GB201300133D0 - Laminated materials, methods and apparatus for making same, and uses thereof - Google Patents
Laminated materials, methods and apparatus for making same, and uses thereofInfo
- Publication number
- GB201300133D0 GB201300133D0 GBGB1300133.4A GB201300133A GB201300133D0 GB 201300133 D0 GB201300133 D0 GB 201300133D0 GB 201300133 A GB201300133 A GB 201300133A GB 201300133 D0 GB201300133 D0 GB 201300133D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- methods
- making same
- laminated materials
- laminated
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0617—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3132—Evaporating
- H01J2237/3137—Plasma-assisted co-operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261718575P | 2012-10-25 | 2012-10-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB201300133D0 true GB201300133D0 (en) | 2013-02-20 |
Family
ID=47747979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB1300133.4A Ceased GB201300133D0 (en) | 2012-10-25 | 2013-01-04 | Laminated materials, methods and apparatus for making same, and uses thereof |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP2912205A2 (en) |
JP (1) | JP2016504485A (en) |
KR (1) | KR20150079749A (en) |
GB (1) | GB201300133D0 (en) |
WO (1) | WO2014063970A2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3366804B1 (en) * | 2017-02-22 | 2022-05-11 | Satisloh AG | Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5227203A (en) * | 1992-02-24 | 1993-07-13 | Nkk Corporation | Ion-plating method and apparatus therefor |
AUPM365594A0 (en) * | 1994-02-02 | 1994-02-24 | Australian National University, The | Method and apparatus for coating a substrate |
DE4412906C1 (en) * | 1994-04-14 | 1995-07-13 | Fraunhofer Ges Forschung | Ion-assisted vacuum coating |
JPH10265946A (en) * | 1997-03-27 | 1998-10-06 | Toyo Metallizing Co Ltd | Vapor deposition device and manufacture of thin film using the same |
DE10111515A1 (en) * | 2001-02-19 | 2002-08-14 | Fraunhofer Ges Forschung | Plasma coating device used for coating metallic strip material in the manufacture of photovoltaic cells and modules comprises a hollow cathode |
GB2395059B (en) | 2002-11-05 | 2005-03-16 | Imp College Innovations Ltd | Structured silicon anode |
US20090188790A1 (en) | 2008-01-18 | 2009-07-30 | 4D-S Pty. Ltd. | Concentric hollow cathode magnetron sputter source |
DE102008064134B4 (en) * | 2008-12-19 | 2016-07-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Process for coating objects by means of a low-pressure plasma |
JPWO2011074439A1 (en) | 2009-12-16 | 2013-04-25 | 東洋紡株式会社 | Negative electrode for lithium ion secondary battery and lithium ion secondary battery using the same |
WO2013045596A2 (en) | 2011-09-29 | 2013-04-04 | The Morgan Crucible Company Plc | Inorganic materials, methods and apparatus for making same, and uses thereof |
-
2013
- 2013-01-04 GB GBGB1300133.4A patent/GB201300133D0/en not_active Ceased
- 2013-10-16 EP EP13779559.7A patent/EP2912205A2/en not_active Withdrawn
- 2013-10-16 KR KR1020157013533A patent/KR20150079749A/en not_active Application Discontinuation
- 2013-10-16 JP JP2015538376A patent/JP2016504485A/en active Pending
- 2013-10-16 WO PCT/EP2013/071640 patent/WO2014063970A2/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
KR20150079749A (en) | 2015-07-08 |
WO2014063970A3 (en) | 2014-07-24 |
EP2912205A2 (en) | 2015-09-02 |
JP2016504485A (en) | 2016-02-12 |
WO2014063970A2 (en) | 2014-05-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
COOA | Change in applicant's name or ownership of the application |
Owner name: NITRIDE SOLUTIONS, INC. Free format text: FORMER OWNER: MORGAN ADVANCED MATERIALS PLC |
|
AT | Applications terminated before publication under section 16(1) | ||
CAT | Correction to former announced terminated application (before grant) |
Free format text: GB1300133.4 WAS ANNOUNCED AS TERMINATED BEFORE SECTION 16 PUBLICATION IN JOURNAL NUMBER 6526 ON 18TH JUNE 2014. THIS TERMINATION WAS MADE IN ERROR AND THE APPLICATION HAS NOW BEEN REINSTATED. |
|
AT | Applications terminated before publication under section 16(1) |