GB1422519A - Sputtering method and apparatus - Google Patents
Sputtering method and apparatusInfo
- Publication number
- GB1422519A GB1422519A GB1013475A GB1013475A GB1422519A GB 1422519 A GB1422519 A GB 1422519A GB 1013475 A GB1013475 A GB 1013475A GB 1013475 A GB1013475 A GB 1013475A GB 1422519 A GB1422519 A GB 1422519A
- Authority
- GB
- United Kingdom
- Prior art keywords
- maintained
- sputtering method
- sputtering
- telic
- gauss
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1422519 Sputtering apparatus TELIC CORP 21 March 1975 10134/75 Addition to 1420061 Heading C7F [Also in Division H1] The Specification reports the subject matter of the parent Specification with the additional disclosure that the working gas environment is maintained at a pressure of 10<SP>-2</SP> torr and below, and the magnetic field is maintained at 300 gauss and below in the described method and apparatus for sputtering material on to a target.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1013475A GB1422519A (en) | 1975-03-21 | 1975-03-21 | Sputtering method and apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1013475A GB1422519A (en) | 1975-03-21 | 1975-03-21 | Sputtering method and apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1422519A true GB1422519A (en) | 1976-01-28 |
Family
ID=9962144
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1013475A Expired GB1422519A (en) | 1975-03-21 | 1975-03-21 | Sputtering method and apparatus |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1422519A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2192196A (en) * | 1986-06-13 | 1988-01-06 | Balzers Hochvakuum | Process for the thermochemical surface treatment of materials in a reactive gas plasma |
GB2211861B (en) * | 1987-10-30 | 1992-01-29 | Pioneer Electronic Corp | Photomagnetic memory medium having a non-columnar structure |
-
1975
- 1975-03-21 GB GB1013475A patent/GB1422519A/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2192196A (en) * | 1986-06-13 | 1988-01-06 | Balzers Hochvakuum | Process for the thermochemical surface treatment of materials in a reactive gas plasma |
GB2192196B (en) * | 1986-06-13 | 1991-01-02 | Balzers Hochvakuum | Process for the thermochemical surface treatment of materials in a reactive gas plasma |
GB2211861B (en) * | 1987-10-30 | 1992-01-29 | Pioneer Electronic Corp | Photomagnetic memory medium having a non-columnar structure |
US5135819A (en) * | 1987-10-30 | 1992-08-04 | Pioneer Electronic Corporation | Photomagnetic memory medium having a non-columnar structure |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |