GB1459626A - Manufacture of identically imaged resist layer on the opposite sides of a foil - Google Patents

Manufacture of identically imaged resist layer on the opposite sides of a foil

Info

Publication number
GB1459626A
GB1459626A GB2144274A GB2144274A GB1459626A GB 1459626 A GB1459626 A GB 1459626A GB 2144274 A GB2144274 A GB 2144274A GB 2144274 A GB2144274 A GB 2144274A GB 1459626 A GB1459626 A GB 1459626A
Authority
GB
United Kingdom
Prior art keywords
foil
masks
mask
photographic
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2144274A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of GB1459626A publication Critical patent/GB1459626A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

1459626 Coincident photographic resist images SIEMENS AG 15 May 1974 [29 June 1973] 21442/74 Heading G2X A foil carrying identically imaged resist layers on either side, which images are in precise register with each other, is made by (i) applying a photosensitive resist layer to each side of the foil, (ii) forming a first photographic mask corresponding to the desired image, (iii) arranging said first mask on an unexposed photo-sensitive mask material in a reproducibly fixed position, exposing the said mask material through the first mask and developing to form a second photographic mask and (iv) placing the foil between the first and second photographic masks, bringing them into the reproducibly fixed position, exposing each photo-sensitive resist layer through a respective one of said masks and developing said exposed resist layers. The masks and foil may be held together by vacuum during exposure. The masks and sensitive materials are maintained in a reproducibly fixed position by placing in a vacuum contacting printing apparatus comprising a pair of frames Figs. 1 and 3 whose relative positions are determined by locating stop pins 11 on the frame shown in Fig. 3 against the stops 5 on the frame shown in Fig. 1. The assembled frames holding the masks and sensitive material are evacuated via tube 7, the vacuum being contained by the endless rubber seal 4.
GB2144274A 1973-06-29 1974-05-15 Manufacture of identically imaged resist layer on the opposite sides of a foil Expired GB1459626A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732333284 DE2333284A1 (en) 1973-06-29 1973-06-29 Process for the production of congruent masking patterns on the opposite sides of a film

Publications (1)

Publication Number Publication Date
GB1459626A true GB1459626A (en) 1976-12-22

Family

ID=5885545

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2144274A Expired GB1459626A (en) 1973-06-29 1974-05-15 Manufacture of identically imaged resist layer on the opposite sides of a foil

Country Status (10)

Country Link
JP (1) JPS5037633A (en)
AU (1) AU6937074A (en)
BE (1) BE817050A (en)
DE (1) DE2333284A1 (en)
DK (1) DK335474A (en)
FR (1) FR2235398B1 (en)
GB (1) GB1459626A (en)
LU (1) LU70424A1 (en)
NL (1) NL7408155A (en)
ZA (1) ZA743242B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS539853A (en) * 1976-07-14 1978-01-28 Takayoshi Kanda Method of making metal mold for plastics reflector
JPS61108512A (en) * 1984-10-31 1986-05-27 Sumitomo Rubber Ind Ltd Mold for vulcanizing type

Also Published As

Publication number Publication date
AU6937074A (en) 1975-11-27
BE817050A (en) 1974-10-16
DK335474A (en) 1975-02-17
FR2235398B1 (en) 1977-10-07
NL7408155A (en) 1974-12-31
DE2333284A1 (en) 1975-01-23
ZA743242B (en) 1975-05-28
FR2235398A1 (en) 1975-01-24
JPS5037633A (en) 1975-04-08
LU70424A1 (en) 1974-10-17

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee