GB2003494B - Polythiol effect curable polymeric composition - Google Patents
Polythiol effect curable polymeric compositionInfo
- Publication number
- GB2003494B GB2003494B GB7834168A GB7834168A GB2003494B GB 2003494 B GB2003494 B GB 2003494B GB 7834168 A GB7834168 A GB 7834168A GB 7834168 A GB7834168 A GB 7834168A GB 2003494 B GB2003494 B GB 2003494B
- Authority
- GB
- United Kingdom
- Prior art keywords
- polythiol
- polymeric composition
- curable polymeric
- effect
- effect curable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/37—Thiols
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/827,002 US4179531A (en) | 1977-08-23 | 1977-08-23 | Polythiol effect, curable monoalkenyl aromatic-diene and ene composition |
US87194978A | 1978-01-23 | 1978-01-23 | |
US05/871,931 US4234676A (en) | 1978-01-23 | 1978-01-23 | Polythiol effect curable polymeric composition |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2003494A GB2003494A (en) | 1979-03-14 |
GB2003494B true GB2003494B (en) | 1982-03-24 |
Family
ID=27420189
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB7834168A Expired GB2003494B (en) | 1977-08-23 | 1978-08-22 | Polythiol effect curable polymeric composition |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS5950971B2 (en) |
AU (1) | AU531102B2 (en) |
DE (1) | DE2834768A1 (en) |
FR (1) | FR2401444A1 (en) |
GB (1) | GB2003494B (en) |
NL (1) | NL7808653A (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2030584B (en) | 1978-10-03 | 1983-03-23 | Lankro Chem Ltd | Photopolymerisable solder resist compositions |
CA1172112A (en) * | 1980-12-12 | 1984-08-07 | Richard P. Plunkett | Process for making conductive coatings |
JPS6138186U (en) * | 1984-08-10 | 1986-03-10 | 三成研機株式会社 | Hanging folding platform |
GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
NZ237919A (en) * | 1990-04-26 | 1994-09-27 | Grace W R & Co | Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates |
US7521015B2 (en) * | 2005-07-22 | 2009-04-21 | 3M Innovative Properties Company | Curable thiol-ene compositions for optical articles |
JP4805068B2 (en) | 2006-08-31 | 2011-11-02 | 富士フイルム株式会社 | Method for producing dye-containing negative curable composition, color filter and method for producing the same |
JP4837603B2 (en) | 2007-03-14 | 2011-12-14 | 富士フイルム株式会社 | Negative curable composition, color filter and method for producing the same |
JP5393092B2 (en) | 2008-09-30 | 2014-01-22 | 富士フイルム株式会社 | Dye-containing negative curable composition, color filter using the same, method for producing the same, and solid-state imaging device |
AT516559B1 (en) * | 2014-12-10 | 2017-12-15 | Joanneum Res Forschungsgmbh | A prepolymer composition comprising such composition and use thereof |
AT516558B1 (en) * | 2014-12-10 | 2018-02-15 | Joanneum Res Forschungsgmbh | Embossing lacquer, embossing method and substrate surface coated with the embossing lacquer |
WO2023181847A1 (en) * | 2022-03-24 | 2023-09-28 | ナミックス株式会社 | Resin composition, adhesive, sealing material, cured product, semiconductor device and electronic component |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1251232A (en) * | 1967-10-12 | 1971-10-27 | ||
US3850770A (en) * | 1969-10-24 | 1974-11-26 | Kansai Paint Co Ltd | Radiation curable compositions from acrylurethane resins |
GB1312492A (en) * | 1969-12-19 | 1973-04-04 | Mccall Corp | Crosslinked polymers and process therefor |
JPS4954491A (en) * | 1972-05-05 | 1974-05-27 | ||
DE2456439A1 (en) * | 1974-11-29 | 1976-08-12 | Basf Ag | MULTI-LAYER COMPOSITE PANELS FOR THE MANUFACTURE OF FLEXO PRINTING FORMS |
US4045231A (en) * | 1975-03-15 | 1977-08-30 | Tokyo Ohka Kogyo Kabushiki Kaisha | Photosensitive resin composition for flexographic printing plates |
US4120721A (en) * | 1977-06-02 | 1978-10-17 | W. R. Grace & Co. | Radiation curable compositions for coating and imaging processes and method of use |
-
1978
- 1978-08-05 DE DE19782834768 patent/DE2834768A1/en not_active Ceased
- 1978-08-16 AU AU38984/78A patent/AU531102B2/en not_active Expired
- 1978-08-21 JP JP53100996A patent/JPS5950971B2/en not_active Expired
- 1978-08-22 FR FR7824407A patent/FR2401444A1/en active Granted
- 1978-08-22 GB GB7834168A patent/GB2003494B/en not_active Expired
- 1978-08-22 NL NL7808653A patent/NL7808653A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
AU3898478A (en) | 1980-02-21 |
GB2003494A (en) | 1979-03-14 |
FR2401444B1 (en) | 1983-10-14 |
JPS5950971B2 (en) | 1984-12-11 |
NL7808653A (en) | 1979-02-27 |
DE2834768A1 (en) | 1979-03-08 |
FR2401444A1 (en) | 1979-03-23 |
AU531102B2 (en) | 1983-08-11 |
JPS5463903A (en) | 1979-05-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |