GB1501128A - Development-free driographic printing plate - Google Patents

Development-free driographic printing plate

Info

Publication number
GB1501128A
GB1501128A GB1901475A GB1901475A GB1501128A GB 1501128 A GB1501128 A GB 1501128A GB 1901475 A GB1901475 A GB 1901475A GB 1901475 A GB1901475 A GB 1901475A GB 1501128 A GB1501128 A GB 1501128A
Authority
GB
United Kingdom
Prior art keywords
printing plate
cnf2n
formula
anion
driographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1901475A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Priority to GB1901475A priority Critical patent/GB1501128A/en
Publication of GB1501128A publication Critical patent/GB1501128A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Abstract

1501128 Driographic printing plate precursor MINNESOTA MINING & Mfg CO 6 May 1975 19014/75 Heading G2C A photo-sensitive material, especially a driographic printing plate precursor, comprises a substrate coated with a light-sensitive composition containing a diazonium salt having an aromatic diazonium cation and the anion of a perfluoroaliphatic acid or salt containing at least 3 carbon atoms in the perfluoroalkyl group, for example an anion of the Formula (CnF2n + 1SO2)2 CR<-> where R is hydrogen, alkyl of up to 4 carbons, halogen or CnF2 n+1 SO2 and n is 4, 6 or 8, of the Formula CnF2n+1 SO3<-> where n is 4, 6 or 8 or of the Formula CnF2n + CO2<-> where n is 3, 5, 7 or 9. The composition may contain a polymeric binder. Exposure of the material gives, without processing, a printing plate having adhesive areas to which printing ink will not adhere and which is used without a fountain solution. Depending on the solvent used in coating the light-sensitive composition, a negative-working or positive-working plate is obtained.
GB1901475A 1975-05-06 1975-05-06 Development-free driographic printing plate Expired GB1501128A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1901475A GB1501128A (en) 1975-05-06 1975-05-06 Development-free driographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1901475A GB1501128A (en) 1975-05-06 1975-05-06 Development-free driographic printing plate

Publications (1)

Publication Number Publication Date
GB1501128A true GB1501128A (en) 1978-02-15

Family

ID=10122326

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1901475A Expired GB1501128A (en) 1975-05-06 1975-05-06 Development-free driographic printing plate

Country Status (1)

Country Link
GB (1) GB1501128A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0069978A2 (en) * 1981-07-09 1983-01-19 Nippon Paint Co., Ltd. Lithographic printing plate and its preparation
US4724195A (en) * 1984-06-08 1988-02-09 Hoechst Aktiengesellschaft Perfluoroalkyl group-containing copolymers and reproduction layers produced therefrom
GB2199415A (en) * 1986-11-26 1988-07-06 Fuji Photo Film Co Ltd Dry photosensitive lithographic plate
US4839256A (en) * 1984-06-08 1989-06-13 Hoechst Aktiengesellschaft Perfluoroalkyl group-containing 1,2-napthoquinone daizide compounds and reproduction materials produced therefrom
US5006443A (en) * 1984-06-08 1991-04-09 Hoechst Aktiengesellschaft Radiation sensitive reproduction composition and element with perfluoroalkyl group containing polymer
US5085975A (en) * 1984-06-08 1992-02-04 Hoechst Aktiengesellschaft Radiation sensitive composition utilizing ethylenically unsaturated perfluoroalkyl group-containing compounds and reproduction layers produced therefrom
US8709542B2 (en) 2006-12-19 2014-04-29 Commissariat A L'energie Atomique Method for preparing an organic film at the surface of solid support under non-electrochemical conditions, solid support thus obtained and preparation kit
US9725602B2 (en) 2006-12-19 2017-08-08 Commissariat A L'energie Atomique Et Aux Energies Alternatives Method for preparing an organic film at the surface of a solid support under non-electrochemical conditions, solid support thus obtained and preparation kit

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0069978A2 (en) * 1981-07-09 1983-01-19 Nippon Paint Co., Ltd. Lithographic printing plate and its preparation
EP0069978A3 (en) * 1981-07-09 1983-06-22 Nippon Paint Company, Ltd Lithographic printing plate and its preparation
US4724195A (en) * 1984-06-08 1988-02-09 Hoechst Aktiengesellschaft Perfluoroalkyl group-containing copolymers and reproduction layers produced therefrom
US4839256A (en) * 1984-06-08 1989-06-13 Hoechst Aktiengesellschaft Perfluoroalkyl group-containing 1,2-napthoquinone daizide compounds and reproduction materials produced therefrom
US4853448A (en) * 1984-06-08 1989-08-01 Hoechst Aktiengesellschaft Perfluoroalkyl group-containing copolymers
US5006443A (en) * 1984-06-08 1991-04-09 Hoechst Aktiengesellschaft Radiation sensitive reproduction composition and element with perfluoroalkyl group containing polymer
US5085975A (en) * 1984-06-08 1992-02-04 Hoechst Aktiengesellschaft Radiation sensitive composition utilizing ethylenically unsaturated perfluoroalkyl group-containing compounds and reproduction layers produced therefrom
GB2199415A (en) * 1986-11-26 1988-07-06 Fuji Photo Film Co Ltd Dry photosensitive lithographic plate
US4861698A (en) * 1986-11-26 1989-08-29 Fuji Photo Film Co., Ltd. Photosensitive lithographic plate using no dampening water
GB2199415B (en) * 1986-11-26 1990-04-25 Fuji Photo Film Co Ltd Photosensitive lithographic plate
US8709542B2 (en) 2006-12-19 2014-04-29 Commissariat A L'energie Atomique Method for preparing an organic film at the surface of solid support under non-electrochemical conditions, solid support thus obtained and preparation kit
US9725602B2 (en) 2006-12-19 2017-08-08 Commissariat A L'energie Atomique Et Aux Energies Alternatives Method for preparing an organic film at the surface of a solid support under non-electrochemical conditions, solid support thus obtained and preparation kit

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Legal Events

Date Code Title Description
PS Patent sealed
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee