GB1493833A - Photosensitive films - Google Patents

Photosensitive films

Info

Publication number
GB1493833A
GB1493833A GB45826/74A GB4582674A GB1493833A GB 1493833 A GB1493833 A GB 1493833A GB 45826/74 A GB45826/74 A GB 45826/74A GB 4582674 A GB4582674 A GB 4582674A GB 1493833 A GB1493833 A GB 1493833A
Authority
GB
United Kingdom
Prior art keywords
photo
sensitive
layer
oct
polyester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB45826/74A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Publication of GB1493833A publication Critical patent/GB1493833A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094Multilayer resist systems, e.g. planarising layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0562Details of resist
    • H05K2203/0577Double layer of resist having the same pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0562Details of resist
    • H05K2203/0585Second resist used as mask for selective stripping of first resist

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)

Abstract

1493833 Photographic stripping films SHIPLEY CO Inc 23 Oct 1974 [25 Oct 1973] 45826/74 Heading G2C A photo-sensitive stripping film comprising a photo-resist layer having a flexible sheet releasably adhered to one side and a non-photo-sensitive layer securely adhered to the other side; the two layers being developable by the same developer. The film is preferably laminated to a permanent support via the non-photo-sensitive layer. In the Examples, a photo-resist layer of a naphthoquinone diazide and a novolak is coated on a polyester stripping film or a paper release sheet, then overcoated with a layer of a mixture of a phenolformaldehyde resin, polyvinyl methyl ether and an acrylic resin. This non-sensitive layer is laminated to a copper-clad circuit board, imagewise exposed, the polyester or paper layer stripped off and developed with alkali to remove both sensitive and non- sensitive layers followed by etching to produce a printed circuit. Printed circuits using 2-developers are disclosed in Specification 1493834. Other photo-resists such as polyvinylazidophthalate, photo-sensitive cinnamate polymers and bichromated colloids may be used.
GB45826/74A 1973-10-25 1974-10-23 Photosensitive films Expired GB1493833A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40964673A 1973-10-25 1973-10-25

Publications (1)

Publication Number Publication Date
GB1493833A true GB1493833A (en) 1977-11-30

Family

ID=23621393

Family Applications (2)

Application Number Title Priority Date Filing Date
GB45826/74A Expired GB1493833A (en) 1973-10-25 1974-10-23 Photosensitive films
GB30114/77A Expired GB1493834A (en) 1973-10-25 1974-10-23 Method of making a printed circuit

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB30114/77A Expired GB1493834A (en) 1973-10-25 1974-10-23 Method of making a printed circuit

Country Status (13)

Country Link
JP (1) JPS5529426B2 (en)
AU (1) AU466665B2 (en)
BE (1) BE821421A (en)
BR (1) BR7408768D0 (en)
CA (1) CA1051707A (en)
DE (1) DE2450380C2 (en)
ES (2) ES431310A1 (en)
FR (1) FR2249364B1 (en)
GB (2) GB1493833A (en)
IT (1) IT1025144B (en)
NL (1) NL7413916A (en)
SE (1) SE422631B (en)
ZA (1) ZA746683B (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0091651A2 (en) * 1982-04-12 1983-10-19 Nippon Telegraph And Telephone Corporation Method for forming micropattern
EP0110145A2 (en) * 1982-11-01 1984-06-13 E.I. Du Pont De Nemours And Company Single exposure positive contact litho film
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
US4756988A (en) * 1982-09-29 1988-07-12 Minnesota Mining And Manufacturing Company Multilayer dry-film negative-acting photoresist
US4983500A (en) * 1987-10-30 1991-01-08 Hitachi, Ltd. Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer
US4985344A (en) * 1986-07-04 1991-01-15 Hitachi, Ltd. Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4316951A (en) 1975-06-03 1982-02-23 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4191572A (en) 1975-06-03 1980-03-04 E. I. Du Pont De Nemours And Company Process for image reproduction using multilayer photosensitive element with solvent-soluble layer
DE2660951C2 (en) * 1975-06-03 1986-08-07 E.I. Du Pont De Nemours And Co., Wilmington, Del. Multi-layer photosensitive material
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
JPS55501072A (en) * 1978-12-25 1980-12-04
US4357416A (en) 1980-04-21 1982-11-02 E. I. Du Pont De Nemours And Company Process for preparation of multilayer photosensitive solvent-processable litho element
DE3036710A1 (en) * 1980-09-29 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Photolacquer structure with photoresist layer - is on deep UV or electron positive resist
JPH0612452B2 (en) * 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド Method of manufacturing integrated circuit device
GB8418938D0 (en) * 1984-07-25 1984-08-30 Davies Bros Ltd Image on substrate
US4815800A (en) * 1984-12-21 1989-03-28 Hughes Aircraft Company Flare reduction in holograms
US4687720A (en) * 1984-12-21 1987-08-18 Hughes Aircraft Company Side lobe suppression in holograms using pre-exposure
US4799746A (en) * 1985-02-27 1989-01-24 Hughes Aircraft Company Efficient holograms and method for making same
US4854674A (en) * 1985-02-27 1989-08-08 Hughes Aircraft Company Process for improving holographic efficiency
CA1337864C (en) * 1988-03-28 1996-01-02 Isao Kobayashi Electrodeposition coating process of photoresist for printed circuit board
EP0433720A3 (en) * 1989-12-22 1992-08-26 Siemens Aktiengesellschaft Method of applying a solder stop coating on printed circuit boards
JP2004140313A (en) * 2002-08-22 2004-05-13 Jsr Corp Method for forming bump on electrode pad using bilayer multilayer film
CN112980410B (en) * 2021-02-25 2022-09-13 山东滨州昱诚化工科技有限公司 Temporary plugging agent for oil field and preparation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE711043C (en) * 1935-08-09 1941-09-25 Bekk & Kaulen Chem Fab G M B H Process for producing planographic printing forms by projecting screened images
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0091651A2 (en) * 1982-04-12 1983-10-19 Nippon Telegraph And Telephone Corporation Method for forming micropattern
EP0091651A3 (en) * 1982-04-12 1984-10-17 Nippon Telegraph And Telephone Public Corporation Method for forming micropattern
US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
US4756988A (en) * 1982-09-29 1988-07-12 Minnesota Mining And Manufacturing Company Multilayer dry-film negative-acting photoresist
EP0110145A2 (en) * 1982-11-01 1984-06-13 E.I. Du Pont De Nemours And Company Single exposure positive contact litho film
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
EP0110145A3 (en) * 1982-11-01 1986-06-11 E.I. Du Pont De Nemours And Company Single exposure positive contact litho film
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4985344A (en) * 1986-07-04 1991-01-15 Hitachi, Ltd. Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer
US4983500A (en) * 1987-10-30 1991-01-08 Hitachi, Ltd. Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer

Also Published As

Publication number Publication date
BR7408768D0 (en) 1975-08-05
AU466665B2 (en) 1975-11-06
JPS5529426B2 (en) 1980-08-04
DE2450380A1 (en) 1975-05-07
ZA746683B (en) 1975-11-26
FR2249364B1 (en) 1982-04-23
GB1493834A (en) 1977-11-30
ES448212A1 (en) 1977-12-01
SE422631B (en) 1982-03-15
DE2450380C2 (en) 1984-10-11
FR2249364A1 (en) 1975-05-23
SE7412818L (en) 1975-04-28
CA1051707A (en) 1979-04-03
AU7446074A (en) 1975-11-06
ES431310A1 (en) 1977-04-16
JPS5072704A (en) 1975-06-16
BE821421A (en) 1975-04-24
NL7413916A (en) 1975-04-29
IT1025144B (en) 1978-08-10

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee