GB2034317B - Photopolymerisable compositions derived coatings and other polymerised products - Google Patents

Photopolymerisable compositions derived coatings and other polymerised products

Info

Publication number
GB2034317B
GB2034317B GB7935935A GB7935935A GB2034317B GB 2034317 B GB2034317 B GB 2034317B GB 7935935 A GB7935935 A GB 7935935A GB 7935935 A GB7935935 A GB 7935935A GB 2034317 B GB2034317 B GB 2034317B
Authority
GB
United Kingdom
Prior art keywords
compositions derived
photopolymerisable compositions
derived coatings
polymerised products
polymerised
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB7935935A
Other versions
GB2034317A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Priority to GB7935935A priority Critical patent/GB2034317B/en
Priority to MX17979779A priority patent/MX152428A/en
Priority to BR7906943A priority patent/BR7906943A/en
Publication of GB2034317A publication Critical patent/GB2034317A/en
Application granted granted Critical
Publication of GB2034317B publication Critical patent/GB2034317B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/06—Polythioethers from cyclic thioethers
    • C08G75/08—Polythioethers from cyclic thioethers from thiiranes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
GB7935935A 1978-10-27 1979-10-16 Photopolymerisable compositions derived coatings and other polymerised products Expired GB2034317B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB7935935A GB2034317B (en) 1978-10-27 1979-10-16 Photopolymerisable compositions derived coatings and other polymerised products
MX17979779A MX152428A (en) 1978-10-27 1979-10-26 IMPROVEMENTS TO PHOTOPOLYMERIZABLE POLYMERIC COMPOSITION FOR COATINGS
BR7906943A BR7906943A (en) 1978-10-27 1979-10-26 PHOTOPOLIMERIZABLE COMPOSITION COATING AND POLYMERIZED COMPOSITION

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB7842235 1978-10-27
GB7935935A GB2034317B (en) 1978-10-27 1979-10-16 Photopolymerisable compositions derived coatings and other polymerised products

Publications (2)

Publication Number Publication Date
GB2034317A GB2034317A (en) 1980-06-04
GB2034317B true GB2034317B (en) 1983-05-11

Family

ID=26269360

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7935935A Expired GB2034317B (en) 1978-10-27 1979-10-16 Photopolymerisable compositions derived coatings and other polymerised products

Country Status (3)

Country Link
BR (1) BR7906943A (en)
GB (1) GB2034317B (en)
MX (1) MX152428A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4351708A (en) 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
US4336366A (en) 1980-02-29 1982-06-22 Ciba-Geigy Corporation Thermally polymerizable mixtures and processes for the thermally-initiated polymerization of cationically polymerizable compounds
EP0136679B1 (en) * 1983-09-30 1987-12-16 Kabushiki Kaisha Toshiba Photopolymerizable epoxy resin composition
JPS6072918A (en) * 1983-09-30 1985-04-25 Toshiba Corp Photopolymerizable epoxy resin composition
JPS61500974A (en) * 1983-10-28 1986-05-15 ロクタイト．コ−ポレ−シヨン Photocurable composition containing two curing types of prepolymers
GB8332073D0 (en) * 1983-12-01 1984-01-11 Ciba Geigy Ag Polymerisable compositions
US4889792A (en) * 1987-12-09 1989-12-26 Minnesota Mining And Manufacturing Company Ternary photoinitiator system for addition polymerization
JP2001200058A (en) * 2000-01-19 2001-07-24 Mitsubishi Gas Chem Co Inc Manufacturing method for optical material
US6635195B1 (en) * 2000-02-04 2003-10-21 Essilor International Compagnie Generale D'optique Cationic photopolymerization of diepisulfides and application to the manufacture of optical lenses

Also Published As

Publication number Publication date
BR7906943A (en) 1980-06-17
MX152428A (en) 1985-07-15
GB2034317A (en) 1980-06-04

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee