GB1328713A - Corpuscular beam scanning microscopes - Google Patents
Corpuscular beam scanning microscopesInfo
- Publication number
- GB1328713A GB1328713A GB3099871A GB3099871A GB1328713A GB 1328713 A GB1328713 A GB 1328713A GB 3099871 A GB3099871 A GB 3099871A GB 3099871 A GB3099871 A GB 3099871A GB 1328713 A GB1328713 A GB 1328713A
- Authority
- GB
- United Kingdom
- Prior art keywords
- diaphragm
- detector
- scattered
- zones
- inner region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2441—Semiconductor detectors, e.g. diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
- H01J2237/24465—Sectored detectors, e.g. quadrants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
1328713 Electron microscopes; ion beam apparatus MAX-PLANCK-GES ZUR FORDERUNG DER WISSENSCHAFTEN EV 2 July 1971 [31 Aug 1970] 30998/71 Heading H1D A corpuscular beam (electrons or ion) scanning microscope comprises a beam generator to project a beam via deflection system 5, 5<SP>1</SP>, 6, 6<SP>1</SP>, (or alternatively an em. system) to condenser lens 7 which focuses the beam on object 8 for transmission studies, a first diaphragm B, with a plurality of transmissive zones for dark field reproduction, and the combination of a second diaphragm B 2 and detector system, or a detector (Fig. 4, not shown) itself serving as the second diaphragm, the diaphragm or detector respectively having an inner region substantially complementary in its effect to that of the first diaphragm such that those beam components not scattered by the object are not incident upon the detector system, whereas scattered components incident within the inner region are detected, and the second diaphragm and/or detector system having an outer region surrounding the inner region, the surface area of which is larger than the total area of the active zones within the inner region. The output signal may be directed to a TV picture tube. The diaphragm regions are preferably annular and concentric and the outer region has a minimum width at least equal to half the minimum distance of the inner region periphery from the beam axis. The zone widths may be all equal and preferably the first diaphragm is a phase zoned diaphragm allowing only those components to pass to the object, which after traversing the condenser lens, have phases of the same sign, in which case, the closed zone width is preferably larger than the minimum, with correspondingly longer active zones in the second diaphragm and/or detector producing the same signal for reduced load on the object. To compensate for change in the image side apertural zone cone during scanning and penetration of non-scattered components, a second deflector system 10, 10<SP>1</SP> may be included. Non-scattered components may also be countered by making the closed zones of diaphragm B 2 wider than the open zones of B 1 . Preferably the first deflection beam is in two parts so that the redeflected beam intercepts the optical axis in the first diaphragm plane so that the beam always has the same position relative to the first diaphragm and the same condition is obtained for the second diaphragm and/or detector by arranging the zoned plates in co-ordinate planes. B 1 disposed in the condenser focal plane ensures the incident beam angle is constant irrespective of the object point being scanned. B 1 may correct astigmatism by non-circular zones or a stigmator used and may also be between the beam source and deflectors, within lens 7 or between lens 7 and object 8. In Fig. 3 (not shown), B 1 and B 2 are each twice the focal length from the lens 7 and of equal size but other image and object planes are possible. The zoned detectors of (Fig. 4) (not shown) may lead to one or different picture tubes, and electrons scattered at a particular angle may be selected. Detectors (11) to (15) may be reverse biased P-N devices. To improve quality of reproduction or study material composition, electrons of differing energies may be selected in particular non-elastically and elastically scattered electrons, by an electrostatic or magnetic velocity analysis (16) (Fig. 5, not shown).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19702043749 DE2043749C3 (en) | 1970-08-31 | 1970-08-31 | Scanning corpuscular beam microscope |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1328713A true GB1328713A (en) | 1973-08-30 |
Family
ID=5781510
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3099871A Expired GB1328713A (en) | 1970-08-31 | 1971-07-02 | Corpuscular beam scanning microscopes |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5435061B1 (en) |
DE (1) | DE2043749C3 (en) |
GB (1) | GB1328713A (en) |
NL (1) | NL7111783A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1197985A2 (en) * | 2000-10-12 | 2002-04-17 | Hitachi, Ltd. | Scanning charged-particle microscope |
JP2007207764A (en) * | 2007-02-26 | 2007-08-16 | Hitachi Ltd | Scanning charged-particle beam microscope |
WO2008152464A2 (en) * | 2007-06-11 | 2008-12-18 | C.N.R. Consiglio Nazionale Delle Ricerche | Detection device for electron microscope |
EP2511938A1 (en) * | 2009-12-07 | 2012-10-17 | Hitachi High-Technologies Corporation | Transmission electron microscope and test sample observation method |
WO2013133739A1 (en) * | 2012-03-06 | 2013-09-12 | Vg Scienta Ab | Analyser arrangement for particle spectrometer |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009016861A1 (en) | 2009-04-08 | 2010-10-21 | Carl Zeiss Nts Gmbh | particle beam |
DE102012007868A1 (en) * | 2012-04-19 | 2013-10-24 | Carl Zeiss Microscopy Gmbh | Transmission electron microscopy system |
-
1970
- 1970-08-31 DE DE19702043749 patent/DE2043749C3/en not_active Expired
-
1971
- 1971-07-02 GB GB3099871A patent/GB1328713A/en not_active Expired
- 1971-08-26 NL NL7111783A patent/NL7111783A/xx not_active Application Discontinuation
- 1971-08-31 JP JP6695571A patent/JPS5435061B1/ja active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1197985A2 (en) * | 2000-10-12 | 2002-04-17 | Hitachi, Ltd. | Scanning charged-particle microscope |
EP1197985A3 (en) * | 2000-10-12 | 2006-07-26 | Hitachi, Ltd. | Scanning charged-particle microscope |
JP2007207764A (en) * | 2007-02-26 | 2007-08-16 | Hitachi Ltd | Scanning charged-particle beam microscope |
WO2008152464A2 (en) * | 2007-06-11 | 2008-12-18 | C.N.R. Consiglio Nazionale Delle Ricerche | Detection device for electron microscope |
WO2008152464A3 (en) * | 2007-06-11 | 2009-04-02 | Consiglio Nazionale Ricerche | Detection device for electron microscope |
EP2511938A1 (en) * | 2009-12-07 | 2012-10-17 | Hitachi High-Technologies Corporation | Transmission electron microscope and test sample observation method |
EP2511938A4 (en) * | 2009-12-07 | 2014-03-12 | Hitachi High Tech Corp | Transmission electron microscope and test sample observation method |
WO2013133739A1 (en) * | 2012-03-06 | 2013-09-12 | Vg Scienta Ab | Analyser arrangement for particle spectrometer |
EP2851933A1 (en) | 2012-03-06 | 2015-03-25 | VG Scienta AB | Analyser arrangement for particle spectrometer |
US9437408B2 (en) | 2012-03-06 | 2016-09-06 | Scienta Omicron Ab | Analyser arrangement for particle spectrometer |
EP2851933B1 (en) * | 2012-03-06 | 2016-10-19 | Scienta Omicron AB | Analyser arrangement for particle spectrometer |
US9978579B2 (en) | 2012-03-06 | 2018-05-22 | Scienta Omicron Ab | Analyser arrangement for particle spectrometer |
Also Published As
Publication number | Publication date |
---|---|
JPS5435061B1 (en) | 1979-10-31 |
DE2043749A1 (en) | 1972-03-02 |
DE2043749C3 (en) | 1975-08-21 |
DE2043749B2 (en) | 1975-01-09 |
NL7111783A (en) | 1972-03-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |