GB1548439A - Dot-etchable photopoymerisable elements and image reproductionprocess - Google Patents
Dot-etchable photopoymerisable elements and image reproductionprocessInfo
- Publication number
- GB1548439A GB1548439A GB47954/76A GB4795476A GB1548439A GB 1548439 A GB1548439 A GB 1548439A GB 47954/76 A GB47954/76 A GB 47954/76A GB 4795476 A GB4795476 A GB 4795476A GB 1548439 A GB1548439 A GB 1548439A
- Authority
- GB
- United Kingdom
- Prior art keywords
- reproductionprocess
- photopoymerisable
- etchable
- dot
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F5/00—Screening processes; Screens therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/037,947 US4229517A (en) | 1976-11-13 | 1979-05-10 | Dot-etchable photopolymerizable elements |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US63272675A | 1975-11-17 | 1975-11-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1548439A true GB1548439A (en) | 1979-07-18 |
Family
ID=24536688
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB47954/76A Expired GB1548439A (en) | 1975-11-17 | 1976-11-17 | Dot-etchable photopoymerisable elements and image reproductionprocess |
Country Status (8)
Country | Link |
---|---|
JP (4) | JPS5262427A (en) |
AU (1) | AU506292B2 (en) |
BE (1) | BE848409A (en) |
BR (1) | BR7607672A (en) |
CA (1) | CA1079565A (en) |
DE (3) | DE2660921C3 (en) |
FR (1) | FR2331813A1 (en) |
GB (1) | GB1548439A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4515877A (en) * | 1982-11-27 | 1985-05-07 | Basf Aktiengesellschaft | Image-recording materials and image-recording carried out using these to produce an optical mask |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2660921C3 (en) * | 1975-11-17 | 1987-07-30 | E.I. Du Pont De Nemours And Co., Wilmington, Del. | Method for producing point-etched masks |
US4311784A (en) | 1978-05-09 | 1982-01-19 | E. I. Du Pont De Nemours And Company | Multilayer photosensitive solvent-processable litho element |
JPS55114370A (en) * | 1979-02-28 | 1980-09-03 | Fuji Photo Film Co Ltd | Treatment of plate |
JPS5630129A (en) * | 1979-08-21 | 1981-03-26 | Agency Of Ind Science & Technol | Manufacture of photomask |
DE3150637C2 (en) * | 1981-12-21 | 1983-11-10 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Etching solution for etching photopolymer films and method for point etching |
JPS59154442A (en) * | 1983-02-22 | 1984-09-03 | Oji Paper Co Ltd | Photosensitive film for forming picture image |
JPS62231245A (en) * | 1986-03-31 | 1987-10-09 | Nippon Zeon Co Ltd | Photosensitive polymer composition |
JPH01282543A (en) * | 1988-05-09 | 1989-11-14 | Fuji Photo Film Co Ltd | Picture forming material |
US5372437A (en) * | 1992-04-24 | 1994-12-13 | Citizen Watch Co., Ltd. | Print head of wire-dot printer and production method thereof |
JP2003107697A (en) * | 2001-09-28 | 2003-04-09 | Fuji Photo Film Co Ltd | Photosensitive transfer material, photomask material, photomask and method for manufacturing the photomask |
JP5203575B2 (en) * | 2005-05-04 | 2013-06-05 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Coating composition |
JP4820640B2 (en) * | 2005-12-20 | 2011-11-24 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
JP4979368B2 (en) * | 2005-12-27 | 2012-07-18 | 関西ペイント株式会社 | Active energy ray-curable resin composition and resist pattern forming method |
TW202313715A (en) * | 2015-03-30 | 2023-04-01 | 日商富士軟片股份有限公司 | Coloring photosensitive composition, cured film, pattern forming method, infrared blocking filter with light shielding film, solid-state imaging element, image display device and infrared sensor |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE525225A (en) * | 1951-08-20 | |||
US3149975A (en) * | 1962-07-06 | 1964-09-22 | Du Pont | Photopolymerizable compositions and elements |
US3380831A (en) * | 1964-05-26 | 1968-04-30 | Du Pont | Photopolymerizable compositions and elements |
US3353955A (en) * | 1964-06-16 | 1967-11-21 | Du Pont | Stratum transfer process based on adhesive properties of photopolymerizable layer |
US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
US3698904A (en) * | 1969-07-23 | 1972-10-17 | Asahi Chemical Ind | Composition for developing photopolymerizable lithographic plate elements comprising a developer base agent,an ink-receptivity-affording agent and a desensitizer |
BE759041A (en) * | 1969-11-18 | 1971-05-17 | Du Pont | PHOTOPOLYMERISABLE COMPOSITIONS CONTAINING AMINOPHENYLCETONES AND ADJUVANTS |
CA993709A (en) * | 1971-01-21 | 1976-07-27 | Leo Roos | Composite, mask-forming photohardenable elements |
BE787932A (en) * | 1971-09-13 | 1973-02-26 | Bristol Myers Co | PRODUCTS SUCH AS BUFFERS, FOR CLEANING OR OTHER USES AND LIQUID COMPOSITIONS FOR PREPARING THESE PRODUCTS |
JPS4877438A (en) * | 1972-01-19 | 1973-10-18 | ||
JPS4893337A (en) * | 1972-03-11 | 1973-12-03 | ||
BE788560A (en) * | 1972-06-09 | 1973-03-08 | Du Pont | PROTECTION AGAINST HALO IN IMAGE FORMING IN MULTI-LAYER PHOTOPOLYMERS |
JPS51139041A (en) * | 1975-05-23 | 1976-12-01 | Kayaba Industry Co Ltd | Disk brake for eccentric retention suspension mechanism |
DE2660921C3 (en) * | 1975-11-17 | 1987-07-30 | E.I. Du Pont De Nemours And Co., Wilmington, Del. | Method for producing point-etched masks |
-
1976
- 1976-11-13 DE DE2660921A patent/DE2660921C3/en not_active Expired
- 1976-11-13 DE DE2660103A patent/DE2660103C3/en not_active Expired
- 1976-11-13 DE DE2651864A patent/DE2651864C3/en not_active Expired
- 1976-11-16 AU AU19666/76A patent/AU506292B2/en not_active Expired
- 1976-11-17 GB GB47954/76A patent/GB1548439A/en not_active Expired
- 1976-11-17 FR FR7634572A patent/FR2331813A1/en active Granted
- 1976-11-17 BR BR7607672A patent/BR7607672A/en unknown
- 1976-11-17 BE BE172416A patent/BE848409A/en not_active IP Right Cessation
- 1976-11-17 CA CA265,899A patent/CA1079565A/en not_active Expired
- 1976-11-17 JP JP51139041A patent/JPS5262427A/en active Granted
-
1980
- 1980-06-06 JP JP7653880A patent/JPS5638047A/en active Pending
- 1980-06-06 JP JP7653980A patent/JPS5638046A/en active Pending
-
1981
- 1981-07-10 JP JP56108067A patent/JPS5762048A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4515877A (en) * | 1982-11-27 | 1985-05-07 | Basf Aktiengesellschaft | Image-recording materials and image-recording carried out using these to produce an optical mask |
Also Published As
Publication number | Publication date |
---|---|
AU506292B2 (en) | 1979-12-20 |
AU1966676A (en) | 1978-05-25 |
JPS6132661B2 (en) | 1986-07-28 |
JPS5262427A (en) | 1977-05-23 |
BR7607672A (en) | 1977-09-27 |
DE2660103B1 (en) | 1981-02-12 |
JPS5762048A (en) | 1982-04-14 |
DE2651864B2 (en) | 1980-02-07 |
DE2660921A1 (en) | 1984-07-19 |
DE2660921C3 (en) | 1987-07-30 |
DE2651864A1 (en) | 1977-05-18 |
DE2651864C3 (en) | 1987-09-10 |
BE848409A (en) | 1977-05-17 |
FR2331813A1 (en) | 1977-06-10 |
FR2331813B1 (en) | 1981-10-02 |
JPS5638047A (en) | 1981-04-13 |
CA1079565A (en) | 1980-06-17 |
DE2660103C3 (en) | 1987-10-22 |
JPS5722372B2 (en) | 1982-05-12 |
JPS5638046A (en) | 1981-04-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PE20 | Patent expired after termination of 20 years |
Effective date: 19961116 |