GB1429622A - Vacuum coating apparatus - Google Patents

Vacuum coating apparatus

Info

Publication number
GB1429622A
GB1429622A GB552775A GB552775A GB1429622A GB 1429622 A GB1429622 A GB 1429622A GB 552775 A GB552775 A GB 552775A GB 552775 A GB552775 A GB 552775A GB 1429622 A GB1429622 A GB 1429622A
Authority
GB
United Kingdom
Prior art keywords
coating chamber
valve
substrate
door
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB552775A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1429622A publication Critical patent/GB1429622A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

1429622 Vapour deposition apparatus INTERNATIONAL BUSINESS MACHINES CORP 10 Feb 1975 [25 Feb 1974] 5527/75 Heading C7F Material, e.g. Cu or Cu-Al, is evaporated, e.g. by electron bombardment, from a source 10 on to a substrate, e.g. a semi-conductor, mounted in a rotatable holder 37 carried by a pivoted door 30 of the coating chamber. A valve 7 separates the coating chamber from the evaporation chamber and a movable shutter 21 prevents material from being deposited on the valve, when closed. The substrates are held by spring clips Fig. 2 (not shown). The coating chamber may be separately evacuated at 50 and argon or nitrogen may be supplied at 52, when the door 30 is open. The evaporation chamber may be closed by a valve 26. In a modification Fig. 3 (not shown) the door is mounted on an inclined wall of the coating chamber, so that the substrate is at an angle to the evaporant stream, and elements are provided to heat the substrate.
GB552775A 1974-02-25 1975-02-10 Vacuum coating apparatus Expired GB1429622A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US445199A US3921572A (en) 1974-02-25 1974-02-25 Vacuum coating apparatus

Publications (1)

Publication Number Publication Date
GB1429622A true GB1429622A (en) 1976-03-24

Family

ID=23767966

Family Applications (1)

Application Number Title Priority Date Filing Date
GB552775A Expired GB1429622A (en) 1974-02-25 1975-02-10 Vacuum coating apparatus

Country Status (5)

Country Link
US (1) US3921572A (en)
JP (1) JPS50116278A (en)
DE (1) DE2460989A1 (en)
FR (1) FR2262126B1 (en)
GB (1) GB1429622A (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4022939A (en) * 1975-12-18 1977-05-10 Western Electric Company, Inc. Synchronous shielding in vacuum deposition system
JPS5319565U (en) * 1976-07-29 1978-02-20
US4137865A (en) * 1976-12-30 1979-02-06 Bell Telephone Laboratories, Incorporated Molecular beam apparatus for processing a plurality of substrates
EP0008807A1 (en) * 1978-09-13 1980-03-19 Elektroschmelzwerk Kempten GmbH Apparatus and method for the discontinuous or continuous coating of articles or strips by vacuum evaporation
US4269137A (en) * 1979-03-19 1981-05-26 Xerox Corporation Pretreatment of substrates prior to thin film deposition
US4310614A (en) * 1979-03-19 1982-01-12 Xerox Corporation Method and apparatus for pretreating and depositing thin films on substrates
DE2940064A1 (en) * 1979-10-03 1981-04-16 Leybold-Heraeus GmbH, 5000 Köln VACUUM EVAPORATION SYSTEM WITH A VALVE CHAMBER, A STEAMING CHAMBER AND AN EVAPORATOR CHAMBER
US5024747A (en) * 1979-12-21 1991-06-18 Varian Associates, Inc. Wafer coating system
US4756815A (en) * 1979-12-21 1988-07-12 Varian Associates, Inc. Wafer coating system
US4478174A (en) * 1983-02-25 1984-10-23 Canadian Patents & Development Limited Vacuum coating vessel with movable shutter plate
US4592926A (en) * 1984-05-21 1986-06-03 Machine Technology, Inc. Processing apparatus and method
US4817556A (en) * 1987-05-04 1989-04-04 Varian Associates, Inc. Apparatus for retaining wafers
US5040484A (en) * 1987-05-04 1991-08-20 Varian Associates, Inc. Apparatus for retaining wafers
US5529634A (en) * 1992-12-28 1996-06-25 Kabushiki Kaisha Toshiba Apparatus and method of manufacturing semiconductor device
US6103069A (en) * 1997-03-31 2000-08-15 Applied Materials, Inc. Chamber design with isolation valve to preserve vacuum during maintenance
JP2007039785A (en) * 2005-07-04 2007-02-15 Seiko Epson Corp Vacuum evaporation apparatus and method of producing electro-optical device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2239642A (en) * 1936-05-27 1941-04-22 Bernhard Berghaus Coating of articles by means of cathode disintegration
US2420722A (en) * 1942-12-11 1947-05-20 Bausch & Lomb Apparatus for coating surfaces
US2932588A (en) * 1955-07-06 1960-04-12 English Electric Valve Co Ltd Methods of manufacturing thin films of refractory dielectric materials
US3236205A (en) * 1961-04-24 1966-02-22 Baird Atomic Inc High temperature furnace
US3180751A (en) * 1961-05-26 1965-04-27 Bausch & Lomb Method of forming a composite article
US3491720A (en) * 1965-07-29 1970-01-27 Monsanto Co Epitaxial deposition reactor
US3524426A (en) * 1968-02-29 1970-08-18 Libbey Owens Ford Glass Co Apparatus for coating by thermal evaporation
US3568632A (en) * 1969-03-24 1971-03-09 Gary F Cawthon Lens coating apparatus
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
US3641973A (en) * 1970-11-25 1972-02-15 Air Reduction Vacuum coating apparatus

Also Published As

Publication number Publication date
FR2262126B1 (en) 1976-12-31
US3921572A (en) 1975-11-25
FR2262126A1 (en) 1975-09-19
DE2460989A1 (en) 1975-08-28
JPS50116278A (en) 1975-09-11

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee