GB2096177B - Improved integrated sputtering apparatus and method - Google Patents

Improved integrated sputtering apparatus and method

Info

Publication number
GB2096177B
GB2096177B GB8209499A GB8209499A GB2096177B GB 2096177 B GB2096177 B GB 2096177B GB 8209499 A GB8209499 A GB 8209499A GB 8209499 A GB8209499 A GB 8209499A GB 2096177 B GB2096177 B GB 2096177B
Authority
GB
United Kingdom
Prior art keywords
sputtering apparatus
improved integrated
integrated sputtering
improved
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8209499A
Other versions
GB2096177A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of GB2096177A publication Critical patent/GB2096177A/en
Application granted granted Critical
Publication of GB2096177B publication Critical patent/GB2096177B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H01J37/32706—Polarising the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • H01J37/3233—Discharge generated by other radiation using charged particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB8209499A 1981-04-07 1982-03-31 Improved integrated sputtering apparatus and method Expired GB2096177B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25187181A 1981-04-07 1981-04-07

Publications (2)

Publication Number Publication Date
GB2096177A GB2096177A (en) 1982-10-13
GB2096177B true GB2096177B (en) 1985-07-17

Family

ID=22953753

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8209499A Expired GB2096177B (en) 1981-04-07 1982-03-31 Improved integrated sputtering apparatus and method

Country Status (2)

Country Link
DE (1) DE3212679A1 (en)
GB (1) GB2096177B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4581118A (en) 1983-01-26 1986-04-08 Materials Research Corporation Shaped field magnetron electrode
NL8402012A (en) * 1983-07-19 1985-02-18 Varian Associates MICROWAVE SPETTER COATING APPLICATION SOURCE FOR BOTH MAGNETIC AND NON-MAGNETIC TARGET MATERIALS.
US4500408A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Apparatus for and method of controlling sputter coating
US4500409A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Magnetron sputter coating source for both magnetic and non magnetic target materials
DE3503398A1 (en) * 1985-02-01 1986-08-07 W.C. Heraeus Gmbh, 6450 Hanau SPUTTER SYSTEM FOR REACTIVELY COATING A SUBSTRATE WITH HARD MATERIALS
US4588490A (en) * 1985-05-22 1986-05-13 International Business Machines Corporation Hollow cathode enhanced magnetron sputter device
DE3527626A1 (en) * 1985-08-01 1987-02-05 Leybold Heraeus Gmbh & Co Kg SPRAYING CATODE ACCORDING TO THE MAGNETRON PRINCIPLE
BE1003701A3 (en) * 1990-06-08 1992-05-26 Saint Roch Glaceries Rotary cathode.
US5798029A (en) * 1994-04-22 1998-08-25 Applied Materials, Inc. Target for sputtering equipment
US5597459A (en) * 1995-02-08 1997-01-28 Nobler Technologies, Inc. Magnetron cathode sputtering method and apparatus
GB9606920D0 (en) * 1996-04-02 1996-06-05 Applied Vision Ltd Magnet array for magnetrons
WO2019158225A1 (en) 2018-02-13 2019-08-22 Evatec Ag Methods of and apparatus for magnetron sputtering

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus
DE2707144A1 (en) * 1976-02-19 1977-08-25 Sloan Technology Corp Cathode sputtering device with magnetic equipment - which can be displaced to move the area of sputtering over an extended surface by relative movement
FR2371009A1 (en) * 1976-11-15 1978-06-09 Commissariat Energie Atomique METHOD FOR CONTROL OF LAYER DEPOSIT BY REACTIVE SPRAYING AND IMPLEMENTATION DEVICE
US4155825A (en) * 1977-05-02 1979-05-22 Fournier Paul R Integrated sputtering apparatus and method
GB2051877B (en) * 1979-04-09 1983-03-02 Vac Tec Syst Magnetically enhanced sputtering device and method

Also Published As

Publication number Publication date
GB2096177A (en) 1982-10-13
DE3212679A1 (en) 1982-11-11

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee