GB1532146A - Semiconductor junction - Google Patents
Semiconductor junctionInfo
- Publication number
- GB1532146A GB1532146A GB20469/77A GB2046977A GB1532146A GB 1532146 A GB1532146 A GB 1532146A GB 20469/77 A GB20469/77 A GB 20469/77A GB 2046977 A GB2046977 A GB 2046977A GB 1532146 A GB1532146 A GB 1532146A
- Authority
- GB
- United Kingdom
- Prior art keywords
- region
- layer
- regions
- semiconductor junction
- junction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 230000000593 degrading effect Effects 0.000 abstract 1
- 238000005468 ion implantation Methods 0.000 abstract 1
- 238000011084 recovery Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
- H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/36—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the concentration or distribution of impurities in the bulk material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- High Energy & Nuclear Physics (AREA)
- Ceramic Engineering (AREA)
- Toxicology (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Bipolar Transistors (AREA)
Abstract
1532146 Semiconductor devices CALIFORNIA LINEAR CIRCUITS Inc 16 May 1977 20469/77 Heading H1K A PN junction, e.g. for a clamping diode, having improved forward and reverse recovery times achieved without degrading the steady state reverse current characteristics is formed between a highly doped P<SP>+</SP> (or N<SP>+</SP>) region 32 and a lightly doped N(P) region 30 by the provision between regions 30, 32 of a thin P(N) layer 34 having a doping level intermediate between those of the regions 30 and 32. The thickness of the layer 34 (preferably 50-200Š) is of the same order as that of the depletion region under forward bias. The layer 34 and the region 32 are preferably formed by ion implantation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB20469/77A GB1532146A (en) | 1977-05-16 | 1977-05-16 | Semiconductor junction |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB20469/77A GB1532146A (en) | 1977-05-16 | 1977-05-16 | Semiconductor junction |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1532146A true GB1532146A (en) | 1978-11-15 |
Family
ID=10146451
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB20469/77A Expired GB1532146A (en) | 1977-05-16 | 1977-05-16 | Semiconductor junction |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1532146A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1787318A2 (en) * | 2004-08-10 | 2007-05-23 | Wafermasters, Incorporated | Method of forming ultra shallow junctions |
-
1977
- 1977-05-16 GB GB20469/77A patent/GB1532146A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1787318A2 (en) * | 2004-08-10 | 2007-05-23 | Wafermasters, Incorporated | Method of forming ultra shallow junctions |
EP1787318A4 (en) * | 2004-08-10 | 2008-10-01 | Wafermasters Inc | Method of forming ultra shallow junctions |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1521518A (en) | Semiconductor structures and methods of making them | |
WO2002049114A3 (en) | High withstand voltage semiconductor device | |
GB1347874A (en) | Semiconductor devices of compound semiconductor material | |
ES8605126A1 (en) | Semiconductor overvoltage suppressor with accurately determined striking potential | |
GB1530010A (en) | Highfrequency transistors | |
SE8007199L (en) | Zener diode | |
JPS5618456A (en) | Substrate potential generator | |
GB1532146A (en) | Semiconductor junction | |
JPS55111171A (en) | Field-effect semiconductor device | |
GB1457909A (en) | Method for producing a semiconductor component protected against excess voltages | |
EP0162165A3 (en) | A Hall effect device and method for fabricating such a device | |
GB988264A (en) | Semi-conductor device with self-protection against overvoltage | |
JPS5778171A (en) | Thyristor | |
JPS5588372A (en) | Lateral type transistor | |
SE7707251L (en) | SEMICONDUCTOR CIRCUIT DIP | |
JPS641284A (en) | Zener diode | |
JPS5750463A (en) | Complementary type mos semiconductor device | |
JPS52127190A (en) | Semiconductor laser device | |
JPS56135965A (en) | Semiconductor device | |
JPS6442858A (en) | Metal semiconductor junction diode and manufacture thereof | |
JPS55103773A (en) | Semiconductor device | |
FR2308207A1 (en) | Semiconductor diode for rectifier or radiation source - has forward bias volts reduced by having NPN or PNP structure of given doping | |
JPS55145373A (en) | Fabricating method of semiconductor device | |
JPS5731183A (en) | Compound semiconductor avalanche photodiode | |
JPS5612779A (en) | Zener diode |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |