GB1494149A - Integrated circuits - Google Patents
Integrated circuitsInfo
- Publication number
- GB1494149A GB1494149A GB49938/75A GB4993875A GB1494149A GB 1494149 A GB1494149 A GB 1494149A GB 49938/75 A GB49938/75 A GB 49938/75A GB 4993875 A GB4993875 A GB 4993875A GB 1494149 A GB1494149 A GB 1494149A
- Authority
- GB
- United Kingdom
- Prior art keywords
- zone
- emitter
- diffusing
- impurity
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012535 impurity Substances 0.000 abstract 4
- 238000000151 deposition Methods 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 238000002513 implantation Methods 0.000 abstract 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/732—Vertical transistors
- H01L29/7327—Inverse vertical transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/2205—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities from the substrate during epitaxy, e.g. autodoping; Preventing or using autodoping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
Abstract
1494149 Integrated circuits SIEMENS AG 5 Dec 1975 [19 Feb 1975] 49938/75 Heading H1K In an integrated circuit comprising an inversely operated transistor as shown in Fig. 2, of which the zone conductivity types may be reversed, the emitter zone consists essentially of a buried zone 3 and a similarly heavily doped zone 15 of the same conductivity type extending upwards through epitaxial layer 2 towards base zone 6. The structure shown, which is an I<SP>2</SP>L transistor, the base of which is fed with current by injector zone 8, may be formed by first implanting or diffusing a slow diffusing impurity, e.g. Sb or As, into an area 3 of P-type substrate 1, similarly introducing a faster diffusing impurity, e.g. As or P, or a higher concentration of the same impurity into area 15 within zone 3, then epitaxially depositing layer 2 and forming by diffusion or implantation first emitter connection zone 4, then base zone 6 and injector zone 8 and finally collector zone 7, the impurities in areas 3 and 15 diffusing further in these later steps to produce the pedestal emitter structure shown. The provision of zone 15 improves the emitter efficiency and reduces emitter capacitance.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2507038A DE2507038C3 (en) | 1975-02-19 | 1975-02-19 | Inverse planar transistor and process for its manufacture |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1494149A true GB1494149A (en) | 1977-12-07 |
Family
ID=5939232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB49938/75A Expired GB1494149A (en) | 1975-02-19 | 1975-12-05 | Integrated circuits |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS51107779A (en) |
DE (1) | DE2507038C3 (en) |
FR (1) | FR2301925A1 (en) |
GB (1) | GB1494149A (en) |
IT (1) | IT1055197B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2532608C2 (en) * | 1975-07-22 | 1982-09-02 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Planar diffusion process for manufacturing a monolithic integrated circuit |
DE2554426C3 (en) * | 1975-12-03 | 1979-06-21 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Process for generating a locally high inverse current gain in a planar transistor and an inversely operated transistor produced according to this process |
JPS5385182A (en) * | 1977-01-05 | 1978-07-27 | Hitachi Ltd | Iil type semiconductor device |
JPS55111159A (en) * | 1979-02-20 | 1980-08-27 | Fuji Electric Co Ltd | Semiconductor integrated circuit |
JPS564275A (en) * | 1979-06-25 | 1981-01-17 | Fujitsu Ltd | Semiconductor device |
JPS6031107B2 (en) * | 1981-01-09 | 1985-07-20 | 株式会社日立製作所 | Semiconductor integrated circuit device |
JPS59158554A (en) * | 1983-02-27 | 1984-09-08 | Rohm Co Ltd | Transistor |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4926752A (en) * | 1972-07-06 | 1974-03-09 | ||
JPS5720711B2 (en) * | 1974-07-09 | 1982-04-30 | ||
JPS5837699B2 (en) * | 1974-12-16 | 1983-08-18 | 三菱電機株式会社 | handmade takiokusouchi |
-
1975
- 1975-02-19 DE DE2507038A patent/DE2507038C3/en not_active Expired
- 1975-12-05 GB GB49938/75A patent/GB1494149A/en not_active Expired
-
1976
- 1976-02-10 FR FR7603630A patent/FR2301925A1/en active Granted
- 1976-02-11 IT IT20065/76A patent/IT1055197B/en active
- 1976-02-18 JP JP51016882A patent/JPS51107779A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE2507038A1 (en) | 1976-09-02 |
IT1055197B (en) | 1981-12-21 |
FR2301925B1 (en) | 1982-03-19 |
JPS51107779A (en) | 1976-09-24 |
DE2507038C3 (en) | 1980-01-24 |
DE2507038B2 (en) | 1979-05-23 |
FR2301925A1 (en) | 1976-09-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |