GB1501194A - Photoresist process - Google Patents

Photoresist process

Info

Publication number
GB1501194A
GB1501194A GB2187875A GB2187875A GB1501194A GB 1501194 A GB1501194 A GB 1501194A GB 2187875 A GB2187875 A GB 2187875A GB 2187875 A GB2187875 A GB 2187875A GB 1501194 A GB1501194 A GB 1501194A
Authority
GB
United Kingdom
Prior art keywords
resist
soluble
hydrogen ions
substrate
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2187875A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1501194A publication Critical patent/GB1501194A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

1501194 Developing photo-resists INTERNATIONAL BUSINESS MACHINES CORP 21 May 1975 [6 June 1974] 21878/75 Heading G2C A resist comprising a base soluble resin and a quinone diazide sensitizer is imagewise exposed, treated with hydrogen ions and then developed in an alkaline solution. The resist, which is normally positive working, is rendered negative working by giving it a blanket exposure subsequent to the hydrogen ion treatment. In this process the areas which become alkaline soluble during the first exposure are rendered less soluble by the hydrogen ions. The blanket exposure renders the initially unexposed areas more soluble and these are then removed during alkaline development. In an alternative process the blanket exposure is omitted and the resist, which is coated on a substrate, remains positive working. The developed relief image and uncovered substrate are coated with a metal e.g. aluminium, and the resist and overlying aluminium are lifted off using acetone, to leave the metal patterned substrate. The hydrogen ion treatment provides an improved resist profile. The resin and sensitizer are preferably a phenol-formaldehyde resin and a 2, 3, 4-trihydroxy benzophenone ester of 1-oxo-2-diazo-naphthalene- 5-sulphonic acid respectively. The hydrogen ions are provided by a mineral acid e.g. HCl or H2SO4.
GB2187875A 1974-06-06 1975-05-21 Photoresist process Expired GB1501194A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US47683174A 1974-06-06 1974-06-06

Publications (1)

Publication Number Publication Date
GB1501194A true GB1501194A (en) 1978-02-15

Family

ID=23893432

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2187875A Expired GB1501194A (en) 1974-06-06 1975-05-21 Photoresist process

Country Status (4)

Country Link
JP (1) JPS5857097B2 (en)
DE (1) DE2521727A1 (en)
FR (1) FR2274072A1 (en)
GB (1) GB1501194A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2171530A (en) * 1985-02-27 1986-08-28 Imtec Products Inc Method for image enhancement in positive photoresist by vapor diffusion image reversal
GB2224362A (en) * 1988-11-01 1990-05-02 Yamatoya Shokai A process and apparatus for the formation of reversal images

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4377633A (en) * 1981-08-24 1983-03-22 International Business Machines Corporation Methods of simultaneous contact and metal lithography patterning
JPS6291938A (en) * 1985-10-18 1987-04-27 Fuji Photo Film Co Ltd Photoengraving method
JPS62152377A (en) * 1985-12-24 1987-07-07 Taga Denki Kk Drive-controlling method for ultrasonic wave vibrator
JPS62114478A (en) * 1985-11-11 1987-05-26 Taga Denki Kk Ultrasonic vibrator and control method for drive thereof
JPS62126874A (en) * 1985-11-27 1987-06-09 Taga Denki Kk Ultrasonic vibrator and drive controlling method thereof
JPS62152378A (en) * 1985-12-24 1987-07-07 Taga Denki Kk Ultrasonic wave vibrator and its drive-controlling method
JPS62171473A (en) * 1986-01-23 1987-07-28 Taga Denki Kk Ultrasonic wave vibrator
JPS62141980A (en) * 1985-12-16 1987-06-25 Taga Denki Kk Ultrasonic vibrator and drive controlling method thereof
JPS63110980A (en) * 1986-10-28 1988-05-16 Taga Electric Co Ltd Driving of ultrasonic motor
JPH0727220B2 (en) * 1988-03-08 1995-03-29 三洋電機株式会社 Pattern formation method
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1058845B (en) * 1958-02-11 1959-06-04 Kalle & Co Ag Process for the production of copies, especially printing forms, with the aid of water-insoluble diazo compounds
DE1224147B (en) * 1963-08-23 1966-09-01 Kalle Ag Process for the reverse development of copying layers containing diazo compounds
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2171530A (en) * 1985-02-27 1986-08-28 Imtec Products Inc Method for image enhancement in positive photoresist by vapor diffusion image reversal
GB2171530B (en) * 1985-02-27 1989-06-28 Imtec Products Inc Method of producing reversed photoresist images by vapour diffusion
GB2224362A (en) * 1988-11-01 1990-05-02 Yamatoya Shokai A process and apparatus for the formation of reversal images
GB2224362B (en) * 1988-11-01 1993-05-19 Yamatoya Shokai A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser

Also Published As

Publication number Publication date
JPS513633A (en) 1976-01-13
FR2274072A1 (en) 1976-01-02
DE2521727A1 (en) 1975-12-18
FR2274072B1 (en) 1982-02-05
JPS5857097B2 (en) 1983-12-19

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee