GB1484061A - Radiation sensitive composition - Google Patents

Radiation sensitive composition

Info

Publication number
GB1484061A
GB1484061A GB4136274A GB4136274A GB1484061A GB 1484061 A GB1484061 A GB 1484061A GB 4136274 A GB4136274 A GB 4136274A GB 4136274 A GB4136274 A GB 4136274A GB 1484061 A GB1484061 A GB 1484061A
Authority
GB
United Kingdom
Prior art keywords
norbornene
radiation
polymer
sensitive
carboxylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4136274A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Publication of GB1484061A publication Critical patent/GB1484061A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
    • C08G61/08—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds of carbocyclic compounds containing one or more carbon-to-carbon double bonds in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Abstract

1484061 Radiation-sensitive compositions of ring-opened polymers JAPAN SYNTHETIC RUBBER CO Ltd 23 Sept 1974 [27 Sept 1973] 41362/74 Heading C3P [Also in Division G2] Radiation-sensitive compositions comprise a ring-opened polymer of a norbornene derivative having at least one ester, nitrile, carboxyl, amide, imide, hydroxyl or carboxylic acid anhydride group or halogen atom substituent, or a hydrolysis product of the polymer; and a radiation-sensitive cross-linking agent or radiation sensitizer. The polymer may be a homopolymer or copolymer of one or more of said norbornene derivatives and may also include units derived from a cycloolefin other than cyclohexene. Radiation-sensitive azides are preferred as cross-linking agent. In examples the ring-opened polymer is derived from (1) methyl 5 - norbornene - 2 - carboxylate, (2) methyl 5-norbornene-2-carboxylate and 5-norbornene-2-nitrile, (3) N,N-dimethyl-5-norbornene 2-carboxylic acid amide, (4) dimethyl 5- norbornene-2,3-dicarboxylate, (5) the free acid form of polymer (1) obtained by acid hydrolysis, (6) methyl 5-norbornene-2-carboxylate and cyclopentane and (7) 5-norbornene-2-3-dicarboxylic acid anhydride and cyclo-octene. The compositions are suitably applied as a thin film to a metal plate or silicon wafer, imagewise exposed to radiation such as light or an electron beam, and developed with a solvent to produce resist images which have applications in printed circuits, name plates, integrated circuits and plate-making.
GB4136274A 1973-09-27 1974-09-23 Radiation sensitive composition Expired GB1484061A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10875373A JPS5628257B2 (en) 1973-09-27 1973-09-27

Publications (1)

Publication Number Publication Date
GB1484061A true GB1484061A (en) 1977-08-24

Family

ID=14492620

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4136274A Expired GB1484061A (en) 1973-09-27 1974-09-23 Radiation sensitive composition

Country Status (3)

Country Link
JP (1) JPS5628257B2 (en)
DE (1) DE2445395A1 (en)
GB (1) GB1484061A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1031879A1 (en) * 1999-02-25 2000-08-30 Shin-Etsu Chemical Co., Ltd. Novel ester compounds, polymers, resist compositions and patterning process
US6291131B1 (en) 1998-08-26 2001-09-18 Hyundai Electronics Industries Co., Ltd. Monomers for photoresist, polymers thereof, and photoresist compositions using the same
US6312865B1 (en) 1997-12-31 2001-11-06 Hyundai Electronics Industries Co., Ltd. Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
US6369181B1 (en) 1997-12-29 2002-04-09 Hyundai Electronics Industries Co., Ltd. Copolymer resin, preparation thereof, and photoresist using the same
US6391518B1 (en) 1998-07-27 2002-05-21 Hyundai Electronics Industries Co., Ltd. Polymers and photoresist compositions using the same
US6410670B1 (en) 1998-08-26 2002-06-25 Hyundai Electronics Industries Co., Ltd. Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
US6569971B2 (en) 1998-08-27 2003-05-27 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1489470A (en) * 1974-07-04 1977-10-19 Showa Denko Kk Norbornene polymers
US4440850A (en) * 1981-07-23 1984-04-03 Ciba-Geigy Corporation Photopolymerisation process with two exposures of a single layer
US4571375A (en) * 1983-10-24 1986-02-18 Benedikt George M Ring-opened polynorbornene negative photoresist with bisazide

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6369181B1 (en) 1997-12-29 2002-04-09 Hyundai Electronics Industries Co., Ltd. Copolymer resin, preparation thereof, and photoresist using the same
US6608158B2 (en) 1997-12-29 2003-08-19 Hyundai Electronics Industries Co., Ltd. Copolymer resin, preparation thereof, and photoresist using the same
US6312865B1 (en) 1997-12-31 2001-11-06 Hyundai Electronics Industries Co., Ltd. Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
US6632903B2 (en) 1997-12-31 2003-10-14 Hyundai Electronics Industries Co., Ltd. Polymer-containing photoresist, and process for manufacturing the same
US6391518B1 (en) 1998-07-27 2002-05-21 Hyundai Electronics Industries Co., Ltd. Polymers and photoresist compositions using the same
US6291131B1 (en) 1998-08-26 2001-09-18 Hyundai Electronics Industries Co., Ltd. Monomers for photoresist, polymers thereof, and photoresist compositions using the same
US6410670B1 (en) 1998-08-26 2002-06-25 Hyundai Electronics Industries Co., Ltd. Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
US6586619B2 (en) 1998-08-26 2003-07-01 Hyundai Electronics Industries Co., Ltd. Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
US6569971B2 (en) 1998-08-27 2003-05-27 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same
US6987155B2 (en) 1998-08-27 2006-01-17 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same
EP1031879A1 (en) * 1999-02-25 2000-08-30 Shin-Etsu Chemical Co., Ltd. Novel ester compounds, polymers, resist compositions and patterning process
US6284429B1 (en) 1999-02-25 2001-09-04 Shin-Etsu Chemical Co., Ltd. Ester compounds, polymers, resist compositions and patterning process

Also Published As

Publication number Publication date
JPS5628257B2 (en) 1981-06-30
JPS5060221A (en) 1975-05-24
DE2445395A1 (en) 1975-04-10

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Legal Events

Date Code Title Description
PS Patent sealed
746 Register noted 'licences of right' (sect. 46/1977)
PCNP Patent ceased through non-payment of renewal fee