GB1411979A - Method of etching - Google Patents

Method of etching

Info

Publication number
GB1411979A
GB1411979A GB4244172A GB4244172A GB1411979A GB 1411979 A GB1411979 A GB 1411979A GB 4244172 A GB4244172 A GB 4244172A GB 4244172 A GB4244172 A GB 4244172A GB 1411979 A GB1411979 A GB 1411979A
Authority
GB
United Kingdom
Prior art keywords
metal layer
powder particles
sept
layer
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4244172A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Primary Products Ingredients Americas LLC
Original Assignee
Tate and Lyle Ingredients Americas LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tate and Lyle Ingredients Americas LLC filed Critical Tate and Lyle Ingredients Americas LLC
Publication of GB1411979A publication Critical patent/GB1411979A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/28—Processing photosensitive materials; Apparatus therefor for obtaining powder images
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0525—Patterning by phototackifying or by photopatterning adhesive
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0585—Second resist used as mask for selective stripping of first resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
    • H05K2203/1333—Deposition techniques, e.g. coating
    • H05K2203/1355—Powder coating of insulating material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)

Abstract

1411979 Photographic process A E STALEY Mfg CO 13 Sept 1972 [27 Sept 1971 (2)] 42441/72 Heading G2X [Also in Division B6] A photo-resist etching process comprises (1) imagewise exposing and powder developing a lightsensitive layer having an Rd (as defined) of 1.0 to 2.2 by the process of Specification 1296709, the light-sensitive layer being on a metal layer, (2) removing non-embedded powder particles, (3) fusing or sintering the embedded water-insoluble powder particles to metal layer by heating or by vapour treatment to form a stencil; and (4) etching through the metal layer in the areas unprotected by the fused water-insoluble powder particles.
GB4244172A 1971-09-27 1972-09-13 Method of etching Expired GB1411979A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18427271A 1971-09-27 1971-09-27
US18380271A 1971-09-27 1971-09-27

Publications (1)

Publication Number Publication Date
GB1411979A true GB1411979A (en) 1975-10-29

Family

ID=26879537

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4244172A Expired GB1411979A (en) 1971-09-27 1972-09-13 Method of etching

Country Status (4)

Country Link
JP (1) JPS4840642A (en)
DE (1) DE2247057A1 (en)
FR (1) FR2154644B1 (en)
GB (1) GB1411979A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50121639U (en) * 1974-03-19 1975-10-04
JPS5227719U (en) * 1975-08-20 1977-02-26
JPH0320591U (en) * 1989-07-07 1991-02-28

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2966429A (en) * 1956-08-31 1960-12-27 Gen Electric Method of and apparatus for making printed circuits
US3677756A (en) * 1970-09-21 1972-07-18 Staley Mfg Co A E Method of dry powder etching

Also Published As

Publication number Publication date
FR2154644A1 (en) 1973-05-11
JPS4840642A (en) 1973-06-14
DE2247057A1 (en) 1973-04-05
FR2154644B1 (en) 1976-05-21

Similar Documents

Publication Publication Date Title
BE830700A (en) METHOD AND DEVICE FOR PROCESSING INFORMATION FOR THE MANUFACTURE OF A PRINTING FORM
GB769090A (en) Method of producing a photograph in glass
PL192402A1 (en) METHOD OF PROCESSING WASTE FROM THE PROCESS OF MANUFACTURING DIPHENYLOLPROPANE
DK134641B (en) A method of making a metal oxide film and an apparatus for carrying out the method.
GB1411979A (en) Method of etching
DE2960276D1 (en) Light-sensitive photographic material, process for making it and its use for realising photographic images
GB2108693B (en) Silver halide photographic material for photo-mechanical process and reduction processing method thereof
GB1185666A (en) A Process for Producing Images
JPS5393822A (en) High contrast silver halide photosensitive material
JPS5357815A (en) Silver halide photographic material
JPS5320927A (en) Fogging component elimination method for photographic processing solution
GB1370695A (en) Reflective elements
JPS51114931A (en) Photoresist pattern formation method
GB1453253A (en) Photomasking method
JPS5222598A (en) Etching method of chromium oxide
IT8222953A0 (en) PROCESS FOR THE PRODUCTION OF HIGH RESOLUTION PHOTOGRAPHIC FILM.
GB1247973A (en) Photographic method for producing a metallic pattern with a metal resinate
JPS51118392A (en) Manuforcturing process for semiconductor unit
GB2090010B (en) Process for the development of photographic silver halide light-sensitive materials
JPS5350831A (en) Photographic processing method and device
FR2278096A1 (en) PROCESS FOR THE TREATMENT OF PHOTOGRAPHIC PHOTOSENSITIVE MATERIALS BASED ON SILVER HALOGENIDE
JPS51124380A (en) Photo mask
JPS5357832A (en) Photographic image formation
ES449318A1 (en) Radiation sensitive materials
JPS51115830A (en) Bias system electronic photograph developing method

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee