GB201809369D0 - Polishing liquid composition for magnetic disk substrate - Google Patents
Polishing liquid composition for magnetic disk substrateInfo
- Publication number
- GB201809369D0 GB201809369D0 GBGB1809369.0A GB201809369A GB201809369D0 GB 201809369 D0 GB201809369 D0 GB 201809369D0 GB 201809369 A GB201809369 A GB 201809369A GB 201809369 D0 GB201809369 D0 GB 201809369D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- magnetic disk
- liquid composition
- polishing liquid
- disk substrate
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/04—Aqueous dispersions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015233525 | 2015-11-30 | ||
PCT/JP2016/084837 WO2017094592A1 (en) | 2015-11-30 | 2016-11-24 | Polishing liquid composition for magnetic disk substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
GB201809369D0 true GB201809369D0 (en) | 2018-07-25 |
GB2560842A GB2560842A (en) | 2018-09-26 |
Family
ID=58796657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1809369.0A Withdrawn GB2560842A (en) | 2015-11-30 | 2016-11-24 | Polishing liquid composition for magnetic disk substrate |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6771484B2 (en) |
GB (1) | GB2560842A (en) |
MY (1) | MY187480A (en) |
TW (1) | TWI723085B (en) |
WO (1) | WO2017094592A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6957232B2 (en) * | 2017-06-27 | 2021-11-02 | 花王株式会社 | Abrasive liquid composition |
JP6944231B2 (en) * | 2017-06-27 | 2021-10-06 | 花王株式会社 | Abrasive liquid composition |
JP7111492B2 (en) * | 2018-03-30 | 2022-08-02 | 株式会社フジミインコーポレーテッド | Polishing composition, pad surface conditioning composition and use thereof |
JP7292923B2 (en) * | 2019-03-29 | 2023-06-19 | 株式会社フジミインコーポレーテッド | Method for manufacturing magnetic disk substrate, polishing composition and polishing method |
CN115820128A (en) * | 2022-11-22 | 2023-03-21 | 深圳市永霖科技有限公司 | Chemical mechanical polishing solution for indium phosphide polishing and polishing process |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101888906B (en) * | 2007-12-17 | 2012-12-19 | 三洋化成工业株式会社 | Cleaning agent and cleaning method for electronic material |
JP6259182B2 (en) * | 2012-12-12 | 2018-01-10 | 株式会社フジミインコーポレーテッド | Polishing liquid for primary polishing of magnetic disk substrate with nickel phosphorus plating |
JP6138677B2 (en) * | 2013-12-27 | 2017-05-31 | 花王株式会社 | Polishing liquid composition for magnetic disk substrate |
-
2016
- 2016-11-24 MY MYPI2018702067A patent/MY187480A/en unknown
- 2016-11-24 TW TW105138641A patent/TWI723085B/en active
- 2016-11-24 WO PCT/JP2016/084837 patent/WO2017094592A1/en active Application Filing
- 2016-11-24 JP JP2017553810A patent/JP6771484B2/en active Active
- 2016-11-24 GB GB1809369.0A patent/GB2560842A/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
TWI723085B (en) | 2021-04-01 |
GB2560842A (en) | 2018-09-26 |
MY187480A (en) | 2021-09-23 |
WO2017094592A1 (en) | 2017-06-08 |
JP6771484B2 (en) | 2020-10-21 |
TW201727626A (en) | 2017-08-01 |
JPWO2017094592A1 (en) | 2018-09-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
789A | Request for publication of translation (sect. 89(a)/1977) |
Ref document number: 2017094592 Country of ref document: WO |
|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |