GB1440244A - Light sensitive composition - Google Patents

Light sensitive composition

Info

Publication number
GB1440244A
GB1440244A GB2785873A GB2785873A GB1440244A GB 1440244 A GB1440244 A GB 1440244A GB 2785873 A GB2785873 A GB 2785873A GB 2785873 A GB2785873 A GB 2785873A GB 1440244 A GB1440244 A GB 1440244A
Authority
GB
United Kingdom
Prior art keywords
resin
acrylic
resins
acrylic resin
diazide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2785873A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Publication of GB1440244A publication Critical patent/GB1440244A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1440244 Photo-resist materials SHIPLEY CO Inc 12 June 1973 [12 June 1972] 27858/73 Heading G2C A photo-resist material comprises between 2 and 20% of a light sensitive diazide and (a) a non- cross-linked carboxylcontaining acrylic resin alone, (b) the acrylic resin with another resin (or resins) other than a novolak resin; the acrylic resin being more than 50 wt. per cent of the resin component or (c) the acrylic resin with a novolak resin; the novolak resin being 1 to 90 wt. per cent of the resin component. Specified diazides are o-naphthoquinone diazide sulphonic acid esters and 3-diazide- 2, 4-diphenyl-3, 4-pyrrolenine Specification 816782. Preferred acrylic resins are terpolymers of alkyl acrylate/styrene/acrylic acid with 3-15% of carboxyl groups. Other resins which may be admixed with the acrylic resin are cellulose ethers, polyesters, polystyrenes, polyurethanes, spray resins and vinyl polymers.
GB2785873A 1972-06-12 1973-06-12 Light sensitive composition Expired GB1440244A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26198272A 1972-06-12 1972-06-12

Publications (1)

Publication Number Publication Date
GB1440244A true GB1440244A (en) 1976-06-23

Family

ID=22995688

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2785873A Expired GB1440244A (en) 1972-06-12 1973-06-12 Light sensitive composition

Country Status (6)

Country Link
JP (1) JPS5114042B2 (en)
BE (1) BE800708A (en)
DE (1) DE2329208A1 (en)
FR (1) FR2188193A1 (en)
GB (1) GB1440244A (en)
NL (1) NL7307936A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1400850A1 (en) * 2001-06-12 2004-03-24 Clariant International Ltd. Method of forming thick resist pattern
US6737212B1 (en) 1999-10-07 2004-05-18 Clariant Finance (Bvi) Limited Photosensitive composition

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2403054C2 (en) * 1972-07-27 1983-01-13 Hoechst Ag, 6000 Frankfurt Process for the production of a photosensitive recording material
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS57173941A (en) * 1981-04-21 1982-10-26 Oki Electric Ind Co Ltd Formation of positive type photo resist pattern
EP0302941B1 (en) * 1987-02-02 1993-12-29 Nippon Paint Co., Ltd. Positive photosensitive resin composition and process for its production
JP2593305B2 (en) * 1987-02-02 1997-03-26 日本ペイント株式会社 Positive photosensitive resin composition
DE69033938T2 (en) * 1989-12-01 2002-07-18 Tosoh Corp Positive working photosensitive compositions for the production of lenses

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6737212B1 (en) 1999-10-07 2004-05-18 Clariant Finance (Bvi) Limited Photosensitive composition
EP1400850A1 (en) * 2001-06-12 2004-03-24 Clariant International Ltd. Method of forming thick resist pattern
EP1400850A4 (en) * 2001-06-12 2006-06-07 Az Electronic Materials Usa Method of forming thick resist pattern

Also Published As

Publication number Publication date
FR2188193A1 (en) 1974-01-18
JPS5114042B2 (en) 1976-05-06
BE800708A (en) 1973-10-01
NL7307936A (en) 1973-12-14
JPS4957055A (en) 1974-06-03
DE2329208A1 (en) 1974-01-03

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee