Shinku Gijutsu Kabushiki Kaisha An apparatus for use in manufacturing a perpendicular magnetic recording member
GB2154658A (en) * 1984-02-28 1985-09-11 Diesel Kiki Co Valve unit including a switch

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2253412A (en) * 1991-02-20 1992-09-09 T & N Technology Ltd Wear resistant bearing overlay
GB2253412B (en) * 1991-02-20 1995-07-05 T & N Technology Ltd Bearings
US5770323A (en) * 1991-02-20 1998-06-23 T & N Technology Limited Bearings
US5955202A (en) * 1995-04-21 1999-09-21 Federal-Mogul Wiesbaden Gmbh Concave sliding element and production process therefor
US6444086B1 (en) 1997-12-03 2002-09-03 Ferderal-Mogul Wiesbaden Gmbh & Co. Kg Device for vacuum coating slide bearings
CN1105833C (en) * 1998-06-02 2003-04-16 联合莫古尔威斯巴登有限公司 Plain bearing and method for the production thereof
US7781015B2 (en) 2005-07-12 2010-08-24 Miba Gleitlager Gmbh Coating method
GB2602705A (en) * 2021-10-21 2022-07-13 Butterworth Colin Floating underwater pipeline "Process of Tyn"
GB2602705B (en) * 2021-10-21 2024-03-13 Butterworth Colin Floating underwater pipelines - "Process of Tyn"

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GB8701503D0 (en) 1987-02-25
IT1201171B (en) 1989-01-27
DE3606529C2 (en) 1988-09-01
IT8719115A0 (en) 1987-01-21
BR8700886A (en) 1987-12-22
DE3606529A1 (en) 1987-09-03
JPS62222057A (en) 1987-09-30
AT395020B (en) 1992-08-25
FR2596419A1 (en) 1987-10-02
ATA44887A (en) 1992-01-15

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