GB1321640A - Vacuum metallising or vacuum coating - Google Patents
Vacuum metallising or vacuum coatingInfo
- Publication number
- GB1321640A GB1321640A GB1321640DA GB1321640A GB 1321640 A GB1321640 A GB 1321640A GB 1321640D A GB1321640D A GB 1321640DA GB 1321640 A GB1321640 A GB 1321640A
- Authority
- GB
- United Kingdom
- Prior art keywords
- valve
- vacuum
- opened
- chamber
- metallising
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Furnace Details (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1321640 Vapour deposition apparatus C J L HUNT 24 Feb 1972 [5 Dec 1970] 57886/70 Heading C7F [Also in Division F1] In a vapour deposition apparatus which may be e.g. of the type described in Specification 1321486 or a horizontal chamber type, air is exhausted from the deposition chamber through orifice 24 by the main rotary pumps 45, at about 0À5 mm. mercury, a valve 27 is closed, valve 48 opened and a valve 41 is opened to another orifice in the chamber, Fig. 1 (not shown) to connect it to a vacuum reservoir 38 kept under vacuum by oildiffusion pumps 39, 40. After deposition, the valve 41 is closed and valve 26 is opened to the atmosphere. The valve 41 is arranged to close, if there is any failure in the electrical, hydraulic or pneumatic systems. Aluminium may be deposited
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB5788670 | 1970-12-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1321640A true GB1321640A (en) | 1973-06-27 |
Family
ID=10480281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1321640D Expired GB1321640A (en) | 1970-12-05 | 1970-12-05 | Vacuum metallising or vacuum coating |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1321640A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0018690A1 (en) * | 1979-04-30 | 1980-11-12 | S.A. Glaceries de Saint-Roch | Vacuum deposition system and method |
EP0095369A2 (en) * | 1982-05-24 | 1983-11-30 | Varian Associates, Inc. | Air lock vacuum pumping methods and apparatus |
DE4401718C1 (en) * | 1994-01-21 | 1995-08-17 | Anke Gmbh & Co Kg | Method and appts. for treatment of workpieces in a vacuum atmosphere |
DE10245537A1 (en) * | 2002-09-30 | 2004-04-08 | Infineon Technologies Ag | Process and process reactor for sequential gas phase separation using a process and an auxiliary chamber |
DE202006007937U1 (en) * | 2006-05-18 | 2007-09-20 | Strämke, Siegfried, Dr.-Ing. | Plasma treatment plant |
-
1970
- 1970-12-05 GB GB1321640D patent/GB1321640A/en not_active Expired
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0018690A1 (en) * | 1979-04-30 | 1980-11-12 | S.A. Glaceries de Saint-Roch | Vacuum deposition system and method |
EP0095369A2 (en) * | 1982-05-24 | 1983-11-30 | Varian Associates, Inc. | Air lock vacuum pumping methods and apparatus |
EP0095369A3 (en) * | 1982-05-24 | 1985-12-04 | Varian Associates, Inc. | Air lock vacuum pumping methods and apparatus |
DE4401718C1 (en) * | 1994-01-21 | 1995-08-17 | Anke Gmbh & Co Kg | Method and appts. for treatment of workpieces in a vacuum atmosphere |
DE10245537A1 (en) * | 2002-09-30 | 2004-04-08 | Infineon Technologies Ag | Process and process reactor for sequential gas phase separation using a process and an auxiliary chamber |
WO2004031439A2 (en) * | 2002-09-30 | 2004-04-15 | Infineon Technologies Ag | Method and process reactor for sequential gas phase deposition by means of a process and an auxiliary chamber |
WO2004031439A3 (en) * | 2002-09-30 | 2004-11-04 | Infineon Technologies Ag | Method and process reactor for sequential gas phase deposition by means of a process and an auxiliary chamber |
DE10245537B4 (en) * | 2002-09-30 | 2007-04-19 | Infineon Technologies Ag | Process and process reactor for sequential vapor deposition by means of a process chamber and an auxiliary chamber |
DE202006007937U1 (en) * | 2006-05-18 | 2007-09-20 | Strämke, Siegfried, Dr.-Ing. | Plasma treatment plant |
US8969753B2 (en) | 2006-05-18 | 2015-03-03 | Siegfried Straemke | Plasma treatment installation |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |